EP1734152A1 - Mittel zur verringerung des gesamtreibungskoeffizienten eines beschichtungsfilms für eine dreiwertiges chromat enthaltende behandlungslösung, dreiwertiges chromat enthaltende behandlungslösung und herstellungsverfahren dafür und dreiwertiges chromat enthaltender beschichtungsfilm mit verringertem gesamtreibungskoeffizienten und herstellungsverfahren dafür - Google Patents
Mittel zur verringerung des gesamtreibungskoeffizienten eines beschichtungsfilms für eine dreiwertiges chromat enthaltende behandlungslösung, dreiwertiges chromat enthaltende behandlungslösung und herstellungsverfahren dafür und dreiwertiges chromat enthaltender beschichtungsfilm mit verringertem gesamtreibungskoeffizienten und herstellungsverfahren dafür Download PDFInfo
- Publication number
- EP1734152A1 EP1734152A1 EP05719901A EP05719901A EP1734152A1 EP 1734152 A1 EP1734152 A1 EP 1734152A1 EP 05719901 A EP05719901 A EP 05719901A EP 05719901 A EP05719901 A EP 05719901A EP 1734152 A1 EP1734152 A1 EP 1734152A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- ion
- treating solution
- trivalent
- trivalent chromate
- conversion film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 title claims abstract description 88
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000011248 coating agent Substances 0.000 title description 3
- 238000000576 coating method Methods 0.000 title description 3
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 claims abstract description 64
- 238000006243 chemical reaction Methods 0.000 claims abstract description 53
- 239000011701 zinc Substances 0.000 claims abstract description 39
- 238000007747 plating Methods 0.000 claims abstract description 34
- 150000001875 compounds Chemical class 0.000 claims abstract description 32
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 29
- 229910001297 Zn alloy Inorganic materials 0.000 claims abstract description 24
- 239000011651 chromium Substances 0.000 claims abstract description 23
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 20
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 63
- 150000002500 ions Chemical class 0.000 claims description 52
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 31
- 235000006408 oxalic acid Nutrition 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 18
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 12
- 229910001430 chromium ion Inorganic materials 0.000 claims description 11
- 150000003839 salts Chemical class 0.000 claims description 11
- -1 inorganic acid ion Chemical class 0.000 claims description 10
- 229910001429 cobalt ion Inorganic materials 0.000 claims description 8
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 8
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 150000007524 organic acids Chemical class 0.000 claims description 6
- 239000003638 chemical reducing agent Substances 0.000 claims description 5
- 229910017052 cobalt Inorganic materials 0.000 claims description 5
- 239000010941 cobalt Substances 0.000 claims description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 5
- 229940085991 phosphate ion Drugs 0.000 claims description 5
- MUBZPKHOEPUJKR-UHFFFAOYSA-L Oxalate Chemical compound [O-]C(=O)C([O-])=O MUBZPKHOEPUJKR-UHFFFAOYSA-L 0.000 claims description 4
- 238000001556 precipitation Methods 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 abstract description 20
- 230000007797 corrosion Effects 0.000 abstract description 20
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 abstract description 14
- 239000000243 solution Substances 0.000 description 94
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 31
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 28
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 20
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 15
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 11
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 229910007567 Zn-Ni Inorganic materials 0.000 description 9
- 229910007614 Zn—Ni Inorganic materials 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- PHFQLYPOURZARY-UHFFFAOYSA-N chromium trinitrate Chemical compound [Cr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PHFQLYPOURZARY-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 102200082816 rs34868397 Human genes 0.000 description 8
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 229910002651 NO3 Inorganic materials 0.000 description 7
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 7
- LOAUVZALPPNFOQ-UHFFFAOYSA-N quinaldic acid Chemical compound C1=CC=CC2=NC(C(=O)O)=CC=C21 LOAUVZALPPNFOQ-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical class Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical class O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229910017604 nitric acid Inorganic materials 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 4
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 4
- 239000011591 potassium Substances 0.000 description 4
- 229910052700 potassium Inorganic materials 0.000 description 4
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000004065 wastewater treatment Methods 0.000 description 4
- FPDPFLYDDGYGKP-UHFFFAOYSA-N 2-quinolin-2-ylacetic acid Chemical compound C1=CC=CC2=NC(CC(=O)O)=CC=C21 FPDPFLYDDGYGKP-UHFFFAOYSA-N 0.000 description 3
