EP2210060A1 - Capteur de vitesse de rotation à deux axes sensibles - Google Patents

Capteur de vitesse de rotation à deux axes sensibles

Info

Publication number
EP2210060A1
EP2210060A1 EP07822375A EP07822375A EP2210060A1 EP 2210060 A1 EP2210060 A1 EP 2210060A1 EP 07822375 A EP07822375 A EP 07822375A EP 07822375 A EP07822375 A EP 07822375A EP 2210060 A1 EP2210060 A1 EP 2210060A1
Authority
EP
European Patent Office
Prior art keywords
rotation
rate sensor
axis
drive
sensor according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP07822375A
Other languages
German (de)
English (en)
Inventor
Reinhard Neul
Johannes Classen
Sebastian Gracki
Burkhard Kuhlmann
Axel Franke
Oliver Kohn
Kersten Kehr
Christian Gerhardt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Publication of EP2210060A1 publication Critical patent/EP2210060A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5705—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis
    • G01C19/5712—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis the devices involving a micromechanical structure

Definitions

  • the invention is based on a rotation rate sensor with a substrate, a bearing, a vibration structure suspended on the bearing by means of springs for the purpose of carrying out a planar drive vibration movement, and drive means for generating the planar drive oscillation movement
  • Micromechanical rotation rate sensors with one sensing axis are used for a wide variety of applications. In motor vehicles, these are for example the anti-skid program ESP, navigation and rollover measurement, in home electronics there are applications in the field of image stabilization, motion detection and navigation.
  • a micromechanical rotation rate sensor with a sensing axis is known from the German patent application DE 195 23 895 A1, in which a rotor mass suspended centrally via bending springs is excited to rotational oscillations and tilts when a rotation rate occurs due to the Coriolis effect. This deflection is detected by means of electrodes placed in a conductive layer above a substrate.
  • the invention is based on a rotation rate sensor with a substrate, a
  • the core of the invention consists in that the rotation rate sensor has first evaluation means for detecting a rotation in a first rotation axis and second evaluation means for detecting a rotation in a second rotation axis.
  • the invention provides a rotary yaw rate sensor with two sensitive axes. This allows two measuring axes to be evaluated simultaneously on a single chip.
  • the sensor is sensitive to both axes of rotation x, y lying in the chip plane.
  • the sensor core is only marginally larger than a single-channel sensor with comparable specification requirements.
  • the power consumption is significantly lower than for two single-channel sensors.
  • only a single drive circuit is required for both measuring axes, and on the other hand, larger functional blocks of the circuit can be shared by temporal multiplexing for both detection channels, in particular when using digital evaluation circuits.
  • the device In combination with the highly symmetrical sensor design, the device guarantees a well-matched performance and sensitivity of the two measurement channels.
  • the relative orientation of the two measuring axes is given by design and is not impaired by tolerances in the assembly and connection technology, as in the case of the assembly of two single-channel sensors. drawing
  • FIG. 1 shows the micromechanical functional part of a rotational speed sensor according to the prior art.
  • Fig. 2 shows the schematic representation of the micromechanical functional part of a rotation rate sensor of FIG. 1 in plan view.
  • FIG. 3 shows a rotation rate sensor according to the invention with two sensitive axes.
  • FIGS. 4 A and B show two embodiments of the suspension structure of a rotation rate sensor according to the invention.
  • FIG. 5 shows a rotation rate sensor according to the invention
  • FIG. 6 shows a rotation rate sensor according to the invention with enlarged drive means.
  • Fig. 1 shows the micromechanical functional part of a rotation rate sensor according to the prior art.
  • the rotation rate sensor is shown in a schematic Thomasdar- position. Shown is a substrate or a carrier 10, a hub 20 with
  • the hub 20 is connected to the carrier 10. About the oscillating springs 30, the hub is also connected to the oscillating mass 40.
  • the rotation rate sensor has drive means in the form of comb structures C A i, C A2 , which serve to drive the vibration V.
  • the drive of the excitable to the vibration seismic Mass, the oscillating mass 40 takes place in that the two crests of a drive structure, such as C A i, represent two electrodes that are charged to different electrical potentials.
  • the complementary combs are drawn into each other due to the electrostatic attraction, and the oscillating mass 40 is thereby deflected. Furthermore, the
  • Rate of rotation sensor comb structures C D i, C 02 which are adapted to detect the amplitude of the drive vibration and the signal is generally used to control this amplitude.
  • the rotation rate sensor has detection means in the form of capacitor structures C S i, C S2 , which serve to measure the deflection of the vibration mass as a result of an acting Coriolis force F 0 .
