EP1344112A2 - Objectif de projection - Google Patents

Objectif de projection

Info

Publication number
EP1344112A2
EP1344112A2 EP01989598A EP01989598A EP1344112A2 EP 1344112 A2 EP1344112 A2 EP 1344112A2 EP 01989598 A EP01989598 A EP 01989598A EP 01989598 A EP01989598 A EP 01989598A EP 1344112 A2 EP1344112 A2 EP 1344112A2
Authority
EP
European Patent Office
Prior art keywords
lens
refractive power
lens group
lenses
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP01989598A
Other languages
German (de)
English (en)
Inventor
Karl-Heinz Schuster
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10126946A external-priority patent/DE10126946A1/de
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of EP1344112A2 publication Critical patent/EP1344112A2/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Definitions

  • the invention relates to a projection lens according to the preamble of patent claim 1.
  • a projection lens is known from DE 199 42 281.8, FIGS. 8-10, the first lens group of which has negative refractive power and consists of 4 negative lenses. Also known from EP 712 019 A2, US 5,969,803, US 5,986,824 and DE 198 18 444 AI projection lenses with a first lens group of negative refractive power, which consist of at least four negative lenses.
  • a projection lens that has a lens group of negative refractive power, which consists of three negative lenses.
  • Projection lenses are known from the documents US Pat. No. 6,084,723, EP 721 150 A2, US Pat. No. 6,088,171 and DE 198 18 444 A1 which have a lens group of negative refractive power, by means of which a first waist is formed, and which consists of four negative lenses, after the first negative lens a lens with positive refractive power is arranged.
  • a lens group of negative refractive power is known from DE 199 42 281, FIGS. 2-4, which consists of four negative lenses, a positive lens being arranged after the second negative lens.
  • a meniscus lens that is bent to the image is provided as a positive lens.
  • the object of the invention was to develop a lens group of negative refractive power which has an advantageous effect on the imaging properties of a projection lens.
  • the object of the invention is achieved by the features given in claim 1.
  • the invention was also based on the object of improving the imaging properties of a projection objective, in particular for an illumination wavelength of 193 nm, with low use of calcium fluoride.
  • This lens group of negative refractive power consists of four lenses of negative refractive power, with a lens of positive refractive power being arranged after the third lens of negative refractive power, the imaging properties of the objective could be improved.
  • This configuration with the lens of positive refractive power has a particularly advantageous effect from the astigmatism and the coma correction.
  • the lens of positive refractive power is provided on the object side with a convex lens surface.
  • Figure 1 projection exposure system
  • FIG. 2 lithography objective, in particular for 193 nm
  • FIG. 3 lithography objective, in particular for the wavelength 193 nm
  • Figure 4 Lithography lens, especially for one
  • Illumination wavelength of 351 nm and FIG. 5 lithography objective, in particular for one
  • the projection exposure system 1 has an illumination device 3 and a projection objective 5.
  • the projection objective comprises a lens arrangement 19 with an aperture diaphragm AP, an optical axis 7 being defined by the lens arrangement 19.
  • a mask 9 is arranged between the illumination device 3 and the projection lens 5 and is held in the beam path by means of a mask holder 11.
  • Such masks 9 used in microlithography have a micrometer to nanometer structure.
  • This structure of the mask is imaged on the image plane 13 by means of the projection lens 5 down to a factor of ten, in particular by a factor of four.
  • a substrate or a wafer 15 positioned by a substrate holder 17 is held in the image plane 13.
  • the minimum structures that can still be resolved depend on the wavelength ⁇ of the light used for the illumination and on the image-side aperture of the projection lens 5, the maximum achievable resolution of the projection exposure system 1 increasing with decreasing wavelength of the illumination device 3 and with increasing aperture of the projection lens 5.
  • FIGS. 2 and 5 Different embodiments of lens arrangements 19 are shown in FIGS. 2 and 5.
  • FIG. 2 shows a lens arrangement 19 which is designed for an illumination wavelength of 193 nm and an image-side aperture of 0.75. With this lens arrangement, the distance between the project plane 0 and image plane 0 '1000 mm.
