EP2080053A1 - Système d'éclairage - Google Patents

Système d'éclairage

Info

Publication number
EP2080053A1
EP2080053A1 EP07818428A EP07818428A EP2080053A1 EP 2080053 A1 EP2080053 A1 EP 2080053A1 EP 07818428 A EP07818428 A EP 07818428A EP 07818428 A EP07818428 A EP 07818428A EP 2080053 A1 EP2080053 A1 EP 2080053A1
Authority
EP
European Patent Office
Prior art keywords
light source
homogenizer
axis
light
lighting arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP07818428A
Other languages
German (de)
English (en)
Inventor
Matthias Kock
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
XSYS Prepress NV
Original Assignee
Punch Graphix Prepress Germany GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Punch Graphix Prepress Germany GmbH filed Critical Punch Graphix Prepress Germany GmbH
Publication of EP2080053A1 publication Critical patent/EP2080053A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0994—Fibers, light pipes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/208—Homogenising, shaping of the illumination light

Definitions

  • the present invention relates to a lighting arrangement for illuminating a reflective light modulator under oblique incidence of light, comprising in succession along an optical axis a light source having a first and a second axis, wherein the second axis is arranged perpendicular to the first axis and an extension of the light source in the direction of the first axis is preferably smaller than an extension of the light source in the direction of the second axis, a homogenizer for coupling the emitted from the light source
  • Light radiation with an entrance surface and an exit surface and an illumination optical system for imaging the exit surface of the homogenizer on a light modulator.
  • the invention equally relates to an exposure apparatus having a lighting arrangement, a light from the illuminating arrangement illuminated oblique light incidence reflective light modulator and an imaging optics for imaging the image of the light modulator on a printing plate to be exposed.
  • Exposure devices of the type mentioned above often include a lighting arrangement of the type mentioned.
  • Such lighting arrangements are used in connection with projection optics such as image projectors or projection televisions or also exposure devices for the exposure of printing plates to be exposed.
  • Light modulator requires that both the lighting arrangement as well the imaging optics are arranged on the same side of the light modulator. This results in the need to separate the incident of the expiring beam path.
  • a spatial separation of the beam paths is made.
  • a generic lighting arrangement comprises a homogenizer, in which the light emitted from a light source is coupled in order to be homogenized in the homogenizer.
  • a homogenized beam thus results as a result of the homogenizing effect of the homogenizer.
  • This is imaged on the light modulator with the help of the illumination optics.
  • the light modulator is in an angle required for the beam separation to the optical axis of the illumination arrangement, arises on the light modulator for geometrical reasons in the result of an inhomogeneous illumination.
  • An originally square cross-sectional area of the illumination beam is given the shape of a convex quadrilateral on the light modulator due to the oblique incidence. However, this inhomogeneity is not acceptable for the application.
  • EP 1 141 780 B1 discloses an exposure device of the type mentioned above with a lighting device of the type mentioned at the outset.
  • a complex system of a field lens which is traversed by both the incident and the outgoing light of the light modulator, for beam adjustment.
  • Micro-mirror array incident and reflected beams designed oval, with their longer transverse extent are arranged substantially perpendicular to the plane defined by incidence and failure direction plane.
  • a prism is arranged in the beam path between a condenser and the micromirror arrangement.
  • this procedure is disadvantageous, since an additional optical element is required for the compensation of the inhomogeneity, which leads to losses and undesirably increases the material and adjustment costs of the exposure optics.
  • the disadvantage here is especially that in the overlay method, a homogenization of the output beam is ultimately achieved in that all the pixels are spent on the intensity level of the pixel at which the lowest illumination intensity prevails.
  • the overlay method thus results in that the worst illuminated pixel determines the maximum intensity of all pixels. Therefore, in this prior art, a system with disadvantageously comparatively low efficiency is obtained, regardless of whether the optics and the optical elements are otherwise optimally selected.
  • the present invention is therefore an object of the invention to improve a lighting arrangement of the type mentioned above and an exposure device with a generic lighting arrangement to the extent that a compensation of inhomogeneities in the illumination of the light modulator can be achieved without a reduction in efficiency.
  • Lighting arrangement solved by the light source is arranged transversely to the optical axis relative to the homogenizer. According to the invention, it is therefore proposed that the light source is not is arranged centrally in front of the homogenizer relative to the optical axis. Instead, an off-center, decentralized orientation is deliberately chosen. This ensures that at the output of the homogenizer an oblique intensity profile is formed.
  • the light source is arranged displaced in the direction of the second axis. This can, for example, when using a laser, the slow
  • the slow axis is the direction of the greater extent, ie the width of the laser diode array.
