EP1140332A1 - In-situ herstellung von mikrofiltrationsmembranen - Google Patents

In-situ herstellung von mikrofiltrationsmembranen

Info

Publication number
EP1140332A1
EP1140332A1 EP99962020A EP99962020A EP1140332A1 EP 1140332 A1 EP1140332 A1 EP 1140332A1 EP 99962020 A EP99962020 A EP 99962020A EP 99962020 A EP99962020 A EP 99962020A EP 1140332 A1 EP1140332 A1 EP 1140332A1
Authority
EP
European Patent Office
Prior art keywords
blank
membrane
embossing
microfilter
web portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP99962020A
Other languages
English (en)
French (fr)
Inventor
Ryan S. Raz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Veracel Inc
Original Assignee
Morphometrix Technologies Inc
Veracel Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morphometrix Technologies Inc, Veracel Inc filed Critical Morphometrix Technologies Inc
Publication of EP1140332A1 publication Critical patent/EP1140332A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D67/00Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0002Organic membrane manufacture
    • B01D67/0023Organic membrane manufacture by inducing porosity into non porous precursor membranes
    • B01D67/0025Organic membrane manufacture by inducing porosity into non porous precursor membranes by mechanical treatment, e.g. pore-stretching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D67/00Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039Inorganic membrane manufacture
    • B01D67/0053Inorganic membrane manufacture by inducing porosity into non porous precursor membranes
    • B01D67/0055Inorganic membrane manufacture by inducing porosity into non porous precursor membranes by mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26FPERFORATING; PUNCHING; CUTTING-OUT; STAMPING-OUT; SEVERING BY MEANS OTHER THAN CUTTING
    • B26F1/00Perforating; Punching; Cutting-out; Stamping-out; Apparatus therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2323/00Details relating to membrane preparation
    • B01D2323/24Use of template or surface directing agents [SDA]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2323/00Details relating to membrane preparation
    • B01D2323/34Use of radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2325/00Details relating to properties of membranes
    • B01D2325/02Details relating to pores or porosity of the membranes
    • B01D2325/021Pore shapes
    • B01D2325/0214Tapered pores
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2325/00Details relating to properties of membranes
    • B01D2325/02Details relating to pores or porosity of the membranes
    • B01D2325/0283Pore size
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29LINDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00Other particular articles
    • B29L2031/14Filters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29LINDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00Other particular articles
    • B29L2031/755Membranes, diaphragms

