EP1397671A2 - Dispositif de mesure - Google Patents

Dispositif de mesure

Info

Publication number
EP1397671A2
EP1397671A2 EP02800094A EP02800094A EP1397671A2 EP 1397671 A2 EP1397671 A2 EP 1397671A2 EP 02800094 A EP02800094 A EP 02800094A EP 02800094 A EP02800094 A EP 02800094A EP 1397671 A2 EP1397671 A2 EP 1397671A2
Authority
EP
European Patent Office
Prior art keywords
sample
measuring arrangement
arrangement according
measuring
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP02800094A
Other languages
German (de)
English (en)
Inventor
Hans-Jürgen DOBSCHAL
Reinhard Steiner
Jörg BISCHOFF
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss Microelectronic Systems GmbH
Original Assignee
Carl Zeiss Microelectronic Systems GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Microelectronic Systems GmbH filed Critical Carl Zeiss Microelectronic Systems GmbH
Publication of EP1397671A2 publication Critical patent/EP1397671A2/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4788—Diffraction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4711—Multiangle measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4711—Multiangle measurement
    • G01N2021/4714—Continuous plural angles
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4735—Solid samples, e.g. paper, glass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4792—Polarisation of scatter light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0635—Structured illumination, e.g. with grating

Definitions

  • the present invention relates to a measuring arrangement with a radiation source, a deflection device arranged downstream thereof, which can be acted upon by a beam emanating from the radiation source and deflecting it successively in different directions, and further with a first and a second optical device and a detector, the first optical device deflects the rays coming from the deflecting device in each case as a measuring beam onto a point of a sample to be arranged in a measuring position such that the angle of incidence of the measuring beam on the sample varies depending on the direction, and of the sample due to the interaction of the measuring beams with the Sample outgoing sample beams are deflected onto the detector by means of the second optical device.
  • this object is achieved in a measuring arrangement of the type mentioned at the outset in that at least one of the two optical devices has a diffractive element for deflection, which diffracts the rays incident from different directions in such a way that the diffracted rays of a predetermined diffraction order are focused into one point.
  • a diffractive element for deflection which diffracts the rays incident from different directions in such a way that the diffracted rays of a predetermined diffraction order are focused into one point.
  • the diffractive element if it is reflective, acts as an ellipsoidal mirror for the predetermined diffraction order (which is preferably not the zero, but rather a higher diffraction order, such as the positive or negative first diffraction order) with which everyone comes from the deflection device Beams onto the sample or all rays coming from the sample can be deflected onto the detector.
  • the predetermined diffraction order which is preferably not the zero, but rather a higher diffraction order, such as the positive or negative first diffraction order
  • the diffractive element can also be transmissive. In this case it acts like a lens with two optically conjugated points.
  • the focussing effect of the diffractive element (transmissive or reflective) for the predetermined diffraction order is preferably ensured for all rays emanating from the first point that strike the diffractive element within a predetermined angular range.
  • the position of the two points can advantageously be chosen relatively freely by appropriately designing the diffractive element.
  • the point or surface element that the focused rays hit or into which the rays are focused is always referred to here.
  • the diffractive element is designed as a reflective element, as a result of which the beam path can be folded, which leads to a more compact arrangement.
  • the diffractive element of the first and the second optical device can be formed as a single element. In this case, the complex and very difficult adjustment that is required when both optical devices are realized by conventional mirrors is eliminated. The problem also arises that the two optical devices partially shade each other, completely, and the relative adjustment of the two diffractive elements to one another no longer has to be carried out.
  • the diffractive element is formed on a flat side of a carrier.
  • the diffractive element can be a phase grating.
  • Such a phase grating can easily be produced with the required accuracy in a reproducible manner, so that the desired effect of the diffractive element can be ensured.
  • the deflection device can comprise a pivotable or rotatable mirror (e.g. a galvanometer mirror) with which the desired deflection can be carried out with the required accuracy.
  • a pivotable or rotatable mirror e.g. a galvanometer mirror
  • the diffractive element can be a switchable grating which can be adjusted in accordance with the wavelength of the beam striking the deflecting element. This makes it possible to set the diffractive element to different wavelengths during the measurement, so that if the light source generates the beam with different wavelengths in succession during the measurement, spectral implementation of the angle-resolved photometric measurement is also made possible.
  • Spatial light modulators in transmission or reflection can be used as switchable gratings.
  • reflective or transmissive LCD modules or reflective tilting mirror matrices can be used.
  • a polychromatic source with a downstream, adjustable monochromator can be used as the radiation source, which can emit a beam with different wavelengths.
