EP0938251A2 - Dispositif de production d'un faisceau d'atomes ou de radicales - Google Patents

Dispositif de production d'un faisceau d'atomes ou de radicales Download PDF

Info

Publication number: EP0938251A2
Authority: EP; European Patent Office
Prior art keywords: tube; heating; heating wire; gas; outlet opening
Prior art date: 1998-02-18
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

EP99102070A

Other languages

German (de)

English (en)

Other versions

EP0938251A3 (fr

EP0938251B1 (fr

Inventor

Karl G. Dr. Tschersich

Johannes Fleischhauer

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Forschungszentrum Juelich GmbH

Original Assignee

Forschungszentrum Juelich GmbH

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1998-02-18

Filing date

1999-02-02

Publication date

1999-08-25

1999-02-02 Application filed by Forschungszentrum Juelich GmbH filed Critical Forschungszentrum Juelich GmbH

1999-08-25 Publication of EP0938251A2 publication Critical patent/EP0938251A2/fr

2002-04-17 Publication of EP0938251A3 publication Critical patent/EP0938251A3/fr

2003-07-23 Application granted granted Critical

2003-07-23 Publication of EP0938251B1 publication Critical patent/EP0938251B1/fr

2019-02-02 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
- H05H3/02—Molecular or atomic-beam generation, e.g. resonant beam generation

Definitions

the present invention relates to a device for Generation of a beam of atoms or radicals thermal dissociation of a gas, with a pipe, the can be connected to a gas source at one end and has a gas outlet opening at its other end, and a heater to heat the pipe.
This type of heating by electron bombardment has although the advantage that a relatively large heating capacity can be applied to the pipe.
it is associated with the disadvantage that to generate the voltage between the filament and the tube Filament near earth potential and the tube on positive Must be high voltage.
the accelerated towards the pipe Electrons therefore have sufficient energy near the tube for a shock ionization of the gas outlet opening the pipe emerging gas and the residual gas.
the resulting positive ions are from the tube accelerated away, whereby they can cross the atomic beam and then an unwanted impurity because of its high energy of the atomic beam.
the object of the invention is therefore to provide a device for Generation of a beam of atoms or radicals thermal dissociation of a gas of the aforementioned Kind so that contamination of the atomic beam largely avoided and at the same time the Effort for electrical supply and electrical Isolation is low.
the Heating device at least one heating wire for heating of the tube by heat radiation and the Heating wire under the pipe in the area of the gas outlet Making an electrical contact touched in the rest but surrounds by a distance.
the invention heating the pipe to that for thermal dissociation temperature of a gas not as in State of the art through electron bombardment but through heat radiation. This allows the use disadvantages associated with electron bombardment a shock ionization of the emerging from the mouth Gas through the accelerated electrons respectively avoided the need for an electron reflector become.
the Heating wire for example, helical can be in the area of the gas outlet opening in at least one turn ends, the narrow turn that Tube surrounds and abuts this to an electrical To make contact with this.
the pipe serves as a support for the heating wire in the area of the Gas outlet opening, which can be prevented the heating wire deforms in the hot state in such a way that in the area where it surrounds the pipe at a distance a short circuit to the tube takes place, through which then Parts of the heating wire no longer flow through the current would.
a short circuit to heat reflectors such as Radiation sheets that form the tube and the Area can surround the heating wire to the from Heating wire to effectively use ohmic heat. The risk of such a short circuit was particularly great then exist if in deviation from the described Design of the heating wire never touch the pipe would and completely isolated from this would be built up.
an inventive Device for generating a beam of atoms or radicals by thermal dissociation of one Gases shown.
this device used to generate hydrogen gas by exposure to heat to decompose and so a stream of hydrogen atoms form.
Thermal dissociation is achieved by the gas to be dissociated passed through a pipe 1 and thereby to a temperature leading to the decomposition of the gas, which can be in the range from 1500 to 2500 K,
the device has a tube 1 on, which is connected at one end to a gas line 2 and a gas outlet opening at its other end 3 has.
the tube 1 has in the illustrated Embodiment a length of 64 mm and one Inside diameter of about one mm.
a resistance heater trained heater 4 is provided.
This Heating device 4 includes a helical heating wire 5 from a tungsten material that surrounds the tube 1 and about is arranged coaxially to this.
the heating wire 5 has Compared to tube 1, a large stretched length of about 300 mm and has a diameter of 0.5 mm.
On his one end facing the gas outlet opening 3 runs Heating wire 5 in two narrow turns 5a, which on the tube 1 contact and form an electrical contact with it, and at its other end the heating wire 5 is insulated attached in a holder 7 and via an electrical Line 8 connected to a voltage source.
the tube 1 supports the heating wire 5 and prevents that it deforms so much when hot, that on the one hand between the two narrow turns 5a and the holder 7, a short circuit from the heating wire 5 to Forms tube 1, which would result in the heating current being direct drain over the pipe 1 and no further through the Heating wire 5 would flow up to the narrow turns 5a, or that on the other hand there is a short circuit between the Heating wire 5 and other components forms.
This danger would exist especially if both ends of the Heating wire isolated from that surrounded by radiation plates 6 Room would be led out.
the tube 1 and the heating wire 5 of heat reflectors in the form of a package of Radiation plates 6 surround that by the heating wire 5 after reflect heat emitted outside back to tube 1, around the heat developed by the heating coil 5 effectively to use.
a housing is located outside the radiation plates 6 9, which is designed as a cylindrical copper jacket and with a water cooling 10 indicated only schematically connected is.
the radiation sheets are in the housing 9 6 by a component 11 made of a material with higher temperature resistance exists, held.
a bracket 12 is provided which gas line end of the tube 1 carries and not shown screws against the water-cooled body is tightened and sealed.
the heating coil 5 with a heating power of 150 watts by a heating voltage of 13 volts and a heating current of 11.5 amps is reached.
a tube temperature of approximately 2200 K can be achieved, which is sufficient to hydrogen to dissociate.
the Spiral temperature at 2350 K and thus only 150 K above the Pipe temperature is.
a slight overtemperature of the Heating wire compared to the temperature of the tube is cheap for a low tungsten evaporation rate from that Heating wire 5 and a long service life of the heating wire.