  • the light source is arranged displaced in the direction of the first axis.
  • This can be the fast axis when using a laser, for example.
  • a fast axis is used in lighting arrangements with a laser diode array as a light source, the height direction of the line, ie the direction which has the smaller extent compared to a width.
  • the light source in the direction of the first and the second axis has a smaller extent than the homogenizer, wherein the light source and the homogenizer are aligned relative to each other such that a cross-sectional area of the light source by vertical projection in Direction of the optical axis on the homogenizer is fully mapped on the cross-sectional area of the homogenizer.
  • the homogenization of the light radiation emitted by the light source is achieved particularly effectively in a further advantageous embodiment of the invention, when the homogenizer is designed as integrator rod.
  • the homogenizer is designed as integrator rod.
  • a very effective mixing of the input beam directions at the exit surface of the homogenizer can be achieved.
  • the homogenization can also be achieved with the integrator rod according to the invention with particularly low intensity losses.
  • the homogenizer is designed as a light tunnel.
  • the principle of homogenization through a light tunnel is the same as for the integrator rod.
  • the radiation is guided by the cavity bounded by the light tunnel. This has the particular advantage that no radiation absorption takes place either in the interior of the light tunnel, nor does reflection losses occur at the entrance surface, since no media transition is present at the entrance surface.
  • the homogenization is particularly effective when the homogenizer has a rectangular cross-sectional area.
  • an aspect ratio of the cross-sectional area is adapted to the light modulator.
  • the aspect ratio of the cross-sectional area of the exit surface of the light modulator can be projected by a suitable illumination optics, the exit surface of the homogenizer on the active surface of the light modulator without geometrically induced overshoot losses. It is thus avoided that a part of the light is guided past the light modulator.
  • the light source has at least one laser diode module with a glass fiber for coupling the of the
  • Laser diode module emitted light radiation.
  • Laser diode modules are particularly suitable for exposure applications because of their narrow emission spectrum and the associated high light output Achieving a high efficiency of an exposure device.
  • the small etendue of a laser diode module is advantageous for a particularly efficient lighting arrangement.
  • the object of the invention is likewise achieved by a generic lighting arrangement in which the emission direction of the light source is arranged at an angle to a surface normal of the entrance surface of the homogenizer.
  • This measure ensures that the light emitted by the light source strikes the entrance surface of the homogenizer obliquely. For geometrical reasons, this causes a distortion of the originally substantially homogeneous intensity profile of the light source in all planes, which run parallel to the entrance surface of the homogenizer. As a result, therefore, the intensity profile of the light at the exit surface of the homogenizer is also inhomogeneous. This caused by the inventive arrangement of the light source at an angle to the entrance surface of the homogenizer targeted inhomogeneity at the exit surface of the homogenizer now leads to the
  • Light modulator which in turn is arranged at an angle to the exit surface of the Ho like is homogeneously illuminated with a suitable design of the angle between the light source and the entrance surface of the homogenizer. This homogeneous illumination is achieved according to the invention without inherent losses.
  • the flexibility in generating desired exit intensity profiles becomes particularly large in an embodiment of the invention if the illumination arrangement according to the variant of the invention is additionally designed according to one of the embodiments described above.
  • the combination of a transverse displacement with an angular arrangement of the light source and the homogenizer advantageously leads to an optimized design of the exit intensity at the homogenizer exit surface.
  • the underlying object of the present invention is also achieved by an exposure device of the type mentioned, in which the illumination arrangement is designed according to one of the embodiments described above.
  • the illumination generated by a lighting arrangement according to the invention with oblique intensity profile is used in a suitable
  • the light modulator is designed as a microelectromechanical system (MEMS), preferably a digital micromirror device (DMD TM).
  • MEMS microelectromechanical system
  • DMD TM digital micromirror device
  • DMDs are an established technique for the light modulator due to the fast response times of the individual mirrors and the now available high resolutions of these mirror arrays.
  • DMDs and others MEMS on the advantage that a modulation of the incident light is independent of its polarization possible. Losses due to upstream polarizers, as they are in principle required in liquid crystal-based systems, are therefore eliminated with advantage.
  • the current generation of DMD chips is characterized by an increased tilt angle of 12 °.
  • Fig. 1 schematic representation of an exposure device according to the invention with a lighting arrangement according to the invention
  • FIG. 2 shows a detailed representation of the illumination arrangement from FIG. 1 for illustrating the relative position of the light source to the indicator entry surface in a sectional view along the line M-II in FIG. 1;
