EP2683853A4 - Plattierungsbad für halbglänzendes nickel und verfahren zu seiner verwendung - Google Patents

Plattierungsbad für halbglänzendes nickel und verfahren zu seiner verwendung

Info

Publication number
EP2683853A4
EP2683853A4 EP12754802.2A EP12754802A EP2683853A4 EP 2683853 A4 EP2683853 A4 EP 2683853A4 EP 12754802 A EP12754802 A EP 12754802A EP 2683853 A4 EP2683853 A4 EP 2683853A4
Authority
EP
European Patent Office
Prior art keywords
semi
same
plating bath
nickel plating
bright nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP12754802.2A
Other languages
English (en)
French (fr)
Other versions
EP2683853A1 (de
EP2683853B1 (de
Inventor
Robert A Tremmel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Acumen Inc
Original Assignee
MacDermid Acumen Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=46798512&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP2683853(A4) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by MacDermid Acumen Inc filed Critical MacDermid Acumen Inc
Publication of EP2683853A1 publication Critical patent/EP2683853A1/de
Publication of EP2683853A4 publication Critical patent/EP2683853A4/de
Application granted granted Critical
Publication of EP2683853B1 publication Critical patent/EP2683853B1/de
Revoked legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/16Acetylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
EP12754802.2A 2011-03-09 2012-02-08 Plattierungsbad für halbglänzendes nickel und verfahren zu seiner verwendung Revoked EP2683853B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/043,783 US20110155582A1 (en) 2009-11-18 2011-03-09 Semi-Bright Nickel Plating Bath and Method of Using Same
PCT/US2012/024233 WO2012121829A1 (en) 2011-03-09 2012-02-08 Semi-bright nickel plating bath and method of using same

Publications (3)

Publication Number Publication Date
EP2683853A1 EP2683853A1 (de) 2014-01-15
EP2683853A4 true EP2683853A4 (de) 2015-01-07
EP2683853B1 EP2683853B1 (de) 2017-10-11

Family

ID=46798512

Family Applications (1)

Application Number Title Priority Date Filing Date
EP12754802.2A Revoked EP2683853B1 (de) 2011-03-09 2012-02-08 Plattierungsbad für halbglänzendes nickel und verfahren zu seiner verwendung

Country Status (5)

Country Link
US (1) US20110155582A1 (de)
EP (1) EP2683853B1 (de)
CN (1) CN103415653B (de)
ES (1) ES2654552T3 (de)
WO (1) WO2012121829A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110114498A1 (en) * 2009-11-18 2011-05-19 Tremmel Robert A Semi-Bright Nickel Plating Bath and Method of Using Same
CN105112949A (zh) * 2015-07-31 2015-12-02 广东欧珀移动通信有限公司 一种改善铝合金镀件光泽度的方法及铝合金镀件、电子装置
CN105002525A (zh) * 2015-08-21 2015-10-28 无锡桥阳机械制造有限公司 一种半光亮镍电镀液
CN107119292A (zh) * 2017-03-10 2017-09-01 广东华普科技股份有限公司 一种镍电镀液及镀镍的方法
US10508348B2 (en) * 2017-06-15 2019-12-17 Rohm And Haas Electronic Materials Llc Environmentally friendly nickel electroplating compositions and methods
TWI779884B (zh) * 2021-10-19 2022-10-01 優勝奈米科技股份有限公司 無硼電鍍添加劑及其使用方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1006333A (en) * 1961-08-29 1965-09-29 Albright & Wilson Mfg Ltd Electrodeposition of nickel
GB1386781A (en) * 1971-03-05 1975-03-12 Albright & Wilson Electrodeposition of nickel
WO2011062693A1 (en) * 2009-11-18 2011-05-26 Macdermid Acumen, Inc. Semi-bright nickel plating bath and method of using same

