EP1344111A1 - Objectif pourvu d'au moins une lentille aspherique - Google Patents

Objectif pourvu d'au moins une lentille aspherique

Info

Publication number
EP1344111A1
EP1344111A1 EP01986853A EP01986853A EP1344111A1 EP 1344111 A1 EP1344111 A1 EP 1344111A1 EP 01986853 A EP01986853 A EP 01986853A EP 01986853 A EP01986853 A EP 01986853A EP 1344111 A1 EP1344111 A1 EP 1344111A1
Authority
EP
European Patent Office
Prior art keywords
lens
aspherical
lens surface
aspherical lens
lenses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP01986853A
Other languages
German (de)
English (en)
Inventor
Karl-Heinz Schuster
Frank Schillke
Franz-Josef Stickel
Alexander Epple
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Publication of EP1344111A1 publication Critical patent/EP1344111A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Definitions

  • the invention relates to a lens with at least one aspherical lens surface and a lens with at least one aspherical lens surface as well as a projection exposure system for microlithography and a method for producing microstructured components with a lens that has at least one aspherical lens surface.
  • projection objectives In particular in the projection objectives of microlithography, lenses with aspherical lens surfaces are increasingly being used to improve the imaging quality.
  • projection objectives are known, for example, from DE 198 18 444 AI, DE 199 42 281, US 5,990,926, US 4,948,328, EP 332 201 B1.
  • Aspherical lenses are increasingly used in projection lenses in microlithography to improve the image quality.
  • the permissible deviations between the target area and the real area are very small due to the ever smaller structures to be imaged.
  • special inspection optics are required. The quality of the aspherical lens surface is checked with this inspection lens.
  • the complexity of such inspection optics depends largely on the surface shape of the aspherical lens surface. It is particularly desirable to use aspherical lenses, the aspherical lens surface of which can be checked using inspection optics are that can be provided with reasonable effort and preferably consists of a small number of spherical lenses.
  • the polishing can also result in an undesirable and uneven change in the surface shape due to the polishing removal, which results in an impermissible change in the aspherical lens surface.
  • the invention has for its object to generate conditions necessary for the manufacture of aspherical lens surfaces.
  • the invention was also based on the object of providing a method with which new designs with aspherical lens surfaces can be generated without consulting production.
  • the object of the invention is achieved by the features given in patent claims 1 and 3.
  • the measure of describing the aspherical lens surfaces by Zernike polynomials made it possible to classify the aspherical lens surfaces in such a way that when at least two of the three conditions a) to c) according to claim 1 are present, the respective aspherical lens surface can be polished and with reasonable effort is testable.
  • condition c) has an advantageous effect on the manufacturability of aspherical lens surfaces.
  • Zernikepolynom Z49 ⁇ 0.2 ⁇ m creates a class of aspherical lens surfaces that are easy to manufacture and test.
  • the coefficients ZI 6, Z25, Z49, Z64 etc. could be called the overtones of the asphere.
  • the overtones of the asphere ever With fewer overtones, ie the faster the amplitudes of the components from the Zernikepolyn polynomials ZI 6 and larger fade away, the easier it is to manufacture an asphere.
  • a compensation optics made from lenses or a computer-generated hologram for checking the aspects becomes much less sensitive to tolerances.
  • a rapid decay of the amplitudes makes it possible to find isoplanatic compensation optics.
  • Figure 1 projection exposure system
  • FIG. 2 lens arrangement of a projection objective which is designed for the wavelength 351 nm;
  • Figure 4 Test arrangement of the aspherical lens used in Figure 2.
  • the projection exposure system has an illumination device 3 and a projection lens 5.
  • the projection objective 5 comprises a lens arrangement 19 with an aperture diaphragm AP, an optical axis 7 being defined by the lens arrangement 19.
  • a mask 9 is arranged between the illumination device 3 and the projection lens 5 and is held in the beam path by means of a mask holder 11.
  • Such masks 9 used in microlithography have a micrometer to nanometer structure, which are imaged on the image plane 13 by the projection objective 5 down to a factor of 10, in particular by a factor of 4.
  • a substrate or a wafer 15 positioned by a substrate holder 17 is held in the image plane 13.
  • the minimum structures that can still be resolved depend on the wavelength ⁇ of the light used for the illumination and on the aperture of the projection lens 5, the maximum achievable resolution of the projection exposure system increasing with decreasing wavelength of the illumination device 3 and with increasing aperture of the projection lens 5.
  • the lens arrangement 19 of a projection objective 5 for microlithography shown in FIG. 2 comprises 31 lenses which can be divided into 6 lens groups G1-G6. This lens arrangement is designed for the wavelength 351 nm.
  • the first lens group Gl begins with a negative lens Ll, followed by the four positive lenses L2 - L5. This first lens group has positive refractive power.
  • the second lens group G2 begins with a thick meniscus lens L6 with negative refractive power, which is curved toward the object.
  • This negative lens is followed by two further negative lenses L7 and L8.
  • the subsequent lens L9 is a meniscus lens of positive refractive power, which has a convex lens surface on the object side and is therefore curved toward the object.
  • the last lens of the second lens group is a meniscus lens of negative refractive power which is curved toward the image and is aspherized on the convex lens surface arranged on the south side.
  • This aspherical lens surface in the second lens group G2 makes it possible in particular to correct image errors in the region between the image field zone and the image field edge. In particular, the higher-order image errors that become apparent when viewing sagittal sections can be corrected. This is a particularly valuable contribution because these image errors, which can be seen in the sagittal section, are particularly difficult to correct.
  • This aspherical lens surface is mathematically described by the following formula with the Zemik polynomials Z9, Z16, Z25, Z36, Z 49 and Z 64. The following applies to the aspherical lens surface:
