EP1922437A4 - Verfahren und vorrichtung zur raffination eines schmelzflüssigen materials - Google Patents

Verfahren und vorrichtung zur raffination eines schmelzflüssigen materials

Info

Publication number
EP1922437A4
EP1922437A4 EP20060733126 EP06733126A EP1922437A4 EP 1922437 A4 EP1922437 A4 EP 1922437A4 EP 20060733126 EP20060733126 EP 20060733126 EP 06733126 A EP06733126 A EP 06733126A EP 1922437 A4 EP1922437 A4 EP 1922437A4
Authority
EP
European Patent Office
Prior art keywords
molten material
refining molten
refining
molten
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP20060733126
Other languages
English (en)
French (fr)
Other versions
EP1922437A1 (de
EP1922437B1 (de
Inventor
Kenneth Friestad
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
REC Solar Norway AS
Original Assignee
Elkem Solar AS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elkem Solar AS filed Critical Elkem Solar AS
Publication of EP1922437A1 publication Critical patent/EP1922437A1/de
Publication of EP1922437A4 publication Critical patent/EP1922437A4/de
Application granted granted Critical
Publication of EP1922437B1 publication Critical patent/EP1922437B1/de
Anticipated expiration legal-status Critical
Active legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/003—Heating or cooling of the melt or the crystallised material
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling
    • Y10T117/1036—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling
    • Y10T117/1036—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die]
    • Y10T117/1044—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die] including means forming a flat shape [e.g., ribbon]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling
    • Y10T117/1068—Seed pulling including heating or cooling details [e.g., shield configuration]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling
    • Y10T117/1072—Seed pulling including details of means providing product movement [e.g., shaft guides, servo means]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
    • Y10T117/108—Including a solid member other than seed or product contacting the liquid [e.g., crucible, immersed heating element]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
    • Y10T117/1088—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone including heating or cooling details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
EP06733126.4A 2005-06-10 2006-05-10 Verfahren und vorrichtung zur raffination eines schmelzflüssigen materials Active EP1922437B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NO20052832A NO326797B1 (no) 2005-06-10 2005-06-10 Fremgangsmate og apparat for raffinering av smeltet materiale
PCT/NO2006/000174 WO2006132536A1 (en) 2005-06-10 2006-05-10 Method and apparatus for refining a molten material

Publications (3)

Publication Number Publication Date
EP1922437A1 EP1922437A1 (de) 2008-05-21
EP1922437A4 true EP1922437A4 (de) 2014-10-29
EP1922437B1 EP1922437B1 (de) 2019-02-20

Family

ID=35295069

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06733126.4A Active EP1922437B1 (de) 2005-06-10 2006-05-10 Verfahren und vorrichtung zur raffination eines schmelzflüssigen materials

Country Status (12)

Country Link
US (2) US8580036B2 (de)
EP (1) EP1922437B1 (de)
JP (1) JP5039696B2 (de)
KR (1) KR100984926B1 (de)
CN (2) CN101194051A (de)
AU (1) AU2006255886B2 (de)
BR (1) BRPI0611809B1 (de)
EA (1) EA011381B1 (de)
ES (1) ES2723750T3 (de)
NO (1) NO326797B1 (de)
UA (1) UA86168C2 (de)
WO (1) WO2006132536A1 (de)

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JP4748187B2 (ja) * 2007-12-27 2011-08-17 国立大学法人東北大学 Ｓｉ結晶インゴットの製造方法
EP2116637A3 (de) * 2008-05-07 2012-03-21 Covalent Materials Corporation Tiegel zum Schmelzen von Silizium
US8545624B2 (en) * 2008-06-20 2013-10-01 Varian Semiconductor Equipment Associates, Inc. Method for continuous formation of a purified sheet from a melt
WO2010025397A2 (en) * 2008-08-31 2010-03-04 Inductotherm Corp. Directional solidification of silicon by electric induction susceptor heating in a controlled environment
JP2012502879A (ja) * 2008-09-19 2012-02-02 エムイーエムシー・シンガポール・プライベイト・リミテッド 溶融汚染物およびウェーハ汚染物を低減するための一方向凝固炉
JP3171560U (ja) * 2008-09-30 2011-11-10 スカルディン, ニコライ ニコラエヴィッチSKALDIN, Nikolay Nikolaevich 結晶化装置
DE102008051492A1 (de) * 2008-10-13 2010-04-15 Pva Tepla Ag Vorrichtung zum Kristallisieren von Nicht-Eisen-Metallen
NO20092797A1 (no) * 2009-07-31 2011-02-01 Nordic Ceramics As Digel
DE112011103958T5 (de) * 2010-11-29 2013-08-29 Ulvac, Inc. Vorrichtungen zum Raffinieren von Silizium und Verfahren zum Raffinieren von Silizium
SG190288A1 (en) * 2010-12-01 2013-06-28 1366 Tech Inc Making semiconductor bodies from molten material using a free-standing interposer sheet
JP2013253298A (ja) * 2012-06-08 2013-12-19 Ulvac Japan Ltd ターゲットユニットの製造方法及びターゲットユニットの製造装置
TWI532890B (zh) * 2012-06-25 2016-05-11 希利柯爾材料股份有限公司 矽之控制定向固化
FR3010716B1 (fr) 2013-09-16 2015-10-09 Commissariat Energie Atomique Substrat pour la solidification de lingot de silicium
BR102013032779A2 (pt) * 2013-12-19 2015-12-08 Cia Ferroligas Minas Gerais Minasligas processo e equipamento para purificação de silício por solidificação direcional
CN106591946A (zh) * 2016-12-20 2017-04-26 大连理工大学 一种逆向离心提高多晶硅定向凝固提纯得率的设备和方法
CN106757336A (zh) * 2016-12-20 2017-05-31 大连理工大学 一种横向提高多晶硅定向凝固提纯得率的设备和方法
CN107881555A (zh) * 2017-10-24 2018-04-06 佛山市三水兴达涂料有限公司 一种半导体材料的加工装置及加工工艺
CN109056063A (zh) * 2018-08-29 2018-12-21 孟静 太阳能电池用多晶硅片的制备方法
CN110106546B (zh) * 2019-05-24 2021-04-27 浙江大学 一种高成品率铸造单晶硅生长方法和热场结构
CN110205672B (zh) * 2019-06-17 2021-06-01 常州常晶科技有限公司 一种类单晶硅晶体生长方法和热场结构
CN112807733A (zh) * 2020-12-29 2021-05-18 华祥（中国）高纤有限公司 一种低熔点聚酯切片的水搅拌结晶设备