- 229910021556 Chromium(III) chloride Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 239000011636 chromium(III) chloride Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000008119 colloidal silica Substances 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- MVSFBDVHKAFARZ-UHFFFAOYSA-M sodium;quinoline-8-sulfonate Chemical compound [Na+].C1=CN=C2C(S(=O)(=O)[O-])=CC=CC2=C1 MVSFBDVHKAFARZ-UHFFFAOYSA-M 0.000 description 3
- 239000001384 succinic acid Substances 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 150000004683 dihydrates Chemical class 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 2
- 239000001103 potassium chloride Substances 0.000 description 2
- 235000011164 potassium chloride Nutrition 0.000 description 2
- ZKIHLVYBGPFUAD-UHFFFAOYSA-N quinoline-2-sulfonic acid Chemical compound C1=CC=CC2=NC(S(=O)(=O)O)=CC=C21 ZKIHLVYBGPFUAD-UHFFFAOYSA-N 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 2
- 229910000162 sodium phosphate Inorganic materials 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- KQTIIICEAUMSDG-UHFFFAOYSA-N tricarballylic acid Chemical compound OC(=O)CC(C(O)=O)CC(O)=O KQTIIICEAUMSDG-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- 206010007269 Carcinogenicity Diseases 0.000 description 1
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910006069 SO3H Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- HSSJULAPNNGXFW-UHFFFAOYSA-N [Co].[Zn] Chemical compound [Co].[Zn] HSSJULAPNNGXFW-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000007670 carcinogenicity Effects 0.000 description 1
- 231100000260 carcinogenicity Toxicity 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 150000001845 chromium compounds Chemical class 0.000 description 1
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 1
- 229910000151 chromium(III) phosphate Inorganic materials 0.000 description 1
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 1
- IKZBVTPSNGOVRJ-UHFFFAOYSA-K chromium(iii) phosphate Chemical compound [Cr+3].[O-]P([O-])([O-])=O IKZBVTPSNGOVRJ-UHFFFAOYSA-K 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 150000001869 cobalt compounds Chemical class 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 229910001981 cobalt nitrate Inorganic materials 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- MULYSYXKGICWJF-UHFFFAOYSA-L cobalt(2+);oxalate Chemical compound [Co+2].[O-]C(=O)C([O-])=O MULYSYXKGICWJF-UHFFFAOYSA-L 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- CMMUKUYEPRGBFB-UHFFFAOYSA-L dichromic acid Chemical compound O[Cr](=O)(=O)O[Cr](O)(=O)=O CMMUKUYEPRGBFB-UHFFFAOYSA-L 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- KFZAUHNPPZCSCR-UHFFFAOYSA-N iron zinc Chemical compound [Fe].[Zn] KFZAUHNPPZCSCR-UHFFFAOYSA-N 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 description 1
- GEVPUGOOGXGPIO-UHFFFAOYSA-N oxalic acid;dihydrate Chemical compound O.O.OC(=O)C(O)=O GEVPUGOOGXGPIO-UHFFFAOYSA-N 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 1
- UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 description 1
- 229910000352 vanadyl sulfate Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/48—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates
- C23C22/53—Treatment of zinc or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
- C23C22/08—Orthophosphates
- C23C22/12—Orthophosphates containing zinc cations
- C23C22/17—Orthophosphates containing zinc cations containing also organic acids
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/46—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing oxalates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/46—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing oxalates
- C23C22/47—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing oxalates containing also phosphates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2222/00—Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
- C23C2222/10—Use of solutions containing trivalent chromium but free of hexavalent chromium
Definitions
- the present invention relates to a technique for reducing an overall friction coefficient in a hexavalent chromium free and corrosion resistant trivalent chromate conversion film on zinc or zinc alloy plating layers, in which fastening capacity is required. More specifically, the present invention relates to an agent for reducing a conversion film overall friction coefficient for a trivalent chromate treating solution, a trivalent chromate treating solution for reducing the overall friction coefficient of a trivalent chromate conversion film and a method for producing thereof, as well as a trivalent chromate conversion film reduced in an overall friction coefficient and a method for production thereof.
- the conversion film obtained by one step of the trivalent chromate treatment generally leads to a higher overall friction coefficient than that of the conventional hexavalent chromate conversion film. Consequently, for a bolt, nut and the like, in which fastening capacity is required, for example, in the automobile industry, after the trivalent chromate treatment is carried out thereon, a topcoating or the like is applied thereto in order to deal safely with the increasing overall friction coefficient.
- the present invention has been completed on the basis of the finding that the foregoing problems associated with the conventional techniques can effectively be solved by applying a trivalent chromate treatment using a treating solution containing a quinoline based compound or its derivative on zinc or zinc alloy plating layers.