  • the coefficients assigned to the Zemik polynomials and the radius for the mathematical description of the aspherical lens surface are also given in the table.
  • the radius of the aspherical lens surface is determined in such a way that:
  • the third lens group G3 is formed by the following five lenses L1 1 - L15. In the middle of the third lens group, two thick positive lenses are arranged, the surfaces of which face one another and are strongly curved. A very thin positive lens L13, which has almost no refractive power, is arranged between these two thick positive lenses. This lens is of lesser importance, so that this lens can be dispensed with if necessary with minor modifications to the lens structure.
  • This third lens group has positive refractive power.
  • the fourth lens group G4 is formed by three negative lenses Ll 6 - Ll 8 and thus has negative refractive power.
  • the fifth lens group G5 is formed by lenses L19-L27.
  • the aperture is arranged after the first three positive lenses L19 - L21.
  • Two thick positive lenses are arranged after the diaphragm, in which the surfaces facing each other have a strong curvature.
  • This arrangement of the lenses L22 and L23 has an advantageous effect on the spherical aberration.
  • This arrangement of the lenses L22 and L23 takes into account the principle of the "lens of the best shape", ie there are strongly curved surfaces in a beam path of approximately parallel beams.
  • the sixth lens group G6 has a negative lens L28 as the first lens, followed by two thick lenses.
  • quartz glass it may be advantageous to use quartz glass as the lens material for the last two lenses of this lens group.
  • This lens is from object level 0 to the image plane 0 '1000 mm.
  • the image field is 8 x 26 mm.
  • the numerical aperture of this lens is 0.75. at a bandwidth of approximately 2.5 pm is permissible for this lens.
  • the exact lens data can be found in Table 1.
  • FIG. 3 shows a lens arrangement which is designed for the wavelength 193 nm and comprises 31 lenses. These 31 lenses can be divided into six lens groups Gl - G6.
  • the first lens group Gl comprises the lenses L101-L105 and has an overall positive refractive power.
  • the second lens group G2 comprises the lenses L106-L1 10.
  • This lens group has an overall negative refractive power and a waist is formed by this lens group.
  • the first three lenses L106-L108 have negative refractive power, the lens L109 being a meniscus lens curved by the reticle and having positive refractive power.
  • the lens L110 is a meniscus lens curved to the wafer and provided with an asphere AS 1 on the lens surface on the image side.
  • This aspherical lens surface AS 1 and the subsequent spherical lens surface S2 of the lens L1 11 form an almost equidistant air gap, which comprises at least a thickness of 10 mm.
  • the lens L1 11 already belongs to the lens group G3, which comprises the lenses of positive refractive power L111-L115.
  • This lens group G3 has positive refractive power overall.
  • the fourth lens group G4 is formed by the lenses Ll 16 - Ll 18 and has negative refractive power.
  • the fifth lens group is formed by lenses L119-L127 and has positive refractive power.
  • a diaphragm is arranged between the lenses L121 and L122.
  • the sixth lens group G6, which has positive refractive power, is formed by the lenses L128-L131.
  • the lens 11 is made of CaF 2 .
  • the use of CaF 2 at this point helps to reduce the transverse color error.
  • the positive lenses around the aperture ie two positive lenses in front of the aperture and the two positive lenses L122 and L123 after the aperture are made of CaF 2 . Since the longitudinal color error depends on both the beam diameter and the refractive power, the longitudinal color error in this area can be compensated well in the area of the diaphragm, since the beam diameter is greatest there and the refractive powers of the lenses are relatively high.
  • these CaF 2 lenses L120 - L123 may have a certain degree of inhomogeneity, which can be compensated for by a specific surface deformation on the respective lens. This is possible because there is only a slight variation in the beam inclinations.
  • This lens L130 is a lens which is particularly heavily exposed to radiation, so that the use of the material CaF helps to avoid compaction and lens heating, since the material CaF 2 shows fewer interaction effects than quartz glass.
  • the distance between object plane 0 and image plane 0 ' is 1000 mm and an image field of 8 * 26 mm 2 can be exposed.
  • the numerical aperture is 0.76.
  • the exact lens data can be found in Table 2.
  • L710 is at 950mbar.
  • K0 -31597.65 nm
  • K4 0
  • FIG. 4 shows a possible structure of a test lens which is suitable for checking the optical properties of the aspherical lens surface contained in FIGS. 2 and 3.
  • These inspection optics comprise 4 spherical lenses Tl to T4 made of quartz glass.
  • the length of this test setup is 480 mm.
  • the working distance i.e. the distance between the last lens of the test optics and the aspherical surface to be tested is 20 mm.
  • a test object can be tested up to a maximum diameter of 155.4 mm.
  • the input diameter of the test optics is 192.107 mm.
  • the maximum diameter of this test lens is 193.874 mm.
  • the deviation from the ideal wavefront is 0.384 at a test wavelength of 632.8 nm. This residual error can be compensated for by calculation.
  • inspection optics are characterized by the fact that they are isoplanatic.
  • the isoplanatic correction of the K optics is valuable because it maintains the imaging scale when imaging the aspherical lens surface from the center to the edge on the resulting interference image. This gives a constant lateral resolution in the aspherical test. Due to the interference pattern that results when irradiated with a flat wavefront, the surface shape of the aspherical lens surface is determined by the interference pattern that appears.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne une lentille pourvue d'au moins une surface asphérique. Lors de la description de la surface asphérique (AS1) de la lentille par des polynômes de Zernike, au moins deux des conditions suivantes (a, b, c) sont satisfaites, le rayon étant déterminé de telle façon que K4 = 0 .
EP01986853A 2000-12-22 2001-12-06 Objectif pourvu d'au moins une lentille aspherique Withdrawn EP1344111A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10065944 2000-12-22
DE10065944 2000-12-22
PCT/EP2001/014314 WO2002052346A1 (fr) 2000-12-22 2001-12-06 Objectif pourvu d'au moins une lentille aspherique

