EP1219568A3 - Sol d'oxide de cerium et abrasif - Google Patents

Sol d'oxide de cerium et abrasif Download PDF

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Publication number
EP1219568A3
EP1219568A3 EP01130261A EP01130261A EP1219568A3 EP 1219568 A3 EP1219568 A3 EP 1219568A3 EP 01130261 A EP01130261 A EP 01130261A EP 01130261 A EP01130261 A EP 01130261A EP 1219568 A3 EP1219568 A3 EP 1219568A3
Authority
EP
European Patent Office
Prior art keywords
iii
neodymium
lanthanum
hydroxide
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP01130261A
Other languages
German (de)
English (en)
Other versions
EP1219568A2 (fr
EP1219568B1 (fr
Inventor
Isao Nissan Chemical Ind. Ltd. Ota
Kenji Nissan Chemical Ind. Ltd. Tanimoto
Tohru Nissan Chemical Ind. Ltd. Nishimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of EP1219568A2 publication Critical patent/EP1219568A2/fr
Publication of EP1219568A3 publication Critical patent/EP1219568A3/fr
Application granted granted Critical
Publication of EP1219568B1 publication Critical patent/EP1219568B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224—Oxides or hydroxides of lanthanides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224—Oxides or hydroxides of lanthanides
    • C01F17/229—Lanthanum oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224—Oxides or hydroxides of lanthanides
    • C01F17/235—Cerium oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1472—Non-aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/01—Crystal-structural characteristics depicted by a TEM-image
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Geology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Catalysts (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
EP01130261A 2000-12-25 2001-12-20 Sol d'oxide de cerium et abrasif Expired - Lifetime EP1219568B1 (fr)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP2000392592 2000-12-25
JP2000392592 2000-12-25
JP2000392593 2000-12-25
JP2000392593 2000-12-25
JP2001140014 2001-05-10
JP2001140015 2001-05-10
JP2001140014 2001-05-10
JP2001140015 2001-05-10

Publications (3)

Publication Number Publication Date
EP1219568A2 EP1219568A2 (fr) 2002-07-03
EP1219568A3 true EP1219568A3 (fr) 2003-12-03
EP1219568B1 EP1219568B1 (fr) 2009-04-08

Family

ID=27481911

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01130261A Expired - Lifetime EP1219568B1 (fr) 2000-12-25 2001-12-20 Sol d'oxide de cerium et abrasif

Country Status (4)

Country Link
US (2) US7887714B2 (fr)
EP (1) EP1219568B1 (fr)
CN (1) CN1248967C (fr)
DE (1) DE60138263D1 (fr)

Families Citing this family (32)

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KR20050006299A (ko) * 1998-12-25 2005-01-15 히다치 가세고교 가부시끼가이샤 Ｃｍｐ 연마제, ｃｍｐ 연마제용 첨가액 및 기판의 연마방법
JP4236857B2 (ja) * 2002-03-22 2009-03-11 三井金属鉱業株式会社 セリウム系研摩材およびその製造方法
AU2003261966A1 (en) 2002-09-06 2004-03-29 Asahi Glass Company, Limited Polishing agent composition for insulating film for semiconductor integrated circuit and method for manufacturing semiconductor integrated circuit
JP4311247B2 (ja) * 2004-03-19 2009-08-12 日立電線株式会社 研磨用砥粒、研磨剤、研磨液の製造方法
EP1818312A4 (fr) * 2004-11-08 2010-09-08 Asahi Glass Co Ltd PROCÉDÉ SERVANT À PRODUIRE DE FINES PARTICULES DE CeO2 ET SUSPENSION ÉPAISSE DE POLISSAGE CONTENANT DE TELLES FINES PARTICULES
DE102005017372A1 (de) 2005-04-14 2006-10-19 Degussa Ag Wässrige Ceroxiddispersion
KR100812052B1 (ko) 2005-11-14 2008-03-10 주식회사 엘지화학 탄산세륨 분말, 산화세륨 분말, 그 제조방법, 및 이를포함하는 ｃｍｐ 슬러리
JP4836731B2 (ja) * 2006-07-18 2011-12-14 旭硝子株式会社 磁気ディスク用ガラス基板の製造方法
CN101386420B (zh) * 2007-09-12 2010-09-22 北京有色金属研究总院 一种复合纳米二氧化铈溶胶
MY155533A (en) 2008-06-11 2015-10-30 Shinetsu Chemical Co Polishing agent for synthetic quartz glass substrate
WO2010118553A1 (fr) 2009-04-15 2010-10-21 Rhodia (China) Co., Ltd. Composition particulaire à base de cérium et sa préparation
CN102504705B (zh) * 2011-10-17 2014-07-09 河南省化工研究所有限责任公司 光通讯Zr02陶瓷插芯精密加工用抛光液及其制备方法
US8916061B2 (en) * 2012-03-14 2014-12-23 Cabot Microelectronics Corporation CMP compositions selective for oxide and nitride with high removal rate and low defectivity
JP6321022B2 (ja) * 2012-11-02 2018-05-09 ローレンス リバモア ナショナル セキュリティー， エルエルシー 表面活性を失うことなく荷電コロイドの凝集を阻止する方法
TWI655281B (zh) * 2013-04-17 2019-04-01 南韓商第一毛織股份有限公司 用於有機膜的化學機械硏磨漿料及使用其的硏磨方法
KR102032758B1 (ko) * 2013-08-05 2019-10-17 삼성전기주식회사 희토류 산화물의 제조방법
CN103923569B (zh) * 2014-05-06 2015-07-08 济南大学 一种玉石翡翠抛光粉的制备方法
WO2015197656A1 (fr) * 2014-06-24 2015-12-30 Rhodia Operations Compositions d'oxyde de cérium dopées par un métal
KR101773543B1 (ko) * 2015-06-30 2017-09-01 유비머트리얼즈주식회사 연마 입자, 연마 슬러리 및 연마 입자의 제조 방법
CN105176492A (zh) * 2015-09-02 2015-12-23 上海大学 镧元素掺杂氧化硅溶胶复合磨粒、抛光液组合物及其制备方法
KR101900543B1 (ko) * 2015-10-02 2018-09-20 삼성에스디아이 주식회사 유기막 ｃｍｐ 슬러리 조성물 및 이를 이용한 연마방법
KR102268320B1 (ko) * 2016-11-14 2021-06-22 니끼 쇼꾸바이 카세이 가부시키가이샤 세리아계 복합미립자 분산액, 그의 제조방법 및 세리아계 복합미립자 분산액을 포함하는 연마용 지립분산액
EP3638626B1 (fr) * 2017-06-15 2021-12-29 Rhodia Operations Particules à base de cérium
CN111566179B (zh) 2017-11-15 2022-03-04 圣戈本陶瓷及塑料股份有限公司 用于实施材料去除操作的组合物及其形成方法
CN108081117A (zh) * 2017-11-29 2018-05-29 浙江工业大学 一种基于软质磨料固着磨具的钽酸锂抛光方法
TWI764338B (zh) * 2019-10-22 2022-05-11 美商Ｃｍｃ材料股份有限公司 用於氧化矽和碳摻雜之氧化矽化學機械拋光的組合物及方法
CN114585699A (zh) * 2019-10-22 2022-06-03 Cmc材料股份有限公司 自停止性的抛光组合物及方法
CN114599752A (zh) * 2019-10-22 2022-06-07 Cmc材料股份有限公司 用于选择性化学机械抛光氧化物的组合物及方法
KR20220090534A (ko) * 2019-10-22 2022-06-29 씨엠씨 머티리얼즈, 인코포레이티드 유전체 cmp를 위한 조성물 및 방법
US20220332977A1 (en) * 2021-04-16 2022-10-20 Entegris, Inc. Cmp compositions for polishing dielectric materials
CN116410666A (zh) * 2021-12-30 2023-07-11 安集微电子科技（上海）股份有限公司 一种合成氧化铈的方法及一种化学机械抛光液
CN115960540A (zh) * 2022-12-23 2023-04-14 昂士特科技(深圳)有限公司 具有改进颗粒的化学机械抛光组合物

