EP0943698A2 - Procédé et appareil pour le transport de substrats cylindriques - Google Patents

Procédé et appareil pour le transport de substrats cylindriques Download PDF

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Publication number
EP0943698A2
EP0943698A2 EP98122276A EP98122276A EP0943698A2 EP 0943698 A2 EP0943698 A2 EP 0943698A2 EP 98122276 A EP98122276 A EP 98122276A EP 98122276 A EP98122276 A EP 98122276A EP 0943698 A2 EP0943698 A2 EP 0943698A2
Authority
EP
European Patent Office
Prior art keywords
coating
substrates
during
source
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP98122276A
Other languages
German (de)
English (en)
Inventor
Tomas Baumecker
Helmut Dr. Grimm
Jürgen Henrich
Klaus Dr. Michael
Gert Rödling
Jürgen Ulrich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leybold Systems GmbH
Original Assignee
Leybold Systems GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Systems GmbH filed Critical Leybold Systems GmbH
Publication of EP0943698A2 publication Critical patent/EP0943698A2/fr
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Definitions

  • the invention relates to a method and a device for even coating of cylindrical shaped substrates with layer material, which consists of a cloud of material on the substrates is deposited, the ones to be coated Substrates are introduced into the material cloud.
  • the invention is therefore based on the object a method of the type described above to indicate at which the coating of large Series of substrates that have a multi-surface Have surface without interrupting the coating process for the reduction of those to be coated Substrate areas is made possible.
  • Farther is to be a device for coating Substrates are created, by means of which the task-based procedures can be carried out.
  • the procedural task is solved according to the invention in that the to be coated Substrates for depositing the layer material are brought into the material cloud, wherein the coating process is at least two one Coating cycle forming one another in time includes the following coating phases. While the one, preferably the first coating phase the individual substrate thus becomes a coating source spatially aligned that in essentially coated its cylindrical surface becomes. During the other, preferably the The second coating phase is the substrate a coating source so spatially oriented, that essentially at least one cylinder bottom of the substrate is coated. Through the different orientation of the substrate during of the two coating phases Substrate evenly in the side and bottom area covered with a coherent surface layer.
  • the first and second coating phases take place immediately in the coating chamber one after the other without the coating chamber for Reposition the substrates between the two Coating phases is ventilated.
  • the procedure is complete Coating of the substrate is therefore advantageous in shortest possible time, which means the entire coating process be carried out inexpensively can. This advantage is particularly important when coating a large number of substrates is.
  • the method according to the invention is designed in particular with the features of claim 2 inexpensively, namely by placing the substrates during the first and second coating phases the same coating source can be coated.
  • This has the advantage that only one coating source What is needed is what makes the process inexpensive makes.
  • According to the features of the claim 3 become the substrates during the coating cycle at a constant distance from the or move along the coating sources. This measure ensures that each single substrate in the same way the material cloud is suspended and the layer application on the substrates from different positions of the substrates in relation to the coating source (s) is dependent. Because the emission the cloud of material from the coating source not isotropic takes place through this Characteristic in particular different layer thicknesses also due to the spatial density differences advantageously completely balanced in the material cloud.
  • the first coating phase is also proposed with the second coating phase interchange (claim 4), whereby the coating process of the inventive method in is flexible to handle as desired.
  • the substrates are transported using a conveyor belt, at which preferably at an equidistant distance individual substrate holding devices each with individually pivotable gripping devices are provided in front of the one or more coating sources method.
  • a conveyor belt extends the conveyor belt over a transport route, along which the substrates are transported.
