EP0881987A4 - Silice pure fondue, four et procede de production - Google Patents

Silice pure fondue, four et procede de production

Info

Publication number: EP0881987A4
Authority: EP; European Patent Office
Prior art keywords: furnace; fused silica; pure fused; pure; silica
Prior art date: 1996-02-21
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Ceased

Application number

EP97905726A

Other languages

German (de)

English (en)

Other versions

EP0881987A1 (fr

Inventor

Robert S Pavlik Jr

Daniel R Sempolinski

Michael H Wasilewski

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Corning Inc

Original Assignee

Corning Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1996-02-21

Filing date

1997-02-11

Publication date

1999-05-12

1997-02-11 Application filed by Corning Inc filed Critical Corning Inc

1998-12-09 Publication of EP0881987A1 publication Critical patent/EP0881987A1/fr

1999-05-12 Publication of EP0881987A4 publication Critical patent/EP0881987A4/fr

Status Ceased legal-status Critical Current

Links

VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title 1
239000005350 fused silica glass Substances 0.000 title 1

Classifications

- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1407—Deposition reactors therefor
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
- C03B19/1492—Deposition substrates, e.g. targets
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/50—Multiple burner arrangements
- C03B2207/52—Linear array of like burners
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/50—Multiple burner arrangements
- C03B2207/54—Multiple burner arrangements combined with means for heating the deposit, e.g. non-deposition burner

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Organic Chemistry (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Ceramic Engineering (AREA)
Manufacturing & Machinery (AREA)
Structural Engineering (AREA)
Life Sciences & Earth Sciences (AREA)
General Chemical & Material Sciences (AREA)
Geochemistry & Mineralogy (AREA)
Glass Melting And Manufacturing (AREA)
Glass Compositions (AREA)

EP97905726A 1996-02-21 1997-02-11 Silice pure fondue, four et procede de production Ceased EP0881987A4 (fr)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US1199796P	1996-02-21	1996-02-21
US11997P		1996-02-21
PCT/US1997/001681 WO1997030933A1 (fr)	1996-02-21	1997-02-11	Silice pure fondue, four et procede de production

Publications (2)

Publication Number	Publication Date
EP0881987A1 EP0881987A1 (fr)	1998-12-09
EP0881987A4 true EP0881987A4 (fr)	1999-05-12

Family

ID=21752895

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
EP97905726A Ceased EP0881987A4 (fr)	1996-02-21	1997-02-11	Silice pure fondue, four et procede de production

Country Status (3)

Country	Link
EP (1)	EP0881987A4 (fr)
JP (1)	JP2000505036A (fr)
WO (1)	WO1997030933A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR100574123B1 (ko) *	1997-09-24	2006-04-25	코닝 인코포레이티드	용융 실리카-티타니아 유리의 제조방법
US6410192B1 (en)	1999-11-15	2002-06-25	Corning Incorporated	Photolithography method, photolithography mask blanks, and method of making
JP2001342026A (ja) *	2000-05-30	2001-12-11	Tosoh Quartz Corp	石英ガラスの製造方法及び製造装置
JP2004516214A (ja) *	2000-12-21	2004-06-03	コーニングインコーポレイテッド	溶融シリカ製造炉のための耐火物
JP5792317B2 (ja) *	2010-12-02	2015-10-07	サン−ゴバンセラミックスアンドプラスティクス，インコーポレイティド	ジルコン耐火製品を処理する方法
JP2018518444A (ja) *	2015-06-10	2018-07-12	コーニングインコーポレイテッド	ガラスから金属付着物を除去する方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CA936790A (en) *	1971-03-31	1973-11-13	J. Kriegler Rudolph	Sio2 structure having resistance to mobile ion contaminates and method for obtaining same
US5395413A (en) *	1993-04-16	1995-03-07	Corning Incorporated	Method for producing fused silica with low sodium ion contamination level

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2272342A (en) *	1934-08-27	1942-02-10	Corning Glass Works	Method of making a transparent article of silica
US2239551A (en) *	1939-04-22	1941-04-22	Corning Glass Works	Method of making sealing glasses and seals for quartz lamps
JPS54134721A (en) *	1978-04-11	1979-10-19	Nippon Telegraph & Telephone	Manufacture of anhydrous glass parent material for optical fiber
JPS54160414A (en) *	1978-06-08	1979-12-19	Nippon Telegraph & Telephone	Production of optical communication fiber material
JPS6046940A (ja) *	1983-08-22	1985-03-14	Furukawa Electric Co Ltd:The	光学系ガラス母材の製造方法とその装置
DE3836934A1 (de) *	1988-10-29	1990-05-03	Heraeus Schott Quarzschmelze	Verfahren zum reinigen von teilchenfoermigem siliziumdioxid
US5043002A (en) *	1990-08-16	1991-08-27	Corning Incorporated	Method of making fused silica by decomposing siloxanes

1997
- 1997-02-11 WO PCT/US1997/001681 patent/WO1997030933A1/fr not_active Ceased
- 1997-02-11 JP JP9530179A patent/JP2000505036A/ja not_active Ceased
- 1997-02-11 EP EP97905726A patent/EP0881987A4/fr not_active Ceased

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CA936790A (en) *	1971-03-31	1973-11-13	J. Kriegler Rudolph	Sio2 structure having resistance to mobile ion contaminates and method for obtaining same
US5395413A (en) *	1993-04-16	1995-03-07	Corning Incorporated	Method for producing fused silica with low sodium ion contamination level

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO9730933A1 *

Also Published As

Publication number	Publication date
EP0881987A1 (fr)	1998-12-09
JP2000505036A (ja)	2000-04-25
WO1997030933A1 (fr)	1997-08-28

Legal Events

Date	Code	Title	Description
1998-10-23	PUAI	Public reference made under article 153(3) epc to a published international application that has entered the european phase	Free format text: ORIGINAL CODE: 0009012
1998-12-09	17P	Request for examination filed	Effective date: 19980902
1998-12-09	AK	Designated contracting states	Kind code of ref document: A1 Designated state(s): DE FR GB NL
1999-03-03	RIN1	Information on inventor provided before grant (corrected)	Inventor name: WASILEWSKI, MICHAEL, H. Inventor name: SEMPOLINSKI, DANIEL, R. Inventor name: PAVLIK, ROBERT, S., JR.
1999-05-12	A4	Supplementary search report drawn up and despatched	Effective date: 19990330
1999-05-12	AK	Designated contracting states	Kind code of ref document: A4 Designated state(s): DE FR GB NL
1999-06-02	RA4	Supplementary search report drawn up and despatched (corrected)	Effective date: 19990415
2000-03-01	17Q	First examination report despatched	Effective date: 20000114
2005-08-12	STAA	Information on the status of an ep patent application or granted ep patent	Free format text: STATUS: THE APPLICATION HAS BEEN REFUSED
2005-09-28	18R	Application refused	Effective date: 20050509

Publication	Publication Date	Title
AU733795C (en)	2002-02-07	Heating furnace tube, method of using the same, and method of manufacturing the same
GB2317611B (en)	2000-06-21	Heat-resistant glass composition
GB9609379D0 (en)	1996-07-10	Mechanism and method
AU4847597A (en)	1998-06-25	Furnace gas pyrometer
GB9821106D0 (en)	1998-11-18	Silica glass composition and method for manufacturing silica glass using the same
EP1030822A4 (fr)	2004-12-15	PROCEDE DE PRODUCTION DE VERRE DE SiO2-TiO2 FONDUE
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