EP1372148A3 - Support d'enregistrement optique, procédé de fabrication dumême, cible de pulverisation cathodique pour le procédé de fabrication dumême et procédé d'enregistrement utilisant lemême - Google Patents

Support d'enregistrement optique, procédé de fabrication dumême, cible de pulverisation cathodique pour le procédé de fabrication dumême et procédé d'enregistrement utilisant lemême Download PDF

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Publication number
EP1372148A3
EP1372148A3 EP03012695A EP03012695A EP1372148A3 EP 1372148 A3 EP1372148 A3 EP 1372148A3 EP 03012695 A EP03012695 A EP 03012695A EP 03012695 A EP03012695 A EP 03012695A EP 1372148 A3 EP1372148 A3 EP 1372148A3
Authority
EP
European Patent Office
Prior art keywords
same
manufacturing
optical recording
recording medium
sputtering target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP03012695A
Other languages
German (de)
English (en)
Other versions
EP1372148B1 (fr
EP1372148A2 (fr
Inventor
Makoto Harigaya
Kazunori Ito
Hiroko Tashiro
Miku Wakamori Mizutani
Michiaki Shinotsuka
Hiroyuki Iwasa
Masaru Shinkai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2002189628A external-priority patent/JP2004025801A/ja
Priority claimed from JP2002214500A external-priority patent/JP3920731B2/ja
Priority to EP05011265A priority Critical patent/EP1566801B1/fr
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to EP05011266A priority patent/EP1566802B1/fr
Priority to EP05011263A priority patent/EP1569214B1/fr
Priority to EP05011264A priority patent/EP1566800B1/fr
Publication of EP1372148A2 publication Critical patent/EP1372148A2/fr
Publication of EP1372148A3 publication Critical patent/EP1372148A3/fr
Publication of EP1372148B1 publication Critical patent/EP1372148B1/fr
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0617—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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    • C23C14/584—Non-reactive treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
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    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/257—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
EP03012695A 2002-06-05 2003-06-04 Support d'enregistrement optique, procédé de fabrication dumême et procédé d'enregistrement utilisant lemême Expired - Lifetime EP1372148B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP05011264A EP1566800B1 (fr) 2002-06-05 2003-06-04 Support d'enregistrement optique, procédé de fabrication du même, cible de pulverisation cathodique pour le procédé de fabrication du même et procédé d'enregistrement utilisant le même
EP05011265A EP1566801B1 (fr) 2002-06-05 2003-06-04 Cible de pulvérisation cathodique pour la fabrication d'un support d'enregistrement optique
EP05011266A EP1566802B1 (fr) 2002-06-05 2003-06-04 procédé d'enregistrement optique
EP05011263A EP1569214B1 (fr) 2002-06-05 2003-06-04 Support d'enregistrement optique, procédé de fabrication dumême, cible de pulverisation cathodique pour le procédé de fabrication dumême et procédé d'enregistrement utilisant lemême

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
JP2002163793 2002-06-05
JP2002163793 2002-06-05
JP2002189628A JP2004025801A (ja) 2002-06-28 2002-06-28 相変化型情報記録媒体
JP2002189628 2002-06-28
JP2002198114 2002-07-08
JP2002198114 2002-07-08
JP2002214500 2002-07-23
JP2002214500A JP3920731B2 (ja) 2002-07-23 2002-07-23 相変化型光記録媒体
JP2002258638 2002-09-04
JP2002258638 2002-09-04
JP2002344719 2002-11-27
JP2002344719 2002-11-27

Related Child Applications (4)

Application Number Title Priority Date Filing Date
EP05011263A Division EP1569214B1 (fr) 2002-06-05 2003-06-04 Support d'enregistrement optique, procédé de fabrication dumême, cible de pulverisation cathodique pour le procédé de fabrication dumême et procédé d'enregistrement utilisant lemême
EP05011265A Division EP1566801B1 (fr) 2002-06-05 2003-06-04 Cible de pulvérisation cathodique pour la fabrication d'un support d'enregistrement optique
EP05011266A Division EP1566802B1 (fr) 2002-06-05 2003-06-04 procédé d'enregistrement optique
EP05011264A Division EP1566800B1 (fr) 2002-06-05 2003-06-04 Support d'enregistrement optique, procédé de fabrication du même, cible de pulverisation cathodique pour le procédé de fabrication du même et procédé d'enregistrement utilisant le même