  • An endless conveyor belt is provided as the conveyor belt to use, which is along a in a returning, closed transport route extends.
  • the transport route of the substrates in the coating chamber is so according to claim 6 chosen that the substrates during the one coating phase the material cloud in opposite Direction of transport to the direction of transport of the substrates during the assigned other coating phase run through.
  • the second coating phase at a different distance from the coating source and on that from the coating source opposite side of the other, preferably the first coating phase Arranged substrates. Because of the distance-dependent The density of the material cloud will be Coating material with different distance-dependent Rate deposited on the substrate, whereby different in the desired manner thick layers are generated.
  • the layer thicknesses on the different Substrate areas can also use the process features be set according to claim 10 by the substrates during the one coating phase partly through the other coating phase continuous substrates shielded become. According to the set degree of coordination can thus be the effective Coating times and thus layer thicknesses for the different coating surfaces of the substrate can be selected.
  • SiO 2 -containing layers are optically transparent and block the passage of gaseous and / or liquid substances.
  • Such layers are z. B. generated by means of evaporator sources and / or sputter cathode sources (see claim 12).
  • Such barrier layers are preferably deposited on plastic substrates, in particular plastic containers, which, for. B. serve as beverage-receiving bottles. The barrier layer is intended to prevent the gases dissolved in the beverage liquid, such as. B. CO 2 , escape from the container volume.
  • a device is used to carry out the method according to claim 13, which at least a coating chamber, preferably a vacuum coating chamber, as well as a coating source includes, proposed.
  • a coating chamber preferably a vacuum coating chamber, as well as a coating source includes, proposed.
  • the vacuum coating chamber is a conveyor belt, preferably an endless conveyor belt for transporting the Substrates arranged along a transport route.
  • the along the transport route with the conveyor belt substrates conveyed on holding devices are generated by a coating source Cloud of material moves.
  • the conveyor belt passes through the material cloud during one, preferably a first coating phase in a preferred direction, the substrates with their area to be coated to the coating source are oriented towards it.
  • a second coating phase such as the coating source Continuously oriented transport route that the Layer material essentially on this Area. This goes through Substrate one the transport route of the first coating phase opposite transport route.
  • the coating device shown in FIG. 1 for coating cylindrical substrates 10-23, 28, 29 essentially consists of a coating chamber 2 and a transfer chamber 7, which is assigned on the end face, through which the substrates 10-23, 28, 29 to be coated pass from a lock 4 can be transported into the coating chamber 2.
  • the interior of the coating chamber 2 can be pumped down to a maximum negative pressure of 10 -3 mbar - 10 -6 mbar, which is typical for vacuum-assisted coating processes, by means of known vacuum pump arrangements, not shown in the drawings, via pump nozzles on the coating chamber.
  • the pressure difference between the one higher pressure, e.g. B. normal pressure outside space 3 and the interior of the coating chamber 2 is maintained via the atmospheric sealing lock chamber 4.
  • the substrates 10-23, 28, 29 to be coated are continuously brought into the lock 4 in not shown, preferably individual lock chambers in the direction of rotation R S to the removal device 6, which removes the substrates from the lock chambers.
  • a plurality of grippers 5 rotating about an axis 26 in the direction of rotation R B are arranged in the removal device 6.
  • the rotational speed of the individual grippers 5 corresponds to the rotational speed of the substrates 10-23, 28, 29 brought up in the lock 4.
  • the substrates 10-23, 28, 29 are gripped by the grippers 5 and discharged from the lock chambers. Subsequently, the substrates 10-23, 28, 29 are introduced into the transport path of a conveyor belt 9 (see FIGS.
  • the substrates 10-23, 28, 29 used in the transport closure devices 24 are first moved on the conveyor belt 9 parallel to the coating sources 50a, b, c, d arranged in the coating chamber 2 in the transport direction T 1 (see FIGS. 1,5,6) .