- the present invention provides an agent for reducing a conversion film overall friction coefficient for a trivalent chromate treating solution, which agent contains a quinoline based compound or its derivative.
- the present invention provides for use of a quinoline based compound or its derivative for reducing an overall friction coefficient of a trivalent chromate conversion film.
- the present invention provides a method for producing a trivalent chromate treating solution for forming a conversion film reduced in an overall friction coefficient comprising a step of adding a quinoline based compound or its derivative to said trivalent chromate treating solution.
- the present invention provides a trivalent chromate treating solution, which contains from 0.1 to 25 g/L of a quinoline based compound or its derivative.
- the present invention provides a method for forming a trivalent chromate conversion film comprising: a step of bringing zinc or zinc alloy plating layers into contact with the treating solution according to the present invention.
- the present invention provides a trivalent chromate conversion film, which contains a quinoline based compound or its derivative.
- the present invention it is possible to produce a hexavalent chromium free and corrosion resistant trivalent chromate conversion film on zinc or zinc alloy plating layers, whose overall friction coefficient is reduced.
- the trivalent chromate conversion film obtained by this method imparts inherent additional excellent corrosion resistance to the corrosion resistance due to the zinc or zinc alloy plating itself.
- the overall friction coefficient of the conversion film is identical to or lower than that of the conventional hexavalent chromate conversion film, a bolt, nut and so on can be designed so that the fastening strength is safe.
- the same devices and processes used in the conventional hexavalent chromate treatment can be used as such without any modification, it is possible to maintain productivity.
- the agent for reducing a conversion film overall friction coefficient for a trivalent chromate treating solution according to the present invention contains a quinoline based compound or its derivative.
- the quinoline based compounds or their derivatives include, for example, acids having a monovalent or divalent substituent derived from quinoline (which has seven isomeric structures) or salts thereof (salts of for example sodium, potassium, ammonium and the like). Water-soluble quinoline based compounds or their derivatives are preferable.
- quinoline sulfonic acid, quinaldinic acid, quinophthalone, quinolyl acetic acid are preferable, in particular quinoline sulfonic acid is preferable.
- the foregoing quinoline based compounds or their derivatives may be used alone or in any combination of at least two of them.
- the reducing agent according to the present invention can be used for any trivalent chromate treating solution.
- the amount of said reducing agent added to the trivalent chromate treating solution is preferably such that the concentration of the quinoline based compound or its derivative in the trivalent chromate treating solution ranges from 0.1 to 25 g/L and more preferably from 0.2 to 15 g/L.
- concentration of the quinoline based compound or its derivative within the above range allows the obtaining of a suitable trivalent chromate treating solution for forming a conversion film reduced in an overall friction coefficient.
- the trivalent chromate treating solution containing a quinoline based compound or its derivative for forming a conversion film with a reduced overall friction coefficient includes, for example, the following treating solutions.
- the concentration of the quinoline based compound or its derivative in each treating solution ranges preferably from 0.1 to 25 g/L and more preferably from 0.2 to 15 g/L.
- the treating solution comprises:
- the treating solution comprises:
- the treating solution comprises:
- the substrate treated with the trivalent chromate treating solution according to the present invention may be a variety of metals such as iron, nickel and copper, alloys thereof and metals or alloys such as aluminum, which have been subjected to zincate treatment and the substrate may have a variety of shapes such as plate-like, rectangular prism-like, column-like, cylindrical and spherical shapes.
- the foregoing substrate is plated with zinc or zinc alloy according to the usual method.
- the zinc-plating layer may be deposited on the substrate using either, for instance, acidic baths such as a sulfuric acid bath, an ammonium chloride bath and a potassium chloride bath, or alkaline baths such as an alkaline non-cyanide bath and an alkaline cyanide bath.
- acidic baths such as a sulfuric acid bath, an ammonium chloride bath and a potassium chloride bath
- alkaline baths such as an alkaline non-cyanide bath and an alkaline cyanide bath.
- the thickness of the zinc or zinc alloy plating to be deposited on the substrate may arbitrarily be selected, but it is desirably not less than 1 ⁇ m and preferably 5 to 25 ⁇ m.
- examples of zinc alloy plating are zinc-iron alloy plating, zinc-nickel alloy plating having a rate of nickel-co-deposition ranging from 5 to 20% by mass, zinc-cobalt alloy plating and tin-zinc alloy plating.
- the thickness of the zinc or zinc alloy plating to be deposited on the substrate may arbitrarily be selected, but it is desirably not less than 1 ⁇ m and preferably 5 to 25 ⁇ m.