  • Fig. 3 spatial intensity distribution in the direction of the slow axis of the light source at the inlet (a) and outlet surface (b) of the homogenizer in a conventional arrangement according to the prior art;
  • FIG. 5 spatial intensity distribution at the light modulator for the illumination according to FIG. 4 (invention) and for comparison FIG. 3
  • FIG. 6 shows a detailed representation of a variant of the illumination arrangement according to the invention from FIG. 1 for illustrating the relative position of the light source relative to the indicator entry surface, the perspective corresponding to that shown in FIG.
  • FIG. 7 spatial intensity distribution in the direction of the slow axis of the light source at the entry (a) or exit surface (b) of the homogenizer in a lighting arrangement according to an alternative of the invention.
  • FIG. 1 schematically shows an exposure device 1 for
  • the exposure device 1 consists essentially of an illumination optical system 3, a light modulator 4 and a Schmopitik 5.
  • the illumination optical system 3 comprises a laser diode module line, not shown.
  • each individual laser diode is assigned a fiber into which the light emitted by the individual laser diode is coupled.
  • the Individual fibers 6 are combined to form a fiber bundle 7.
  • the fiber bundle 7 is directed onto an entry surface 8 of an integrator rod 9.
  • the entrance surface 8 appears in the schematic plan view of Figure 1 as a line.
  • the illumination optics 3 has an optical axis 10 shown schematically in FIG. 1 as a dash-dotted line.
  • the integrator rod 9 has an exit surface 11.
  • the exit surface 11 of the integrator rod 9 again appears in the schematic plan view of Figure 1 as a line.
  • a lens 12 is arranged behind the integrator rod 9 in the exit surface 11.
  • a digital micromirror device DMD TM 4 is arranged at a angle to the optical axis of the illumination optics 3 of the exposure device 1.
  • the DMD 4 has an active mirror matrix (not shown in the plan view of FIG. 1), which is arranged in an active modulation plane 13.
  • the modulation plane 13 appears in the figure 1, which is designed as a plan view, also only as a line.
  • the imaging optics 5, which is arranged opposite the printing plate 2 adjoins the DMD 4.
  • FIG. 1 shows an input beam 14 and an output beam 15.
  • the input beam 14 falls in the figure from the left on the DMD 4 and leaves the modulation plane 13 of the DMD 4 after reflection in the form of the output beam 15.
  • Figure 1 shows an exposure beam 16.
  • the exposure beam 16 extends from the imaging optics 5 on the printing plate second
  • FIG. 2 is a side view in the direction of the optical axis 10 of the illumination optics 3.
  • a sectional illustration along the line H-II from FIG. 1, which shows the entrance surface 8 of the integrator rod 9, can be seen includes.
  • the individual fibers 6 of the fiber bundle 7 are, as can be seen in Figure 2, arranged side by side in a row. The figure shows a total of four individual fibers 6.
  • a center line of the entry surface 8 of the integrator rod 9 is designated by the reference numeral 17 in FIG.
  • the entirety of the five individual fibers 6 of the fiber bundle 7 has a slow 18 and a fast axis 19.
  • the slow axis 18 runs parallel to a width of the entirety of the individual fins 6, whereas the fast axis 19 runs parallel to a height of the entirety of the individual fibers 6.
  • Each individual fiber 6 has a sheath 20.
  • a single fiber 6 in the illustration according to FIG. 2 is located substantially to the left of the center line 17 of the entry surface 8 of the integrator rod 9, whereas two of the individual fibers 6 are located substantially to the right of the center line 17 of the entry surface 8 of FIG Integrator rod 9 are located.
  • the light source from the totality of the individual fibers 6 is thus oriented decentrally to the entry surface 8 of the integrator rod 9.
  • the decentralized orientation refers to a direction transverse to the optical axis 10 of the illumination optics 3. More specifically, the light source formed from the totality of the individual fibers 6 is in the direction of the slow axis 18 relative to the center line 17 of the entrance surface 8 of the integrator rod 9 shifted.
  • the integrator rod 9 is 6 mm wide.
  • the diameter of each individual fiber is 1, 0 mm, minus the sheath 20, the active diameter of the fibers 6 is 0.9 mm.
  • the decentralized orientation is shown for clarity particularly pronounced. In practice have become familiar with the dimensions of the integrator and The single fibers transverse displacements of about 0.6 mm proved to be favorable.
  • the light emitted by the laser diodes is coupled into the individual fibers connected to the fiber bundles 7.
  • Output end of the fiber bundle 7 are the individual fibers 6 as shown in Figure 2 arranged side by side, so that the guided in them light from the individual fibers 6 out strikes the inlet surface 8 of the integrator 9.
  • the light radiation emitted by the fiber bundle 7 has a narrow entrance intensity distribution 21, as shown schematically in FIG. 3a.
  • the diagram representation according to FIG. 3a shows a relative intensity of the light radiation at the intensity axis 22 and a spatial coordinate parallel to the slow axis 18 in the horizontal axis 23.
  • the center line 17 of the entrance surface 8 of the integrator rod 9 is shown schematically on this location axis 23. Strictly speaking, the center line 17 should only appear as a point on the one-dimensional location axis 23, since in the intensity diagram according to FIGS. 3a and 4a the vertical axis represents the intensity and not a location coordinate.
