EP2168136A2 - Mikroquelle für ionenemissionen - Google Patents
Mikroquelle für ionenemissionenInfo
- Publication number
- EP2168136A2 EP2168136A2 EP08828202A EP08828202A EP2168136A2 EP 2168136 A2 EP2168136 A2 EP 2168136A2 EP 08828202 A EP08828202 A EP 08828202A EP 08828202 A EP08828202 A EP 08828202A EP 2168136 A2 EP2168136 A2 EP 2168136A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- needle
- electrode
- tip
- cavity
- extraction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000605 extraction Methods 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 16
- 238000010438 heat treatment Methods 0.000 claims description 11
- 230000001105 regulatory effect Effects 0.000 claims description 6
- 230000005540 biological transmission Effects 0.000 claims description 5
- 239000011163 secondary particle Substances 0.000 claims description 3
- 239000011819 refractory material Substances 0.000 claims description 2
- 238000009413 insulation Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 description 31
- 239000000203 mixture Substances 0.000 description 18
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002585 base Substances 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 230000008901 benefit Effects 0.000 description 9
- 238000010884 ion-beam technique Methods 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 229910052733 gallium Inorganic materials 0.000 description 5
- 230000009257 reactivity Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 230000033228 biological regulation Effects 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 150000008040 ionic compounds Chemical class 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 229910052792 caesium Inorganic materials 0.000 description 3
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 229910001338 liquidmetal Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 229910013553 LiNO Inorganic materials 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 238000005001 rutherford backscattering spectroscopy Methods 0.000 description 2
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000003556 assay Methods 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- -1 e.g. Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000002608 ionic liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000006193 liquid solution Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000004452 microanalysis Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 239000011214 refractory ceramic Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
Definitions
- the present invention relates to a micronic source of ionic emission.
- the field of the invention is that of the emission of ions focused from a point or quasi-point source.
- the material to be ionized is supplied to the source in the liquid phase in the form of pure elements or compounds often including metal elements.
- LMIS abbreviation of the English term “Liquid Metal Ion Source”
- FIB abbreviation of the English expression " Focused Ion Beam”
- This technology makes it possible to produce a sub-micron sized ion probe with a current density of several A / cm 2 . It is used in particular in microelectronics for various tasks: - failure analysis of integrated circuits,
- Some sources may have a relatively long life (greater than 1000 ⁇ A.h) but they only target materials that have a low saturation vapor pressure at their melting temperature. These materials are therefore limited to a few metals and some metal alloys and gallium is a preferred metal.
- the article "Characteristics of a gallium liquid metal field emission ion source" J. Phys. D: Appl. Phys., 13 (1980), pp. 1747-1755 discloses an ion source provided for ionizing this metal.
- This source comprises a transmission member arranged under an extraction member which takes the form of a discoidal electrode pierced at its center.
- the emitter is a tank at the top of which protrudes the apex of a tungsten tip disposed therein.
- This tip is metallic because the ionization field is obtained by applying a relatively high voltage (4 to 10 kV) between this tip and the disc electrode.
- gallium makes it possible to obtain a very good spatial resolution (of the order of about ten nanometers), its secondary ion emission efficiency is low, thus reducing the faculty of using it for quantitative analyzes.
- more conventional assay systems using reactive species to achieve high secondary ion yield have low spatial resolution.
- Cesium which is one of the most chemically reactive metals, significantly increases the emission yield of negative secondary ions.
- Industrial SIMS systems use conventional Cs sources (usually of surface ionization type) but the brightness of these ion sources is low and therefore can not be compared to that of Gallium LMIS sources.
- the violent reactivity of cesium makes it difficult to handle.
- all attempts to produce cesium-based LMIS sources have been confined to research laboratories because they have not reached a level of reliability sufficient for industrial applications.
- the energy measurement of the ions emitted with a potential-delay analyzer reveals an energy dispersion of 110 eV at the width at half-height. This dispersion would be due to the participation of gas phase field ionization and field desorption at the apex of the tip. Ion sources with such wide energy dispersion are not suitable for use in industrial systems because the focus of the ion beam is considerably limited by chromatic aberrations.