- the plated substrate is water rinsed, and then brought into contact with a treating solution for forming a trivalent chromate film according to the present invention, for instance, subjected to a dipping treatment using this treating solution.
- the source of the trivalent chromium may be any chromium compound containing trivalent chromium, but preferred examples thereof usable herein are trivalent chromium salts such as chromium chloride, chromium sulfate, chromium nitrate, chromium phosphate and chromium acetate or it is also possible to reduce hexavalent chromium such as chromic acid or dichromic acid into trivalent chromium using a reducing agent.
- the foregoing sources of trivalent chromium may be used alone or in any combination of at least two of them.
- the concentration of trivalent chromium in the treating solution is preferably as low as possible from the viewpoint of making the waste water treatment as easy as possible, but it is preferably 0.2 to 10 g/L and most preferably 1 to 5 g/L, when taking into account the corrosion resistance.
- the use of trivalent chromium in such a low concentration falling within the range specified above is also quite advantageous from the viewpoint of making the waste water treatment and the treating cost.
- sources of oxalic acid usable herein are oxalic acid and salts thereof (such as sodium, potassium and ammonium salts), which may be used alone or in any combination of at least two of them.
- concentration of oxalic acid used herein preferably ranges from 0.2 to 13 g/L and more preferably 2 to 11 g/L.
- the cobalt ion sources usable herein may be any cobalt compound containing bivalent cobalt and specific examples thereof preferably used herein are cobalt nitrate, cobalt sulfate and cobalt chloride.
- the cobalt ion concentration in the treating solution preferably ranges from 0.2 to 10 g/L and more preferably 0.5 to 8 g/L.
- the cobalt ion concentration is desirably not less than 2.0 g/L, in particular, to improve corrosion resistance after heating of the resulting conversion film.
- the amount of cobalt present in the resulting film increases as the cobalt ion concentration present in the treating solution increases and the corrosion resistance of the resulting conversion film is improved in proportion thereto.
- the molar ratio of trivalent chromium to oxalic acid present in the treating solution preferably ranges from 0.5/1 to 1.5/1 and more preferably 0.8/1 to 1.3/1.
- the foregoing treating solution (1) may additionally comprise an inorganic salt selected from the group consisting of inorganic salts of nitric acid, sulfuric acid and hydrochloric acid.
- concentration of the inorganic acid (hydrochloric acid, sulfuric acid, nitric acid) ions present in the treating solution preferably ranges from 1 to 50 g/L and more preferably 5 to 20 g/L.
- the treating solution may likewise comprise at least one member selected from the group consisting of phosphorus oxyacids such as phosphoric acid and phosphorous acid and alkali salts thereof.
- concentration of these components preferably ranges from 0.1 to 50 g/L and more preferably 0.5 to 20 g/L.
- a dicarboxylic acid such as malonic acid or succinic acid
- an oxycarboxylic acid such as citric acid, tartaric acid or malic acid
- a polyvalent carboxylic acid such as tricarballylic acid.
- concentration thereof to be incorporated into the treating solution preferably falls within the range of 1 to 30 g/L.
- the pH value of the treating solution of the present invention is preferably adjusted to the range of 0.5 to 4 and more preferably 2 to 2.5.
- ions of the foregoing inorganic acids or an alkaline agent such as an alkali hydroxide or aqueous ammonia in order to adjust the pH value thereof to the range specified above.
- the trivalent chromium and oxalic acid should be present in the treating solution in the form of a stable water-soluble complex formed therebetween, which is conjectured to have a structure represented by the following general formula, while cobalt ions should stably exist in the solution without causing any precipitation due to their forming a hardly soluble metal salt with oxalic acid.
- [(Cr) 1 ⁇ (C 2 O 4 )m ⁇ (H 2 O) n ] +(n-3) wherein the molar ratio of Cr to oxalic acid satisfies the relations: 0.5 ⁇ m/l ⁇ 1.5 and n 6 - 2m/l and there is not any restriction in the counter ions.
- the components of the solution react with zinc to thus form a hexavalent chromium free, corrosion resistant, trivalent chromate film comprising zinc, chromium, cobalt, oxalic acid and a quinoline based compound or its derivative on the zinc or zinc alloy plating, as conjectured in J.P. Patent No. 3332373 .
- the source of the trivalent chromium is the same as in the above treating solution (1).
- the concentration of trivalent chromium in the treating solution is preferably as low as possible from the viewpoint of making the waste water treatment as easy as possible, but it is preferably 0.2 to 10 g/L and most preferably 1 to 5 g/L, while taking into account the corrosion resistance.