Publications (3)

Publication Number Publication Date
EP1372148A2 EP1372148A2 (fr) 2003-12-17
EP1372148A3 true EP1372148A3 (fr) 2004-03-03
EP1372148B1 EP1372148B1 (fr) 2007-09-12

Family

ID=29587936

Family Applications (5)

Application Number Title Priority Date Filing Date
EP05011265A Expired - Lifetime EP1566801B1 (fr) 2002-06-05 2003-06-04 Cible de pulvérisation cathodique pour la fabrication d'un support d'enregistrement optique
EP05011266A Expired - Lifetime EP1566802B1 (fr) 2002-06-05 2003-06-04 procédé d'enregistrement optique
EP05011263A Expired - Lifetime EP1569214B1 (fr) 2002-06-05 2003-06-04 Support d'enregistrement optique, procédé de fabrication dumême, cible de pulverisation cathodique pour le procédé de fabrication dumême et procédé d'enregistrement utilisant lemême
EP03012695A Expired - Lifetime EP1372148B1 (fr) 2002-06-05 2003-06-04 Support d'enregistrement optique, procédé de fabrication dumême et procédé d'enregistrement utilisant lemême
EP05011264A Expired - Lifetime EP1566800B1 (fr) 2002-06-05 2003-06-04 Support d'enregistrement optique, procédé de fabrication du même, cible de pulverisation cathodique pour le procédé de fabrication du même et procédé d'enregistrement utilisant le même

Family Applications Before (3)

Application Number Title Priority Date Filing Date
EP05011265A Expired - Lifetime EP1566801B1 (fr) 2002-06-05 2003-06-04 Cible de pulvérisation cathodique pour la fabrication d'un support d'enregistrement optique
EP05011266A Expired - Lifetime EP1566802B1 (fr) 2002-06-05 2003-06-04 procédé d'enregistrement optique
EP05011263A Expired - Lifetime EP1569214B1 (fr) 2002-06-05 2003-06-04 Support d'enregistrement optique, procédé de fabrication dumême, cible de pulverisation cathodique pour le procédé de fabrication dumême et procédé d'enregistrement utilisant lemême

Family Applications After (1)

Application Number Title Priority Date Filing Date
EP05011264A Expired - Lifetime EP1566800B1 (fr) 2002-06-05 2003-06-04 Support d'enregistrement optique, procédé de fabrication du même, cible de pulverisation cathodique pour le procédé de fabrication du même et procédé d'enregistrement utilisant le même

Country Status (3)

