EP0966355A1 - Bildaufzeichnungsmethode für lithographische druckplatten mittels hochintensität-laser - Google Patents
Bildaufzeichnungsmethode für lithographische druckplatten mittels hochintensität-laserInfo
- Publication number
- EP0966355A1 EP0966355A1 EP98909081A EP98909081A EP0966355A1 EP 0966355 A1 EP0966355 A1 EP 0966355A1 EP 98909081 A EP98909081 A EP 98909081A EP 98909081 A EP98909081 A EP 98909081A EP 0966355 A1 EP0966355 A1 EP 0966355A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- colloid
- layer
- exposure
- laser beam
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 34
- 238000007639 printing Methods 0.000 title claims abstract description 32
- 238000003384 imaging method Methods 0.000 title description 2
- 239000000084 colloidal system Substances 0.000 claims abstract description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- RKFMOTBTFHXWCM-UHFFFAOYSA-M [AlH2]O Chemical compound [AlH2]O RKFMOTBTFHXWCM-UHFFFAOYSA-M 0.000 claims description 3
- QFJPQEKQIKSNBU-UHFFFAOYSA-M [Ti]O Chemical compound [Ti]O QFJPQEKQIKSNBU-UHFFFAOYSA-M 0.000 claims description 3
- DOEDEOQXJFKNFA-UHFFFAOYSA-M [Zr]O Chemical compound [Zr]O DOEDEOQXJFKNFA-UHFFFAOYSA-M 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052785 arsenic Inorganic materials 0.000 claims description 3
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052790 beryllium Inorganic materials 0.000 claims description 3
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000011230 binding agent Substances 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 3
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- XQSFXFQDJCDXDT-UHFFFAOYSA-N hydroxysilicon Chemical compound [Si]O XQSFXFQDJCDXDT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- 239000011777 magnesium Substances 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 229910052714 tellurium Inorganic materials 0.000 claims description 3
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 229910000314 transition metal oxide Inorganic materials 0.000 claims description 2
- 229920006267 polyester film Polymers 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims 1
- 229910052723 transition metal Inorganic materials 0.000 claims 1
- 150000003624 transition metals Chemical class 0.000 claims 1
- 238000000576 coating method Methods 0.000 description 28
- 239000011248 coating agent Substances 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 27
- 239000000976 ink Substances 0.000 description 21
- 239000000203 mixture Substances 0.000 description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- -1 polyethylene terephthalate Polymers 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 229920000139 polyethylene terephthalate Polymers 0.000 description 9
- 239000005020 polyethylene terephthalate Substances 0.000 description 9
- 239000004094 surface-active agent Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 7
- 239000006096 absorbing agent Substances 0.000 description 7
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 6
- 239000011324 bead Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 229920008347 Cellulose acetate propionate Polymers 0.000 description 5
- 239000000020 Nitrocellulose Substances 0.000 description 5
- 239000008119 colloidal silica Substances 0.000 description 5
- 229920001220 nitrocellulos Polymers 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 239000004971 Cross linker Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 150000001540 azides Chemical class 0.000 description 2
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 2
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 description 1
- 229920001651 Cyanoacrylate Polymers 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 235000021388 linseed oil Nutrition 0.000 description 1
- 239000000944 linseed oil Substances 0.000 description 1
- 150000004706 metal oxides Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 235000019198 oils Nutrition 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- 238000007651 thermal printing Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000010407 vacuum cleaning Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
Definitions
- This invention relates to the method of making a lithographic printing plate comprising exposing a support coated with a melonophilic layer photothermal conversion layer and a melonophobic layer to a focused laser beam.
- the art of lithographic printing is based upon the immiscibility of oil and water, wherein the oily material or ink is preferentially retained by the image area and the water or fountain solution is preferentially retained by the non-image area.
- the background or non-image area retains the water and repels the ink while the image area accepts the ink and repels the water.
- the ink on the image area is then transferred to the surface of a material upon which the image is to be reproduced; such as paper, cloth and the like. Commonly the ink is transferred to an intermediate material called the blanket which in turn transfers the ink to the surface of the material upon which the image is to be reproduced.
- a very widely used type of lithographic printing plate has a light- sensitive coating applied to an aluminum base support.
- the coating may respond to light by having the portion which is exposed become soluble so that it is removed in the developing process.