- the use of trivalent chromium in such a low concentration falling within the range specified above is also quite advantageous from the viewpoint of the waste water treatment and the treating cost.
- the source of the ion selected from the group consisting of the Al ion, Si ion, Ti ion, Mn ion, Fe ion, Co ion, Ni ion, Zn ion and the combination thereof usable herein may be any compound containing these ions and specific examples thereof preferably used herein are inorganic acid salts such as nitrate, sulfate and hydrochloride, which are easily ionized in an aqueous solution.
- the concentration of these ions in the treating solution preferably ranges from 0.2 to 10 g/L and more preferably 0.5 to 8 g/L in total.
- the concentration is desirably not less than 2.0 g/L, in particular, to improve corrosion resistance.
- the amount of these ions present in the resulting film increases as their concentration present in the treating solution increases and the corrosion resistance of the resulting conversion film is improved in proportion thereto.
- the concentration of inorganic acid ion selected from the group consisting of a hydrochloride ion, nitrate ion, sulfate ion, phosphate ion and the combination thereof in the treating solution preferably ranges from 1 to 50 g/L and more preferably 5 to 20 g/L in total.
- the pH value of said treating solution (2) of the present invention is preferably adjusted to the range of 0.5 to 4 and more preferably 1 to 3.
- an alkaline agent such as an alkali hydroxide or aqueous ammonia
- an organic acid that forms a water-soluble complex with the trivalent chromium ion is added to the above treating solution (2).
- the organic acid usable herein may be a carboxylic acid such as an oxalic acid and salts thereof (such as sodium, potassium and ammonium salts), which may be used alone or in any combination of at least two of them.
- the concentration of organic acid preferably ranges from 0.2 to 13 g/L and more preferably 2 to 11 g/L.
- the molar ratio of trivalent chromium to an organic acid present in the treating solution preferably ranges from 0.5/1 to 1.5/1 and more preferably 0.8/1 to 1.3/1.
- the rest (balance) of the foregoing treating solutions (1) to (3) used in the present invention, except for the foregoing essential components, is water.
- the trivalent chromate conversion film containing a quinoline based compound or its derivative on zinc or zinc alloy plating layers can be formed by bringing zinc or zinc alloy plating into contact with the foregoing treating solution according to the present invention.
- the concentration of the quinoline based compound or its derivative in the trivalent chromate conversion film preferably ranges from 0.1 to 15 mg/dm 2 and more preferably 0.2 to 10 mg/dm 2 .
- the method for bringing the zinc or zinc alloy plating into contact with the foregoing treating solution it is usual to immerse an article plated with zinc or zinc alloy in the foregoing treating solution.
- an article is immersed in the solution maintained at a temperature ranging from 10 to 50°C and more preferably 20 to 40°C for preferably 5 to 600 seconds and more preferably 20 to 60 seconds.
- the subject to be treated is in general immersed in a dilute nitric acid solution in order to improve the luster of the resulting trivalent chromate film, before it is subjected to the trivalent chromate treatment.
- a pretreatment may be used or may not be used in the present invention.
- the method for forming the above conversion film may further comprise a step of preparing a trivalent chromate treating solution by taking a part of the treating solution, adding the reducing agent of the present invention to the taken part of the treating solution and putting the taken part back into the treating solution.
- This step allows the concentration of a quinoline based compound or its derivative in the treating solution to be kept constant easily.
- the quinoline based compound or its derivative is powdery or oily, such a step is more advantageous than methods such as adding the quinoline based compound or its derivative directly onto the treating solution in the treating tank from the viewpoint of its solubility and homogenation.
- the total amount of the treating solution may increase depending on the supplied amount.
- the methods for taking a part of the trivalent chromate treating solution include, for example, the method in which it is taken out of the treating tank as overflow liquid, the method in which it is taken out of the treating tank using a pump, and the like. Said part of the treating solution is preferably filtered when it is put back into the processing solution.
- a M6 bolt (S45C material, strength division of 8.8), which had been plated with each Zn in a thickness of 8 ⁇ m (zincate bath (NZ-87 available from Dipsol Chemicals Co., Ltd.), cyanide bath (L-800 available from Dipsol Chemicals Co., Ltd.), chloride bath (EZ-988 available from Dipsol Chemicals Co., Ltd.)) was immersed in a trivalent chromate treating solution having a composition as shown in the following Tables 1 and 2, then washed with water.
