EP2298032A4 - ELECTROCONDUCTIVE STRUCTURE FOR AN OPTICAL TRANSMITTER DEVICE - Google Patents

ELECTROCONDUCTIVE STRUCTURE FOR AN OPTICAL TRANSMITTER DEVICE

Info

Publication number
EP2298032A4
EP2298032A4 EP08741968A EP08741968A EP2298032A4 EP 2298032 A4 EP2298032 A4 EP 2298032A4 EP 08741968 A EP08741968 A EP 08741968A EP 08741968 A EP08741968 A EP 08741968A EP 2298032 A4 EP2298032 A4 EP 2298032A4
Authority
EP
European Patent Office
Prior art keywords
optical transmitter
transmitter device
electroconductive structure
electroconductive
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP08741968A
Other languages
German (de)
French (fr)
Other versions
EP2298032A1 (en
Inventor
Furong Zhu
Ging Meng Ng
Pooi Kwan Liew
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agency for Science Technology and Research Singapore
Original Assignee
Agency for Science Technology and Research Singapore
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency for Science Technology and Research Singapore filed Critical Agency for Science Technology and Research Singapore
Publication of EP2298032A1 publication Critical patent/EP2298032A1/en
Publication of EP2298032A4 publication Critical patent/EP2298032A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
    • H10F77/247—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers comprising indium tin oxide [ITO]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
    • H10F77/254—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers comprising a metal, e.g. transparent gold
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/81—Electrodes
    • H10K30/82—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/82—Cathodes
    • H10K50/828—Transparent cathodes, e.g. comprising thin metal layers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/302—Details of OLEDs of OLED structures
    • H10K2102/3023—Direction of light emission
    • H10K2102/3031—Two-side emission, e.g. transparent OLEDs [TOLED]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/50—Photovoltaic [PV] devices
    • H10K30/57—Photovoltaic [PV] devices comprising multiple junctions, e.g. tandem PV cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)
EP08741968A 2008-05-06 2008-05-06 ELECTROCONDUCTIVE STRUCTURE FOR AN OPTICAL TRANSMITTER DEVICE Withdrawn EP2298032A4 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/SG2008/000168 WO2009136863A1 (en) 2008-05-06 2008-05-06 An electrically conducting structure for a light transmissible device

Publications (2)

Publication Number Publication Date
EP2298032A1 EP2298032A1 (en) 2011-03-23
EP2298032A4 true EP2298032A4 (en) 2012-06-20

Family

ID=41264788

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08741968A Withdrawn EP2298032A4 (en) 2008-05-06 2008-05-06 ELECTROCONDUCTIVE STRUCTURE FOR AN OPTICAL TRANSMITTER DEVICE

Country Status (4)

Country Link
EP (1) EP2298032A4 (en)
JP (1) JP2011524463A (en)
TW (1) TWI503050B (en)
WO (1) WO2009136863A1 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103165786A (en) * 2011-12-12 2013-06-19 展晶科技(深圳)有限公司 Light-emitting diode crystal grain and its manufacturing method
DE102012201284B4 (en) * 2012-01-30 2018-10-31 Ewe-Forschungszentrum Für Energietechnologie E. V. Method for producing a photovoltaic solar cell
TWI480953B (en) * 2012-03-30 2015-04-11 Hannstouch Solution Inc Composite transparent oxide film and manufacturing method for the same
CN104584252B (en) * 2012-07-02 2018-11-02 赫里亚泰克有限责任公司 Transparent electrode for photoelectricity component
DE102012105809B4 (en) * 2012-07-02 2017-12-07 Heliatek Gmbh Organic optoelectronic component with transparent counterelectrode and transparent electrode device
CN104508809B (en) * 2012-07-26 2017-12-12 Ev 集团 E·索尔纳有限责任公司 The method of bonded substrate
EP2722412B1 (en) * 2012-10-17 2018-04-25 Solmates B.V. Method for depositing a target material onto a sensitive material
CN103227287B (en) * 2013-04-23 2015-06-24 吉林大学 Three-terminal parallel polymer solar cell based on metal nanoparticle doping and preparation method of solar cell
US9997651B2 (en) * 2015-02-19 2018-06-12 Sunpower Corporation Damage buffer for solar cell metallization
KR20170029037A (en) * 2015-09-04 2017-03-15 삼성디스플레이 주식회사 Transparent display devices and methods of manufacturing transparent display devices
WO2017170345A1 (en) * 2016-03-29 2017-10-05 住友化学株式会社 Organic photoelectric conversion element, and solar battery module and sensor provided with same
WO2019035252A1 (en) * 2017-08-16 2019-02-21 ソニー株式会社 Imaging element, layered imaging element and solid-state imaging device
CN114914311B (en) * 2022-04-18 2023-03-07 通威太阳能（安徽）有限公司 Conductive layer, solar cell and preparation method thereof
CN115942761A (en) * 2022-11-24 2023-04-07 隆基绿能科技股份有限公司 Perovskite solar cell and its preparation method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6137048A (en) * 1996-11-07 2000-10-24 Midwest Research Institute Process for fabricating polycrystalline semiconductor thin-film solar cells, and cells produced thereby
US20030170437A1 (en) * 2002-02-26 2003-09-11 Fujikura Ltd. Substrate for transparent electrodes
EP1798774A2 (en) * 2005-12-13 2007-06-20 The Boeing Company Multijunction solar cell with bonded transparent conductive interlayer
KR20080006812A (en) * 2006-07-13 2008-01-17 삼성코닝 주식회사 ITO double film deposition method and ITO double film manufactured accordingly