- Such a plate is referred to as positive- working.
- the plate is referred to as negative-working.
- the image area remaining is ink-receptive or oleophilic and the non-image area or background is water-receptive or hydrophilic.
- the differentiation between image and non-image areas is made in the exposure process where a film is applied to the plate with a vacuum to insure good contact.
- the plate is then exposed to a light source, a portion of which is composed of UV radiation.
- the area on the film that corresponds to the image on the plate is opaque so that no light will strike the plate, whereas the area on the film that conesponds to the non-image area is clear and permits the transmission of light to the coating which then becomes more soluble and is removed.
- a negative plate the converse is true.
- the area on the film corresponding to the image area is clear while the non-image area is opaque.
- the coating under the clear area of film is hardened by the action of light while the area not struck by light is removed.
- the light-hardened surface of a negative plate is therefore oleophilic and will accept ink while the non-image area which has had the coating removed through the action of a developer is desensitized and is therefore hydrophilic.
- Direct write photothermal litho plates are known as the Kodak Direct Image Thermal Printing Plate. However, they require wet processing in alkaline solutions. It would be desirable to have a direct write photothermal litho plate that did not require any processing.
- US-A-4,034,183 describes a direct write litho plate without development so that a laser absorbing hydrophilic top layer coated on a support is exposed to a laser beam to burn the absorber to convert it from an ink repelling to an ink receiving state. All of the examples and teachings require a high power laser, and the run lengths of the resulting litho plates are limited.
- US-A-3,832,948 describes both a printing plate with a hydrophilic layer that may be ablated by strong light from a hydrophobic support and also a printing plate with a hydrophobic layer that may be ablated from a hydrophilic support. However, no examples are given.
- US-A-3,964,389 describes a no process printing plate made by laser transfer of material from a carrier film (donor) to a lithographic surface.
- the problem of this method is that small particles of dust trapped between the two layers may cause image degradation. Also, two sheets to prepare is more expensive.
- US-A-4,054,094 describes a process for making a litho plate by using a laser beam to etch away a thin top coating of polysilicic acid on a polyester base, thereby rendering the exposed areas receptive to ink. No details of run length or print quality are given, but it is expected that an uncrosslinked polymer such as polysilicic acid will wear off relatively rapidly and give a short run length of acceptable prints.
- US-A-4,081,572 describes a method for preparing a printing master on a substrate by coating the substrate with a hydrophilic polyamic acid and then imagewise converting the polyamic acid to melonophilic polyimide with heat from a flash lamp or a laser. No details of run length, image quality or ink/water balance are given.
- US-A-4,731,317 describes a method for making a litho plate by coating a polymeric diazo resin on a grained anodized aluminum litho support, exposing the image areas with a YAG laser, and then processing the plate with a graphic arts lacquer.
- the lacquering step is inconvenient and expensive.
- Japanese Kokai No. 55/105560 describes a method of preparation of a litho plate by laser beam removal of a hydrophilic layer coated on a melonophilic support, in which the hydrophilic layer contains colloidal silica, colloidal alumina, a carboxylic acid, or a salt of a carboxylic acid.
- the only examples given use colloidal alumina alone, or zinc acetate alone, with no crosslinkers or addenda. No details are given for the ink/water balance or limiting run length.
- WO 92/09934 describes and broadly claims any photosensitive composition containing a photoacid generator, and a polymer with acid labile tetrahydropyranyl groups. This would include a hydrophobic/hydrophilic switching lithographic plate composition. However, such a polymeric switch is known to give weak discrimination between ink and water in the printing process.
- EP 0 562 952 Al describes a printing plate having a polymeric azide coated on a lithographic support, and removal of the polymeric azide by exposure to a laser beam. No printing press examples are given.
- WO 94/18005 describes a printing plate having a laser absorbing layer coated on a support with a crosslinked hydrophilic layer which is removed upon exposure to the laser. All the examples teach a polyvinyl alcohol layer crosslinked with hydrolyzed tetraethylorthosilicate.
- US-A-5,460,918 describes a thermal transfer process for preparing a litho plate from a donor with an oxazoline polymer to a silicate surface receiver.
- a two sheet system such as this is subject to image quality problems from dust and the expense of preparing two sheets.
