EP1324351A3 - Röntgen-optisches System mit Blende im Fokus eines Röntgen-Spiegels - Google Patents

Röntgen-optisches System mit Blende im Fokus eines Röntgen-Spiegels Download PDF

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Publication number
EP1324351A3
EP1324351A3 EP02027472A EP02027472A EP1324351A3 EP 1324351 A3 EP1324351 A3 EP 1324351A3 EP 02027472 A EP02027472 A EP 02027472A EP 02027472 A EP02027472 A EP 02027472A EP 1324351 A3 EP1324351 A3 EP 1324351A3
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EP
European Patent Office
Prior art keywords
ray
mirror
focus
ray source
optical system
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Granted
Application number
EP02027472A
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English (en)
French (fr)
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EP1324351A2 (de
EP1324351B1 (de
Inventor
Joachim Lange
Detlef Bahr
Kurt Erlacher
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Bruker AXS SE
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Bruker AXS SE
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Publication date
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Publication of EP1324351A2 publication Critical patent/EP1324351A2/de
Publication of EP1324351A3 publication Critical patent/EP1324351A3/de
Application granted granted Critical
Publication of EP1324351B1 publication Critical patent/EP1324351B1/de
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Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

Ein Röntgen-optisches System mit einer Röntgen-Quelle (Q) und einem ersten Gradienten-Multischicht-Spiegel (graded multilayer mirror) (A), wobei die Ausdehnung Qx der Röntgen-Quelle (Q) in einer x-Richtung senkrecht zur Verbindungslinie zwischen Röntgen-Quelle (Q) und erstem Gradienten-Multischicht-Spiegel (A) in z-Richtung größer ist als der Akzeptanzbereich des Spiegels (A) in einem Fokus des Spiegels (A) in der x-Richtung, ist dadurch gekennzeichnet, dass in einem Fokus des ersten Gradienten-Multischicht-Spiegels (A) zwischen Röntgen-Quelle (Q) und Spiegel (A) eine erste Blende (bI) angeordnet ist, deren Öffnung in x-Richtung dem Akzeptanzbereich des ersten Gradienten-Multischicht-Spiegels (A) entspricht, und dass für den Abstand qzA zwischen erster Blende (bI) und Röntgen-Quelle (Q) gilt

         qzA = Qx / tan αx,

wobei αx den Winkel bezeichnet, unter dem der erste Gradienten-Multischicht-Spiegel (A) von der ersten Blende (bI) aus gesehen in x-Richtung erscheint. Dadurch wird eine Reduzierung der Stör-Strahlung auf der Probe bei gleichbleibender Leistung der genutzten Röntgen-Strahlung aus der Quelle Q ermöglicht.
EP02027472A 2001-12-18 2002-12-10 Röntgen-optisches System mit Blende im Fokus eines Röntgen-Spiegels Expired - Lifetime EP1324351B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10162093A DE10162093A1 (de) 2001-12-18 2001-12-18 Röntgen-optisches System mit Blende im Fokus einer Röntgen-Spiegels
DE10162093 2001-12-18

Publications (3)

Publication Number Publication Date
EP1324351A2 EP1324351A2 (de) 2003-07-02
EP1324351A3 true EP1324351A3 (de) 2007-07-18
EP1324351B1 EP1324351B1 (de) 2010-04-21

Family

ID=7709619

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02027472A Expired - Lifetime EP1324351B1 (de) 2001-12-18 2002-12-10 Röntgen-optisches System mit Blende im Fokus eines Röntgen-Spiegels

Country Status (3)

