EP1760760A2 - Source de rayons X ou de XUV - Google Patents

Source de rayons X ou de XUV Download PDF

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Publication number
EP1760760A2
EP1760760A2 EP06016388A EP06016388A EP1760760A2 EP 1760760 A2 EP1760760 A2 EP 1760760A2 EP 06016388 A EP06016388 A EP 06016388A EP 06016388 A EP06016388 A EP 06016388A EP 1760760 A2 EP1760760 A2 EP 1760760A2
Authority
EP
European Patent Office
Prior art keywords
deflection
particle beam
point
target
diaphragm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06016388A
Other languages
German (de)
English (en)
Other versions
EP1760760A3 (fr
Inventor
Alfred Reinhold
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Comet GmbH
Original Assignee
Comet GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Comet GmbH filed Critical Comet GmbH
Publication of EP1760760A2 publication Critical patent/EP1760760A2/fr
Publication of EP1760760A3 publication Critical patent/EP1760760A3/fr
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/087—Deviation, concentration or focusing of the beam by electric or magnetic means by electrical means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H01J35/147—Spot size control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H01J35/153—Spot position control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/24—Tubes wherein the point of impact of the cathode ray on the anode or anticathode is movable relative to the surface thereof
    • H01J35/30—Tubes wherein the point of impact of the cathode ray on the anode or anticathode is movable relative to the surface thereof by deflection of the cathode ray