  • a further embodiment of the measuring arrangement according to the invention is that an aperture is provided in the beam path from the sample to the detector, which is dependent on the deflection effected by means of the deflection device is movable in such a way that sample beams of one or more predetermined diffraction orders are shadowed and thus do not strike the detector. This ensures that only sample beams of one or more desired diffraction orders are detected by the detector.
  • Fig. 1 is a schematic view of the measuring arrangement according to the invention
  • Fig. 2 is a schematic plan view of part of the reflection grating
  • the measuring arrangement comprises a light source 1 (for example an argon-ion laser) which has a coherent beam 2 with a predetermined wavelength (in the case of the argon-ion laser the wavelength is 457.9 nm), and a lens 3 and a rotating mirror 5 rotatable about an axis of rotation 4.
  • the beam 2 is focused by means of the lens 3 such that the focused beam 2 strikes the intersection S of the axis of rotation 4 with the plane of the drawing ,
  • the measuring arrangement further includes a detector 6 and a reflection grating 7, which is formed on a flat side of a carrier plate 8 and has a first and a second section 9, 10, which adjoin one another at a center M in the illustration in FIG. 1.
  • the measuring arrangement is designed so that a sample point P of a sample 11 can be examined if the sample 11 is arranged in a measuring plane 12 running parallel to the reflection grating 7.
  • the investigable sample point P then lies on the normal N of the reflection grating 7, which runs through the center M.
  • the rotating mirror 5 and the detector 6 are arranged symmetrically to the normal N of the reflection grating 7, the distance between the rotating mirror 5 (or the point S of the rotating mirror 5 which the beam 2 strikes) from the center M of the reflection grating 7 is 50.0 mm. Due to the symmetrical arrangement of the detector 6 to the rotating mirror 5, the distance of the detector 6 from the center M is 50.0 mm. Finally, the distance between the sample point P and the center M is 50.0 mm.
  • the connecting line from the mirror 5 to the center M closes with the connecting line from Sample point P to the center M an angle of 50 °. The same applies to the connecting line from the sample point P to the center M and the connecting line from the detector 6 to the center M.
  • the first section 9 is designed such that the positive first diffraction order of each of the rotating mirror 5 coming and hitting the first section 9 beam is focused into point P.
  • the first section 9 of the reflection grating 7 thus acts with respect to the first order of diffraction like a mirror which reproduces the point S in the point P.
  • the first section 9 in this sense has a first focal point S and a second focal point P.
  • the angle of incidence of the beam impinging on the sample 11 depends on the angle of deflection in such a way that the angle of incidence becomes greater, the greater the angle of deflection.
  • the radiation emanating from the sample point P strikes the second section 10 of the reflection grating 7, which is designed such that the diffraction maximum of the positive first order of the rays striking it in the detector 6 or lies in a detector point D.
  • the second section 10 of the reflection grating 7 thus carries out an imaging of the sample point P into the detector point D with respect to the first diffraction order.
  • the reflection grating 7 thus acts as a mirror element with three focal points for the first-order beams diffracted thereon, the first focal point being S, the second focal point being sample point P and the third focal point being detector point D.
  • the first and second focal points on the one hand and the second and third focal points on the other hand are each optically conjugate points.
  • the line distribution (or the line curvature) of the first section 9 is asymmetrical in a first direction R1, while it is symmetrical in a second direction R2 (perpendicular to the first direction R1).
  • the first section 9 is designed and arranged symmetrically to the second section 10 (not shown in FIG. 2) with respect to a center line ML, on which the center point M lies and which extends along the second direction R2.
  • the rotating mirror 5 is acted upon by the collimated beams 2, the rotating mirror 5 being rotated over the entire swivel range 13, so that the point P is successively applied with measuring beams with different angles of incidence.
  • the intensity of the sample rays then emanating from the sample 11 (here essentially the specular reflex) as a function of the rotational position of the rotating mirror 5 and thus as a function of the angle of incidence is detected on the basis of the imaging property of the second section 10 by means of the detector 6, so that the intensity of the Sample beams (here mainly zeroth diffraction order) as a function of the angle of incidence (which is also referred to as the optical signature of the sample point or the sample) can be detected.
  • the bundle diameter of the incident measuring beams is preferably selected so that it illuminates at least some periods of the structure.
  • the period of such structures can be 150 nm, so that a bundle diameter of a few 10 ⁇ m is then sought.
  • the measured optical signature also changes, so that starting from the measured optical signature by known methods (such as neural networks) to the actual values of the desired parameters (such as line width, Line height, flank angle) can be closed.
  • a movable diaphragm or beam trap is arranged between the sample 11 and the detector 6, which is guided depending on the rotational position of the mirror 5 in such a way that the specular reflex is shadowed and therefore not hits the detector.
  • the aperture can also be designed and moved so that only the specular reflex hits the detector. In this case, the higher diffraction orders of the sample beams are masked out, so that it can be ensured that only the specular reflex is detected.