- Cr 3+ sources used were CrCl 3 (in Examples 1, 3, 5, 8, 10, 15 and 18) and Cr(NO 3 ) 3 (in Examples 2, 4, 6, 7, 9, 11 to 14, 16 and 17); the oxalic acid used was dihydrate; and Co source used was Co(NO 3 ) 2 .
- Si source used was colloidal silica; V source used was VOSO 4 ; and Ni source used was NiSO 4 .
- Further NO 3 - sources used were HNO 3 (in Examples 2, 3, 4, 9 to 11, 14, 15 and 18) and NaNO 3 (in Examples 1, 5 to 7, 12, 13, 16 and 17).
- Further Cl - source used was NaCl; and PO 4 - source used was NaH 2 PO 4 .
- the balance of each treating solution was water. Moreover, the pH value of each solution was adjusted using NaOH.
- Cr 3+ sources used were Cr(NO 3 ) 3 (in Examples 15 and 17) and CrCl 3 (in Examples 16 and 18) ; the oxalic acid used was dihydrate; and Co source used was Co(NO 3 ) 2 .
- Si source used was colloidal silica; and Ni source used was NiSO 4 .
- NO 3 - source was NaNO 3 ; Cl - source used was NaCl; and PO 4 - source used was NaH 2 PO 4 .
- the balance of each treating solution was water. Moreover, the pH value of each solution was adjusted using NaOH.
- a M6 bolt (S45C material, strength division of 8.8), which had been plated with each Zn in a thickness of 8 ⁇ m (zincate bath (NZ-87 available from Dipsol Chemicals Co., Ltd.), cyanide bath (L-800 available from Dipsol Chemicals Co., Ltd.), chloride bath (EZ-988 available from Dipsol Chemicals Co., Ltd.)) was subjected to a hexavalent chromate treatment.
- the hexavalent chromate bath used herein was Z-493 (10 mL/L) available from Dipsol Chemicals Co., Ltd. and the hexavalent chromate treatment was carried out at 30°C for 40 seconds.
- a M6 bolt (S45C material, strength division of 8.8), which had been plated with each Zn in a thickness of 8 ⁇ m (zincate bath (NZ-87 available from Dipsol Chemicals Co., Ltd.), cyanide bath (L-800 available from Dipsol Chemicals Co., Ltd.), chloride bath (EZ-988 available from Dipsol Chemicals Co., Ltd.)) was subjected to a trivalent chromate treatment using a treating solution having the following composition as disclosed in the examples of J.P. Patent No.
- a M6 bolt (S45C material, strength division of 8.8), which had been plated with each Zn in a thickness of 8 ⁇ m (zincate bath (NZ-87 available from Dipsol Chemicals Co., Ltd.), cyanide bath (L-800 available from Dipsol Chemicals Co., Ltd.), chloride bath (EZ-988 available from Dipsol Chemicals Co., Ltd.)) was subjected to a trivalent chromate treatment using a treating solution having the following composition as disclosed in Example 7 of J.P. KOKAI No.
- a M6 bolt (S45C material, strength division of 8.8), which had been plated with each Zn in a thickness of 8 ⁇ m (zincate bath (NZ-87 available from Dipsol Chemicals Co., Ltd.), cyanide bath (L-800 available from Dipsol Chemicals Co., Ltd.), chloride bath (EZ-988 available from Dipsol Chemicals Co., Ltd.)) was subjected to a trivalent chromate treatment using a treating solution having the following composition as disclosed in Example 2 of J.P. KOKAI No.
- 2000-509434 50 g/L (9.8 g/L as expressed in terms of Cr 3+ ) of CrCl 3 ⁇ 6H 2 O; 3 g/L (1.0 g/L as expressed in terms of Co) of Co(NO 3 ) 2 ; 100 g/L of NaNO 3 ; and 31.2 g/L of malonic acid (pH: 2.0, adjusted using NaOH).
- the trivalent chromate treatment was carried out at 30°C for 30 seconds.
- a M6 bolt (S45C material, strength division of 8.8), which had been plated with alkali Zn-Ni alloy in a thickness of 8 ⁇ m (IZ-262 (Ni: 7%) available from Dipsol Chemicals Co., Ltd.) was subjected to a hexavalent chromate treatment.
- the hexavalent chromate bath used herein was IZ-268 (30 mL/L) available from Dipsol Chemicals Co., Ltd. and the hexavalent chromate treatment was carried at 30°C for 30 seconds.
- a M6 bolt (S45C material, strength division of 8.8), which had been plated with alkali Zn-Ni alloy in a thickness of 8 ⁇ m (IZ-252 (Ni: 14%) available from Dipsol Chemicals Co., Ltd.) was subjected to a hexavalent chromate treatment.