Country Link
US (1) US6898270B2 (de)
EP (1) EP1324351B1 (de)
DE (2) DE10162093A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10236640B4 (de) * 2002-08-09 2004-09-16 Siemens Ag Vorrichtung und Verfahren zur Erzeugung monochromatischer Röntgenstrahlung
US7280634B2 (en) * 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
US7120228B2 (en) * 2004-09-21 2006-10-10 Jordan Valley Applied Radiation Ltd. Combined X-ray reflectometer and diffractometer
JP4557939B2 (ja) * 2006-07-18 2010-10-06 株式会社ジェイテック Ｘ線ミラーの高精度姿勢制御法およびｘ線ミラー
US7651270B2 (en) * 2007-08-31 2010-01-26 Rigaku Innovative Technologies, Inc. Automated x-ray optic alignment with four-sector sensor
US8243878B2 (en) 2010-01-07 2012-08-14 Jordan Valley Semiconductors Ltd. High-resolution X-ray diffraction measurement with enhanced sensitivity
US8687766B2 (en) 2010-07-13 2014-04-01 Jordan Valley Semiconductors Ltd. Enhancing accuracy of fast high-resolution X-ray diffractometry
US8437450B2 (en) 2010-12-02 2013-05-07 Jordan Valley Semiconductors Ltd. Fast measurement of X-ray diffraction from tilted layers
DE102010062472A1 (de) 2010-12-06 2012-06-06 Bruker Axs Gmbh Punkt-Strich-Konverter
US8781070B2 (en) 2011-08-11 2014-07-15 Jordan Valley Semiconductors Ltd. Detection of wafer-edge defects
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
EP2896960B1 (de) * 2014-01-15 2017-07-26 PANalytical B.V. Röntgenvorrichtung für SAXS und Bragg-Brentano Messungen
US9726624B2 (en) 2014-06-18 2017-08-08 Bruker Jv Israel Ltd. Using multiple sources/detectors for high-throughput X-ray topography measurement
RU175420U1 (ru) * 2017-08-03 2017-12-05 Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Нижегородский государственный университет им. Н.И. Лобачевского" Устройство для управления сходимостью рентгеновского пучка
CN112424591B (zh) * 2018-06-04 2024-05-24 斯格瑞公司 波长色散x射线光谱仪
DE112019003777B4 (de) 2018-07-26 2025-09-11 Sigray, Inc. Röntgenreflexionsquelle mit hoher helligkeit
CN112638261B (zh) 2018-09-04 2025-06-27 斯格瑞公司 利用滤波的x射线荧光的系统和方法
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
RU2719395C1 (ru) * 2019-09-03 2020-04-17 Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Нижегородский государственный университет им. Н.И. Лобачевского" Способ управления кривизной рабочей поверхности монокристаллической пластины дифракционного блока, обеспечивающей коллимацию рентгеновского пучка
US11217357B2 (en) 2020-02-10 2022-01-04 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0459833A2 (de) * 1990-06-01 1991-12-04 Canon Kabushiki Kaisha Röntgenstrahlenmikroskop
DE4407278A1 (de) * 1994-03-04 1995-09-07 Siemens Ag Röntgen-Analysegerät
DE19833524A1 (de) * 1998-07-25 2000-02-24 Bruker Axs Analytical X Ray Sy Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
WO2002065481A1 (de) * 2001-02-14 2002-08-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Anordnung für röntgenanalytische anwendungen

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE68923890T2 (de) * 1988-02-25 1996-02-22 Japan Res Dev Corp Strahlenoptische Elemente mit Graphit-Schichten.
US5204887A (en) * 1990-06-01 1993-04-20 Canon Kabushiki Kaisha X-ray microscope
US5274435A (en) * 1992-02-26 1993-12-28 Hettrick Michael C Grating monochromators and spectrometers based on surface normal rotation
JP3499592B2 (ja) * 1994-01-31 2004-02-23 株式会社ルネサステクノロジ 投影露光装置及びパターン転写方法
US5923720A (en) * 1997-06-17 1999-07-13 Molecular Metrology, Inc. Angle dispersive x-ray spectrometer
US6041099A (en) 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0459833A2 (de) * 1990-06-01 1991-12-04 Canon Kabushiki Kaisha Röntgenstrahlenmikroskop
DE4407278A1 (de) * 1994-03-04 1995-09-07 Siemens Ag Röntgen-Analysegerät
DE19833524A1 (de) * 1998-07-25 2000-02-24 Bruker Axs Analytical X Ray Sy Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
WO2002065481A1 (de) * 2001-02-14 2002-08-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Anordnung für röntgenanalytische anwendungen

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
ARNDT U W: "FOCUSING OPTICS FOR LABORATORY SOURCES IN X-RAY CRYSTALLOGRAPHY", JOURNAL OF APPLIED CRYSTALLOGRAPHY, COPENHAGEN, DK, vol. 23, 1990, pages 161 - 168, XP009041316, ISSN: 0021-8898 *
SAUNEUF R ET AL: "LARGE-FIELD HIGH-RESOLUTION X-RAY MICROSCOPE FOR STUDYING LASER PLASMAS", REVIEW OF SCIENTIFIC INSTRUMENTS, AIP, MELVILLE, NY, US, vol. 68, no. 9, September 1997 (1997-09-01), pages 3412 - 3420, XP000723533, ISSN: 0034-6748 *
SUZUKI Y ET AL: "X-Ray focusing with elliptical Kirkpatrick-Baez mirror system", JAPANESE JOURNAL OF APPLIED PHYSICS, PART 1 (REGULAR PAPERS & SHORT NOTES) JAPAN, vol. 30, no. 5, May 1991 (1991-05-01), pages 1127 - 1130, XP002436248, ISSN: 0021-4922 *

Also Published As

Publication number Publication date
DE50214385D1 (de) 2010-06-02
US20030112923A1 (en) 2003-06-19
EP1324351A2 (de) 2003-07-02
EP1324351B1 (de) 2010-04-21
DE10162093A1 (de) 2003-07-10
US6898270B2 (en) 2005-05-24

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