EP0676792A3 - Ionentechnische Vorrichtung. - Google Patents

Ionentechnische Vorrichtung. Download PDF

Info

Publication number
EP0676792A3
EP0676792A3 EP95104594A EP95104594A EP0676792A3 EP 0676792 A3 EP0676792 A3 EP 0676792A3 EP 95104594 A EP95104594 A EP 95104594A EP 95104594 A EP95104594 A EP 95104594A EP 0676792 A3 EP0676792 A3 EP 0676792A3
Authority
EP
European Patent Office
Prior art keywords
technology device
ion technology
ion
technology
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP95104594A
Other languages
English (en)
French (fr)
Other versions
EP0676792A2 (de
Inventor
Waldemar Rauch
Davide Bassi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atomika Instruments GmbH
Original Assignee
Atomika Instruments GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atomika Instruments GmbH filed Critical Atomika Instruments GmbH
Publication of EP0676792A2 publication Critical patent/EP0676792A2/de
Publication of EP0676792A3 publication Critical patent/EP0676792A3/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/06—Electron- or ion-optical arrangements
    • H01J49/067—Ion lenses, apertures, skimmers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/147—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers with electrons, e.g. electron impact ionisation, electron attachment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1207—Einzel lenses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electron Tubes For Measurement (AREA)
EP95104594A 1994-04-05 1995-03-29 Ionentechnische Vorrichtung. Withdrawn EP0676792A3 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT70094 1994-04-05
AT700/94 1994-04-05

Publications (2)

Publication Number Publication Date
EP0676792A2 EP0676792A2 (de) 1995-10-11
EP0676792A3 true EP0676792A3 (de) 1996-01-10

Family

ID=3497513

Family Applications (1)

Application Number Title Priority Date Filing Date
EP95104594A Withdrawn EP0676792A3 (de) 1994-04-05 1995-03-29 Ionentechnische Vorrichtung.

Country Status (1)

Country Link
EP (1) EP0676792A3 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016110495B4 (de) * 2016-06-07 2018-03-29 Vacom Vakuum Komponenten & Messtechnik Gmbh Vorrichtung und Verfahren zum Erzeugen, Speichern und Freisetzen von Ionen aus einer umgebenden Restgasatmosphäre
NL2029253B1 (en) 2020-10-20 2025-03-04 Asml Netherlands Bv Residual gas analyser

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59230246A (ja) * 1983-06-14 1984-12-24 Shimadzu Corp 四重極形質量分析装置
EP0324247A2 (de) * 1988-01-11 1989-07-19 Eaton Corporation Verfahren und Vorrichtung zur Kontrolle der Oberflächenladung in der Ionen-Implantation
US4916311A (en) * 1987-03-12 1990-04-10 Mitsubishi Denki Kabushiki Kaisha Ion beaming irradiating apparatus including ion neutralizer
US5101105A (en) * 1990-11-02 1992-03-31 Univeristy Of Maryland, Baltimore County Neutralization/chemical reionization tandem mass spectrometry method and apparatus therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59230246A (ja) * 1983-06-14 1984-12-24 Shimadzu Corp 四重極形質量分析装置
US4916311A (en) * 1987-03-12 1990-04-10 Mitsubishi Denki Kabushiki Kaisha Ion beaming irradiating apparatus including ion neutralizer
EP0324247A2 (de) * 1988-01-11 1989-07-19 Eaton Corporation Verfahren und Vorrichtung zur Kontrolle der Oberflächenladung in der Ionen-Implantation
US5101105A (en) * 1990-11-02 1992-03-31 Univeristy Of Maryland, Baltimore County Neutralization/chemical reionization tandem mass spectrometry method and apparatus therefor

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 009, no. 106 (E - 313) 10 May 1985 (1985-05-10) *

Also Published As

Publication number Publication date
EP0676792A2 (de) 1995-10-11

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