EP2417480A4 - Structure comprenant au moins un mince film réfléchissant sur une surface d'objet macroscopique, procédé de fabrication d'une structure, et utilisations de celle-ci - Google Patents

Structure comprenant au moins un mince film réfléchissant sur une surface d'objet macroscopique, procédé de fabrication d'une structure, et utilisations de celle-ci

Info

Publication number
EP2417480A4
EP2417480A4 EP10761231A EP10761231A EP2417480A4 EP 2417480 A4 EP2417480 A4 EP 2417480A4 EP 10761231 A EP10761231 A EP 10761231A EP 10761231 A EP10761231 A EP 10761231A EP 2417480 A4 EP2417480 A4 EP 2417480A4
Authority
EP
European Patent Office
Prior art keywords
fabricating
thin film
same
reflecting thin
macroscopic object
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP10761231A
Other languages
German (de)
English (en)
Other versions
EP2417480A1 (fr
Inventor
Jarmo Maula
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beneq Oy
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Publication of EP2417480A1 publication Critical patent/EP2417480A1/fr
Publication of EP2417480A4 publication Critical patent/EP2417480A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)
EP10761231A 2009-04-08 2010-04-07 Structure comprenant au moins un mince film réfléchissant sur une surface d'objet macroscopique, procédé de fabrication d'une structure, et utilisations de celle-ci Withdrawn EP2417480A4 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20095382A FI20095382A0 (fi) 2009-04-08 2009-04-08 Heijastava kalvorakenne, menetelmä heijastavan kalvorakenteen valmistamiseksi, ja käytöt kalvorakenteelle ja menetelmälle
PCT/FI2010/050269 WO2010116034A1 (fr) 2009-04-08 2010-04-07 Structure comprenant au moins un mince film réfléchissant sur une surface d'objet macroscopique, procédé de fabrication d'une structure, et utilisations de celle-ci

Publications (2)

Publication Number Publication Date
EP2417480A1 EP2417480A1 (fr) 2012-02-15
EP2417480A4 true EP2417480A4 (fr) 2012-12-12

Family

ID=40590264

Family Applications (1)

Application Number Title Priority Date Filing Date
EP10761231A Withdrawn EP2417480A4 (fr) 2009-04-08 2010-04-07 Structure comprenant au moins un mince film réfléchissant sur une surface d'objet macroscopique, procédé de fabrication d'une structure, et utilisations de celle-ci

Country Status (7)

Country Link
US (1) US20120120514A1 (fr)
EP (1) EP2417480A4 (fr)
CN (1) CN102369464A (fr)
EA (1) EA201190202A1 (fr)
FI (1) FI20095382A0 (fr)
TW (1) TW201044026A (fr)
WO (1) WO2010116034A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103773083B (zh) * 2012-10-18 2015-04-22 上海纳米技术及应用国家工程研究中心有限公司 一种光学干涉变色颜料及其制备方法和应用
US20160237566A1 (en) * 2013-10-16 2016-08-18 Mitsui Engineering & Shipbuilding Co., Ltd. Film forming device and film forming method
CN110422345B (zh) * 2019-07-26 2022-07-19 中国电子科技集团公司第三十三研究所 一种基于光子晶体的osr热控涂层
CN112526663A (zh) * 2020-11-04 2021-03-19 浙江大学 一种基于原子层沉积的吸收膜及其制作方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4805989A (en) * 1986-09-18 1989-02-21 Hoya Corporation Multi-layered back reflecting mirror
US4921331A (en) * 1986-12-27 1990-05-01 Hoya Corporation Multi-layered mirror
US20040197527A1 (en) * 2003-03-31 2004-10-07 Maula Jarmo Ilmari Conformal coatings for micro-optical elements

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003318094A (ja) * 2002-04-24 2003-11-07 Shin Etsu Handotai Co Ltd 露光装置用反射鏡および露光装置ならびに、それらを用いて製造される半導体デバイス
JP2003328094A (ja) * 2002-05-17 2003-11-19 Sky Alum Co Ltd 平版印刷版支持体用アルミニウム合金圧延板の製造方法
US20090225427A1 (en) * 2008-03-10 2009-09-10 Masco Corporation Optically modified three-dimensional object

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4805989A (en) * 1986-09-18 1989-02-21 Hoya Corporation Multi-layered back reflecting mirror
US4921331A (en) * 1986-12-27 1990-05-01 Hoya Corporation Multi-layered mirror
US20040197527A1 (en) * 2003-03-31 2004-10-07 Maula Jarmo Ilmari Conformal coatings for micro-optical elements

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
"Atomic Layer Deposition for optical applications: metal fluoride thin films and novel devices", 2008, UNIVERSITY OF HELSINKI, FINLAND, article TERO PILVI: "Atomic Layer Deposition for optical applications: metal fluoride thin films and novel devices", pages: 1 - 104, XP055042222 *
See also references of WO2010116034A1 *

Also Published As

Publication number Publication date
US20120120514A1 (en) 2012-05-17
EA201190202A1 (ru) 2012-04-30
FI20095382A0 (fi) 2009-04-08
EP2417480A1 (fr) 2012-02-15
TW201044026A (en) 2010-12-16
WO2010116034A1 (fr) 2010-10-14
CN102369464A (zh) 2012-03-07

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Ipc: C23C 16/455 20060101ALI20121106BHEP

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