Definitions

  • the invention relates to a device referred to in the preamble of claim 1 for generating X-ray or XUV radiation.
  • Such devices are for generating x-rays, for example in the form of x-ray tubes US 3,793,549 and GB 1 057 284 and for generating XUV radiation, for example by WO 2004/023512 A1 . US 3,138,729 . EP 0 887 639 A1 and US 4,523,327 known.
  • XUV (extreme ultraviolet) radiation is understood here radiation in a wavelength range between about 0.25 and about 20 nm.
  • the known devices are used in particular in imaging processes, for example in the investigation of electronic components, in particular printed circuit boards, as well as for the control and adjustment of optical components.
  • the known devices comprise means for directing a particle beam of electrically charged particles onto a target, wherein the material of the target is selected according to the desired wavelength of the emitted radiation.
  • a disadvantage of the known devices is that a deviation of the impingement point of the particle beam on the target from a predetermined impact point to a deterioration of the image quality the images generated by irradiation of components and in measurement and adjustment functions and adjustment tasks leads to measurement errors.
  • the invention has for its object to provide a device referred to in the preamble of claim 1, are reduced in the deviations of the impact point of the particle beam on the target of a given impingement point, the positional stability of the particle beam is thus improved with respect to its impact on the target.
  • the basic idea of the teaching according to the invention is to provide deflection means for deflecting the particle beam, by which the particle beam is deflected such that its central axis passes through a first and a second deflection point, wherein the first and the second deflection point in axis with a predetermined or predeterminable impact point of the particle beam are on the target and wherein the particle beam is deflectable by the deflection means with respect to a deflection point independent of a deflection with respect to the other deflection point.
  • the particle beam always passes through the first and the second deflection point and these deflection points are in axis with the desired point of impingement of the particle beam on the target, a high local stability is achieved with respect to the impact point of the particle beam on the target.
  • the particle beam under the action of the deflection means extends through at least two deflection points, which lie in axis with the desired point of impingement of the particle beam on the target.
  • the central axis of the particle beam may be, for example and in particular, coincident with a central axis of the device according to the invention, for example an X-ray tube.
  • the deflection means are designed for an independent deflection of the particle beam with respect to the first deflection point and the second deflection point spaced apart in the beam direction from the first deflection point.
  • the deflection means it is also possible according to the invention to deflect the particle beam through the deflection means such that it is arranged not only by the first and second deflection point but in the beam direction behind the second deflection point Deflection points runs, with all the deflection points are then in axis with the desired point of impingement of the particle beam on the target.
  • the deflection of the particle beam with respect to the first and the second deflection point by a first and a second deflection unit it is according to the invention possible to provide in addition to these deflection units further deflection units, which are then arranged downstream in the beam direction of the second deflection unit.
  • the central axis of the particle beam is understood to mean an axis passing through the geometric center of the beam cross section of the particle beam.
  • the deflection means comprises a first deflection unit for deflecting the particle beam such that its central axis passes through the first deflection point, and a second deflection unit spaced from the first deflection unit in the beam direction of the particle beam for deflecting the particle beam its central axis passes through the second deflection point. Since the deflection units can be constructed essentially identical, the structural complexity of a device according to the invention is kept low in this way.
  • control means For controlling the deflection means or the deflection units control means are expediently provided.
  • Another development of the embodiment with the deflection units provides that the first deflection unit and the second deflection unit can be controlled by the control means independently of each other for mutually independent deflection of the particle beam with respect to the first deflection point and the second deflection point. In this way, the particle beam can be deflected with particularly high precision.
  • each of the deflection units expediently has at least one deflection element.
  • more than one deflection element can also be provided per deflection unit.
  • Shape, size, number and design of the deflector can be selected within wide limits.
  • An advantageous development provides insofar as the deflection element has at least one coil or coil arrangement, in particular a quadrupole. Such coils are available as simple and inexpensive standard components available and allow by selecting a corresponding Ablenkstromes a precise deflection of the particle beam.
  • the deflection element has at least one electrostatic deflection plate.
  • the deflection means are designed to deflect the particle beam in the direction of two mutually perpendicular axes. If the central axis of the particle beam runs, for example, in the Z direction, then, in this embodiment, the deflection means are designed, for example, for deflecting the particle beam along the X and Y directions.
  • At least one of the deflection units is associated with a diaphragm which is arranged in the beam direction behind the deflection of the deflection unit.
  • the aperture can be used here, for example, and in particular to one from the Measuring the particle beam incident on the diaphragm electric current and to control the deflection of the particle beam in response to the measured current, as will be explained in more detail below.
  • a development of the aforementioned embodiment provides that the first deflection unit is assigned a first diaphragm and that the first diaphragm is assigned in the beam direction in the region of a plane of action of a deflection element of the second deflection unit. In this way, with regard to the deflection of the particle beam in the beam direction in the region of the second deflection point particularly favorable conditions.
  • Another embodiment of the embodiments with the diaphragm provides that the second deflection unit is associated with a second diaphragm.
  • the second diaphragm assigned to the second deflection unit can correspond in function to the first diaphragm assigned to the first deflection unit.
  • At least one diaphragm is at least partially made of an electrically conductive material and that the diaphragm is associated with a measuring unit for measuring an electric current resulting from an impingement of the particle beam on the diaphragm.