  • the distance between the sample 11 and the reflection grating 7 is preferably set such that the measurement beams (or the measurement beam bundles) on the sample 11 have the smallest possible diameter (the focusing results thus the smallest possible bundle diameter at the sample point).
  • the sample 11 is then moved in the measurement plane 12 after each measurement, which is carried out in the manner described above, so that the spatial resolution of the signature is generated by the movement of the sample.
  • the movement of the sample 11 is carried out, for example, by means of a sample table (not shown) on which the sample 11 is held, wherein the sample table can also be used to set the distance of the sample 11 from the reflection grating 7.
  • the reflection grating 7 has a very high diffraction efficiency in reflection
  • the carrier 8 either consist of a highly reflective material or else the surface of the 8 is coated with a highly reflective material.
  • the reflection grating 7 can be formed from aluminum or, for longer wavelengths, also from semiconductor materials (such as germanium or silicon).
  • the support can be made of PMMA, photoresist, glass or quartz glass, which has a structured side which is coated with a coating layer, e.g. Gold.
  • the reflection grating 7 can be produced holographically as follows.
  • a lacquer layer 21 sensitive to this wavelength is applied to a plane-parallel plate 20 which is transparent for the wavelength of 457.9 nm (FIG. 3).
  • two laser light waves (spherical waves with a wavelength of 457.9 nm) emanating from points 22 and 23 are generated, which are coated in the lacquer layer 21 with an opposing laser light wave (spherical wave with a wavelength of 457.9 nm) interfere and thereby generate the latent lattice structure of the lattice to be formed in the lacquer layer 21.
  • the Points 22, 23 and 24 correspond in their arrangement to one another and to lacquer layer 21 to points S, D and P of the measuring arrangement shown in FIG. 1.
  • the latent lattice structure thus produced in the lacquer layer 21 is e.g. converted into a surface relief in a wet chemical development process, whereby a blaze grating is formed on the basis of the exposure described.
  • the coating with a reflective layer, e.g. Gold or aluminum leads to the reflection grating 7.
  • the surface relief of the blaze grating in the lacquer layer can serve as a mask for suitable structuring processes (e.g. ion beam etching) in order to transfer the grating profile into the more stable material of the carrier plate 20.
  • suitable structuring processes e.g. ion beam etching
  • the grating edges of the holographically produced reflection grating 7 are continuous, so that advantageously hardly any diffuse scattered light occurs.
  • the structuring can also be carried out by electron beam lithography or other suitable microstructuring methods.
  • the measuring arrangement according to the invention has a polarizer 14, which can be inserted into the parallel beam path between the light source 1 and the lens 3, as indicated by the broken line of the polarizer 14 and the double arrow A in FIG. 1.
  • the deflection mirror 5 is thus exposed to polarized light (e.g. linearly polarized light).
  • the detector 6 is then designed as a four-quadrant detector, which is preceded by a polarization mosaic filter 15 (FIG. 4).
  • the polarization mosaic filter 15 has four square fields 16, 17, 18, 19, which are each assigned to one of the four quadrants of the four-quadrant detector.
  • the sections 16, 17, 18 are each provided with a fine metal grating, the grating period of which is smaller than the wavelength of the coherent beam 2, so that only the light which is polarized perpendicular to the schematically drawn grating lines is transmitted.
  • Information about the polarization state of the light reflected by the sample can thus be obtained with the corresponding quadrants of the four-quadrant detector, which are connected downstream of sections 16, 17, 18. Since the fourth section 19 is unstructured, it transmits the light regardless of its polarization state, so that the section 19 assigned quadrant of the four-quadrant detector is used for photometric measurement.
  • an angle-resolved ellipsometry can also be carried out in addition to the angle-resolved photometry.
  • a switchable, diffractive element (not shown) can also be used, which acts in the same or similar manner as the reflection grating 7 described.
  • the switchable element can be used to adapt the grating structure to different wavelengths.
  • a polychromatic light source e.g. a mercury lamp
  • variable monochromator e.g. a prism or a grating
  • the measurement can then be carried out in such a way that a predetermined wavelength is first set and for this wavelength the switchable, diffractive element is controlled in such a way that the grating for the predetermined wavelength is present, with which the desired imaging can be carried out.
  • the rotating mirror is then rotated in the manner previously described and the measurement is carried out.
  • a second wavelength is set and the diffractive element is also set to the second wavelength, with the rotating or swiveling mirror then being pivoted again.
  • a spectral and angle-dependent measurement of the intensity can thus be carried out. If the polarizer 14 and the four-quadrant detector with the polarization mosaic filter 15 described above are also used, a spectral and angle-resolved ellipsometry can also be carried out.
  • spatial light modulators such as reflective LCD modules or reflective tilting mirror matrices can be used.
  • spatial light modulators in transmission such as transmissive LCD modules.
  • the spatial resolution of the switchable, diffractive elements should preferably be less than a quarter of the working wavelength.
  • the monochrometer and the rotating mirror are preferably controlled by a control unit (not shown) in such a way that for each wavelength only the relevant angle of incidence or the relevant angle of incidence range can be set.
  • the measurement time can thus advantageously be shortened.

