EP2242087A2 - Source d'ions destinée à la production d'un faisceau de particules, électrode pour une source d'ions ainsi que procédé de conduite d'un gaz ionisant dans une source d'ions - Google Patents

Source d'ions destinée à la production d'un faisceau de particules, électrode pour une source d'ions ainsi que procédé de conduite d'un gaz ionisant dans une source d'ions Download PDF

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Publication number
EP2242087A2
EP2242087A2 EP10155569A EP10155569A EP2242087A2 EP 2242087 A2 EP2242087 A2 EP 2242087A2 EP 10155569 A EP10155569 A EP 10155569A EP 10155569 A EP10155569 A EP 10155569A EP 2242087 A2 EP2242087 A2 EP 2242087A2
Authority
EP
European Patent Office
Prior art keywords
electrode
gas
ion source
plasma chamber
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP10155569A
Other languages
German (de)
English (en)
Other versions
EP2242087A3 (fr
Inventor
Thomas Uhl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Publication of EP2242087A2 publication Critical patent/EP2242087A2/fr
Publication of EP2242087A3 publication Critical patent/EP2242087A3/fr
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation

Definitions

  • the invention relates to an ion source for generating a particle beam and an electrode for such an ion source.
  • the invention further relates to a method for introducing a gas to be ionized into such an ion source.
  • a particle beam is formed, for example, from protons or heavy ions, such as e.g. Carbon ions generated.
  • the particle beam is generated in an acceleration system and fed into a treatment room where it enters via an exit window.
  • the particle beam can be directed by the acceleration system alternately into different treatment rooms.
  • a patient to be treated is e.g. positioned on a patient table and immobilized if necessary.
  • the acceleration system includes an ion source, such as an electron cyclotron resonance ion source (ECR ion source).
  • ECR ion source an electron cyclotron resonance ion source
  • a directed movement of free ions is generated with a certain energy distribution, the exit energy of the ions is very accurate.
  • positively charged ions such as protons or carbon ions, are ideal for the irradiation of certain tumors. The reason for this is that they can be brought to high energy with the help of the accelerator and, secondly, they release this energy very precisely in the body tissue.
  • the particles generated in the ion source travel in a ring accelerator with more than 50 MeV / u in a circular path. It thus becomes a pulsed or continuous particle beam for the therapy delivered with exactly pre-defined energy, focus and intensity.
  • the ion source comprises a plasma chamber for ionizing an operating gas in which vacuum prevails. Permanent magnets are concentrically arranged around the plasma chamber, which form and hold the plasma.
  • the gas to be ionized is fed into the plasma chamber via a connecting part. Free electrons in the plasma chamber that ionize the injected gas are accelerated by microwave radiation.
  • the microwave radiation is likewise introduced into the plasma chamber via a waveguide arranged in the connection part.
  • an electrode a so-called bias electrode, which is negatively charged to a housing of the plasma chamber and repels the free electrons from the plasma chamber and thus encloses them within the plasma chamber.
  • the electrons generate the ions (the plasma) within the plasma chamber by impact ionization.
  • a coupling cylinder At the connecting part transverse to the electrode is a coupling cylinder, on which extends a tube side. Through the pipe passes through a curved gas line whose outlet is directed towards the connection part, the gas to be ionized in the connection part and from there via the waveguide in the plasma chamber. On the clutch cylinder, a vacuum pump is provided to the gas, which does not get into the plasma chamber,imi meetings.
  • the described arrangement for introducing gas into the plasma chamber has a number of disadvantages.
  • the diameter of the gas line varies greatly in the different sections, so that dead zones form for the gas flow. Since this significantly prolongs the residence time of some gas particles, switching from one operating gas to another can take several minutes.
  • the gas from the gas line is introduced directly into the clutch cylinder via the vacuum pump, so that a large part of the gas is sucked in and the plasma chamber is not reached.
  • the proportion of gas entering the plasma chamber depends on the efficiency of the vacuum pump and can only be estimated.
  • the invention has for its object to enable an efficient gas supply and a faster reaction time when changing the operating gas of an ion source.
  • an ion source for generating a particle beam comprising a plasma chamber and an electrode which extends to the plasma chamber, wherein a gas line for a gas to be ionized over the entire length of the electrode extends parallel to the electrode.
  • the electrode is a bias electrode negatively charged with respect to the ion source voltage, which is used to repel the electrons released in the plasma chamber.