- the hexavalent chromate bath used herein was IZ-258 (S: 200 mL/L; E: 10 g/L) available from Dipsol Chemicals Co., Ltd. and the hexavalent chromate treatment was carried out at 30°C for 40 seconds.
- the resulting overflow liquid was transferred into a spare tank.
- the pumping speed was at 800 L/hr.
- quinaldinic acid was added into the treating solution in the spare tank such that its concentration in the treating solution was 8 g/L, and then the resulting treating solution was returned to a treating tank through a filter (K-05 available from Kizai Company). Consequently, the concentration of the quinaldinic acid present in the treating solution in the treating tank could be kept constant.
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004058857A JP4446233B2 (ja) | 2004-03-03 | 2004-03-03 | 3価クロメート処理溶液用の皮膜総合摩擦係数低減剤、3価クロメート処理溶液及びその製造方法、並びに総合摩擦係数が低減した3価クロメート皮膜及びその製造方法 |
| PCT/JP2005/003597 WO2005085497A1 (ja) | 2004-03-03 | 2005-03-03 | 3価クロメート処理溶液用の皮膜総合摩擦係数低減剤、3価クロメート処理溶液及びその製造方法、並びに総合摩擦係数が低減した3価クロメート皮膜及びその製造方法 |
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| Publication Number | Publication Date |
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| EP1734152A1 true EP1734152A1 (de) | 2006-12-20 |
| EP1734152A4 EP1734152A4 (de) | 2011-03-02 |
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| EP05719901A Withdrawn EP1734152A4 (de) | 2004-03-03 | 2005-03-03 | Mittel zur verringerung des gesamtreibungskoeffizienten eines beschichtungsfilms für eine dreiwertiges chromat enthaltende behandlungslösung, dreiwertiges chromat enthaltende behandlungslösung und herstellungsverfahren dafür und dreiwertiges chromat enthaltender beschichtungsfilm mit verringertem gesamtreibungskoeffizienten und herstellungsverfahren dafür |
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| US (1) | US20070023104A1 (de) |
| EP (1) | EP1734152A4 (de) |
| JP (1) | JP4446233B2 (de) |
| KR (1) | KR100799845B1 (de) |
| CN (1) | CN1950544B (de) |
| WO (1) | WO2005085497A1 (de) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2008107039A1 (de) * | 2007-03-05 | 2008-09-12 | Atotech Deutschland Gmbh | Chrom(vi)-freie schwarzpassivierung für zinkhaltige oberflächen |
| WO2009132344A2 (en) | 2008-04-25 | 2009-10-29 | Henkel Ag & Co. Kgaa | Trichrome passivates for treating galvanized steel |
| EP2138606A1 (de) * | 2008-06-17 | 2009-12-30 | PanGang Group Research Institute Co., Ltd. | Zusammensetzung mit Kieselsäurensol, Verfahren zu ihrer Herstellung und die Zusammensetzung verwendendes verzinktes selbstschmierendes Metallmaterial |
| WO2011147447A1 (en) * | 2010-05-26 | 2011-12-01 | Atotech Deutschland Gmbh | Process for forming corrosion protection layers on metal surfaces |
| EP2385154A4 (de) * | 2009-01-30 | 2012-03-28 | Yuken Kogyo Co Ltd | Zusammensetzung für chemische konversionsbeschichtung und element mit einem chemischen konversionnsbeschichtungsfilm mit der zusammensetzung |
| EP2492371A1 (de) * | 2011-02-24 | 2012-08-29 | Dr.Ing. Max Schlötter GmbH & Co. KG | Cobalt-freie Passivierungslösung und Verfahren zur Abscheidung Cobalt-freier Passivierungsschichten auf Zink- und Zinklegierungsoberflächen |
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| JP3774415B2 (ja) * | 2002-03-14 | 2006-05-17 | ディップソール株式会社 | 亜鉛及び亜鉛合金めっき上に黒色の六価クロムフリー化成皮膜を形成するための処理溶液及び亜鉛及び亜鉛合金めっき上に黒色の六価クロムフリー化成皮膜を形成する方法。 |
| DE10305449A1 (de) * | 2003-02-11 | 2004-08-26 | Walter Hillebrand Gmbh & Co. | Pigmenthaltiges Stoffgemisch zur Erzeugung farbiger Passivierungsschichten |
-
2004