  • an electric current is measured by means of the measuring unit, which flows when the particle beam impinges on the diaphragm or an electrically conductive part of the diaphragm. If the particle beam traverses the aperture of the diaphragm without electrically charged particles hitting the diaphragm, then ideally no current flows, while in the case of the complete diaphragm Impact of the particle beam on the aperture a relatively high current flows.
  • the measured current is thus a measure of the deviation of the central axis of the particle beam from the desired position. If, for example, it is ascertained from the measuring unit that the particle beam impinges completely on the diaphragm, then the deflection unit assigned to the diaphragm can be controlled such that the particle beam no longer impinges on the diaphragm, but instead passes through the diaphragm aperture of the diaphragm. At small deflection angles of the particle beam, there is a proportionality between the deflection current and the deflection path of the particle beam.
  • an advantageous development of the teaching according to the invention provides that the measuring unit is in communication with the control means for controlling the deflection means, such that the deflection of the particle beam is effected in dependence on a current measured by the measuring means.
  • a counter to the target is associated with a measuring unit which measures in a first mode of operation an electric current, which results from the impact of the particle beam on the surface facing away from the target of the diaphragm, and in In a second mode of operation, measuring an electric current resulting from backscattered electrically charged particles from the target.
  • the output signal of the measuring unit in its first operating mode can be used, for example, to determine a deflection current for driving the associated deflection unit in order to deflect the particle beam so that it passes through the desired Deflection point runs.
  • the current measured by the measuring unit can be used to control or regulate the target current of the target of the device by driving a particle beam generating particle source.
  • an advantageous development of the aforementioned embodiment provides that the measuring unit is connected to control and / or regulating means which control the target current by controlling a particle source for generating the particle beam in response to a measured by the measuring unit in the second operating mode current or regulate.
  • the focusing means are expediently arranged downstream of the deflection means in the jet direction.
  • the particle beam is first deflected to the desired position, in which its central axis passes through the first and second deflection points and impinges on the target at the desired point of impact. Subsequently, the electron beam is focused by means of the focusing means to achieve a desired focus diameter on the target.
  • a device 2 which serves in this embodiment for the generation of XUV radiation.
  • the device 2 is constructed in the manner of an X-ray tube and has a housing 4, whose interior 6 is formed as a vacuum chamber and can be evacuated via an opening 8 by means of a vacuum pump, not shown.
  • a particle source 10 for generating a particle beam of electrically charged particles is arranged, wherein the electrically charged particles are formed in this embodiment by electrons emerging from a cathode.
  • the electrons are accelerated to form a particle beam 12 by means of a ring anode 14 in the direction of a target 16 formed as a layer target in this exemplary embodiment.
  • the electrons forming the particle beam 12 are decelerated, resulting in bremsstrahlung whose spectrum depends on the energy of the particles and the chemical nature (atomic number) of the material of the target 16.
  • the material of the target 16 is selected so that radiation is generated which contains a usable proportion in the XUV spectral range.
  • the apparatus 2 comprises means for deflecting the particle beam 12 such that the symbolized in Fig. 1 by a dashed line 18 central axis of the particle beam 12 through a first deflection point 20 and in the beam direction behind the first deflection point 20 and spaced therefrom arranged second Deflection point 22 extends, wherein the first deflection point 20 and the second deflection point 22 are in axis with a predetermined impingement point 24 of the particle beam 12 on the target 16 and wherein the particle beam 12 by the deflection means in the beam direction with respect to the first deflection point 20 regardless of a deflection of the particle beam 12 with respect to the second deflection point 22 is deflected.
  • the deflection means in this embodiment comprise a first deflection unit 26 which has a deflection element 28, which in this embodiment is formed by a coil arrangement in the form of a quadrupole.
  • the first deflecting unit 26 is assigned a first aperture 30, which is spaced apart in the direction of the beam from the deflecting element 28 and arranged behind it.
  • the first diaphragm 30 has a diaphragm opening with a circular cross-section, wherein the first deflection point 20 lies in the center of the diaphragm opening.
  • the deflection means further comprises a second deflection unit 32 having a deflection element 34, which in this embodiment is formed by a coil arrangement in the form of a quadrupole.
  • the second deflection unit 32 is assigned a second diaphragm 36, which is arranged behind the deflection element 34 of the second deflection unit 32 in the beam direction.
  • the second aperture 36 has in this embodiment, a circular aperture, wherein the second. Deflection point 22 is located in the center of the aperture.
  • the device 2 further comprises control means 38, which in a manner explained in more detail below for driving the deflection elements 28, 34 with a deflection current and for driving a high voltage generator 40 and the particle source 10 is used.
  • the first deflection unit 26 and the second deflection unit 32 are independently controllable by the control means 38 for mutually independent deflection of the particle beam 12 with respect to the first deflection point 20 and the second deflection point 22.
  • the deflection units 26, 32 are formed in this embodiment for deflecting the particle beam 12 transversely to its central axis 18 along mutually perpendicular axes, namely for deflecting the propagating in the Z direction particle beam 12 in the X and Y directions.
  • the first diaphragm 30 is arranged in the beam direction approximately at the level of the deflection element 34 of the second deflection unit 32.
  • the first diaphragm 30, which in this embodiment consists of an electrically conductive material, is associated with a first measuring unit 42 for measuring an electric current, which originates from an impingement of the particle beam 12 on the first diaphragm 30.
  • the output of the first measuring unit 42 is connected to the control means 38.
  • the second diaphragm 36 which is opposite to the target 16, also made of an electrically conductive material, wherein it is associated with a second measuring unit 44.