  • the invention is based on the consideration that a particularly efficient gas supply is provided by the gas to be ionized as far as possible is introduced into the ion source, so that it flows out in the immediate vicinity of the plasma chamber from the gas line and thus a very large proportion of gas particles in enter the plasma chamber.
  • the gas is not introduced "from below” via a coupling cylinder for a vacuum pump, but the gas line is introduced from another side, namely in the region of the electrode and has within the ion source a straight line parallel to the electrode, ie the gas flow flows without deflection within the ion source. Since the gas line is straightforward, it is particularly easy to implement technically and to introduce into the ion source.
  • the gas line in particular has a substantially constant cross-section, so that no dead zones arise.
  • the gas line runs along the entire length of the electrode, so that the gas flow at least as deeply into the ion source as the electrode extends.
  • the gas line opens in the immediate vicinity of the plasma chamber, so that the gas supply is not affected by the operation of the vacuum pump and thus significantly improves the efficiency of the generated ions from the gas introduced.
  • a structurally particularly simple embodiment is present in that the gas line preferably extends within an electrode tube. Since the electrode is substantially formed as a hollow body, a good use of space is achieved by the gas line is guided within the electrode tube. There are no additional openings on the ion source for performing the gas line required.
  • the gas line is arranged concentrically to the electrode.
  • the electrode extends along an axis of symmetry of the plasma chamber.
  • the gas line concentric with the electrode and the gas line runs along the axis of symmetry of the plasma chamber, so that the gas can flow centrally into the plasma chamber.
  • a deflection-free gas flow is realized by the electrode preferably having a connection flange with a gas connection for connecting the gas line to a feed line, the gas connection being flush with the gas line.
  • the gas connection is in line with the gas line and only the separable supply line, via which the gas from a gas storage to the gas line and thus enters the ion source, if necessary, has bends.
  • a coolant can flow through the electrode tube and has a return line for the coolant, in which the gas line is arranged.
  • an electrically non-conductive coolant such as Deionized water or oil, fed into the electrode tube, wherein the coolant flows in the direction of a voltage applied to the plasma chamber electrode tip.
  • an opening of a return line is provided, into which the mentioned coolant flows in and out of the electrode at the other end of the return line in the region of the connection flange.
  • the gas line is concentric with the enclosing return line and the return line is arranged concentrically to the electrode tube.
  • the return line is usually arranged concentrically to the electrode tube. In view of a symmetrical arrangement of the gas line with respect to the electrode tube, it is therefore particularly advantageous that the gas line is disposed within the return line.
  • connection flange has a first connection for introducing and a second connection for executing the coolant, and the gas connection is arranged in one of the connections.
  • the connection flange has a first connection for introducing and a second connection for executing the coolant, and the gas connection is arranged in one of the connections.
  • an outlet opening for the gas to be ionized is provided on the front side of the electrode tube.
  • the outlet opening is thus directed to the plasma chamber, so that the operating gas also flows directly and without deflection into the plasma chamber even after leaving the electrode tube.
  • the electrode tube has an exchangeable electrode tip, in which the outlet opening is formed. Since during operation of the ion chamber the electrode tip very often by the high temperatures, which it is exposed, is damaged, this is interchangeable and attached by a thread on the electrode tube.
  • the electrode tip usually has an open end side, so that the outlet opening for the gas line is formed in particular by the open end side of the electrode tip.
  • a coupling piece is arranged between the electrode tube and the replaceable electrode tip, in which a bore is formed.
  • the electrode tube and the electrode tip are both formed as a hollow body, but the coupling piece arranged between the two is usually a solid body.
  • a bore is provided which extends in particular centrally. The flow of the coolant in the longitudinal direction of the electrode is limited by the coupling piece. So that the coolant can not flow out of the electrode through the hole, the gas line contacts the coupling piece or extends into the hole, the contact area between the gas line and the coupling piece being sealed off.