Definitions

  • This invention relates to the manufacture of membrane microfilters.
  • 5 Membrane microfilters as opposed to depth filters, function as simple sieves. If a fluid suspension is passed through a membrane microfilter, all objects within that suspension under a certain size (the pore size) are permitted to pass. Everything else is held back and captured on the membrane microfilter's surface.
  • the quality and performance of membrane microfilters are - j O characterized by the pore size distribution, the number of pores in a given area
  • the dominant technology for the production of membrane microfilters is the track-etch technique.
  • a thin polymeric film is exposed to a collimated beam of massive, -J5 energetic nuclei such as U 235 fission fragments. As the nuclei pass through the film, they break the polymer's backbone bonds, leaving a directed trail of defects.
  • the film is placed in a warm caustic bath where the defect trails are preferentially etched against the bulk of the material. The result is a set of microscopic pores whose average size can be controlled by 20 the etch parameters (temperature, concentration, time) and whose surface density is controlled by the length of time the film is left in the particle beam.
  • track-etch technique places numerous restrictions on the 25 materials used, their thickness and composition. They cannot be too thick or the fission fragments will not leave a complete defect trail. Nor can they be conductive or the charge build-up will distort the otherwise collimated beam.
  • the technique is rather difficult to apply in practice, requiring as it does a particle beam source, which may represent a considerable investment.
  • the track-etching takes place under restrictive conditions that make it impractical to process anything other than continuous rolls of polymeric film material.
  • the second stage etching process is difficult (though not impossible) to control and any piece produced in this way must be further processed to remove traces of the harsh chemical used to manufacture the part.
  • track-etch membrane microfilters often fail to follow their theoretical models of performance.
  • the restrictions inherent in the manufacturing of track-etch membrane microfilters will often translate into application problems for the designer or engineer.
  • the track-etch membrane is manufactured in a separate process and must eventually be mated to some support structure in order to be used. Affixing the track-etch membrane to this support will necessitate the use of glues or thermo-welding process. Placing the membrane on the support structure is not trivial, nor is maintaining a taut, uniformly-stressed surface.
  • the microfilter's composition may be incompatible with the intended use of the completed part.
  • a method for manufacturing a membrane microfilter comprising forming a blank having a web portion defining a filter region, embossing one side of the web portion in the filter region with an array of indentations of cross-sections comparable to a desired pore size of the filter, and ablating material from the web portion in the filter region until the indentation forms through pores of the desired pore size.
  • Figures 1 a, 1 b, and 1c show stages in the production of a blank for application of the method of the invention; all views in this and subsequent figures are cross-sectioned unless otherwise stated; Figures 2a, 2b and 2c show successive stages in the embossing of the moulded blank;
  • Figure 3 shows an embossing tool
  • Figure 4 shows deformation occurring when an embossing tool breaks through the blank
  • Figures 5a and 5b show the result of misalignment of a two-part embossing tool
  • Figure 6 shows damage to the embossing tool caused by it contacting a hard surface
  • Figures 7a and 7b illustrate a method of operating the embossing tool
  • Figures 8a and 8b show etching of the blank from the side opposite the tool
  • Figures 9a and 9b show how pore characteristics can be controlled during the etching
  • Figures 10a, 10b and 10c illustrate how different pore size may be formed in the same blank, Figure 10c being a plan view.
  • Figure 1 illustrates the formation of a blank to be subsequently provided with an integral microfilter.
  • the precise technique used to create the moulded blank is not important to the invention.
  • the blank may be pressure moulded from a starting blank c between two mould parts (as in Figure 1 A), together defining a mould cavity d (see Figure 1 B), or may be injection moulded, cast, or manufactured by any other applicable technique.
  • What is important is that the blank has a defined filter region e in which the process membrane microfilter is required. It is usually advisable that this region be relatively thin compared to the rest of the blank, but it should be understood that the final thickness of the filter is determined by subsequent steps of the process. In practice, a thickness much less than 100 microns may be difficult to produce.
  • the filter region c ⁇ where the membrane microfilter is required is embossed (see figure 2), using an embossing tool E having an array of projections g so as to produce an array of indentations in one side of the filter region.
  • the embossing technique is not critical. The embossing may be performed immediately after the blank is moulded while the material is still relatively soft. Alternatively, the embossing may take place as the part is moulded or may be a completely separate step. In any case, the region that requires the microfilter is embossed using a tool having an array of asperities g that can create an array of micro-indentations h in the molded part.
  • the indentations may typically have a diameter up to 10 microns and a separation of at least 10 microns.
  • Embossing tools f whose details include extremely high asperities (see Figure 3) can be easily manufactured by techniques such as microlithography.
  • the drawback to this, or indeed any other embossing tool with such an array of micro-formed features is that the tool must be brought to bear against a hard surface n if the intention is to complete the microfilter formation in this step. If the embossing tool simply breaks through the part to form the microfilter pores, the microfilter itself will be of poor quality, with a deformed surface as seen at k in Figure 4B, with a consequently wide distribution of pore sizes.