  • the oscillating mass 40 oscillates on a spherical path V about the hub 20.
  • the yaw rate sensor detects rotations about the sensitive axis, the axis of rotation ⁇ , as intended.
  • Coriolis forces F 0 occur, which lead to a deflection of the oscillating mass 40 in the direction indicated by arrows perpendicular to the vibration plane.
  • the sense of direction of the Coriolis forces F 0 changes in each case with the sense of direction of the torsional vibration V of the oscillating mass 40.
  • Fig. 2 shows the schematic representation of the micromechanical functional part of a rotation rate sensor of FIG. 1 in plan view.
  • the drive combs CAU, C A i2, C A 2i, C A 22 and the detection combs C D n, C D i2, C D2 i, C D22 are shown .
  • the drive combs CAU, C A i 2 serve to drive the oscillating mass 40 in FIG.
  • the drive combs C A2 i, C A22 serve to drive the oscillating mass 40 in the direction -V.
  • the detection combs C D n, C D i 2 , C D2 i, C D22 serve to measure the amplitude of the drive deflection in the two directions + V and -V.
  • the capacity of this capacitor-like comb structures C D n, D i C 2, C i D2, D22 C depends on the depth of immersion of the combs into each other and thus from the
  • the electrodes CTL and CT2 represent test electrodes. By applying a voltage to the test electrodes CTL and CT2, a deflection of the oscillating weight 40 in the direction of the Coriolis forces F can be got 0. Thus, the effect of the Corio lis guide F 0 simulated and the deflectability of the oscillating mass 40 of the tested. This allows the functionality of the sensor to be tested.
  • FIG. 3 shows a rotation rate sensor according to the invention with two sensitive axes.
  • the yaw rate sensor according to the invention is developed from the gyroscope sensor described above in the prior art.
  • the inventive two-channel (because equipped with two sensitive axes) rotation rate sensor can be manufactured in the same surface micromechanical process. While the single-channel angular rate sensor in the prior art has a large asymmetry in the spring stiffness and moments of inertia of the suspension structure with the
  • the design of the two-channel structure is highly symmetrical with respect to these two axes.
  • the rotor 40 is connected to the substrate 10 via springs 30, which lead centrally inwards and are suspended near the center on a hub 20.
  • the structure is set over drive combs in rotation about the vertical axis (z-axis).
  • Drive detection combs measure the deflection of the system and feed the signal to a control loop that allows the sensor to operate stably at its drive frequency.
  • Axis is below the four “rotor arms", ie the springs 30, in the buried conductor track plane of a substrate 10 are detection means in the form of structured electrode surfaces which detect the tilting of the rotor via the resulting capacitance changes From the difference signals Cx, p-Cx, n or Cy , p - Cy, n of the respectively opposite electrodes of first detection means and second detection means, respectively, the yaw rates can be derived around the x and y axes respectively and vice versa.
  • Figures 4 A and B show two embodiments of the suspension structure of a rotation rate sensor according to the invention.
  • the exact position of the natural frequencies in the drive and detection movement has a significant influence, inter alia, on the sensitivity and power consumption of the sensor.
  • the spring geometry must therefore be designed accordingly to achieve the desired frequencies.
  • AIIg. simple bending springs, as they are schema Table are shown in Figure 2, to use.
  • the springs 30 will have more complicated geometries. These may be, for example, meander-shaped springs as shown in FIGS. 4 A and B.
  • the number of springs 30 may also vary, but for symmetry reasons it will advantageously be a multiple of four.
  • more than eight springs make little sense because they require too much space and the resulting spring stiffness would be too high for most applications.
  • FIG. 5 shows a rotation rate sensor according to the invention with self-test electrodes.
  • a simple self-test of the sensor is possible.
  • FIG. 6 shows a rotation rate sensor according to the invention with enlarged drive means. To increase the drive amplitude or to reduce the required drive voltage (and thus the power consumption) compared to the
  • Prior art embodiments may desire to increase drive capacity via additional drive combs.
  • the micromechanical rotation rate sensors described here are cost-effectively manufactured in surface micromechanics.
  • a semiconductor substrate with many sensors after processing is separated into rectangular pieces, each carrying a sensor element.
  • the drive electrode trunks extend essentially along the diagonals of the rectangular substrate 10. Since the extension of the electrodes into the chip diagonals shows, without enlargement of the rectangular chip area, an extension of the drive electrode dams beyond the actual rotor radius and thus a larger number of drive or drive detection combs can be realized. Since just the outer ridges are particularly efficient in generating the drive torque, even a small increase in the comb number is very beneficial.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Gyroscopes (AREA)