  • the projection lens shown comprises 31 lenses L1-L31, which can be divided into six lens groups LG1-LG6.
  • a first lens group LG1 has positive refractive power and consists of the lenses L1-L5.
  • the adjoining lens group LG2 has an overall negative refractive power; on.
  • the first lens of this lens group L6 is a thick meniscus lens, the center thickness of which is at least 15% of the maximum lens diameter in the region of the optical axis. This lens has a particularly advantageous effect on the leveling of the image shell in the tangential and sagital directions.
  • Two further lenses of negative refractive power track this lens L6.
  • two biconave lenses are provided for these lenses L7 and L8.
  • the adjoining lens L9 has positive refractive power.
  • This lens L9 is a meniscus lens bent towards the image with a concave radius of curvature on the image side. This lens has an advantageous effect with regard to astigmatism, coma and gutter defects.
  • the subsequent lens L10 has negative refractive power and is a meniscus lens that is bent towards the image.
  • This lens L10 is provided with an asphere on the image side. This asphere in particular allows image errors in the area between the image field zone and the image field edge to be corrected. This correction in particular increases the image quality in the sagital direction.
  • a waist is formed by this second lens group LG2, which has negative refractive power.
  • the subsequent third lens group LG3 has positive refractive power and consists of lenses L1 1 to L14.
  • This third lens group LG3 is followed by a fourth lens group LG4, which has negative refractive power and through which a second waist is formed.
  • This fourth lens group LG4 comprises the lenses L15-L18, the lens L15 being a meniscus lens bent toward the image with a concave surface curvature on the image side.
  • the fifth lens group LG5 comprises the lenses L19-L27 and has positive refractive power overall.
  • An aperture is arranged between the positive lenses L21 and L22.
  • the maximum diameter of this lens group or the projection lens is approx. 240 mm.
  • the sixth lens group LG6 also has positive refractive power and comprises the lenses L28-L31, the lens L31 being a plane-parallel plate.
  • the L30 lens which is heavily exposed to radiation, consists of calcium fluoride to reduce compaction. Quartz glass is provided as the lens material for the other lenses.
  • quartz glass as a lens material has the advantage that, compared to calcium fluoride, this material is available on the market and is a cheaper material compared to fluoride crystals such as calcium fluoride and barium fluoride, to name just a few.
  • the longitudinal color error for the bandwidth of 0.25 pm, i.e. ⁇ 0.125 pm is a maximum of ⁇ 57.5 nm.
  • the transverse color error does not reach a value greater than ⁇ 1.2 nm for ⁇ ⁇ 0.125pm.
  • the RMS value is an established measure, eg established in CODE N, how strongly the wavefront deviates from the wavefront of an ideal spherical wave. In this exemplary embodiment, the RMS value for all pixels is less than 7.0 m ⁇ .
  • the numerical aperture of this projection lens is 0J5.
  • the transverse color error in this embodiment variant is at most ⁇ 0.82 nm for ⁇ ⁇ 0.125 pm and the longitudinal color error is at most ⁇ 57.5 nm.
  • the lens data of the modified variant with two calcium fluoride lenses are shown in Table 2.
  • L710 is air at 950mbar
  • the lens arrangement 19 shown in FIG. 3 has 31 lenses L1-L31, which can be divided into six lens groups LG1-LG6.
  • the distance between object plane 0 and image plane 0 ' is 1000 mm.
  • the first lens group has positive refractive power and consists of the lenses L1-L5.
  • the first lens L1 is a biconcave lens and has negative refractive power.
  • the subsequent lenses L2-L5 are biconvex lenses that have positive refractive power.
  • the second lens group LG2 consists of the lenses L6-L10, the lenses L6 to L8 having negative refractive power.
  • the lens L9 has positive refractive power.
  • This lens L9 is in turn a meniscus lens with a concave surface on the image side.
  • the lens L10 has a negative refractive power and is provided with an aspherical lens surface on the image side. This lens surface can be used to correct, in particular, higher-order image errors.
  • the adjoining lens group LG3 has positive refractive power.
  • a stomach is formed by this lens group with the lenses L1 1-L14.
  • the lens L14 is provided with a flat surface on the image side.