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US2841602A (en) * 1955-10-04 1958-07-01 Udylite Res Corp Alkynoxy acids
GB871276A (en) 1959-02-26 1961-06-28 Hanson Van Winkle Munning Co Improvements in electrodeposition of nickel
US3264200A (en) 1964-01-16 1966-08-02 Udylite Corp Electrodeposition of nickel
GB1114615A (en) * 1965-03-26 1968-05-22 Harshaw Chem Corp Electrodeposition of nickel
GB1166631A (en) * 1965-12-07 1969-10-08 Vickers Ltd Sa Improvements in or relating to the Electrodeposition of Base Metals
ES346165A0 (es) * 1966-10-18 1970-12-01 M & T Chemicals Inc Procedimiento para galvanoplastia de niquel.
US3745097A (en) * 1969-05-26 1973-07-10 M & T Chemicals Inc Electrodeposition of an iridescent chromium coating
US3677913A (en) * 1971-04-01 1972-07-18 M & T Chemicals Inc Nickel plating
DE2210879C3 (de) * 1972-03-07 1978-06-15 Hoechst Ag, 6000 Frankfurt Verfahren zum einbadigen Färben unmodifizierter Polyolefinfasern mit metallhaltigen Phthalocyaninfarbstoffen
US4049509A (en) * 1972-05-16 1977-09-20 W. Canning & Company Limited Plating
US3898138A (en) * 1974-10-16 1975-08-05 Oxy Metal Industries Corp Method and bath for the electrodeposition of nickel
US3953304A (en) * 1975-06-23 1976-04-27 Dart Industries Inc. Electroplating baths for nickel and brightener-leveler compositions therefor
GB1541118A (en) * 1976-12-03 1979-02-21 Bnf Metals Tech Centre Nickel plating
US4310389A (en) * 1980-06-16 1982-01-12 Chrysler Corporation Method for simultaneous determination of thickness and electrochemical potential in multilayer plated deposits
US4441969A (en) * 1982-03-29 1984-04-10 Omi International Corporation Coumarin process and nickel electroplating bath
US4554219A (en) * 1984-05-30 1985-11-19 Burlington Industries, Inc. Synergistic brightener combination for amorphous nickel phosphorus electroplatings
CS271564B1 (en) * 1987-07-21 1990-10-12 Dostal Jaroslav Lustre forming admixture into semi-lustrous nickel plating bathes
CN1011316B (zh) * 1989-01-19 1991-01-23 铁道部戚墅堰机车车辆工艺研究所 镀镍溶液及镀镍方法
CN1051942A (zh) * 1990-12-03 1991-06-05 太仓县电镀助剂厂 快速镀镍光亮剂、制造及其应用
US5338342A (en) * 1993-05-21 1994-08-16 Mallory Jr Glen O Stabilized electroless nickel plating baths
US5413874A (en) * 1994-06-02 1995-05-09 Baldwin Hardware Corporation Article having a decorative and protective multilayer coating simulating brass
AU783229B2 (en) * 1999-08-31 2005-10-06 Remedy Research Limited Metal-containing compositions, preparations and uses
CA2362244A1 (en) * 2001-11-14 2003-05-14 Peter Forth Method of treating an electroplating bath
WO2004072320A2 (en) * 2003-02-07 2004-08-26 Pavco, Inc. Use of n-allyl substituted amines and their salts as brightening agents in nickel plating baths
US20060096868A1 (en) 2004-11-10 2006-05-11 Siona Bunce Nickel electroplating bath designed to replace monovalent copper strike solutions
BRPI0612981A2 (pt) * 2005-06-20 2010-12-14 Pavco Inc composiÇço aquosa de galvanizaÇço com liga de zinco-nÍquel e mÉtodo para a deposiÇço de uma liga de zinco-nÍquel sobre um substrato
EP2145986B1 (de) 2008-07-15 2010-03-24 Atotech Deutschland Gmbh Lösung und Verfahren zur elektrochemischen Abscheidung eines Metalls auf ein Substrat
DE102008056470B3 (de) 2008-11-05 2010-04-22 Atotech Deutschland Gmbh Verfahren zum Untersuchen einer Metallschicht und Verfahren zur analytischen Kontrolle eines zum Abscheiden der Metallschicht dienenden Abscheideelektrolyten

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1006333A (en) * 1961-08-29 1965-09-29 Albright & Wilson Mfg Ltd Electrodeposition of nickel
GB1386781A (en) * 1971-03-05 1975-03-12 Albright & Wilson Electrodeposition of nickel
WO2011062693A1 (en) * 2009-11-18 2011-05-26 Macdermid Acumen, Inc. Semi-bright nickel plating bath and method of using same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2012121829A1 *

Also Published As

Publication number Publication date
EP2683853A1 (de) 2014-01-15
CN103415653A (zh) 2013-11-27
WO2012121829A1 (en) 2012-09-13
EP2683853B1 (de) 2017-10-11
US20110155582A1 (en) 2011-06-30
CN103415653B (zh) 2016-12-07
ES2654552T3 (es) 2018-02-14

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