EP1891407A4 - Dispositifs d'acceleration et procedes d'utilisation correspondants - Google Patents

Dispositifs d'acceleration et procedes d'utilisation correspondants

Info

Publication number
EP1891407A4
EP1891407A4 EP06784915A EP06784915A EP1891407A4 EP 1891407 A4 EP1891407 A4 EP 1891407A4 EP 06784915 A EP06784915 A EP 06784915A EP 06784915 A EP06784915 A EP 06784915A EP 1891407 A4 EP1891407 A4 EP 1891407A4
Authority
EP
European Patent Office
Prior art keywords
reinforcing devices
reinforcing
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP06784915A
Other languages
German (de)
English (en)
Other versions
EP1891407A2 (fr
Inventor
Peter J Morrisroe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Revvity Inc
Original Assignee
PerkinElmer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/156,274 external-priority patent/US7742167B2/en
Priority claimed from US11/156,249 external-priority patent/US8622735B2/en
Application filed by PerkinElmer Inc filed Critical PerkinElmer Inc
Publication of EP1891407A2 publication Critical patent/EP1891407A2/fr
Publication of EP1891407A4 publication Critical patent/EP1891407A4/fr
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
    • B23K20/10—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating making use of vibrations, e.g. ultrasonic welding
    • B23K20/106—Features related to sonotrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/72—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using flame burners
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/62—Detectors specially adapted therefor
    • G01N30/72—Mass spectrometers
    • G01N30/7206—Mass spectrometers interfaced to gas chromatograph
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/62—Detectors specially adapted therefor
    • G01N30/72—Mass spectrometers
    • G01N30/7233—Mass spectrometers interfaced to liquid or supercritical fluid chromatograph
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/62—Detectors specially adapted therefor
    • G01N30/72—Mass spectrometers
    • G01N30/7233—Mass spectrometers interfaced to liquid or supercritical fluid chromatograph
    • G01N30/724—Nebulising, aerosol formation or ionisation
    • G01N30/7246—Nebulising, aerosol formation or ionisation by pneumatic means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/62—Detectors specially adapted therefor
    • G01N30/72—Mass spectrometers
    • G01N30/7233—Mass spectrometers interfaced to liquid or supercritical fluid chromatograph
    • G01N30/7273—Desolvation chambers

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
EP06784915A 2005-06-17 2006-06-15 Dispositifs d'acceleration et procedes d'utilisation correspondants Ceased EP1891407A4 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/156,274 US7742167B2 (en) 2005-06-17 2005-06-17 Optical emission device with boost device
US11/156,249 US8622735B2 (en) 2005-06-17 2005-06-17 Boost devices and methods of using them
PCT/US2006/023277 WO2006138441A2 (fr) 2005-06-17 2006-06-15 Dispositifs d'acceleration et procedes d'utilisation correspondants

Publications (2)

Publication Number Publication Date
EP1891407A2 EP1891407A2 (fr) 2008-02-27
EP1891407A4 true EP1891407A4 (fr) 2009-09-23

Family

ID=37571144

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06784915A Ceased EP1891407A4 (fr) 2005-06-17 2006-06-15 Dispositifs d'acceleration et procedes d'utilisation correspondants

Country Status (6)

Country Link
EP (1) EP1891407A4 (fr)
JP (1) JP2008544454A (fr)
CN (1) CN102291921B (fr)
AU (1) AU2006259381B2 (fr)
CA (1) CA2608528C (fr)
WO (1) WO2006138441A2 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7511246B2 (en) 2002-12-12 2009-03-31 Perkinelmer Las Inc. Induction device for generating a plasma
US7742167B2 (en) 2005-06-17 2010-06-22 Perkinelmer Health Sciences, Inc. Optical emission device with boost device
US8622735B2 (en) 2005-06-17 2014-01-07 Perkinelmer Health Sciences, Inc. Boost devices and methods of using them
DE102009004410B4 (de) * 2009-01-13 2011-06-01 Leibniz-Institut für Analytische Wissenschaften-ISAS-e.V. Vorrichtung und Verfahren von in einer Elektrolytlösung enthaltenen Analytsubstanzen
CN102843851B (zh) * 2012-05-04 2015-01-28 上海华力微电子有限公司 一种等离子发生装置及方法
US9259798B2 (en) 2012-07-13 2016-02-16 Perkinelmer Health Sciences, Inc. Torches and methods of using them
WO2014184947A1 (fr) * 2013-05-17 2014-11-20 株式会社島津製作所 Détecteur à capture d'électrons
US10475626B2 (en) 2015-03-17 2019-11-12 Applied Materials, Inc. Ion-ion plasma atomic layer etch process and reactor
JP7121035B2 (ja) * 2017-03-21 2022-08-17 ノードソン コーポレーション 後付け型照明アセンブリ、及び一体型又は後付け型照明を有する粉末スプレーガン
CN109443406B (zh) * 2018-10-19 2021-04-09 中国科学院深圳先进技术研究院 声学流体传感器
CN112782174A (zh) * 2020-12-25 2021-05-11 西南化工研究设计院有限公司 一种高频无极氩放电离子化检测器及气体中硫、磷化合物的分析方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4955717A (en) * 1986-12-02 1990-09-11 Geochemical Services, Inc. Demand modulated atomization apparatus and method for plasma spectroscopy
US5194731A (en) * 1990-07-24 1993-03-16 Varian Associates, Inc. Inductively coupled plasma spectroscopy
EP0673186A1 (fr) * 1994-03-17 1995-09-20 Fuji Electric Co., Ltd. Procédé et appareillage de génération d'un plasme inductif
US20030080097A1 (en) * 2001-10-05 2003-05-01 Maher Boulos Multi-coil induction plasma torch for solid state power supply
US20040001295A1 (en) * 2002-05-08 2004-01-01 Satyendra Kumar Plasma generation and processing with multiple radiation sources