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JPH08295964A (ja) * 1995-04-25 1996-11-12 Nippon Light Metal Co Ltd アルミニウム又はアルミニウムスクラップの精製方法
EP1085559A2 (de) * 1999-09-14 2001-03-21 Sharp Kabushiki Kaisha Vorrichtung für die Herstellung polykristalliner Siliziumfolien und Herstellungsverfahren das sie benutzt
JP2003048798A (ja) * 2001-08-06 2003-02-21 Sharp Corp 結晶シートの製造装置、結晶シートの製造方法、それを用いて得られる結晶シートおよび太陽電池
JP2003286024A (ja) * 2002-03-27 2003-10-07 Mitsubishi Materials Corp 一方向凝固シリコンインゴット及びこの製造方法並びにシリコン板及び太陽電池用基板及びスパッタリング用ターゲット素材
US20040246789A1 (en) * 2001-10-08 2004-12-09 Yoshihiro Tsukuda Silicon plate, method for producing silicon plate, and solar cell

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DE10124423A1 (de) * 2001-05-18 2003-01-02 Schott Glas Züchten von orientierten Einkristallen mit wiederverwendbaren Kristallkeimen
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Publication number Priority date Publication date Assignee Title
FR2602503A1 (fr) * 1986-08-07 1988-02-12 Showa Aluminum Corp Procede et appareillage pour la purification du silicium
JPH08295964A (ja) * 1995-04-25 1996-11-12 Nippon Light Metal Co Ltd アルミニウム又はアルミニウムスクラップの精製方法
EP1085559A2 (de) * 1999-09-14 2001-03-21 Sharp Kabushiki Kaisha Vorrichtung für die Herstellung polykristalliner Siliziumfolien und Herstellungsverfahren das sie benutzt
JP2003048798A (ja) * 2001-08-06 2003-02-21 Sharp Corp 結晶シートの製造装置、結晶シートの製造方法、それを用いて得られる結晶シートおよび太陽電池
US20040246789A1 (en) * 2001-10-08 2004-12-09 Yoshihiro Tsukuda Silicon plate, method for producing silicon plate, and solar cell
JP2003286024A (ja) * 2002-03-27 2003-10-07 Mitsubishi Materials Corp 一方向凝固シリコンインゴット及びこの製造方法並びにシリコン板及び太陽電池用基板及びスパッタリング用ターゲット素材

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Title
See also references of WO2006132536A1 *

Also Published As

Publication number Publication date
CN101194051A (zh) 2008-06-04
US20100034723A1 (en) 2010-02-11
US8580036B2 (en) 2013-11-12
NO20052832D0 (no) 2005-06-10
BRPI0611809B1 (pt) 2020-11-03
EA200800009A1 (ru) 2008-04-28
NO326797B1 (no) 2009-02-16
AU2006255886B2 (en) 2010-03-25
KR100984926B1 (ko) 2010-10-01
NO20052832L (no) 2006-12-11
BRPI0611809A2 (pt) 2008-12-09
WO2006132536A1 (en) 2006-12-14
AU2006255886A1 (en) 2006-12-14
KR20080015457A (ko) 2008-02-19
ES2723750T3 (es) 2019-08-30
UA86168C2 (uk) 2009-03-25
JP2008543565A (ja) 2008-12-04
CN105088330A (zh) 2015-11-25
JP5039696B2 (ja) 2012-10-03
US20080196209A1 (en) 2008-08-21
EP1922437A1 (de) 2008-05-21
EA011381B1 (ru) 2009-02-27
EP1922437B1 (de) 2019-02-20

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