- US 4, 488, 045 discloses an ion source which comprises a reservoir.
- This tank has a tip projecting at its apex. It comprises a cavity having an exhaust port (the end of the capillary) opening at the tip.
- the tip is electrically conductive. Indeed, an extraction voltage is applied between the tip and an extraction electrode.
- JP 59 054156 discloses an electrode structure for an ion beam generator of field emission type.
- the electrode is conductive.
- EP 0 706 199 significantly improved this situation by providing a source provided with an insulating refractory ceramic needle, thus eliminating the electroerosion phenomenon. This improvement, however, is not sufficient to obtain a lifetime compatible with industrial constraints because the problem of the evaporation rate which has not yet been solved limits both the service life and the compositions that can be used with this type of tip.
- the present invention thus has as its first object a micronic source of ionic emission having a considerably extended lifetime and allowing to use a very large variety of active or inactive compositions.
- the ionic emission device comprises an emission member which comprises a hollow needle, this needle having an insulating tip which projects at its apex; moreover this needle comprises a cavity having an exhaust port which opens at the tip.
- the composition to be ionized is in the cavity, which provides several advantages. In the first place, this arrangement considerably limits the evaporation of this composition. This results in a significant increase in the life of the source. In addition, it becomes possible to include in this composition elements with a high saturating vapor pressure at their melting point. Secondly, the use of a cavity for storing the composition makes it possible to use very reactive elements, especially liquid solutions at ambient temperature such as acids, bases or dissolved salts.
- the needle is also electrically insulating.
- the invention has its best performance when the sensitive elements have micron or submicron dimensions.
- the surface of the exchange section between the cavity and the outside of the needle is less than 100 ⁇ m.
- the largest dimension of the tip is preferably less than 50 microns.
- the tip is disposed in the cavity in coaxial configuration with the needle.
- the tip is secured to the apex of the needle.
- the volume of the composition that can be stored in the cavity is very small.
- a support in which is fixed the base of the hollow needle.
- the support comprises a reservoir which communicates with the supply orifice that the cavity presents. This feed port opens at the base of the needle.
- the device comprises a means for heating the needle. Similarly, it comprises a heating means of the support.
- it further comprises a pierced extraction electrode mechanically connected to the needle.
- a second object of the present invention is to increase the heating uniformity of the needle.
- the device comprises a cylindrical metal sleeve mechanically connected to this needle.
- a third object of the present invention is to allow fine adjustment of the emission current and efficient regulation of this current.
- a first electrode electrically conductive and isolated from the needle then acts as regulation electrode the device comprises a voltage supply of this plate.
- the needle is made of a refractory insulating material.
- the invention also relates to a focused ion emission process by means of a device comprising an emission needle and an extraction electrode, this needle having an electrically insulating emission tip which projects at its apex and is associated with an extraction electrode, the needle further comprising a cavity having an exhaust port opening at the tip, the method comprising applying an extraction voltage to said extraction electrode; in addition, this device comprising a regulation electrode, the method comprises the application of a regulation voltage to this control electrode. It is of primary interest of the present invention to provide novel sources of high gloss, long lived point ions using liquid ionic compounds consisting of mixtures, e.g., mixtures of molten salts, acids, and the like. or bases but not limited to these.
- FIG. 1 represents a sectional view of a first embodiment of a hollow needle
- FIG. 2 represents a sectional view of a second embodiment of a hollow needle
- FIG. 3 represents a variant of this second embodiment
- FIG. 4 represents a schematic sectional view of an ion emission device
- - Figure 5 shows a partial view of a variant of this device
- - Figure 6 shows a partial view of a second variant of this device.
- a hollow needle 10 is in the form of a capillary, the inner conduit of this capillary constituting a cavity 11 intended to receive the composition subjected to ionization.
- This capillary is similar to crucibles used in microelectronics for ultrasonic or thermo-compression wiring. It is preferably electrically insulating.
- the base 12 of the needle 10 (bottom in the figure) is shown open but could be closed if it turns out that the volume of the cavity 11 is sufficient to store the required amount of composition.
- the cavity 11 opens at the apex of the needle 10 through a circular exhaust orifice 14 whose diameter is less than a few tens of microns.