- the present invention is a method of forming a lithographic plate containing a support web coated with an ink accepting laser absorbing layer which is subsequently overcoated with a crosslinked hydrophilic layer having metal oxide groups on the surface. Exposure of this plate to a high intensity laser beam followed by mounting on a press results in excellent impressions without chemical processing.
- the lithographic printing plate comprises: a) a support web with b) a coextensive melonophilic photothermal conversion layer with c) a coextensive melonophobic layer comprising a crosslinked polymeric matrix containing a member of the group consisting of colloids of beryllium, magnesium, aluminum, silicon, gadolinium, germanium, arsenic, indium, tin, antimony, tellurium, lead, bismuth and the transition metal oxides and combinations thereof to a laser beam having an intensity greater than 0.1 mW/ ⁇ 2 for a time sufficient to give a total exposure of 200 mJ/cm 2 or greater.
- the support for this invention can be a polymer, metal or paper foil, or a lamination of any of the three.
- the thickness of the support can be varied, as long as it is sufficient to sustain the wear of the printing press and thin enough to wrap around the printing form.
- a preferred embodiment uses polyethylene terephthalate in a thickness from 100 to 200 microns.
- Another preferred embodiment uses aluminum from 100 to 500 microns in thickness.
- the support should resist stretching so the color printing records will register in a full color image.
- the support may be coated with one or more "subbing" layers to improve adhesion of the final assemblage.
- the back side of the support may be coated with antistat agents and/or slipping layers or matte layers to improve handling and "feel" of the litho plate.
- the term "melonophilic" is Greek for ink-loving. Since most conventional printing inks are linseed oil based, melonophilic will usually coincide with oleophilic.
- the photothermal conversion layer absorbs laser radiation and converts it into heat. It converts photons into phonons. To do this it must contain a non-luminescent absorber.
- Such an absorber may be a dye, a pigment, a metal, or a dichroic stack of materials that absorb by virtue of their refractive index and thickness.
- the absorber may be in the hydrophilic layer or thermally close to the hydrophilic layer.
- the binder used to hold the dye or pigment in the photothermal conversion layer may be chosen from a large list of film forming polymers.
- Useful polymers may be found in the families of polycarbonates, polyesters, and polyacrylates. Chemically modified cellulose derivatives are particularly useful, such as nitrocellulose, cellulose acetate propionate, and cellulose acetate. Exemplary polymers may be found in US-A-4,695,286; 4,470,797; 4,775,657; and 4,962,081.
- Surfactants may be included in the photothermal conversion layer to facilitate coating uniformity.
- a particularly useful surfactant for solvent coated polymer layers is DC510, a silicone oil sold by the Dow Corning Company of Midland, Michigan.
- the melonophobic or hydrophilic layer is intended to be wet effectively by the aqueous fountain solution in the lithographic printing process, and when wet, to repel the ink.
- the hydrophilic layer is somewhat porous, so that wetting is even more effective.
- the hydrophilic layer must be crosslinked if long printing run lengths are to be achieved, because an uncrosslinked layer will wear away too quickly. Many crosslinked hydrophilic layers are available.
- colloids of hydroxysilicon, hydroxyaluminum, hydroxytitanium and hydroxyzirconium are formed by methods fully described in US-A- 2,244,325; 2,574,902; and 2,597,872. Stable dispersions of such colloids can be conveniently purchased from companies such as the DuPont Company of Wilmington, Delaware.
- the hydrophilic layer is most effective when it contains a minimum amount of hydrophobic groups such as methyl or alkyl groups.
- the hydrophilic layer preferably should contain less than 5% hydrocarbon groups by weight.
- a preferred embodiment of the invention uses aminopropyltriethoxysilane as the crosslinking and polymer forming layer, with the addition of colloidal silica to add porosity to the layer.
- the thickness of the crosslinking and polymer forming layer may be from .05 to 1 micron in thickness, and most preferably from .1 to .3 microns in thickness.
- the amount of silica added to the layer may be from 100 to 5000% of the crosslinking layer, and most preferably from 500% to 1500% of the crosslinking layer.
- Surfactants, dyes, laser absorbers, colorants useful in visualizing the written image, and other addenda may be added to the hydrophilic layer, as long as their level is low enough that there is no significant interference with the ability of the layer to hold water and repel ink.