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3492074A (en) * 1967-11-24 1970-01-27 Hewlett Packard Co Atomic absorption spectroscopy system having sample dissociation energy control
JPS5532317A (en) * 1978-08-28 1980-03-07 Asahi Chemical Ind High frequency magnetic field coupling arc plasma reactor
DE2947542A1 (de) * 1979-11-26 1981-06-04 Leybold-Heraeus GmbH, 5000 Köln Einrichtung zur ueberwachung und/oder steuerung von plasmaprozessen
US4300834A (en) * 1980-05-22 1981-11-17 Baird Corporation Inductively coupled plasma atomic fluorescence spectrometer
JPS61161138A (ja) * 1985-01-09 1986-07-21 Natl Inst For Res In Inorg Mater プラズマ利用化学反応装置
DE3521529A1 (de) * 1985-06-15 1987-01-02 Harald Dipl Chem Dr Berndt Vorrichtung zum zerstaeuben von probenfluessigkeit fuer spektroskopische zwecke
JPS62213056A (ja) * 1986-03-14 1987-09-18 Yokogawa Electric Corp 高周波誘導結合プラズマを用いた分析装置
JPH0624112B2 (ja) * 1986-04-16 1994-03-30 横河電機株式会社 高周波誘導結合プラズマ・質量分析計
JPS62273047A (ja) * 1986-05-22 1987-11-27 Natl Inst For Res In Inorg Mater 燃焼炎複合高周波熱プラズマ発生装置
JPS63158799A (ja) * 1986-12-22 1988-07-01 日本高周波株式会社 多段無電極高周波プラズマ反応装置
JPH0781953B2 (ja) * 1990-02-07 1995-09-06 川崎製鉄株式会社 分析試料の原子化方法
GB9226335D0 (en) * 1992-12-17 1993-02-10 Fisons Plc Inductively coupled plasma spectrometers and radio-frequency power supply therefor
JPH05119006A (ja) * 1991-10-30 1993-05-14 Mitsubishi Heavy Ind Ltd 炭化水素濃度測定装置
JPH05142200A (ja) * 1991-11-20 1993-06-08 Sumitomo Electric Ind Ltd 元素分析法
US5217362A (en) * 1991-12-30 1993-06-08 Thompson Richard E Method for enhanced atomization of liquids
JP3116151B2 (ja) * 1993-03-05 2000-12-11 セイコーインスツルメンツ株式会社 加熱気化誘導結合プラズマ質量分析装置
US6639227B1 (en) * 2000-10-18 2003-10-28 Applied Materials, Inc. Apparatus and method for charged particle filtering and ion implantation
CN2482075Y (zh) * 2001-04-25 2002-03-13 王澎蛟 原子吸收分光光度计
JP2003168594A (ja) * 2001-11-29 2003-06-13 High Frequency Heattreat Co Ltd 高周波熱プラズマ装置
JP2003168595A (ja) * 2001-11-29 2003-06-13 High Frequency Heattreat Co Ltd 高周波熱プラズマ装置
EP1483775B1 (fr) * 2002-03-08 2017-10-11 Analytik Jena AG Spectrometre de masse a plasma

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4955717A (en) * 1986-12-02 1990-09-11 Geochemical Services, Inc. Demand modulated atomization apparatus and method for plasma spectroscopy
US5194731A (en) * 1990-07-24 1993-03-16 Varian Associates, Inc. Inductively coupled plasma spectroscopy
EP0673186A1 (fr) * 1994-03-17 1995-09-20 Fuji Electric Co., Ltd. Procédé et appareillage de génération d'un plasme inductif
US20030080097A1 (en) * 2001-10-05 2003-05-01 Maher Boulos Multi-coil induction plasma torch for solid state power supply
US20040001295A1 (en) * 2002-05-08 2004-01-01 Satyendra Kumar Plasma generation and processing with multiple radiation sources

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2006138441A2 *

Also Published As

Publication number Publication date
JP2008544454A (ja) 2008-12-04
AU2006259381A1 (en) 2006-12-28
CA2608528C (fr) 2014-12-23
WO2006138441A2 (fr) 2006-12-28
WO2006138441A3 (fr) 2007-11-08
AU2006259381B2 (en) 2012-01-19
CN102291921B (zh) 2014-09-17
CA2608528A1 (fr) 2006-12-28
CN102291921A (zh) 2011-12-21
EP1891407A2 (fr) 2008-02-27

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