  • an electrode for an ion source comprising a connection flange and an electrode tube, wherein a gas connection for a gas line is provided at the connection flange, which extends over the entire length of the electrode tube.
  • the gas line is arranged concentrically to the electrode tube.
  • the electrode tube can be traversed by a coolant and has a return line for the coolant, in which the gas line is arranged.
  • the object is also achieved according to the invention by a method for introducing a gas to be ionized into an ion source for generating a particle beam, the ion source comprising a plasma chamber and an electrode extending to the plasma chamber, and wherein the gas is parallel over the entire length of the electrode to the electrode and in particular within the electrode is introduced into the plasma chamber.
  • FIG. 1 an ion source 2 for generating a particle beam is shown, which is part of a particle therapy system, not shown.
  • the ion source 2 comprises a plasma chamber 4 in which the particle beam is generated by ionizing an operating gas.
  • the gas to be ionized is introduced into the plasma chamber 4 by means of a gas line 6.
  • the gas line 6 extends along an electrode 8, which is provided for repelling the free electrons in the plasma chamber 4.
  • microwave radiation is also introduced into the plasma chamber 4 through a microwave connection 10 into a connection part 12, and from there the microwave radiation is supplied to the plasma chamber 4 via a waveguide 14, in which the electrode 8 also extends with the gas line 6 , Opposite the microwave port 10, a pump port 15 for a vacuum pump is provided at the connecting part 12, which sucks gas particles from the cavities of the connecting piece.
  • the electrode 8 comprises a connecting flange 16, with which it is fastened to the connecting part 12, and a hollow electrode tube 18, which extends to the plasma chamber 4.
  • the electrode 8 also has an exchangeable electrode tip 20, which is screwed into a coupling piece 22 and is thus fastened to the electrode tube 18 via the coupling piece 22.
  • the electrode 8 is continuously cooled by means of a coolant, which is indicated by the arrows K, for example with the aid of cooling water.
  • a first connection 24 is provided on the connecting flange 16.
  • the cooling water K is discharged from the electrode 8 through a second connection 26.
  • the introduced cooling water K flows along an inner circumferential wall of the electrode tube 18 until it reaches the coupling piece 22. Concentric with the electrode tube 18 extends a return line 28, via which the heated coolant K is guided to the second port 26.
  • the gas line 6 is arranged within the return line 28 and extends in a straight line between a gas connection 29, which is connectable to a separate supply line for gas supply from a gas storage, not shown, and the coupling piece 22 at the distal end of the electrode.
  • the electrode tube 18, the return line 28 and the gas line 6 are arranged concentrically to each other, as is apparent from FIG. 3 is apparent.
  • the electron tube 18 also extends concentrically with the waveguide 14, so that the gas line 6 extends along an axis of symmetry D of the plasma chamber.
  • the gas is introduced centrally into the plasma chamber, so that a high symmetry in the generation of the Plasmas is present, which is important for a stable particle beam.
  • the exact structure and the arrangement of the gas line 6 in the region of the electrode tip 20 are in the enlarged view in FIG. 2 shown.
  • the electrode tip 20 is substantially hollow and has an open end face, which forms an outlet opening 30 for the gas.
  • a bore 32 is formed in the coupling piece 22. In this case, the area in which the gas line 6 enters into the coupling piece 22, sealed watertight, so that the coolant K does not enter the bore 32.
  • the gas line 6 has a straight course and over its entire length to the electrode tip 20 a substantially constant cross section.
  • the gas to be ionized can thus be introduced without deflection into the ion source 2. Due to this design of the gas line 6 in particular no dead zones, in which gas particles can stay for longer periods arise.
  • a change of the working gas e.g. From carbon dioxide to hydrogen, can therefore be done very quickly and after short times of a few seconds, a constant gas flow and thus a stable particle beam.
  • the described gas line 6 is distinguished by a further advantage, namely that it extends far into the interior of the ion source 2 up to immediately before an entrance 34 of the plasma chamber 4, so that the gas particles pass undisturbed from the vacuum pump into the plasma chamber 4.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
EP10155569A 2009-04-16 2010-03-05 Source d'ions destinée à la production d'un faisceau de particules, électrode pour une source d'ions ainsi que procédé de conduite d'un gaz ionisant dans une source d'ions Withdrawn EP2242087A3 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102009017647A DE102009017647A1 (de) 2009-04-16 2009-04-16 Ionenquelle zum Erzeugen eines Partikelstrahls, Elektrode für eine Ionenquelle sowie Verfahren zum Einleiten eines zu ionisierenden Gases in eine Ionenquelle