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Physical Or Chemical Processes And Apparatus (AREA)
Particle Accelerators (AREA)
Resistance Heating (AREA)
Heat Treatment Of Strip Materials And Filament Materials (AREA)

EP99102070A 1998-02-18 1999-02-02 Dispositif de production d'un faisceau d'atomes ou de radicales Expired - Lifetime EP0938251B1 (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE19806692A DE19806692C2 (de)	1998-02-18	1998-02-18	Vorrichtung zur Erzeugung eines Strahls von Atomen oder Radikalen
DE19806692		1998-02-18

Publications (3)

Publication Number	Publication Date
EP0938251A2 true EP0938251A2 (fr)	1999-08-25
EP0938251A3 EP0938251A3 (fr)	2002-04-17
EP0938251B1 EP0938251B1 (fr)	2003-07-23

Family

ID=7858114

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
EP99102070A Expired - Lifetime EP0938251B1 (fr)	1998-02-18	1999-02-02	Dispositif de production d'un faisceau d'atomes ou de radicales

Country Status (3)

Country	Link
US (1)	US6191416B1 (fr)
EP (1)	EP0938251B1 (fr)
DE (2)	DE19806692C2 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN110290628A (zh) *	2019-07-02	2019-09-27	郑州大学	一种用于超高真空环境下的原子发生装置
CN113398852A (zh) *	2021-06-21	2021-09-17	许昌学院	一种板式塔的内调温装置

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE10047042C2 (de) *	2000-09-22	2002-08-01	Forschungszentrum Juelich Gmbh	Verfahren und Vorrichtung zur Herstellung von wasserstoffhaltigen Si¶1¶¶-¶¶x¶C¶x¶:H-Schichten
US7750654B2 (en) *	2002-09-02	2010-07-06	Octec Inc.	Probe method, prober, and electrode reducing/plasma-etching processing mechanism
CN105376923B (zh) *	2015-11-12	2018-03-09	华中科技大学	一种能提高原子束密度的原子发生器
CN105430864B (zh) *	2015-11-12	2017-12-12	华中科技大学	一种原子发生器
US20180019169A1 (en) *	2016-07-12	2018-01-18	QMAT, Inc.	Backing substrate stabilizing donor substrate for implant or reclamation
CN114710871A (zh) *	2022-02-25	2022-07-05	华南师范大学	一种用于产生高准直度原子束流的内加热超高温装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4783595A (en) *	1985-03-28	1988-11-08	The Trustees Of The Stevens Institute Of Technology	Solid-state source of ions and atoms
US4878989A (en) *	1986-11-26	1989-11-07	Texas Instruments Incorporated	Chemical beam epitaxy system
US5541407A (en) *	1992-09-24	1996-07-30	The United States Of America As Represented By The Secretary Of Commerce	Arsenic atom source
US5693173A (en) *	1994-12-21	1997-12-02	Chorus Corporation	Thermal gas cracking source technology