- the laser used to expose the lithoplate of this invention is preferably a diode laser, because of the reliability and low maintenance of diode laser systems, but other lasers such as gas or solid state lasers may also be used.
- the layers are coated onto the support by any of the commonly known coating methods such as spin coating, knife coating, gravure coating, dip coating, or extrusion hopper coating.
- the process for using the resulting lithographic plate comprises the steps of 1) exposing the plate to a focused laser beam in the areas where ink is desired in the printed image, and 2) employing the plate on a printing press. No heating, processing, or cleaning is needed before the printing operation.
- a vacuum cleaning dust collector may be useful during the laser exposure step to keep the focusing lens clean. Such a collector is fully described in US-A-5, 574,493.
- the power, intensity and exposure level of the laser is fully described in the above cross referenced co-pending application.
- Example 1 A mixture of 10 g of carbon (Cabot Black Pearls 700) in 400 g methyl ethyl ketone and 400 g methylisobutyl ketone with 21 g of nitrocellulose was tumbled with 1 mm diameter zirconium oxide beads (the amount of beads filled half the container) for 24 hours. The beads were filtered off and the suspension was coated onto polyethylene terephthalate at 3.0 cc/ft 2 wet laydown.
- the web When dry, the web was overcoated with a solution of 120 g of colloidal silica stabilized with ammonia (Nalco 2326) mixed with 280 g of water, 2 g of aminopropyltriethoxysilane and .1 g of Zonyl FSN surfactant, the mixture coated at 16 cc per square meter wet laydown. The coating was dried for 3 minutes at 118°C. The coating was then exposed to a focused diode laser beam at 830 nm wavelength on an apparatus similar to that described in US-A-5,446,477. The exposure level was about 600 mJ/cm 2 , and the intensity of the beam was about 3 mW/ ⁇ 2 . The laser beam was modulated to produce a halftone dot image. After exposure the plate was mounted on an ABDick press and several thousand good impressions were made.
- the exposure level was about 600 mJ/cm 2 , and the intensity of the beam was about 3mW/ ⁇ 2 .
- the laser beam was modulated to produce a halftone dot image. After exposure the plate was mounted on an ABDick press and several adequate impressions were made.
- Example 4 22 g tetraethylorthosilicate, 44 g water and 44 g ethanol with 300 mg concentrated hydrochloric acid) and .5% zonyl FSN surfactant in water was coated at 21.5 cc/m 2 onto a polyethylene terephthalate support and dried at 118°C for 3 minutes. The coating was then held at 100°C for 1 hour. The coating was then exposed to a focused diode laser beam at 830 nm wavelength on an apparatus similar to that described in US-A-5,446,477. The exposure level was about 600 mJ/cm 2 , and the intensity of the beam was about 3mW/ ⁇ 2 . The laser beam was modulated to produce a halftone dot image. After exposure the plate was mounted on an ABDick press and several thousand good impressions were made.
- Example 4 22 g tetraethylorthosilicate, 44 g water and 44 g ethanol with 300 mg concentrated hydrochloric acid) and .5% zonyl
- a mixture of 22 g of tetraethylorthosilicate, 44 g water and 44 g ethanol with 300 mg concentrated hydrochloric acid was diluted with 4.4 liters of water and .5% zonyl FSN surfactant in water was added.
- the mixture was coated at 21.5 cc/m 2 onto a polyethylene terephthalate support and dried at 118°C for 3 minutes. The coating was then held at 100°C for 1 hour.
- the coating was then exposed to a focused diode laser beam at 830 nm wavelength on an apparatus similar to that described in US-A-5,446,477.
- the exposure level was about 600 mJ/cm 2 , and the intensity of the beam was about 3mW/ ⁇ 2 .
- the laser beam was modulated to produce a halftone dot image. After exposure the plate was mounted on an ABDick press and several good impressions were made.
- the web When dry, the web was overcoated with a solution of 120 g of colloidal silica stabilized with ammonia (Nalco 2326) mixed with 280 g of water, 2 g of aminopropyltriethoxysilane and .1 g of Zonyl FSN surfactant, the mixture coated at 16 cc/m 2 wet laydown. The coating was dried for 3 minutes at 118°C. The coating was then exposed to a focused diode laser beam at 830 nm wavelength on an apparatus similar to that described in US-A-5,446,477. The exposure level was about 600 mJ/cm 2 , and the intensity of the beam was about 3 mW/ ⁇ 2 . The laser beam was modulated to produce a halftone dot image. After exposure the plate was mounted on an ABDick press and several thousand good impressions were made.