  • the intensity distribution shown in Figure 3a corresponds to that in a conventional illumination optical system 3.
  • this conventional illumination optical system in contrast to the arrangement shown in Figure 2, a centric alignment of the light source relative to the
  • Center line 17 of the entrance surface 8 of the integrator rod 9 is provided. This leads to the conventional intensity distribution shown in FIG. 3a, which is arranged symmetrically around the center line 17.
  • the decentralized orientation of the light source shown in Figure 2 relative to the center line 17 of the entrance surface 8 of the integrator rod 9 leads to the 21a shown in Figure 4a at the entrance surface 8 of the integrator rod 9 in the direction of the slow axis 18.
  • the entrance intensity distribution 21a is shifted to the right with respect to the center line 16 and is in no way centered with the center line 17.
  • the intensity distribution 24a in the exit surface 11 of the integrator rod 9 is illustrated as in FIG. 4b.
  • the exit intensity distribution 24a has a gradient rising obliquely from left to right.
  • FIG. 5 shows the intensity distribution in the modulation plane 13 of the DMD 4, wherein the illustrated spatial axis runs in the plane of the drawing according to FIG.
  • the diagram of FIG. 5 shows for comparison Modulation intensity distribution 25 in the modulation plane 13 of the DMD 4 for the case of Fig. 3 a and b, which as mentioned relate to the prior art.
  • the exit intensity distribution 24 according to FIG. 3 b obtained in the prior art from the centered coupling of the light source into the integrator rod 9 leads to the conventional modulation intensity distribution 25 in the modulation plane 13 in the representation in FIG. 5.
  • the homogeneous exit intensity distribution 24 from FIG. 3 b is thus distorted in the prior art into the inhomogeneous intensity distribution 25, which drops sharply from left to right.
  • Modulation intensity distribution 26 according to the invention in contrast to the modulation intensity distribution 25 in the prior art, is nearly homogeneous over the spatial axis 23.
  • FIG. 6 shows a detailed representation of an alternative embodiment of a lighting arrangement 3.
  • the general layout of this variant of the illumination optics 3 according to the invention corresponds to the layout outlined in FIG.
  • the relative arrangement according to this variant of the invention is chosen as follows:
  • the individual fibers 6 of the fiber bundle 7 are oriented so that an emission direction 28 does not run parallel to a surface normal 29 of the leading surface 8 of the integrator rod 9, but is oriented at an angle 30 to this.
  • This arrangement results in the spatial intensity distribution sketched in FIG. 7 in the direction of the slow axis of the light source at the entrance or exit surface of the integrator rod.
  • the angle 30 may be less than about 1 ° in a preferred embodiment of the invention.
  • Figure 7 corresponds in principle to the representations of Figures 3 and 4.
  • Figure 7a shows the intensity distribution at the entrance surface 8 of the integrator rod.
  • the entrance intensity distribution 21b at the entrance surface 8 of the integrator rod 9 corresponds to the course after that, which one also at
  • Lighting according to the prior art receives.
  • the entrance intensity distribution 21b according to FIG. 7a is symmetrical to the center line 17 of the entrance surface 18 of the integrator rod 9.
  • the light source is not displaced transversely with respect to the integrator rod 9.
  • the intensity distribution 24b shown in FIG. 7b is obtained at the exit surface 11 of the integrator rod 9.
  • the exit intensity distribution 24b which is obtained with the angular orientation of the light source sketched in FIG. 6 relative to the entrance surface 8 of the integrator rod 9, is therefore asymmetrical.
  • Exit intensity distribution 24b is therefore inhomogeneous as desired. Due to the inhomogeneity, the exit intensity distribution 24b is suitable for illuminating it homogeneously under oblique incidence on the DMD 4. In the context of the invention, it is also possible to combine the arrangements according to FIGS. 2 (transverse displacement) and 6 (angular position) in order to achieve suitable exit intensity distributions 24, 24a, 24b. This is not explicitly shown in the figures.
  • a lighting arrangement 3 and an exposure apparatus is proposed in which, despite oblique incidence of light on the light modulator, a homogeneous intensity distribution on the modulation plane 13 of the light modulator 4 can be generated with high efficiency.
  • the exposure device according to the invention with the illumination arrangement according to the invention can be used in particular for the exposure of conventional offset plates or other photosensitive materials.
  • Typical exposure wavelengths are between 350 and 450 nm. Further screens for screen printing, flexographic printing plates, proofing materials or steel plates for the production of stamped samples can be exposed.
  • the exposure device according to the invention for the illumination arrangement according to the invention is particularly suitable for an exposure method in which a large area can be exposed in a structured manner by relative movement of the exposure unit to the material to be exposed.
  • the images of the display can be set either discretely next to each other, the exposure unit moves stepwise and exposed at a standstill.
  • the exposure unit may be continuously driven and exposed, the image content on the display being moved in opposite directions so that a fixed image is exposed on the material to be exposed. Such resulting stripes can in turn be set side by side by discrete steps. LIST OF REFERENCE NUMBERS