- a cylindrical rod 15 of insulating refractory material whose diameter is smaller than that of the exhaust orifice is arranged in the cavity 11. Its upper end forming a tip 16 protrudes with respect to the apex 13 of the needle 10 This rod is held in position so that its axis substantially coincides with that of the needle 10 by any appropriate means, an adhesive point 17 for example.
- the diameter of the cylindrical rod 15 also allows a partial closure of the exhaust port 14 by providing an exchange section between the cavity and the outside which is of micron or submicron dimension, in order to limit the The surface of the exchange section is preferably less than 100 ⁇ m.
- the tip 16 has the function of stabilizing the Taylor cone well known to those skilled in the art, cone whose theoretical value of the half angle of inclination with reference to its axis is 49.3 °. It is thus machined so that it also forms a cone whose half-angle angle of inclination is preferably less than or equal to 60 °.
- a preferred machining technique of this tip 16 is focused ion beam assisted etching. This technique can shape the upper end of the rod 15 of alumina to define the tip 16 of micron or submicron dimension (height less than 10 microns) with a high spatial resolution, of the order of a few nanometers.
- a second embodiment of a tip at the apex of a hollow needle is exposed.
- the body of the needle 20 is the same as in the previous case so that here it also has a cavity 21 which opens at its apex 23 through an exhaust port 24.
- a tip 26 is shaped on the apex 23 of the needle.
- This operation is preferably performed by a deposition technique assisted by a focused ion or electron beam, chemical vapor deposition, hereinafter called CVD (for the English expression “Chemical Vapor Deposition”) for example.
- CVD chemical vapor deposition
- This technique also makes it possible to achieve a partial closure 27 of the exhaust port 24 by providing an exchange section between the cavity and the outside which is of micron or submicron size, in order to limit the evaporation at the of the point 26.
- the surface of the section is of micron or submicron size, in order to limit the evaporation at the of the point 26.
- 2 exchange is preferably less than 100 microns.
- the needle 30 again includes an internal cavity 31 which opens at its apex 33 through an exhaust port 34.
- the tip 36 here takes the form of a tripod resting on the apex 33 of the needle. It is also performed by CVD deposition assisted by a focused ion or electron beam.
- the cavities of the needles above have a reduced volume, often insufficient for most applications. It is therefore expected, within a transmission member, an additional reservoir to increase the amount of stored composition.
- the needle 41 (shown without its tip) is fitted in a sealed manner in a metal support 42 itself fixed on a base 43 of insulating material.
- This support 42 comprises a reservoir 44 which communicates with the base of the needle 41, this base thus acting as an inlet for the cavity 45 of this needle.
- a heating element 47 such as a coaxial heating cable is helically wound around the part of the needle 41 which protrudes from the support 42.
- This cable heater 47 is optionally extended on the upper part of the support 42.
- a cylindrical sleeve 48 surrounds all or part of the cable 47. Its function is, on the one hand, to standardize the heating and, on the other hand to act as than the thermal shield with respect to the radiation emitted by the hot source, namely the needle 41 and the support 42.
- the heating cable 47 comprises a resistive core coated with an insulator, this insulator being itself trapped in a conductive outer sheath. At one end of the cable, the core is connected to a first crossing 50 while at its other end, the core and the outer sheath are connected to a second crossing 51. Thus, the potential of the sheath is set to the potential Vref reference.
- the two bushings 50, 51 are also connected to a heating supply 52.
- the support 42 has a constriction 55 below the heating cable 47, so that its lower part is at a relatively low temperature to maintain a powder in the solid state.
- the device further comprises an extraction member.
- This ion extraction member comprises a second cylindrical tube 70 fixed to the plate 61.
- This second tube 70 is provided with centering screws 72a, 72b which bear on the plate 61 so that one can accurately position its axis relative to that of the support 42 and the needle 41.
- a second electrode 73 closes the second tube 70 except that it is pierced at its center to clear the ion emission cone 75. It is secured to this tube so that it can undergo axial translation of the tube. limited amplitude.
- complementary threads are provided at the relevant ends of the second tube 70 and the second electrode 73.