  • the embossing tool is designed to break through into a set of aligned wells m, there is a problem in obtaining precise alignment of the asperities with the wells to avoid tool damage (see Figures 5a and 5b). in either case, the tool will rapidly wear out if it is brought to bear against a hard surface during embossing - its delicate microstructure will be destroyed (see figure 6). Instead, the embossing tool is only used to create an array of precisely formed indentations in the microfilter region e of the blank (see Figure 7). It does not
  • the moulded, embossed part e is subjected to an in situ ablation procedure in the region of the embossing (see Figure 8).
  • the ablation procedure may be any one of a range currently available, such as laser ablation, chemical etching, mechanical abrasion, or any other technique that may remove material from a surface in a specified region in a controlled manner. Material may be removed from the side of the region opposite the embossing, or from both sides. As the material is removed from the embossed region, the embossed indentations will reach the opposite surface of the region, forming through pores ⁇ _ in the microfilter region of the blank so that it forms a membrane microfilter.
  • the pore size may be controlled through the etching without comprising porosity or incurring overlap problems.
  • the embossing tool has a microstructure consisting of an array of high-asperity cones then the embossed region will consist of an array of deep, conical wells.
  • a pre-determined cone cross-section is revealed. If the etching is increased, the exposed cross-section is increased and the effective pore size s rises uniformly (see Figure 9).
  • microfilter can be "post-processed" into the filter region of the moulded, embossed part, it is possible to stock-pile an enormous number of blanks for "just-in-time" microfilter manufacture that would correspond to a consumer's requirements. In de-coupling the microfilter blank manufacture from actual microfilter production, both may be separately optimized. This technique then allows the two to be varied independently without compromising the flexibility in pore dimensions often required by a range of customers.
  • the filter region of the blank can be moulded with a minimum thickness of about 100 microns, this being limited by the technique used to form the region, while the area of this region may be as large as required but is typically of the order of one square centimetre or less.
  • any of a number of techniques may be used to produce the surface structure of the embossing tool.
  • the fine structure of that embossing surface depends, to some extent, on the technique used to create it.
  • a presently preferred method for the manufacture of the embossing tool is the LIGA process (X-ray Lithographic, Galvanoformung, Abformtechnik (reference: E.W. Becker et al, Microelectronic Engineering 4, 35-56, 1986).
  • LIGA process X-ray Lithographic, Galvanoformung, Abformtechnik (reference: E.W. Becker et al, Microelectronic Engineering 4, 35-56, 1986).
  • a fine structure can be produced using an X-ray source in a photoresist material.
  • Subsequent development of this resist creates a relief reproduction of the fine structure, although the resist itself is too fragile to be used directly.
  • Electro-deposition fills the resist's surface with metal and when the resist is removed, the metal part is ready
  • a typical embossing tool might have protuberances 10 microns in diameter, spaced by 20 microns.
  • the protuberances themselves may be tapered, as in Figures 7a and 7b, or cylindrical as in Figure 5A.
  • the depth of penetration of the hot embossing tool into the filter region depends on the thickness of the latter but is typically in the range of 10 to 100 microns.
  • a wide range of ablation techniques may be used, of which the following are only exemplary of subtractive micro-machining techniques that may be compatible with the invention having regard to the materials employed.
  • Hot photo-ablation in which material is removed by the action of a laser system (or other light source) that heats, melts and vapourizes the work material to remove it. Again, the action is directional, but the heat-damage effects can make this more difficult to control (a problem that does not appear in the cold- worked process above).
  • Ultrasonic etching in which an ultrasonic tool is set in motion and is coupled to the workpiece by an abrasive slurry. The mechanical motion of the ultrasonic tool drives the abrasive slurry to eat away at the workpiece.
  • Ultra-high precision mechanical machining in which computer numerical controlled (CNC) milling machines capable of 0.05 micron steps are used to remove work material using single crystal diamond tools.
  • CNC computer numerical controlled
  • the quality of the finished filter of the invention should normally be greatly superior to its track-etched counterpart. Pore size can now be controlled to within a narrow tolerance and its statistical distribution is many times narrower than a comparable track-etched membrane.
  • the use of an embossing tool to create the pore distribution over the microfilter's surface means that pore distributing can be precisely controlled.
  • the porosity can be specified to within narrow tolerances depending on the requirements of the application. There is no danger of pore overlap and thus nothing to compromise the integrity of the filter cut-off.
  • embossing tool may be produced with any desired array of cones, which need not all be of the same size (see Figure 10). After the postprocessing etching, these can yield a variety in the size of pores within the filter in any desired arrangement.
  • a great advantage of the process of the invention is that the membrane microfilter can be included in a moulded part without the drawbacks encountered in mechanical mounting methods. This reduces part cost, reduces manufacture time, and eliminates the problem of contamination during the mounting procedure.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Forests & Forestry (AREA)
  • Inorganic Chemistry (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Filtering Materials (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
EP99962020A 1998-12-23 1999-12-23 In-situ herstellung von mikrofiltrationsmembranen Withdrawn EP1140332A1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11381498P 1998-12-23 1998-12-23
US113814P 1998-12-23
PCT/CA1999/001242 WO2000038823A1 (en) 1998-12-23 1999-12-23 In situ manufacture of membrane microfilters