  • the arrangement of the lens group LG3 has the special feature that unusually large air gaps are provided on both sides between the lens groups LG2 and LG4 adjacent to the lens group LG3.
  • the special arrangement of the third lens group reduced the derivative of the wavefront across all image heights.
  • the sum of the two air spaces before and after the LG3 is significantly larger than the sum of the glass thicknesses of the following lens group LG 4. This has a particularly advantageous effect on the transverse aberrations.
  • the fourth lens group LG4 through which a second waist is formed, consists of the lenses L15-L18.
  • the lens L15 is bent towards the object.
  • the lens L19, the lens group LG5 adjoining it, has lens surfaces which are bent and approximately parallel to the image.
  • the difference in the radii is less than 3% based on the smaller radius. In particular, the absolute radius difference is less than 4mm.
  • the refractive power of this lens L19 is, with f ⁇ > 4000, very low.
  • the lens group LG5 comprises the further lenses L20-L27, an aperture being arranged between the lens L21-L22.
  • the last lens group LG6 is formed by the lenses L28-L31, where L31 is a plane parallel plate.
  • This lens arrangement 19 shown in FIG. 3 is designed for the wavelength 193 nm.
  • the bandwidth of the light source is 0.25 pm.
  • a field of 10.5 ⁇ 26 mm can be exposed by means of this lens arrangement 19.
  • the numerical aperture of this lens arrangement is 0.75 on the image side.
  • the RMS value as a deviation from the ideal spherical wave is monochromatic less than 5m ⁇ referred to 193nm.
  • the transverse color error is smaller than ⁇ 1.4 nm for ⁇ ⁇ 0.125 pm and the longitudinal color error is smaller than ⁇ 58J5nm in the entire image field.
  • L710 is air at 950mbar
  • the lens arrangement 19 of a lithography objective shown in FIG. 4 is designed for the exposure wavelength of 351 nm.
  • the light source should have a maximum bandwidth "of 3.25 pm.
  • the numerical aperture is 0J5.
  • This lens array 19 has a length from the object plane 0 to the image plane on O'von 1000mm.
  • This lens arrangement 19 shown in FIG. 4 can be subdivided into six lens groups LG1-LG6.
  • the first lens group begins with a negative lens Ll, followed by the four positive lenses L2 - L5. This first lens group has positive refractive power.
  • the second lens group begins with a meniscus lens L6 of negative refractive power, which is curved toward the object. This negative lens is followed by two further negative lenses L 7 and L 8.
  • the following lens L9 is a meniscus lens with positive refractive power, which has a convex lens surface on the object side and is therefore curved toward the lens.
  • the last lens of the second lens group is a meniscus lens of negative refractive power which is curved toward the image and is aspherized on the convex lens surface arranged on the image side. This second lens group has negative refractive power.
  • the third lens group is formed by the following five lenses L1 1 - L15. In the middle of the third lens group, two thick positive lenses are arranged, the surfaces of which face one another and are strongly curved. A very thin positive lens L13, which has almost no refractive power, is arranged between these two thick positive lenses. This lens is of lesser importance, so that this lens can be dispensed with if necessary with minor modifications to the lens structure.
  • This third lens group has positive refractive power.
  • the fourth lens group is formed by three negative lenses L16 - L18.
  • the fifth lens group is formed by lenses L19-L27.
  • the aperture is arranged after the first three positive lenses L19 - L21.
  • Two thick positive lenses are arranged after the diaphragm, in which the surfaces facing each other have a strong curvature.
  • This arrangement of the lenses L22 and L23 has an advantageous effect on the spherical aberration.
  • This arrangement of the lenses L22 and L23 makes it one of the Principle of the "best shape lens" taken into account, ie there are strongly curved surfaces in a beam path of approximately parallel beams.
  • the sixth lens group has a negative lens L28 as the first lens, followed by two thick lenses.
  • all lenses consist of the material with a refractive index of 1.506 at 351 nm, for example the material FK5 from Schott.
  • quartz glass can be used as the lens material for the last two lenses of this lens group.
  • the exact lens data can be found in Table 4. With this lens arrangement, a field of 8 x 26 mm can be exposed with an aperture of 0J5 on the image side. A bandwidth of around 3.25pm is permitted with this lens.