- the second tube 70 is connected to an extraction power supply 74 which is provided to apply to it a positive or negative potential with respect to the reference potential Vref. It is thus possible to emit negative or positive ions.
- the device comprises a regulating member.
- This member comprises a first cylindrical tube 60 fixed to a plate 61.
- This first tube 60 is provided with centering screws 62a, 62b which bear on the base 43 so that one can precisely position its axis relative to that of the support 42 and needle 41.
- An electrode 63 closes off this first tube 60 except that it is pierced at its center to disengage the apex of the needle 41. It is secured to this tube so that it can undergo axial translation. limited amplitude.
- complementary threads are provided at the relevant ends of the first tube 60 and the first electrode 63.
- the regulator plays primarily a role of heat shield.
- control power supply 64 which is provided to apply a positive or negative potential between 0 and 2000V relative to the reference potential Vref.
- a variant of the device is presented in which the apex of the needle 81 is now slightly set back from the first electrode or extraction electrode 82 and the second electrode 83 is disposed above this electrode, its central opening constituting an acceptance diaphragm 84.
- the supply of the second electrode 83 delivers here a positive or negative voltage of between 300 and 1000 V with respect to the potential of the first extraction electrode 82. This voltage allows the suppression of the secondary particles emitted on the acceptance diaphragm 84 through a portion of the cone 85.
- the apex of the needle 91 is now in front of the first electrode or control electrode 92.
- the second electrode or extraction electrode 93 is disposed above this electrode 92, likewise the third electrode or electrode 94 is disposed above the electrode 93.
- the central opening of the electrode 94 constitutes an acceptance diaphragm 95.
- the first electrode 92 is connected to the regulating power supply 64 which makes it possible to apply to it a positive or negative potential between 0 and 2000V relative to the reference potential Vref.
- the second electrode 93 is connected to an extraction power supply 74 which is provided to apply to it a positive or negative potential with respect to the reference potential Vref. It is thus possible to emit negative or positive ions.
- the third electrode 94 is connected to an additional power supply not shown in FIGS. 4 and 6, here delivering a positive or negative voltage of between 300 and 1000V. This voltage allows the removal of the secondary particles emitted on the acceptance diaphragm
- the device detailed so far is suitable for the implementation of a focused ionic emission process, this device comprising a transmission needle, an extraction electrode and a control electrode. It applies that the needle has an additional reservoir or does not include, although in the latter case it does not benefit from the advantages of the device outlined above.
- the method essentially comprises applying an extraction voltage to the extraction electrode and a regulating voltage to the control electrode.
- compositions having a wide range of saturation vapor pressures at their melting temperature, compositions including acids, bases and mixtures of ionic compounds such as dissolved salts.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
- Elimination Of Static Electricity (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0704939A FR2918790A1 (fr) | 2007-07-09 | 2007-07-09 | Source micronique d'emission ionique |
| PCT/FR2008/000989 WO2009027596A2 (fr) | 2007-07-09 | 2008-07-08 | Source micronique d'émission ionique |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP2168136A2 true EP2168136A2 (de) | 2010-03-31 |
Family
ID=39191468