1998
- 1998-02-18 DE DE19806692A patent/DE19806692C2/de not_active Expired - Fee Related
1999
- 1999-02-02 EP EP99102070A patent/EP0938251B1/fr not_active Expired - Lifetime
- 1999-02-02 DE DE59906316T patent/DE59906316D1/de not_active Expired - Lifetime
- 1999-02-18 US US09/252,349 patent/US6191416B1/en not_active Expired - Lifetime

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN110290628A (zh) *	2019-07-02	2019-09-27	郑州大学	一种用于超高真空环境下的原子发生装置
CN110290628B (zh) *	2019-07-02	2021-03-30	郑州大学	一种用于超高真空环境下的原子发生装置
CN113398852A (zh) *	2021-06-21	2021-09-17	许昌学院	一种板式塔的内调温装置
CN113398852B (zh) *	2021-06-21	2023-03-28	许昌学院	一种板式塔的内调温装置

Also Published As

Publication number	Publication date
DE19806692A1 (de)	1999-08-26
DE59906316D1 (de)	2003-08-28
EP0938251A3 (fr)	2002-04-17
DE19806692C2 (de)	2000-03-30
US6191416B1 (en)	2001-02-20
EP0938251B1 (fr)	2003-07-23

Legal Events

Date	Code	Title	Description
1999-07-09	PUAI	Public reference made under article 153(3) epc to a published international application that has entered the european phase	Free format text: ORIGINAL CODE: 0009012
1999-08-25	AK	Designated contracting states	Kind code of ref document: A2 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE Kind code of ref document: A2 Designated state(s): CH DE FR GB IT LI
1999-08-25	AX	Request for extension of the european patent	Free format text: AL;LT;LV;MK;RO;SI
2002-03-02	PUAL	Search report despatched	Free format text: ORIGINAL CODE: 0009013
2002-04-17	AK	Designated contracting states	Kind code of ref document: A3 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
2002-04-17	AX	Request for extension of the european patent	Free format text: AL;LT;LV;MK;RO;SI
2002-07-10	RAP1	Party data changed (applicant data changed or rights of an application transferred)	Owner name: FORSCHUNGSZENTRUM JUELICH GMBH
2002-11-06	17P	Request for examination filed	Effective date: 20020821
2003-01-08	AKX	Designation fees paid	Free format text: CH DE FR GB IT LI
2003-06-03	GRAH	Despatch of communication of intention to grant a patent	Free format text: ORIGINAL CODE: EPIDOS IGRA
2003-06-06	GRAA	(expected) grant	Free format text: ORIGINAL CODE: 0009210
2003-07-23	AK	Designated contracting states	Designated state(s): CH DE FR GB IT LI
2003-07-23	REG	Reference to a national code	Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH
2003-07-31	REG	Reference to a national code	Ref country code: CH Ref legal event code: EP
2003-08-20	REG	Reference to a national code	Ref country code: IE Ref legal event code: FG4D Free format text: GERMAN
2003-08-28	REF	Corresponds to:	Ref document number: 59906316 Country of ref document: DE Date of ref document: 20030828 Kind code of ref document: P
2003-09-10	GBT	Gb: translation of ep patent filed (gb section 77(6)(a)/1977)
2004-02-25	REG	Reference to a national code	Ref country code: IE Ref legal event code: FD4D
2004-04-02	ET	Fr: translation filed
2004-05-28	PLBE	No opposition filed within time limit	Free format text: ORIGINAL CODE: 0009261
2004-05-28	STAA	Information on the status of an ep patent application or granted ep patent	Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT
2004-07-14	26N	No opposition filed	Effective date: 20040426
2012-06-29	PGFP	Annual fee paid to national office [announced via postgrant information from national office to epo]	Ref country code: IT Payment date: 20120223 Year of fee payment: 14
2013-04-30	PGFP	Annual fee paid to national office [announced via postgrant information from national office to epo]	Ref country code: FR Payment date: 20130315 Year of fee payment: 15 Ref country code: CH Payment date: 20130220 Year of fee payment: 15 Ref country code: GB Payment date: 20130219 Year of fee payment: 15
2014-04-30	PGFP	Annual fee paid to national office [announced via postgrant information from national office to epo]	Ref country code: DE Payment date: 20140121 Year of fee payment: 16
2014-09-30	REG	Reference to a national code	Ref country code: CH Ref legal event code: PL
2014-10-29	GBPC	Gb: european patent ceased through non-payment of renewal fee	Effective date: 20140202
2014-10-31	PG25	Lapsed in a contracting state [announced via postgrant information from national office to epo]	Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20140228 Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20140228
2014-11-21	REG	Reference to a national code	Ref country code: FR Ref legal event code: ST Effective date: 20141031
2015-01-30	PG25	Lapsed in a contracting state [announced via postgrant information from national office to epo]	Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20140228 Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20140202
2015-09-01	REG	Reference to a national code	Ref country code: DE Ref legal event code: R119 Ref document number: 59906316 Country of ref document: DE
2016-01-29	PG25	Lapsed in a contracting state [announced via postgrant information from national office to epo]	Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20150901
2016-06-30	PG25	Lapsed in a contracting state [announced via postgrant information from national office to epo]	Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20140202