Country Link
EP (5) EP1566801B1 (fr)
DE (5) DE60320018T2 (fr)
TW (1) TWI272606B (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4249590B2 (ja) 2002-11-18 2009-04-02 株式会社リコー 光情報記録媒体およびその製造方法
JP3977740B2 (ja) * 2002-12-27 2007-09-19 株式会社リコー 相変化型光記録媒体とその記録方法
DE602004023166D1 (de) * 2003-10-16 2009-10-29 Ricoh Kk Medium zur optischen Datenspeicherung und Verfahren zu dessen Herstellung
TW200614224A (en) * 2004-07-15 2006-05-01 Tdk Corp Optical recording medium
DE102004041191A1 (de) * 2004-08-25 2006-03-02 Infineon Technologies Ag Neue Materialien für elektrische Phasenwechselspeicher
JP2006155794A (ja) 2004-11-30 2006-06-15 Tdk Corp 光記録媒体及びその試験方法
DE102005031394A1 (de) * 2005-07-05 2007-01-18 Infineon Technologies Ag Aufbau und Verfahren zur Herstellung von Phasenwechselspeichern mit bestimmten Schalteigenschaften
WO2007083837A1 (fr) 2006-01-23 2007-07-26 Ricoh Company, Ltd. Support d'enregistrement optique
JP4871062B2 (ja) 2006-03-01 2012-02-08 株式会社リコー スパッタリングターゲット及びその製造方法、並びに追記型光記録媒体
JP2009080895A (ja) * 2007-09-26 2009-04-16 Toshiba Corp 情報記録媒体及びこの媒体を用いたディスク装置
EP2447945A4 (fr) * 2009-06-24 2015-09-02 Mitsubishi Kagaku Media Co Ltd Support d'enregistrement optique
US9917252B2 (en) * 2015-06-19 2018-03-13 Macronix International Co., Ltd. GaSbGe phase change memory materials
JP7283273B2 (ja) * 2019-07-01 2023-05-30 株式会社レゾナック 磁気記録媒体およびその製造方法ならびに磁気記録再生装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0354528A2 (fr) * 1988-08-09 1990-02-14 EASTMAN KODAK COMPANY (a New Jersey corporation) Matériaux d'enregistrement optique comprenant des alliages d'antimoine et d'étain avec un troisième élément
US5314734A (en) * 1992-02-10 1994-05-24 Hitachi, Ltd. Information-recording medium
US5848043A (en) * 1995-03-31 1998-12-08 Mitsubishi Chemical Corporation Modulation of laser power in accordance with a linear velocity by pulse division schemes
US5912104A (en) * 1993-06-18 1999-06-15 Hitachi, Ltd. Information recording medium
US6383595B1 (en) * 1997-08-01 2002-05-07 Hitachi, Ltd. Information recording medium
WO2002084657A1 (fr) * 2001-04-12 2002-10-24 Koninklijke Philips Electronics N.V. Support de stockage de donnees optique reenregistrable et utilisation d'un tel support
EP1260973A2 (fr) * 2001-05-21 2002-11-27 Ricoh Company, Ltd. Procédé d'enregistrement optique et support d'enregistrement optique

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0354528A2 (fr) * 1988-08-09 1990-02-14 EASTMAN KODAK COMPANY (a New Jersey corporation) Matériaux d'enregistrement optique comprenant des alliages d'antimoine et d'étain avec un troisième élément
US5314734A (en) * 1992-02-10 1994-05-24 Hitachi, Ltd. Information-recording medium
US5912104A (en) * 1993-06-18 1999-06-15 Hitachi, Ltd. Information recording medium
US5848043A (en) * 1995-03-31 1998-12-08 Mitsubishi Chemical Corporation Modulation of laser power in accordance with a linear velocity by pulse division schemes
US6383595B1 (en) * 1997-08-01 2002-05-07 Hitachi, Ltd. Information recording medium
WO2002084657A1 (fr) * 2001-04-12 2002-10-24 Koninklijke Philips Electronics N.V. Support de stockage de donnees optique reenregistrable et utilisation d'un tel support
EP1260973A2 (fr) * 2001-05-21 2002-11-27 Ricoh Company, Ltd. Procédé d'enregistrement optique et support d'enregistrement optique

Also Published As

Publication number Publication date
EP1566802B1 (fr) 2008-01-09
DE60320018D1 (de) 2008-05-08
DE60316223D1 (de) 2007-10-25
DE60318615T2 (de) 2008-12-24
EP1372148B1 (fr) 2007-09-12
EP1566801A1 (fr) 2005-08-24
DE60320017T2 (de) 2009-04-16
EP1372148A2 (fr) 2003-12-17
DE60316223T2 (de) 2008-06-05
DE60320017D1 (de) 2008-05-08
TWI272606B (en) 2007-02-01
EP1566800A1 (fr) 2005-08-24
DE60320018T2 (de) 2009-06-18
EP1569214A1 (fr) 2005-08-31
TW200405323A (en) 2004-04-01
EP1566801B1 (fr) 2008-07-16
EP1566800B1 (fr) 2008-03-26
EP1566802A1 (fr) 2005-08-24
DE60322252D1 (de) 2008-08-28
EP1569214B1 (fr) 2008-03-26
DE60318615D1 (de) 2008-02-21

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