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0031749A2 (fr) * 1979-12-27 1981-07-08 Rhone-Poulenc Specialites Chimiques Procédé de fabrication de compositions de polissage
US4786325A (en) * 1983-05-13 1988-11-22 Rhone-Poulenc Specialites Chimiques Cerium/rare earth polishing compositions
EP0822164A2 (fr) * 1996-07-30 1998-02-04 Nissan Chemical Industries, Limited Procédé de production de particules cristallines d'oxide de cerium, abrasif et procédé de polissage
US6136048A (en) * 1995-11-22 2000-10-24 Rhodia Chimie Organic sol comprising at least one oxygenated rare-earth compound, synthesis method therefor, and use of said sol for catalysis
WO2000076920A1 (fr) * 1999-06-16 2000-12-21 Saint-Gobain Ceramics & Plastics, Inc. Poudre d'oxyde cerique amelioree

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JPS6035393A (ja) 1983-08-05 1985-02-23 Nec Corp 読出し専用メモリ
JPH0649555B2 (ja) 1986-07-16 1994-06-29 三菱電機株式会社 乗客コンベアの手摺駆動装置
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JP4053623B2 (ja) * 1996-12-27 2008-02-27 阿南化成株式会社 ジルコニウム−セリウム系複合酸化物及びその製造方法
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Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0031749A2 (fr) * 1979-12-27 1981-07-08 Rhone-Poulenc Specialites Chimiques Procédé de fabrication de compositions de polissage
US4786325A (en) * 1983-05-13 1988-11-22 Rhone-Poulenc Specialites Chimiques Cerium/rare earth polishing compositions
US6136048A (en) * 1995-11-22 2000-10-24 Rhodia Chimie Organic sol comprising at least one oxygenated rare-earth compound, synthesis method therefor, and use of said sol for catalysis
EP0822164A2 (fr) * 1996-07-30 1998-02-04 Nissan Chemical Industries, Limited Procédé de production de particules cristallines d'oxide de cerium, abrasif et procédé de polissage
WO2000076920A1 (fr) * 1999-06-16 2000-12-21 Saint-Gobain Ceramics & Plastics, Inc. Poudre d'oxyde cerique amelioree

Non-Patent Citations (1)

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Title
HARRISON P G ET AL: "CHEMICAL MICROENGINEERING IN SOL-GEL DERIVED FLUORIDE AND LANTHANIDE MODIFIED CERIA MATERIALS", JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, KLUWER ACADEMIC PUBLISHERS, DORDRECHT, NL, vol. 13, no. 1 - 3, 1998, pages 1049 - 1055, XP000880434, ISSN: 0928-0707 *

Also Published As

Publication number Publication date
US20040223898A1 (en) 2004-11-11
CN1248967C (zh) 2006-04-05
EP1219568A2 (fr) 2002-07-03
EP1219568B1 (fr) 2009-04-08
US6887289B2 (en) 2005-05-03
CN1361064A (zh) 2002-07-31
US7887714B2 (en) 2011-02-15
DE60138263D1 (de) 2009-05-20
US20020086618A1 (en) 2002-07-04

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