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3527815B2 (en) * 1996-11-08 2004-05-17 昭和シェル石油株式会社 Method for producing transparent conductive film of thin film solar cell
JPH111769A (en) * 1997-06-10 1999-01-06 Canon Inc Method of manufacturing sputtered film and sputtered film
US6420031B1 (en) * 1997-11-03 2002-07-16 The Trustees Of Princeton University Highly transparent non-metallic cathodes
JP4449116B2 (en) * 1999-09-20 2010-04-14 ソニー株式会社 ORGANIC ELECTROLUMINESCENCE ELEMENT, MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE
WO2003009394A1 (en) * 2001-07-18 2003-01-30 Honda Giken Kogyo Kabushiki Kaisha Method of film-forming transparent electrode layer and device therefor
US6569697B2 (en) * 2001-08-20 2003-05-27 Universal Display Corporation Method of fabricating electrodes
GB2404284B (en) * 2003-07-10 2007-02-21 Dainippon Printing Co Ltd Organic electroluminescent element
KR100563058B1 (en) * 2003-11-21 2006-03-24 삼성에스디아이 주식회사 Organic electroluminescent element
TWI250669B (en) * 2003-11-26 2006-03-01 Sanken Electric Co Ltd Semiconductor light emitting element and its manufacturing method
US7061026B2 (en) * 2004-04-16 2006-06-13 Arima Optoelectronics Corp. High brightness gallium nitride-based light emitting diode with transparent conducting oxide spreading layer
KR100682870B1 (en) * 2004-10-29 2007-02-15 삼성전기주식회사 Multi-layer electrode and compound semiconductor light emitting device having same
JP4635570B2 (en) * 2004-11-08 2011-02-23 凸版印刷株式会社 Method and apparatus for manufacturing organic electroluminescence element
JP4789535B2 (en) * 2005-08-01 2011-10-12 株式会社アルバック Sputtering apparatus, film forming method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6137048A (en) * 1996-11-07 2000-10-24 Midwest Research Institute Process for fabricating polycrystalline semiconductor thin-film solar cells, and cells produced thereby
US20030170437A1 (en) * 2002-02-26 2003-09-11 Fujikura Ltd. Substrate for transparent electrodes
EP1798774A2 (en) * 2005-12-13 2007-06-20 The Boeing Company Multijunction solar cell with bonded transparent conductive interlayer
KR20080006812A (en) * 2006-07-13 2008-01-17 삼성코닝 주식회사 ITO double film deposition method and ITO double film manufactured accordingly

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
A. CHAOUI ET AL: "Indium tin oxide/(n+-p) silicon solar cell", SOLAR CELLS, vol. 14, no. 2, 1 May 1985 (1985-05-01), pages 133 - 138, XP055026578, ISSN: 0379-6787, DOI: 10.1016/0379-6787(85)90035-3 *
See also references of WO2009136863A1 *

Also Published As

Publication number Publication date
TWI503050B (en) 2015-10-01
EP2298032A1 (en) 2011-03-23
JP2011524463A (en) 2011-09-01
TW200948179A (en) 2009-11-16
WO2009136863A1 (en) 2009-11-12

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RIN1 Information on inventor provided before grant (corrected)

Inventor name: LIEW, POOI KWAN

Inventor name: NG, GING MENG

Inventor name: ZHU, FURONG

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Effective date: 20120523

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