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP08828202A Withdrawn EP2168136A2 (de) | 2007-07-09 | 2008-07-08 | Mikroquelle für ionenemissionen |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20100181493A1 (de) |
| EP (1) | EP2168136A2 (de) |
| JP (1) | JP2010533350A (de) |
| FR (1) | FR2918790A1 (de) |
| WO (1) | WO2009027596A2 (de) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9837239B2 (en) * | 2013-11-07 | 2017-12-05 | Gregory Hirsch | Techniques for optimizing nanotips derived from frozen taylor cones |
| EP3066680B1 (de) * | 2013-11-07 | 2018-12-12 | HIRSCH, Gregory | Helle und dauerhafte feldemissionsquelle aus feuerfesten taylor-kegeln |
| US10546719B2 (en) | 2017-06-02 | 2020-01-28 | Fei Company | Face-on, gas-assisted etching for plan-view lamellae preparation |
| FR3070791B1 (fr) | 2017-09-05 | 2023-04-14 | Centre Nat Rech Scient | Generateur de faisceau ionique a nanofils |
| US10684308B1 (en) * | 2017-12-11 | 2020-06-16 | Gregory Hirsch | Methods for stabilizing biological and soft materials for atom probe tomography |
| FR3100464B1 (fr) * | 2019-09-10 | 2023-05-05 | Centre Nat Rech Scient | Procede d’emission d’atomes, de molecules ou d’ions |
| FR3112420B1 (fr) | 2020-07-10 | 2022-09-09 | Univ Paris Saclay | Procédé pour la production d’un faisceau d’espèces chargées en phase gazeuse et dispositif associé |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56127661U (de) * | 1980-02-29 | 1981-09-29 | ||
| JPS5838906B2 (ja) * | 1981-09-03 | 1983-08-26 | 日本電子株式会社 | 金属イオン源 |
| JPS5954156A (ja) * | 1982-09-21 | 1984-03-28 | Agency Of Ind Science & Technol | 電界放出型イオンビ−ム発生装置用電極構造 |
| JPS6056342A (ja) * | 1983-09-08 | 1985-04-01 | Anelva Corp | イオンビ−ム発生装置 |
| JPS61230237A (ja) * | 1985-04-05 | 1986-10-14 | Hitachi Ltd | 液体金属イオン源 |
| US4752692A (en) * | 1985-04-26 | 1988-06-21 | Hughes Aircraft Company | Liquid metal ion source |
| JPS62259332A (ja) * | 1985-10-23 | 1987-11-11 | Nippon Denshi Zairyo Kk | イオン発生装置 |
| JPS62206744A (ja) * | 1986-03-05 | 1987-09-11 | Mitsubishi Electric Corp | イオン源装置 |
| JPS62290042A (ja) * | 1986-06-06 | 1987-12-16 | Mitsubishi Electric Corp | 液体金属イオン源 |
| JPS63128527A (ja) * | 1986-11-18 | 1988-06-01 | Fuji Electric Co Ltd | 液体金属イオン源 |
| JPH01274342A (ja) * | 1988-04-25 | 1989-11-02 | Fuji Electric Co Ltd | 液体金属イオン源 |
| JPH05128965A (ja) * | 1991-11-05 | 1993-05-25 | Hitachi Ltd | エミツタ部作製方法および装置ならびに集束イオンビーム装置 |
| US5223226A (en) * | 1992-04-14 | 1993-06-29 | Millipore Corporation | Insulated needle for forming an electrospray |
| DE69432899D1 (de) * | 1994-10-07 | 2003-08-07 | Ibm | Flüssige ionische Zusammensetzungen verwendende Ionenpunktquellen hoher Luminosität |
| JP3048907B2 (ja) * | 1995-11-29 | 2000-06-05 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 高輝度点イオン源 |
| US5788166A (en) * | 1996-08-27 | 1998-08-04 | Cornell Research Foundation, Inc. | Electrospray ionization source and method of using the same |
| US6452196B1 (en) * | 1999-12-20 | 2002-09-17 | Axcelis Technologies, Inc. | Power supply hardening for ion beam systems |
| JP2004014309A (ja) * | 2002-06-07 | 2004-01-15 | Hitachi High-Technologies Corp | アパーチャおよび集束イオンビーム装置 |
-
2007
- 2007-07-09 FR FR0704939A patent/FR2918790A1/fr not_active Withdrawn
-
2008
- 2008-07-08 US US12/668,228 patent/US20100181493A1/en not_active Abandoned
- 2008-07-08 JP JP2010515550A patent/JP2010533350A/ja active Pending
- 2008-07-08 WO PCT/FR2008/000989 patent/WO2009027596A2/fr not_active Ceased
- 2008-07-08 EP EP08828202A patent/EP2168136A2/de not_active Withdrawn
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2009027596A2 * |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2918790A1 (fr) | 2009-01-16 |
| WO2009027596A3 (fr) | 2009-05-14 |
| JP2010533350A (ja) | 2010-10-21 |
| WO2009027596A2 (fr) | 2009-03-05 |
| US20100181493A1 (en) | 2010-07-22 |
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