  • the substrates 10-23, 28, 29 pass through the material clouds 41, 42, 43, 47 generated by the coating sources 50a, b, c, d, which, as shown in FIGS. 3 and 7, are essentially individual, however partially overlapping evaporation lobes are formed, which have the spatial extent along the trajectories W 1 , W 2 , W 3 , W 4 .
  • the conveyor belt 9 runs through the coating chamber 2 in two horizontally running planes, the transport directions T 1 , T 2 , T 3 , T 4 within the same transport plane over the Reverse the longitudinal direction of the coating chamber 2.
  • a substrate 10-23, 28, 29 to be coated runs through four transport directions, namely the same direction T 1 and T 3 as well as the opposite direction T 2 and T 4 in the direction sequence T 1 -T 2 -T 3 -T 4 .
  • the transport path of an individual substrate 10, which is shown in FIGS. 1, 2 and 5, is followed as an example.
  • the substrate 10 is first pivoted by means of the pivotable transport closures by approximately 120 ° counterclockwise in the figure view of FIG. 2 in the pivot direction S 1 . 3 and 7, the substrate 11 passes through the coating chamber 2 in the longitudinal direction, the substrate 11 essentially with its outer surface facing the coating sources 50a, b, c, d (see FIGS. 3, 7, 8). is aligned.
  • the z. B. between the trajectories W 1 and W 2 see Fig. 3.7) expanding coating lobe detects the substrate 11 and coats it almost exclusively on the side region.
  • the substrates 10-23, 28, 29 are rotated about their longitudinal axis during the entire coating cycle, as a result of which the container circumference corresponds to the coating sources 50a, b, c , d is turned evenly.
  • the substrate 12 After completion of this first coating phase along the transport direction T 1 , the substrate 12, which is now only coated in the side area, is pivoted from its 120 ° position into a horizontal position (see FIG. 4) and the transport path T 1 is turned over a turning device (31, 32a, 37 , 69a, 70a) deflected in the opposite direction T 2 . Then the horizontally stored substrates 13 are transferred to a vertical substrate position 14, 15. The substrates 14, 15 are now aligned with their base surface to be coated to the coating sources 50a, b, c, d, as a result of which the layer material essentially deposits on the substrate base.
  • the transport path T 2 of this second coating phase leads to a 360 ° turning station with a rack wheel 68a, in which the substrates 16, 17 (see FIG. 1, 2) are fed to a third coating section with a transport direction T 3 , which initiates a second coating cycle .
  • the substrates 18, 21 pass through the transport path in the transport direction T 3 and are transported parallel to the substrates 14, 15 passing through the second coating section and the substrate base is coated.
  • the substrates 10-23, 28, 29 in turn via a further turning device 30.32b, 34.36.69b, 70b in reversed their direction of movement.
  • the substrates as shown in Figs. 5 and 7, from its vertical position to the 120 ° inclined position pivoted to with the substrates 21,22 their cylindrical surface to the coating sources 50a, b, c, d.
  • this fourth coating phase the now completely coated substrates 22, 23 of the transfer device 8 in the transfer chamber 7 fed. Analogous to when removing the Substrates 10-23,28,29 from the lock chambers the substrates are removed from the conveyor belt by means of grippers 5 9 into the lock chambers of the lock device 4 passed and by means of this in the Atmospheric exterior space 1 passed. The whole Substrate transport and the coating process take place continuously.
  • the conveyor belt 9 is at the four turning stations each from a concentric to an associated one Deflection wheel arranged drive wheel 68a, 68b, 69a, 69b, which each have a Coupling having drive axle 36, 37, 66, 67 34, 35, 64, 65, which have a gear 32a, 32b, 62.63 is rotated by a motor 30,31,60,61.
  • the drive wheels 68a, 68b, 69a, 69b are preferably designed as pinwheel wheels, which with appropriate attached to the conveyor belt 9 Interacting feed elements.
  • the drive devices of the conveyor belt 9 are axially parallel and opposite each other in relation to the longitudinal symmetry planes the coating chamber 2 in each end the coating chamber 2 arranged turning devices intended.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Spray Control Apparatus (AREA)
EP98122276A 1998-02-19 1998-11-24 Procédé et appareil pour le transport de substrats cylindriques Withdrawn EP0943698A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19807032A DE19807032A1 (de) 1998-02-19 1998-02-19 Verfahren und Vorrichtung zum Transportieren zu beschichtender zylindrischer Substrate
DE19807032 1998-02-19