Abstract

L'invention concerne un capteur de vitesse de rotation comprenant : un substrat (10) ; un palier (20) ; une structure vibrante (40) suspendue au palier (20) à rotation, par l'intermédiaire de ressorts (30), pour exécuter un mouvement vibrant d'entraînement plan ; et des moyens d'entraînement pour produire le mouvement vibrant d'entraînement plan de la structure vibrante. Selon l'invention, le capteur de vitesse de rotation comprend : des premiers moyens d'interprétation pour détecter une rotation dans un premier axe de rotation ; et des seconds moyens d'interprétation pour détecter une rotation dans un second axe de rotation.
EP07822375A 2007-11-08 2007-11-08 Capteur de vitesse de rotation à deux axes sensibles Withdrawn EP2210060A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2007/062073 WO2009059639A1 (fr) 2007-11-08 2007-11-08 Capteur de vitesse de rotation à deux axes sensibles

Publications (1)

Publication Number Publication Date
EP2210060A1 true EP2210060A1 (fr) 2010-07-28

Family

ID=39575644

Family Applications (1)

Application Number Title Priority Date Filing Date
EP07822375A Withdrawn EP2210060A1 (fr) 2007-11-08 2007-11-08 Capteur de vitesse de rotation à deux axes sensibles

Country Status (6)

Country Link
US (1) US20110088469A1 (fr)
EP (1) EP2210060A1 (fr)
JP (1) JP2011503557A (fr)
KR (1) KR20100080555A (fr)
CN (1) CN101855515A (fr)
WO (1) WO2009059639A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009046515A1 (de) * 2009-11-09 2011-05-12 Robert Bosch Gmbh Magnetometer
JP4939671B2 (ja) * 2010-07-05 2012-05-30 パイオニア株式会社 回転振動型ジャイロ
KR101306877B1 (ko) * 2011-01-26 2013-09-10 주식회사 유비트로닉스 내부감지전극을 갖는 튜닝포크형 자이로스코프
DE102017213802A1 (de) * 2017-08-08 2019-02-14 Robert Bosch Gmbh Drehratensensor, Verfahren zur Herstellung eines Drehratensensors
DE102017217009B3 (de) 2017-09-26 2018-07-19 Robert Bosch Gmbh MEMS-Vorrichtung sowie entsprechendes Betriebsverfahren
JP7389767B2 (ja) * 2021-02-26 2023-11-30 株式会社東芝 センサ及び電子装置
IT202200024732A1 (it) * 2022-11-30 2024-05-30 St Microelectronics Srl Dispositivo microelettromeccanico con struttura di test, apparecchiatura di test per testare dispositivi microelettromeccanici e metodo per fabbricare un dispositivo microelettromeccanico