- Example 6 Example 5 was repeated but the nitrocellulose was replaced with cellulose acetate propionate and the mixture was coated at 18.88 g/m 2 .
- Example 6 was repeated but the cellulose acetate propionate was replaced with polyvinylacetate.
- Example 8 was repeated but the cellulose acetate propionate was replaced with polyvinylacetate.
- Example 6 was repeated but the cellulose acetate propionate was replaced with Novolak.
- Example 6 was repeated but the cellulose acetate propionate was replaced with -cyanoacrylate and the solvent was acetonitrile.
- Example 10 A mixture of 3% zirconium butoxide in propanol was stirred with slow addition of a total of 5% water, added as 10% water in propanol. The zirconium butoxide amount was chosen so the total concentration was 1 % after addition of the water in propanol. After 2 hours the mixture had a slightly hazy appearance. The mix was then coated at 21.5 cc/m 2 on a polyethylene terephthalate support and dried at 118°C for 3 minutes. The layer was then overcoated with a solution of 1.5% aminopropyl triethoxysilane in 50:50 propanol: water and dried at 118°C for 3 minutes.
- the coating was then exposed to a focused diode laser beam at 830 nm wavelength on an apparatus similar to that described in US-A-5,446,477.
- the exposure level was about 600 mJ/cm 2 , and the intensity of the beam was about 3mW/ ⁇ 2 .
- the laser beam was modulated to produce a halftone dot image. After exposure the plate was mounted on an ABDick press and several adequate impressions were made.
- Example 11 Example 1 was repeated but the hardener used was a mixture of dimethyl dimethoxysilane and methyl trimethoxysilane sold as Z-6070 by the Dow Corning Company. Several hundred good impressions were printed.
- Example 12 Example 11 was repeated but the hardener used was a glycidoxypropyltrimethoxysilane. Several hundred good impressions were printed.
- a mixture of 10 g of carbon (Cabot Black Pearls 700) in 400 g methyl ethyl ketone and 400 g methylisobutyl ketone with 21 g of nitrocellulose was tumbled with 1 mm diameter zirconium oxide beads (the amount of beads filled half the container) for 24 hours. The beads were filtered off and the suspension was coated onto polyethylene terephthalate at 3.0 cc/ft 2 wet laydown.
- the web When dry, the web was overcoated with a solution of 120 g of colloidal silica stabilized with ammonia (Nalco 2326) mixed with 280 g of water, 2 g of aminopropyltriethoxysilane and .1 g of Zonyl FSN surfactant, the mixture coated at 16 cc/m 2 wet laydown. The coating was dried for 3 minutes at 118°C. The coating was then exposed to a focused diode laser beam at 830 nm wavelength on an apparatus similar to that described in US-A-5,446,477. The laser intensity was step wise modulated in 40 steps from full intensity down by 6/256 of the total power in each step. The exposure was made at four different drum rotation speeds.
- the resulting set of step wedge exposures provides a set of different intensity exposures for different lengths of time.
- the plate was mounted on an ABDick press and 1000 impressions were made. Impression number 500 was selected and the last (lowest power) full density step was determined for each ⁇ m.
- the laser intensity for each step is given by the laser power at that step divided by the area of the laser spot.
- the area of the laser spot was measured by a laser beam profilometer, and was 25 x 12 microns at the 1/e 2 point. For each of the lowest full density steps the exposure and intensity were calculated and are given in Table 1.
- a solution of 5% colloidal Alumina (Dispal 18N4-20) in water was coated at 21.5 cc/m 2 onto the same carbon coated support used in Example 1 and dried for 3 minutes at 118°C.
- the coating was then exposed to a focused diode laser beam at 830 nm wavelength on an apparatus similar to that described in US- A-5,446,477.
- the exposure level was about 600 mJ/cm 2
- the intensity of the beam was about 3mW/ ⁇ 2 .