  • the second measuring unit 44 measures an electrical current which originates from the impingement of the particle beam 12 on the surface of the diaphragm 36 facing away from the target 16.
  • the second measuring unit 44 measures an electrical current resulting from backscattered electrically charged particles from the target 16. The backscattering of electrically charged particles from the target 16 is indicated in FIG. 1 by arrows 46.
  • the device 2 For focusing the particle beam 12, the device 2 has focusing means, which are formed in this embodiment by an electromagnetic lens 48, which is arranged downstream in the beam direction of the second deflection unit 32 in this embodiment.
  • XUV radiation generated by the impact of the electrically charged particles on the target 16 exits the housing 4 through an exit window 49 formed laterally in the housing 4, as indicated at reference numeral 50.
  • a filter 52 can be arranged in the exit window 4.
  • the exit window 49 is surrounded by a trap ring 54 which on a positive potential and captures the flying in the direction of the exit window 40 backscattered electrons.
  • the trapping ring 54 is for this reason connected to the positive pole of a voltage source 56 whose negative pole is connected to the housing 4 and to ground.
  • FIG. 2 illustrates an operating state of the device 2 in which a disturbance has occurred with respect to the direction of the particle beam 12.
  • a disturbance may be, for example, that a filament tip of the particle source 10 is inclined, an external magnetic field acts or a thermal expansion is effective.
  • the particle beam 12 passes obliquely through the anode hole of the annular anode 14.
  • the electrons undergo a first bundling (first crossover) in the beam direction approximately in the plane of the annular anode 14, as indicated at 58 in FIG.
  • the electrons diverge due to different Mechanisms of action, for example, due to the Boersch effect, which describes the repulsive forces of the same name charged electrons apart. Since the high voltage applied to the ring anode 14 is no longer effective after the electrons have left the plane of the ring anode 14, the electrons then continue to fly in the direction they left after leaving the crossover.
  • the electrons would therefore, as shown hatched in Fig. 2 at the reference numeral 60, impinge on the first aperture 30 and thus not reach the target 16.
  • the first measuring unit 42 measures a current and supplies the control means 38 with a corresponding signal.
  • the control means 38 then control the deflection element 28 of the first deflection unit 20 with a deflection current.
  • the plane of action of the first deflection unit 26 is symbolized in FIG. 2 by a dashed line 62.
  • the control means 38 in this case select the deflection current so that the particle beam 12 is deflected so that its central axis 18 passes through the first deflection point 20.
  • the resulting direction of the particle steel 12 is indicated in Fig. 2 at reference numeral 62.
  • the deflection element 26 is formed in this embodiment by a quadrupole, which consists of four arranged in the square electromagnetic coils and through which the electron beam in X- as well as in Y direction is deflectable.
  • a quadrupole which consists of four arranged in the square electromagnetic coils and through which the electron beam in X- as well as in Y direction is deflectable.
  • these positions 64, 66, 68, 70 are selected so that approximately half the cross-sectional area of the particle beam 12 impinges on the first aperture 30, so that the current measured by the first measuring unit 42 corresponds to about half of the maximum current, then is measured when the particle beam 12 completely impinges on the first diaphragm 30.
  • control means 38 control the coils of the deflection element 28 with these deflection currents, so that the central axis 18 of the electron beam 12 then passes through the center of the aperture stop of the first aperture 30 and thus through the first deflection point 20 , In this case, the particle beam 12 remains divergent, since the first deflection unit 26 has no focusing effect, but causes only a lateral deflection of the particle beam 12.
  • the particle beam After the deflection thus effected, the particle beam would propagate in accordance with the profile 74 shown hatched in FIG. 2 and hit, for example, the second diaphragm 36 and a lateral wall of the vacuum chamber 6, so that it would not reach the target 16.
  • the current is first measured by the second measuring unit 44, the current when the particle beam 12 on the second panel 36 is formed. Thereafter, in the manner described above with respect to deflection by the first deflector 26, the control means 38 detects the currents required to deflect the particle beam 12 in the x and y directions and drives the deflector 34 of the second deflector 32 with these currents. Due to this, the particle beam 12 is deflected to pass through the second deflection point 22.
  • the plane of action of the second deflection unit 32 is designated in FIG. 2 by reference numeral 72.
  • the central axis 18 of the particle beam 12 extends through both the first deflection point 20 and the second deflection point 22 and the deflection points 20, 22 are in axis with the predetermined point of incidence 24 on the target 16, the particle beam 12 hits the desired manner at the point of impact 24 on the target 16.
  • the particle beam 12 is focused by the focusing means 48, which in this embodiment comprise an electromagnetic lens.
  • the second measuring unit 44 is in a first operating mode in which it measures an electric current resulting from the impact of the particle beam 12 on the surface of the second diaphragm 36 facing away from the target 16. After completion of the above-described processes, the particle beam 12 is no longer incident on the second aperture 36, so that no corresponding current is measured more.
  • the second measuring unit 44 measures an electrical current resulting from electrons backscattered from the target 16. Since this current is a measure of the target current of the target 16, it can be used to control or regulate the target current.
  • the control means 38 control the particle source 10 so that it generates a particle beam 12 which leads to the respective desired target current. In this way, a precise control of the target current is possible, which is a direct measure of the photon flux at constant high voltage between the particle source 10 and ring anode 14.
  • the device 2 according to the invention enables with simple means a highly precise deflection of the particle beam 12 and likewise a high-precision control of the target flow. It is therefore excellently suitable, for example, and in particular for use in imaging processes and in inspection and measurement in the XUV range.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • X-Ray Techniques (AREA)
  • Particle Accelerators (AREA)
  • Measurement Of Radiation (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
EP06016388A 2005-09-03 2006-08-05 Source de rayons X ou de XUV Withdrawn EP1760760A3 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102005041923A DE102005041923A1 (de) 2005-09-03 2005-09-03 Vorrichtung zur Erzeugung von Röntgen- oder XUV-Strahlung