Publications (1)

Publication Number Publication Date
EP1140332A1 true EP1140332A1 (de) 2001-10-10

Family

ID=22351670

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99962020A Withdrawn EP1140332A1 (de) 1998-12-23 1999-12-23 In-situ herstellung von mikrofiltrationsmembranen

Country Status (5)

Country Link
EP (1) EP1140332A1 (de)
JP (1) JP2002533236A (de)
AU (1) AU1852900A (de)
CA (1) CA2356684A1 (de)
WO (1) WO2000038823A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3838385A1 (de) 2019-12-17 2021-06-23 3M Innovative Properties Company Per ultraschall oberflächenmodifizierte polyethersulfonmembranen und verfahren zur herstellung davon

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10392199T5 (de) * 2002-01-18 2005-01-05 Avery Dennison Corp., Pasadena Folie mit Mikroarchitektur
EP1467945A2 (de) 2002-01-18 2004-10-20 Avery Dennison Corporation Bedeckte mikrokammerstrukturen
DE10239551A1 (de) * 2002-08-23 2004-03-04 Daimlerchrysler Ag Filterkörper für Rußfilter
US7597815B2 (en) * 2003-05-29 2009-10-06 Dressel Pte. Ltd. Process for producing a porous track membrane
DK1704585T3 (en) * 2003-12-19 2017-05-22 Univ North Carolina Chapel Hill Methods for preparing isolated micro- and nanostructures using soft lithography or printing lithography
WO2006057619A1 (en) * 2004-11-26 2006-06-01 Agency For Science, Technology And Research Method and apparatus for forming microstructures
JP2008525180A (ja) * 2004-12-22 2008-07-17 ドレセル プライヴェイト リミテッド メンブレンカード並びにその製造方法及び使用方法
NL1028759C2 (nl) * 2005-04-13 2006-10-16 Fluxxion B V Emulsificatie met behulp van microzeef.
TWI506070B (zh) * 2009-12-14 2015-11-01 3M Innovative Properties Co 微穿孔聚合物薄膜及其製造方法與用途
US9266066B2 (en) * 2011-12-13 2016-02-23 Pall Corporation Membrane with localized asymmetries
US10384168B2 (en) 2014-07-18 2019-08-20 Sartorius Stedim Biotech Gmbh Membrane with performance enhancing multi-level macroscopic cavities

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3929135A (en) * 1974-12-20 1975-12-30 Procter & Gamble Absorptive structure having tapered capillaries
US4652412A (en) * 1985-06-14 1987-03-24 Polaroid Corporation Method for forming microporous filter
FR2623100B1 (fr) * 1987-11-13 1991-04-05 Commissariat Energie Atomique Membrane microporeuse obtenue par irradiation de deux faces et procede d'obtention correspondant
US4964992A (en) * 1989-03-21 1990-10-23 Goldsmith Susan H Method of making membrane-type filter and product thereof
JP2542790B2 (ja) * 1993-10-15 1996-10-09 清二 加川 多孔質フィルムの製造装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO0038823A1 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3838385A1 (de) 2019-12-17 2021-06-23 3M Innovative Properties Company Per ultraschall oberflächenmodifizierte polyethersulfonmembranen und verfahren zur herstellung davon
WO2021124082A1 (en) 2019-12-17 2021-06-24 3M Innovative Properties Company Ultrasonically surface modified polyethersulfone membranes and method of making thereof

Also Published As

Publication number Publication date
JP2002533236A (ja) 2002-10-08
CA2356684A1 (en) 2000-07-06
AU1852900A (en) 2000-07-31
WO2000038823A1 (en) 2000-07-06

Similar Documents

Publication Publication Date Title
Hwang et al. Microchannel fabrication on glass materials for microfluidic devices
EP1140332A1 (de) In-situ herstellung von mikrofiltrationsmembranen
Gao et al. Recent advances in micro-and nano-machining technologies
Uriarte et al. Comparison between microfabrication technologies for metal tooling
Jain et al. Micromanufacturing processes
Snoeys et al. Current trends in non-conventional material removal processes
Saptaji et al. Burr reduction of micro-milled microfluidic channels mould using a tapered tool
CN115697625B (zh) 用于在基材中开设凹部的方法
Jensen et al. Rapid prototyping of polymer microsystems via excimer laser ablation of polymeric moulds
JP2618576B2 (ja) 片側に微小凹所を備えたプラスチック半製品の加工方法
EP1422193B1 (de) Verfahren zur Herstellung eines Werkzeugeinsatzes zum spritzgiessen eines teils mit einstufigen Mikrostrukturen
Bissacco et al. Precision manufacturing methods of inserts for injection molding of microfluidic systems
Thornell et al. Microprocessing at the fingertips
Kam et al. Three-dimensional biomimetic microchannel network by laser direct writing
Pfleging et al. Rapid fabrication and replication of metal, ceramic and plastic mould inserts for application in microsystem technologies
EP1422192B1 (de) Verfahren zur Herstellung eines Werkzeugeinsatzes zum Spritzgiessen eines teils mit zweistufigen Mikrostrukturen
Yi et al. Overview of polymer micro/nanomanufacturing for biomedical applications
EP1300708A1 (de) Herstellungsverfahren von multikern-steckerstiften
JP2004188588A (ja) 微細構造化部品を射出成形するための工具挿入体の製造方法
Guo et al. Ultra-precision cutting of linear micro-groove array for distributed feedback laser devices
JP5288690B2 (ja) 研磨パッドの製造方法および研磨パッドの溝加工方法
KR20070004525A (ko) 미공성 필터
Prabhakar Micromachining and Its Applications
KR102820842B1 (ko) 기판의 가공을 위한 유리 기판 캐리어 및 그 제조 방법
Piccolo et al. Surface Micro-/Nano-Texturing of Plastics Manufacturing Tools

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20010720

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

AX Request for extension of the european patent

Free format text: AL;LT;LV;MK;RO;SI

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: VERACEL INC.

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

17Q First examination report despatched

Effective date: 20021120

18D Application deemed to be withdrawn

Effective date: 20020702

RBV Designated contracting states (corrected)

Designated state(s): DE FR GB IT