Publications (2)

Publication Number Publication Date
EP2242087A2 true EP2242087A2 (fr) 2010-10-20
EP2242087A3 EP2242087A3 (fr) 2012-12-05

Family

ID=42671686

Family Applications (1)

Application Number Title Priority Date Filing Date
EP10155569A Withdrawn EP2242087A3 (fr) 2009-04-16 2010-03-05 Source d'ions destinée à la production d'un faisceau de particules, électrode pour une source d'ions ainsi que procédé de conduite d'un gaz ionisant dans une source d'ions

Country Status (5)

Country Link
US (1) US20100264825A1 (fr)
EP (1) EP2242087A3 (fr)
JP (1) JP2010251323A (fr)
CN (1) CN101868114A (fr)
DE (1) DE102009017647A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113491174A (zh) * 2018-12-20 2021-10-08 机械解析有限公司 用于等离子体放电设备的电极组件

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5502717B2 (ja) * 2010-12-20 2014-05-28 株式会社東芝 重粒子線治療用重粒子イオン発生装置
US9117617B2 (en) * 2013-06-24 2015-08-25 Agilent Technologies, Inc. Axial magnetic ion source and related ionization methods
CN119342673B (zh) * 2024-10-21 2025-10-14 上海科技大学 一种兼容近常压光电子能谱的等离子体喷枪装置

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DE753327C (de) * 1937-03-25 1954-09-27 Licentia Gmbh Verfahren zur Justierung einer Entladungsroehre zur Erzeugung schneller Ionen (Kanalstrahlrohr)
DE1202849B (de) * 1958-07-17 1965-10-14 Varian Associates Steckverbindung
JPS5956342A (ja) * 1982-09-24 1984-03-31 Toshiba Corp ホロ−陰極放電装置
FR2550681B1 (fr) * 1983-08-12 1985-12-06 Centre Nat Rech Scient Source d'ions a au moins deux chambres d'ionisation, en particulier pour la formation de faisceaux d'ions chimiquement reactifs
US4785220A (en) * 1985-01-30 1988-11-15 Brown Ian G Multi-cathode metal vapor arc ion source
FR2581244B1 (fr) * 1985-04-29 1987-07-10 Centre Nat Rech Scient Source d'ions du type triode a une seule chambre d'ionisation a excitation haute frequence et a confinement magnetique du type multipolaire
JPH0277851U (fr) * 1988-12-03 1990-06-14
JPH05128977A (ja) * 1991-11-07 1993-05-25 Japan Steel Works Ltd:The イオン生成方法及びイオン源
JPH06139978A (ja) * 1992-10-29 1994-05-20 Japan Steel Works Ltd:The パルス駆動型の電子サイクロトロン共振イオン源
GB9224745D0 (en) * 1992-11-26 1993-01-13 Atomic Energy Authority Uk Microwave plasma generator
JPH09270233A (ja) * 1996-03-29 1997-10-14 Nissin Electric Co Ltd 同軸型ｅｃｒプラズマ発生装置
JP2965293B1 (ja) * 1998-11-10 1999-10-18 川崎重工業株式会社 電子ビーム励起プラズマ発生装置
TWI279169B (en) * 2002-01-24 2007-04-11 Alps Electric Co Ltd Plasma processing apparatus capable of performing uniform plasma treatment by preventing drift in plasma discharge current
RU2208871C1 (ru) * 2002-03-26 2003-07-20 Минаков Валерий Иванович Плазменный источник электронов
US6806651B1 (en) * 2003-04-22 2004-10-19 Zond, Inc. High-density plasma source
WO2005038849A1 (fr) * 2003-10-15 2005-04-28 Saintech Pty Ltd Source d'ions avec alimentation en gaz modifie
US7750575B2 (en) * 2004-04-07 2010-07-06 Zond, Inc. High density plasma source

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113491174A (zh) * 2018-12-20 2021-10-08 机械解析有限公司 用于等离子体放电设备的电极组件

Also Published As

Publication number Publication date
CN101868114A (zh) 2010-10-20
EP2242087A3 (fr) 2012-12-05
DE102009017647A1 (de) 2010-10-21
JP2010251323A (ja) 2010-11-04
US20100264825A1 (en) 2010-10-21

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