EP2134665A4 - Mechanisches verfahren zur bildung von teilchen in einem fluid - Google Patents

Mechanisches verfahren zur bildung von teilchen in einem fluid

Info

Publication number
EP2134665A4
EP2134665A4 EP08727029A EP08727029A EP2134665A4 EP 2134665 A4 EP2134665 A4 EP 2134665A4 EP 08727029 A EP08727029 A EP 08727029A EP 08727029 A EP08727029 A EP 08727029A EP 2134665 A4 EP2134665 A4 EP 2134665A4
Authority
EP
European Patent Office
Prior art keywords
particles
template
microscopic
discrete surface
submicroscopic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP08727029A
Other languages
English (en)
French (fr)
Other versions
EP2134665A1 (de
Inventor
Thomas G Mason
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of California Berkeley
University of California San Diego UCSD
Original Assignee
University of California Berkeley
University of California San Diego UCSD
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of California Berkeley, University of California San Diego UCSD filed Critical University of California Berkeley
Publication of EP2134665A1 publication Critical patent/EP2134665A1/de
Publication of EP2134665A4 publication Critical patent/EP2134665A4/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0005—Separation of the coating from the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/003—3D structures, e.g. superposed patterned layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/006—Nanostructures, e.g. using aluminium anodic oxidation templates [AAO]
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/0036—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity
    • H01F1/0045—Zero dimensional, e.g. nanoparticles, soft nanoparticles for medical/biological use
    • H01F1/0054—Coated nanoparticles, e.g. nanoparticles coated with organic surfactant

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Biomedical Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Power Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Molecular Biology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
EP08727029A 2007-03-20 2008-03-20 Mechanisches verfahren zur bildung von teilchen in einem fluid Withdrawn EP2134665A4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US91889607P 2007-03-20 2007-03-20
PCT/US2008/003679 WO2008115550A1 (en) 2007-03-20 2008-03-20 Mechanical process for creating particles in a fluid

Publications (2)

Publication Number Publication Date
EP2134665A1 EP2134665A1 (de) 2009-12-23
EP2134665A4 true EP2134665A4 (de) 2011-09-14

Family

ID=39766278

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08727029A Withdrawn EP2134665A4 (de) 2007-03-20 2008-03-20 Mechanisches verfahren zur bildung von teilchen in einem fluid

Country Status (3)

Country Link
EP (1) EP2134665A4 (de)
CA (1) CA2681374A1 (de)
WO (1) WO2008115550A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5375005B2 (ja) * 2008-09-30 2013-12-25 ソニー株式会社 マイクロビーズ作製方法
EP2454393B1 (de) * 2009-07-14 2016-09-28 MSM Krystall GBR Verfahren zur herstellung von wendeschneidplatten
US20130068410A1 (en) * 2009-08-21 2013-03-21 Qinetiq Limited Production of Flake Particles
US9211519B2 (en) * 2009-10-08 2015-12-15 University Of Pittsburgh-Of The Commonwealth System Of Higher Education Methods to prepare patchy microparticles
JP5824878B2 (ja) * 2011-05-31 2015-12-02 大日本印刷株式会社 偽装防止用粒子の製造方法
CN106752302A (zh) * 2016-12-01 2017-05-31 深圳市美信电子有限公司 一种硅烷改性石墨烯油墨及其制备方法
CN108328610B (zh) * 2018-04-28 2021-10-08 丁道其 一种脂质体修饰改性纳米石墨烯的制备方法及其应用

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999029498A1 (en) * 1997-12-08 1999-06-17 Washington University Designer particles of micron and submicron dimension

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6832735B2 (en) 2002-01-03 2004-12-21 Nanoproducts Corporation Post-processed nanoscale powders and method for such post-processing
WO2000007702A2 (de) * 1998-08-03 2000-02-17 Poly-An Gmbh Templat-geprägte materialien, verfahren zu ihrer herstellung und ihre verwendung
US20050260503A1 (en) * 2004-05-20 2005-11-24 Taiwan Semiconductor Manufacturing Co., Ltd. Reticle film stabilizing method
KR101161197B1 (ko) * 2004-06-08 2012-06-29 도꾸리쯔교세이호징 리가가쿠 겐큐소 나노 구조체의 제조 방법 및 나노 구조체
WO2006105102A2 (en) * 2005-03-28 2006-10-05 The Research Foundation Of State University Of New York Synthesis of nanostructured materials using liquid crystalline templates
WO2006121819A1 (en) 2005-05-06 2006-11-16 Board Of Regents, The University Of Texas System Methods for fabricating nano and microparticles for drug delivery
US20070048383A1 (en) * 2005-08-25 2007-03-01 Helmus Michael N Self-assembled endovascular structures

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999029498A1 (en) * 1997-12-08 1999-06-17 Washington University Designer particles of micron and submicron dimension

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
HERNANDEZ C J ET AL: "Colloidal alphabet soup: monodisperse dispersions of shape-designed lithoparticles", JOURNAL OF PHYSICAL CHEMISTRY C, vol. 111, no. 12, 13 February 2007 (2007-02-13), American Chemical Society (ACS) [US], pages 4477 - 4480, XP002654297, ISSN: 1932-7447, DOI: 10.1021/jp0672095 *
MIKRAJUDDIN ET AL: "Single route for producing organized metallic domes, dots, and pores by colloidal templating and over-sputtering", ADVANCED MATERIALS, vol. 14, no. 12, 17 June 2002 (2002-06-17), WILEY-VCH VERLAG [DE], pages 930 - 933, XP001130546, DOI: 10.1002/1521-4095(20020618)14:12<930::AID-ADMA930>3.0.CO;2-L *
See also references of WO2008115550A1 *
XIA Y ET AL: "Soft Lithography", ANNUAL REVIEW OF MATERIALS SCIENCE, vol. 28, August 1998 (1998-08-01), Annual Reviews Inc., Palo Alto, CA [US], pages 153 - 184, XP009023786, ISSN: 0084-6600, DOI: 10.1146/ANNUREV.MATSCI.28.1.153 *

Also Published As

Publication number Publication date
CA2681374A1 (en) 2008-09-25
WO2008115550A1 (en) 2008-09-25
EP2134665A1 (de) 2009-12-23

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