- the laser beam was modulated to produce a halftone dot image. After exposure the plate was mounted on an ABDick press and impressions were made. After about 20 impressions the background began to scum. After 100 impressions the image was ugly and unusable. This shows that the crosslinker is essential for good press performance.
- Example 1 was repeated in all respects except the aminopropyltriethoxysilane crosslinking agent was omitted. After exposure the plate was mounted on an ABDick press and impressions were made. The background never did go completely white, but there was a faint, low contrast image visible for a few impressions. After about 20 impressions the background was so dark that the image was essentially invisible. This control shows that the crosslinking agent is essential for good press perfonnance.
- the coating was then exposed to a focused diode laser beam at 830 nm wavelength on an apparatus similar to that described in US-A- 5,446,477.
- the exposure level was about 600 mJ/cm 2 , and the intensity of the beam was about 3 mW/m 2 .
- the laser beam was modulated to produce a halftone dot image.
- After exposure the plate was mounted on an ABDick press and impressions were made. The first three or four impressions gave a light but visible image. By the tenth impression full ink density was achieved but the background had scummed to the point that the image was unrecognizable. This control shows that the process and element described in WO 94/18005 are vastly inferior to the present invention.
- Control 4 A mixture of 1.5% aminopropyltriethoxysilane in water was coated onto the carbon containing layer of Example 1. After drying the coating was exposed as in Example 1 and mounted on the press. The plate took ink everywhere, and no good images were printed. This shows that both the hardener and the colloidal oxide (such as silica) are needed for good printing performance.
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Printing Plates And Materials Therefor (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US816287 | 1986-01-06 | ||
| US81628797A | 1997-03-13 | 1997-03-13 | |
| PCT/US1998/004640 WO1998040213A1 (en) | 1997-03-13 | 1998-03-10 | Method of imaging lithographic printing plates with high intensity laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0966355A1 true EP0966355A1 (de) | 1999-12-29 |
| EP0966355B1 EP0966355B1 (de) | 2002-05-29 |
Family
ID=25220182
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP98909081A Expired - Lifetime EP0966355B1 (de) | 1997-03-13 | 1998-03-10 | Verfahren zur bebilderung von lithographischen druckplatten mittels hochintensität-laser |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0966355B1 (de) |
| JP (1) | JP2001514591A (de) |
| DE (1) | DE69805613T2 (de) |
| WO (1) | WO1998040213A1 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6090524A (en) * | 1997-03-13 | 2000-07-18 | Kodak Polychrome Graphics Llc | Lithographic printing plates comprising a photothermal conversion material |
| US6207348B1 (en) * | 1997-10-14 | 2001-03-27 | Kodak Polychrome Graphics Llc | Dimensionally stable lithographic printing plates with a sol-gel layer |
| US6268113B1 (en) * | 1998-04-30 | 2001-07-31 | Eastman Kodak Company | Antireflection direct write lithographic printing plates |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3964906A (en) * | 1973-12-12 | 1976-06-22 | Western Electric Company, Inc. | Method of forming a hydrophobic surface by exposing a colloidal sol to UV radiation |
| WO1994018005A1 (en) * | 1993-02-09 | 1994-08-18 | Agfa-Gevaert Naamloze Vennootschap | Heat mode recording material and method for making a lithographic printing plate therewith |
| DE4442235C2 (de) * | 1993-12-01 | 2002-12-05 | Roland Man Druckmasch | Verfahren zur Herstellung einer Druckform für einen Formzylinder einer Druckmaschine und danach hergestellte Druckform |
-
1998
- 1998-03-10 WO PCT/US1998/004640 patent/WO1998040213A1/en not_active Ceased
- 1998-03-10 JP JP53970198A patent/JP2001514591A/ja active Pending
- 1998-03-10 DE DE69805613T patent/DE69805613T2/de not_active Expired - Fee Related
- 1998-03-10 EP EP98909081A patent/EP0966355B1/de not_active Expired - Lifetime
Non-Patent Citations (1)
| Title |
|---|
| See references of WO9840213A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0966355B1 (de) | 2002-05-29 |
| JP2001514591A (ja) | 2001-09-11 |
| DE69805613T2 (de) | 2002-12-05 |
| DE69805613D1 (de) | 2002-07-04 |
| WO1998040213A1 (en) | 1998-09-17 |
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