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)

Abstract

L'invention concerne un système d'éclairage (3) qui éclaire un modulateur réfléchissant de lumière (4) frappé obliquement par la lumière et qui comprend successivement le long d'un axe optique (10) une source de lumière (6) qui présente un premier axe (19) et un deuxième axe (18). Le deuxième axe (18) est disposé perpendiculairement au premier axe (19) et l'extension de la source de lumière (6) dans la direction du premier axe (19) est de préférence plus petite que l'extension de la source de lumière (6) dans la direction du deuxième axe (18), un homogénéiseur (9) qui injecte le faisceau lumineux émis par la source de lumière (6) et qui présente une surface d'entrée (8) et une surface de sortie (11) ainsi qu'une optique d'éclairage (12) qui forme l'image de la surface de sortie (11) de l'homogénéiseur (9) sur un modulateur de lumière (4) en conservant le rendement, de manière à obtenir un éclairage homogène du modulateur de lumière. Selon l'invention, la source de lumière (6) est décalée de l'homogénéiseur (9) transversalement par rapport à l'axe optique (10) ou la direction d'émission (28) de la source de lumière (6) forme un angle (30) par rapport à la normale (29) de la surface d'entrée (8) de l'homogénéiseur (9).
EP07818428A 2006-10-18 2007-09-26 Système d'éclairage Withdrawn EP2080053A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006049169A DE102006049169A1 (de) 2006-10-18 2006-10-18 Beleuchtungsanordnung
PCT/EP2007/008344 WO2008046494A1 (fr) 2006-10-18 2007-09-26 système d'éclairage

Publications (1)

Publication Number Publication Date
EP2080053A1 true EP2080053A1 (fr) 2009-07-22

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP07818428A Withdrawn EP2080053A1 (fr) 2006-10-18 2007-09-26 Système d'éclairage

Country Status (5)

Country Link
US (1) US20100321659A1 (fr)
EP (1) EP2080053A1 (fr)
JP (1) JP2010507112A (fr)
DE (1) DE102006049169A1 (fr)
WO (1) WO2008046494A1 (fr)

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WO2012137842A1 (fr) * 2011-04-04 2012-10-11 株式会社ニコン Appareil d'éclairage, appareil d'exposition, procédé de production d'un dispositif, élément optique guidant la lumière, et procédé de production d'un élément optique guidant la lumière
DE102011119565A1 (de) * 2011-05-16 2012-11-22 Limo Patentverwaltung Gmbh & Co. Kg Beleuchtungsvorrichtung
JP6051905B2 (ja) * 2013-02-06 2016-12-27 株式会社ニコン 光分配装置、照明システム及びこれを備える露光装置
KR101469445B1 (ko) * 2014-04-30 2014-12-05 주식회사 세코닉스 필드렌즈를 포함한 투사광학계 및 이를 이용한 피코 프로젝터

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Also Published As

Publication number Publication date
WO2008046494A1 (fr) 2008-04-24
US20100321659A1 (en) 2010-12-23
DE102006049169A1 (de) 2008-04-30
JP2010507112A (ja) 2010-03-04

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