  • the RMS value as a deviation from the ideal spherical wave is monochromatically less than 6 m ⁇ .
  • the transverse color error is smaller than ⁇ 0.1 nm for ⁇ ⁇ 1.625 pm and the longitudinal color error is smaller than ⁇ 104nm in the entire image field. This allows structure widths of 180 nm to be created.
  • the aspherical surfaces are given by the equation:
  • the aspherical surfaces are given by the equation:
  • L710 is air at 950mbar
  • FIG. 5 shows a lens arrangement 19 with an aperture of 0.7 on the image side, which can be divided into six lens groups and consists only of spherical lenses.
  • this exemplary embodiment has an extremely long first lens group which comprises the lenses L1-L5.
  • This elongated abdomen is largely formed by the thick positive lenses L4 and L5. Due to this first elongated abdomen, only slight distortion is achieved with spherical lenses, a poorer entrance telecentricity due to the shape of this first abdomen, which can be compensated for by the lighting system, being accepted.
  • This first lens group has positive refractive power.
  • the second lens group L2 comprises four negative lenses, again a positive meniscus lens L9, which is curved toward the object, being arranged between the third negative lens L8 and fourth negative lens L10. In this embodiment, no aspherical lens surface is provided.
  • This configuration of the first lens group LG2 with negative refractive power allows in particular astigmatism, coma and channel defects to be corrected.
  • the third lens group comprises the lenses L1 1 - L15 and has positive refractive power. In contrast to the first exemplary embodiment, the lenses L12 and L14 are less pronounced in this exemplary embodiment. This third lens group in particular has a positive effect on the imaging quality in the quadrants.
  • the fourth lens group LG4 is formed by three negative lenses despite the high aperture of 0J0 and thus has negative refractive power.
  • the subsequent fifth lens group LG5, which has positive refractive power, begins with the three positive lenses L19-L21, behind which an aperture is arranged.
  • two thick positive lenses L22 and L23 are arranged behind the diaphragm, which are formed with lens surfaces that are strongly curved with respect to one another.
  • the adjoining lenses L24 and L25 are intended for the correction of the oblique spherical aberration in the sagital and tangential direction.
  • the sixth lens group LG6 comprises the lenses L28-L31 and has positive refractive power.
  • the length from image plane 0 to objective plane 0 ' is 1000 mm, an image field of 8 x 26 mm being illuminated. All lenses are made of crown glass, e.g. FK 5 from SCHOTT. With a diagonal field of view diameter of 27.20 mm, the lens requires laser light with a half width of approx. 4.3 pm for the imaging of 210 nm wide structures. For a ⁇ of ⁇ 2.15 pm, the longitudinal color error is ⁇ 140 nm, the transverse color error is a maximum of 2.4 nm. The exact lens data can be found in Table 5.
  • L710 is air at 950 mbar.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne une installation d'éclairage de projection et un objectif de projection comportant un ensemble de lentilles qui comprend au moins un groupe de lentilles (LG2) à réfringence négative, ce groupe de lentilles comportant au moins quatre lentilles à réfringence négative et une lentille (L9) à réfringence positive qui est montée après la troisième lentille (L8) à réfringence négative.
EP01989598A 2000-12-22 2001-12-15 Objectif de projection Withdrawn EP1344112A2 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE10065944 2000-12-22
DE10065944 2000-12-22
DE10126946A DE10126946A1 (de) 2000-11-02 2001-06-01 Projektionsobjektiv
DE10126946 2001-06-01
PCT/EP2001/014846 WO2002052303A2 (fr) 2000-12-22 2001-12-15 Objectif de projection

Publications (1)

Publication Number Publication Date
EP1344112A2 true EP1344112A2 (fr) 2003-09-17

Family

ID=26008138

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01989598A Withdrawn EP1344112A2 (fr) 2000-12-22 2001-12-15 Objectif de projection

Country Status (4)

Country Link
US (1) US6954316B2 (fr)
EP (1) EP1344112A2 (fr)
JP (1) JP2004524554A (fr)
WO (1) WO2002052303A2 (fr)

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Also Published As

Publication number Publication date
US20030048547A1 (en) 2003-03-13
WO2002052303A3 (fr) 2002-10-31
JP2004524554A (ja) 2004-08-12
US6954316B2 (en) 2005-10-11
WO2002052303A2 (fr) 2002-07-04

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