Publications (1)

Publication Number Publication Date
EP0943698A2 true EP0943698A2 (fr) 1999-09-22

Family

ID=7858325

Family Applications (1)

Application Number Title Priority Date Filing Date
EP98122276A Withdrawn EP0943698A2 (fr) 1998-02-19 1998-11-24 Procédé et appareil pour le transport de substrats cylindriques

Country Status (4)

Country Link
US (1) US6132562A (fr)
EP (1) EP0943698A2 (fr)
JP (1) JPH11314055A (fr)
DE (1) DE19807032A1 (fr)

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US6223683B1 (en) * 1997-03-14 2001-05-01 The Coca-Cola Company Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating
DE19807032A1 (de) * 1998-02-19 1999-08-26 Leybold Systems Gmbh Verfahren und Vorrichtung zum Transportieren zu beschichtender zylindrischer Substrate
DE59810465D1 (de) * 1998-02-19 2004-01-29 Applied Films Gmbh & Co Kg Schleuseneinrichtung zum Ein- und/oder Ausbringen von Substraten in und/oder aus einer Behandlungskammer
US6251233B1 (en) 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
DE10001976A1 (de) * 2000-01-18 2001-08-02 Krones Ag Vorrichtung zum Beschichten von Flaschen und Flaschen-Transportkörper
US6720052B1 (en) * 2000-08-24 2004-04-13 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US6740378B1 (en) 2000-08-24 2004-05-25 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
DE10115087A1 (de) * 2001-03-27 2002-10-17 Krones Ag Verfahren und Vorrichtung zum Beschichten eines Kunststoffbehälters
US6599584B2 (en) * 2001-04-27 2003-07-29 The Coca-Cola Company Barrier coated plastic containers and coating methods therefor
WO2003064723A1 (fr) * 2002-01-31 2003-08-07 Jamar Venture Corporation Chaine de production et procede pour formation d'alliage de surface par diffusion continue et formation d'alliage de surface de carbure par diffusion continue
DE10205167C5 (de) * 2002-02-07 2007-01-18 Von Ardenne Anlagentechnik Gmbh In-Line-Vakuumbeschichtungsanlage zur Zwischenbehandlung von Substraten
WO2003089502A1 (fr) * 2002-04-15 2003-10-30 The Coca-Cola Company Composition de revetement contenant un additif epoxy et structures recouvertes de ce dernier
DE10221461B4 (de) * 2002-05-15 2004-05-06 Schott Glas Vorrichtung und Verwendung einer Vorrichtung zum Aufnehmen und Vakuumabdichten eines Behältnisses mit einer Öffnung
DE10224547B4 (de) * 2002-05-24 2020-06-25 Khs Corpoplast Gmbh Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken
DE10233137A1 (de) * 2002-07-20 2004-02-05 Applied Films Gmbh & Co. Kg Vorrichtung zum Beschichten von Substraten
DE10252543A1 (de) * 2002-11-08 2004-05-27 Applied Films Gmbh & Co. Kg Beschichtung für ein Kunststoffsubstrat
KR100536797B1 (ko) * 2002-12-17 2005-12-14 동부아남반도체 주식회사 화학 기상 증착 장치
US7513953B1 (en) * 2003-11-25 2009-04-07 Nano Scale Surface Systems, Inc. Continuous system for depositing films onto plastic bottles and method
MX2009011551A (es) * 2007-04-26 2009-12-03 Coca Cola Co Proceso y aparato para secar y curar un recubrimiento de recipiente y recipientes producidos a traves de ellos.
US8171638B2 (en) * 2008-12-22 2012-05-08 Lexmark International, Inc. Process for providing improved electrical properties on a roll for use in electrophotography
CN103241546A (zh) * 2012-02-14 2013-08-14 苏州丰鑫机械设备有限公司 一种酒瓶贴花生产线及其贴花工艺
ITMI20121358A1 (it) * 2012-08-01 2014-02-02 Tapematic Spa Macchina per la verniciatura e linea per la finitura di oggetti tridimensionali di piccole dimensioni e relativi metodi
US10889895B2 (en) * 2014-06-12 2021-01-12 Raytheon Technologies Corporation Deposition apparatus and use methods
FR3038890B1 (fr) * 2015-07-13 2019-08-30 Coating Plasma Innovation Dispositif de transfert d'objets entre une zone a pression atmospherique et une zone sous vide, installation de traitement et procede de mise en oeuvre correspondants
US11694913B2 (en) 2018-12-18 2023-07-04 Intevac, Inc. Hybrid system architecture for thin film deposition
US11414748B2 (en) * 2019-09-25 2022-08-16 Intevac, Inc. System with dual-motion substrate carriers
DE102020101460B4 (de) * 2020-01-22 2025-03-27 VON ARDENNE Asset GmbH & Co. KG Umlaufförderer-Transportrad, Substratträger und Verfahren

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DE19807032A1 (de) * 1998-02-19 1999-08-26 Leybold Systems Gmbh Verfahren und Vorrichtung zum Transportieren zu beschichtender zylindrischer Substrate

Also Published As

Publication number Publication date
US6132562A (en) 2000-10-17
JPH11314055A (ja) 1999-11-16
DE19807032A1 (de) 1999-08-26

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