- 2004-03-03 JP JP2004058857A patent/JP4446233B2/ja not_active Expired - Fee Related
-
2005
- 2005-03-03 CN CN200580014275XA patent/CN1950544B/zh not_active Expired - Fee Related
- 2005-03-03 WO PCT/JP2005/003597 patent/WO2005085497A1/ja not_active Ceased
- 2005-03-03 EP EP05719901A patent/EP1734152A4/de not_active Withdrawn
- 2005-03-03 KR KR1020067018882A patent/KR100799845B1/ko not_active Expired - Fee Related
-
2006
- 2006-09-01 US US11/514,505 patent/US20070023104A1/en not_active Abandoned
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008107039A1 (de) * | 2007-03-05 | 2008-09-12 | Atotech Deutschland Gmbh | Chrom(vi)-freie schwarzpassivierung für zinkhaltige oberflächen |
| EP1970470A1 (de) * | 2007-03-05 | 2008-09-17 | Atotech Deutschland Gmbh | Chrom(VI)-freie Schwarzpassivierung für Zink-haltige Oberflächen |
| US8460534B2 (en) | 2007-03-05 | 2013-06-11 | Atotech Deutschland Gmbh | Chromium(VI)-free black passivation of surfaces containing zinc |
| US11643732B2 (en) | 2007-08-03 | 2023-05-09 | Dipsol Chemicals Co., Ltd. | Corrosion-resistant trivalent-chromium chemical conversion coating and solution for trivalent-chromium chemical treatment |
| EP2940188A1 (de) * | 2007-08-03 | 2015-11-04 | Dipsol Chemicals Co., Ltd. | Korrosionsbeständige chemische konversionsbeschichtung mit dreiwertigem chrom und lösung zur chemischen behandlung mit dreiwertigem chrom |
| EP2735626A3 (de) * | 2007-08-03 | 2014-10-22 | Dipsol Chemicals Co., Ltd. | Korrosionsbeständige chemische Konversionsbeschichtung mit dreiwertigem Chrom und Lösung zur chemischen Behandlung mit dreiwertigem Chrom |
| EP2276873A4 (de) * | 2008-04-25 | 2012-03-21 | Henkel Ag & Co Kgaa | Trichrome passivierungszusammensetzungen zur behandlung von verzinktem stahl |
| CN102066611A (zh) * | 2008-04-25 | 2011-05-18 | 汉高股份及两合公司 | 用于处理镀锌钢的三价铬钝化剂 |
| WO2009132344A2 (en) | 2008-04-25 | 2009-10-29 | Henkel Ag & Co. Kgaa | Trichrome passivates for treating galvanized steel |
| EP2138606A1 (de) * | 2008-06-17 | 2009-12-30 | PanGang Group Research Institute Co., Ltd. | Zusammensetzung mit Kieselsäurensol, Verfahren zu ihrer Herstellung und die Zusammensetzung verwendendes verzinktes selbstschmierendes Metallmaterial |
| EP2385154A4 (de) * | 2009-01-30 | 2012-03-28 | Yuken Kogyo Co Ltd | Zusammensetzung für chemische konversionsbeschichtung und element mit einem chemischen konversionnsbeschichtungsfilm mit der zusammensetzung |
| WO2011147447A1 (en) * | 2010-05-26 | 2011-12-01 | Atotech Deutschland Gmbh | Process for forming corrosion protection layers on metal surfaces |
| EP2492371A1 (de) * | 2011-02-24 | 2012-08-29 | Dr.Ing. Max Schlötter GmbH & Co. KG | Cobalt-freie Passivierungslösung und Verfahren zur Abscheidung Cobalt-freier Passivierungsschichten auf Zink- und Zinklegierungsoberflächen |
| EP3896194A1 (de) * | 2012-06-08 | 2021-10-20 | PRC-Desoto International, Inc. | Indikatorbeschichtungen für metalloberflächen |
| RU2643759C2 (ru) * | 2015-11-13 | 2018-02-05 | Закрытое акционерное общество "ФК" | Хроматирующий состав для обработки оцинкованного проката и оцинкованной проволоки |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1950544B (zh) | 2011-12-21 |
| US20070023104A1 (en) | 2007-02-01 |
| EP1734152A4 (de) | 2011-03-02 |
| KR100799845B1 (ko) | 2008-01-31 |
| WO2005085497A1 (ja) | 2005-09-15 |
| JP2005248233A (ja) | 2005-09-15 |
| JP4446233B2 (ja) | 2010-04-07 |
| KR20060123628A (ko) | 2006-12-01 |
| CN1950544A (zh) | 2007-04-18 |
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