Publications (2)

Publication Number Publication Date
EP1760760A2 true EP1760760A2 (fr) 2007-03-07
EP1760760A3 EP1760760A3 (fr) 2008-07-09

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Family Applications (1)

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EP06016388A Withdrawn EP1760760A3 (fr) 2005-09-03 2006-08-05 Source de rayons X ou de XUV

Country Status (11)

Country Link
US (1) US20070051907A1 (fr)
EP (1) EP1760760A3 (fr)
JP (1) JP2007073517A (fr)
KR (1) KR20070026024A (fr)
CN (1) CN1959924A (fr)
AU (1) AU2006203782A1 (fr)
CA (1) CA2558216A1 (fr)
DE (1) DE102005041923A1 (fr)
IL (1) IL177803A0 (fr)
RU (1) RU2006131616A (fr)
TW (1) TW200715337A (fr)

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Publication number Publication date
TW200715337A (en) 2007-04-16
CN1959924A (zh) 2007-05-09
EP1760760A3 (fr) 2008-07-09
RU2006131616A (ru) 2008-03-10
KR20070026024A (ko) 2007-03-08
DE102005041923A1 (de) 2007-03-08
IL177803A0 (en) 2006-12-31
CA2558216A1 (fr) 2007-03-03
US20070051907A1 (en) 2007-03-08
JP2007073517A (ja) 2007-03-22
AU2006203782A1 (en) 2007-03-22

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