Publication	Publication Date	Title
EP0938251B1 (fr)	2003-07-23	Dispositif de production d'un faisceau d'atomes ou de radicales
DE60108504T2 (de)	2005-12-29	Kathodenanordnung für eine indirekt geheizte kathode einer ionenquelle
DE69013720T2 (de)	1995-06-01	Vakuumschalter.
EP1527477B1 (fr)	2006-05-24	Lampe electrique a incandescence
WO2002082871A1 (fr)	2002-10-17	Procede et dispositif de production de rayonnement ultraviolet extreme/rayonnement x mou
DE2718166A1 (de)	1977-11-10	Elektrische anordnung mit einem als entladungsrohr ausgefuehrten schalter
EP1228668A1 (fr)	2002-08-07	Chauffage par rayonnement a haut pouvoir de rayonnement infrarouge destine a des chambres de traitement
DE2527609C3 (de)	1985-10-24	Ionenquelle
DE2525401A1 (de)	1976-01-02	Strahlungsquelle hoher intensitaet
EP1654914B1 (fr)	2009-03-25	Generateur de rayons ultraviolets extremes et de rayons x mous
DE102014110685A1 (de)	2015-09-17	Blitzlampenanordnung
DE2412997A1 (de)	1975-09-11	Ultraviolett-strahlungsquelle
DE68909036T2 (de)	1994-03-10	Heizgerät für sehr hohe temperaturen.
DE658480C (de)	1938-04-04	Entladungsroehre mit zwei Gasen, von denen das eine leichter ionisierbar ist als das andere, und mit Hohlkathode
DE2112888A1 (de)	1972-09-07	Hochfrequenz-Induktionsplasmabrenner
DE734793C (de)	1943-04-24	Elektrisch mittels Glimmentladung beheizter Fluessigkeitserhitzer
DE4432982C2 (de)	1998-07-09	Vorrichtung zum Bestrahlen von Oberflächen mit Elektronen
DE2558314C2 (de)	1978-02-23	Vorrichtung zum Verbinden von zwei Thermodrähten eines Thermoelements mittels Lichtbogenschweißung unter Schutzgas
DE693547C (de)	1940-07-13	Roentgenroehrenanordnung
DE1565898C (de)	1972-04-27	Verfahren und Gerat zum dichten Verschließen des Endes eines rohrförmigen Metallgehauses, welches Thermoelement drahte umgibt
AT159296B (de)	1940-08-10	Elektrische Heizeinrichtung.
DE2633424C2 (de)	1978-06-08	Vorrichtung zur Wärmebehandlung eines Werkstückes im Plasma einer Glimmentladung
DE506448C (de)	1930-09-03	Verfahren zum Entgasen von in einem hoch evakuierten Gehaeuse eingeschlossenen Kontakten
DE102009057903B4 (de)	2013-05-02	Hochtemperaturgasverdampfungsvorrichtung und Verfahren zur Hochtemperaturgasverdampfung
DE715876C (de)	1942-01-08	Elektrische Niederdruckleuchtroehre mit entladungsbeheizter Gluehelektrode und Verfahren zur Herstellung der Elektrode