Publications (1)

Publication Number Publication Date
EP1344111A1 true EP1344111A1 (fr) 2003-09-17

Family

ID=7669554

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01986853A Withdrawn EP1344111A1 (fr) 2000-12-22 2001-12-06 Objectif pourvu d'au moins une lentille aspherique

Country Status (5)

Country Link
US (1) US6831794B2 (fr)
EP (1) EP1344111A1 (fr)
JP (1) JP2004516526A (fr)
KR (1) KR20030072568A (fr)
WO (1) WO2002052346A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002052303A2 (fr) * 2000-12-22 2002-07-04 Carl Zeiss Smt Ag Objectif de projection
JP2005017506A (ja) * 2003-06-24 2005-01-20 Ricoh Co Ltd 原稿読取レンズ・原稿読取レンズユニット及び原稿読取装置及び画像形成装置
JP2005017734A (ja) * 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
WO2005033800A1 (fr) * 2003-09-09 2005-04-14 Carl Zeiss Smt Ag Objectif de lithographie et installation d'eclairage par projection dotee d'au moins un objectif de lithographie de ce type
JP2005331784A (ja) * 2004-05-20 2005-12-02 Fuji Xerox Co Ltd 光学レンズ系およびこれを用いた位置計測システム
TWI454731B (zh) 2005-05-27 2014-10-01 卡爾蔡司Ｓｍｔ有限公司 用於改進投影物鏡的成像性質之方法以及該投影物鏡

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0332201B1 (fr) 1988-03-11 1994-06-29 Matsushita Electric Industrial Co., Ltd. Système de projection optique
US5164750A (en) * 1990-11-08 1992-11-17 Yoshi Adachi Aspheric surface topographer
US6018424A (en) * 1996-12-11 2000-01-25 Raytheon Company Conformal window design with static and dynamic aberration correction
DE19818444A1 (de) 1997-04-25 1998-10-29 Nikon Corp Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren
US6075650A (en) * 1998-04-06 2000-06-13 Rochester Photonics Corporation Beam shaping optics for diverging illumination, such as produced by laser diodes
DE19942281A1 (de) * 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
WO2001050171A1 (fr) * 1999-12-29 2001-07-12 Carl Zeiss Objectif de projection pourvu de surfaces de lentilles aspheriques disposees l'une a cote de l'autre

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO02052346A1 *

Also Published As

Publication number Publication date
JP2004516526A (ja) 2004-06-03
US20040212899A1 (en) 2004-10-28
US6831794B2 (en) 2004-12-14
KR20030072568A (ko) 2003-09-15
WO2002052346A1 (fr) 2002-07-04

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