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5203208A (en) * 1991-04-29 1993-04-20 The Charles Stark Draper Laboratory Symmetrical micromechanical gyroscope
US5377544A (en) * 1991-12-19 1995-01-03 Motorola, Inc. Rotational vibration gyroscope
DE19617666B4 (de) * 1996-05-03 2006-04-20 Robert Bosch Gmbh Mikromechanischer Drehratensensor
JP4011626B2 (ja) * 1996-07-10 2007-11-21 株式会社ワコー 角速度センサ
DE19641284C1 (de) * 1996-10-07 1998-05-20 Inst Mikro Und Informationstec Drehratensensor mit entkoppelten orthogonalen Primär- und Sekundärschwingungen
GB2318184B (en) * 1996-10-08 2000-07-05 British Aerospace A rate sensor
US6158820A (en) * 1997-12-03 2000-12-12 Hayes Lemmerz International, Inc. Air tight vehicle wheel with lightener pocket and process for manufacturing same
JP3399336B2 (ja) * 1997-12-22 2003-04-21 株式会社豊田中央研究所 検出器
JP2000009473A (ja) * 1998-06-22 2000-01-14 Tokai Rika Co Ltd ２軸ヨーレートセンサ及びその製造方法
US6584845B1 (en) * 1999-02-10 2003-07-01 California Institute Of Technology Inertial sensor and method of use
JP2000249719A (ja) * 1999-03-03 2000-09-14 Mitsubishi Electric Corp 半導体３軸加速度・２軸角速度センサ
DE19915257A1 (de) * 1999-04-03 2000-06-15 Bosch Gmbh Robert Drehratensensor
TWI220155B (en) * 2003-07-25 2004-08-11 Ind Tech Res Inst Micro vibratory dual-axis sensitive gyroscope
JP4353087B2 (ja) * 2004-12-01 2009-10-28 株式会社デンソー 回転振動型角速度センサ
EP1832841B1 (fr) * 2006-03-10 2015-12-30 STMicroelectronics Srl Structure de capteur intégré microélectromécanique avec déplacement de commande rotative
US8087295B2 (en) * 2006-03-13 2012-01-03 Yishay Sensors Ltd. Dual-axis resonator gyroscope
JP4687577B2 (ja) * 2006-06-16 2011-05-25 ソニー株式会社 慣性センサ

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2009059639A1 *

Also Published As

Publication number Publication date
CN101855515A (zh) 2010-10-06
JP2011503557A (ja) 2011-01-27
KR20100080555A (ko) 2010-07-08
US20110088469A1 (en) 2011-04-21
WO2009059639A1 (fr) 2009-05-14

Similar Documents

Publication Publication Date Title
EP1996899B1 (fr) Capteur de taux de rotation avec poutres d'accouplement
DE112005002196B4 (de) Drehratensensor
EP2263093B1 (fr) Capteur d'acceleration micromecanique
EP2193335B1 (fr) Capteur de vitesse de rotation micromécanique
DE69822756T2 (de) Mikromechanischer Schwingkreisel
DE102008040525B4 (de) Mikromechanisches Sensorelement
DE102010029634B4 (de) Drehratensensor
EP2210060A1 (fr) Capteur de vitesse de rotation à deux axes sensibles
DE102021200483A1 (de) Dreiachsiger Drehratensensor mit einem Substrat und einem Doppelrotor
DE102012207937A1 (de) Drehratensensor
DE3719037A1 (de) Vibrierender beschleunigungsmesser-multisensor
DE112019004565B4 (de) Z-Achse-Beschleunigungsmesser mit erhöhter Empfindlichkeit
EP0765464B1 (fr) Capteur de vitesse angulaire
DE602005005478T2 (de) Mehrachsiger kapazitiver wandler
DE69212603T2 (de) Verbesserungen von oder mit bezug auf kreiselgeräte
DE19500800A1 (de) Beschleunigungssensor
DE19937747C2 (de) Mechanischer Resonator für Rotationssensor
DE10060091B4 (de) Mikromechanischer Inertialsensor
DE102006052522A1 (de) Drehratensensor mit zwei sensitiven Achsen
DE102009045420A1 (de) Drehratensensor, Drehratensensoranordnung und Verfahren zum Betrieb eines Drehrtensensors
EP3110746B1 (fr) Composant micromécanique comportant une structure active séparée à isolation galvanique et procédé de fonctionnement d'un tel composant
DE102019200839A1 (de) Mikromechanischer Inertialsensor
DE102024201674A1 (de) Dreiachsiger Drehratensensor mit einem Substrat und einem Doppelrotor
DE102017213637A1 (de) Ein- und zweiachsiger Drehratensensor
DE102008043256A1 (de) Verfahren zum Betrieb einer Sensoranordnung und Sensoranordnung

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20100608

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL BA HR MK RS

DAX Request for extension of the european patent (deleted)
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20130601