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

L'invention concerne un dispositif de mesure comportant une source de rayonnement (1) ainsi qu'un dispositif de déviation (5) placé en aval de cette dernière et pouvant recevoir un rayon (2) émis par la source de rayonnement (1) pour le dévier successivement dans différentes directions. Ce dispositif de mesure comprend en outre un premier et un deuxième dispositif optiques (9, 10) ainsi qu'un détecteur (6). Le premier dispositif optique (9) dévie les rayons provenant du dispositif de déviation (5) sous la forme d'un rayon de mesure sur un point (P) d'un échantillon (11) à placer dans une position de mesure, de sorte que l'angle d'incidence du rayon de mesure sur l'échantillon (11) varie en fonction de la direction. Les rayons quittant l'échantillon (11) en raison de l'interaction des rayons de mesure avec l'échantillon sont déviés sur le détecteur (6) au moyen du deuxième dispositif optique (10). Au moins un des deux dispositifs optiques (9, 10) présente un élément de diffraction (7) assurant une déviation. Cet élément diffracte les rayons incidents provenant de différentes directions, de sorte que les rayons diffractés d'un ordre de diffraction prédéterminé soient focalisés en un point (P, D).
EP02800094A 2001-09-24 2002-09-18 Dispositif de mesure Withdrawn EP1397671A2 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10146944 2001-09-24
DE10146944A DE10146944A1 (de) 2001-09-24 2001-09-24 Meßanordnung
PCT/EP2002/010474 WO2003029793A2 (fr) 2001-09-24 2002-09-18 Dispositif de mesure

Publications (1)

Publication Number Publication Date
EP1397671A2 true EP1397671A2 (fr) 2004-03-17

Family

ID=7700039

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02800094A Withdrawn EP1397671A2 (fr) 2001-09-24 2002-09-18 Dispositif de mesure

Country Status (5)

Country Link
US (1) US20040145744A1 (fr)
EP (1) EP1397671A2 (fr)
JP (1) JP2005504318A (fr)
DE (1) DE10146944A1 (fr)
WO (1) WO2003029793A2 (fr)

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EP2539853B1 (fr) * 2010-02-25 2019-01-09 Lirhot Systems Ltd. Filtre de lumière avec angles de polarisation variables et algorithme de traitement
DE102012216284A1 (de) * 2011-09-27 2013-03-28 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage
KR102231730B1 (ko) * 2012-06-26 2021-03-24 케이엘에이 코포레이션 각도 분해형 반사율 측정에서의 스캐닝 및 광학 계측으로부터 회절의 알고리즘적 제거
US20160187252A1 (en) * 2013-10-04 2016-06-30 Halliburton Energy Services Inc. Real-Time Programmable ICE and Applications in Optical Measurements
KR102648880B1 (ko) * 2017-11-07 2024-03-15 에이에스엠엘 네델란즈 비.브이. 관심 특성을 결정하는 계측 장치 및 방법

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Also Published As

Publication number Publication date
JP2005504318A (ja) 2005-02-10
WO2003029793A3 (fr) 2003-12-04
WO2003029793A2 (fr) 2003-04-10
US20040145744A1 (en) 2004-07-29
DE10146944A1 (de) 2003-04-10

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