EP2746876A3 - Techniques de fabrication pour améliorer l'uniformité de la pression dans des cellules de vapeur anodiquement liées - Google Patents

Techniques de fabrication pour améliorer l'uniformité de la pression dans des cellules de vapeur anodiquement liées Download PDF

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Publication number
EP2746876A3
EP2746876A3 EP13181421.2A EP13181421A EP2746876A3 EP 2746876 A3 EP2746876 A3 EP 2746876A3 EP 13181421 A EP13181421 A EP 13181421A EP 2746876 A3 EP2746876 A3 EP 2746876A3
Authority
EP
European Patent Office
Prior art keywords
wafer
anodically bonded
fabrication techniques
diameter
sacrificial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP13181421.2A
Other languages
German (de)
English (en)
Other versions
EP2746876B1 (fr
EP2746876A2 (fr
Inventor
Daniel W. Younger
Jeff A. Ridley
Son T. Lu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/662,850 external-priority patent/US8941442B2/en
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of EP2746876A2 publication Critical patent/EP2746876A2/fr
Publication of EP2746876A3 publication Critical patent/EP2746876A3/fr
Application granted granted Critical
Publication of EP2746876B1 publication Critical patent/EP2746876B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • GPHYSICS
    • G04HOROLOGY
    • G04FTIME-INTERVAL MEASURING
    • G04F5/00Apparatus for producing preselected time intervals for use as timing standards
    • G04F5/14Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
    • G04F5/145Apparatus for producing preselected time intervals for use as timing standards using atomic clocks using Coherent Population Trapping

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  • Life Sciences & Earth Sciences (AREA)
  • Ecology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Micromachines (AREA)
  • Ceramic Products (AREA)
  • Stabilization Of Oscillater, Synchronisation, Frequency Synthesizers (AREA)
  • Measuring Fluid Pressure (AREA)
EP13181421.2A 2012-10-29 2013-08-22 Techniques de fabrication pour améliorer l'uniformité de la pression dans des cellules de vapeur anodiquement liées et struktur plaquette correspondante Active EP2746876B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/662,850 US8941442B2 (en) 2010-02-04 2012-10-29 Fabrication techniques to enhance pressure uniformity in anodically bonded vapor cells

Publications (3)

Publication Number Publication Date
EP2746876A2 EP2746876A2 (fr) 2014-06-25
EP2746876A3 true EP2746876A3 (fr) 2018-01-10
EP2746876B1 EP2746876B1 (fr) 2019-04-10

Family

ID=49028964

Family Applications (1)

Application Number Title Priority Date Filing Date
EP13181421.2A Active EP2746876B1 (fr) 2012-10-29 2013-08-22 Techniques de fabrication pour améliorer l'uniformité de la pression dans des cellules de vapeur anodiquement liées et struktur plaquette correspondante

Country Status (3)

Country Link
EP (1) EP2746876B1 (fr)
JP (1) JP6198522B2 (fr)
CN (1) CN103792838B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6488599B2 (ja) 2014-09-08 2019-03-27 セイコーエプソン株式会社 量子干渉装置、原子セルの製造方法および電子機器
JP6852377B2 (ja) * 2016-12-12 2021-03-31 株式会社村田製作所 原子発振器および電子機器
CN107128871B (zh) * 2017-05-10 2019-04-05 中国电子科技集团公司第四十九研究所 一种基于mems原子芯片的物理封装件及其封装方法
US10544039B2 (en) * 2017-09-08 2020-01-28 Texas Instruments Incorporated Methods for depositing a measured amount of a species in a sealed cavity
JP2019165332A (ja) * 2018-03-19 2019-09-26 株式会社リコー 電子デバイスおよび原子発振器
JP7232510B2 (ja) * 2019-01-31 2023-03-03 国立研究開発法人情報通信研究機構 量子光学装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1591846A2 (fr) * 2004-04-26 2005-11-02 Northrop Grumman Corporation Couche intermédiair d' une structure de matrice avec une cavité contenant un métal alcalin
US20060022761A1 (en) * 2004-07-16 2006-02-02 Abeles Joseph H Chip-scale atomic clock (CSAC) and method for making same
JP2009212416A (ja) * 2008-03-06 2009-09-17 Epson Toyocom Corp ガスセルの製造方法及びガスセル
JP2009215099A (ja) * 2008-03-10 2009-09-24 Konica Minolta Holdings Inc 陽極接合方法及び液滴吐出ヘッドの製造方法
EP2362281A2 (fr) * 2010-02-04 2011-08-31 Honeywell International Inc. Techniques de fabrication pour améliorer l'uniformité de la pression dans des cellules de vapeur anodiquement liées

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005016965A (ja) * 2003-06-23 2005-01-20 Sumitomo Precision Prod Co Ltd パッケージおよびその製造方法、ならびに振動ジャイロおよびその製造方法
US7400207B2 (en) * 2004-01-06 2008-07-15 Sarnoff Corporation Anodically bonded cell, method for making same and systems incorporating same
JP5121493B2 (ja) * 2008-02-21 2013-01-16 セイコーインスツル株式会社 圧電振動子の製造方法
CN101407372B (zh) * 2008-11-07 2011-01-12 清华大学 一种原子蒸气泡的制作方法
CN101598772B (zh) * 2009-06-26 2011-12-07 中北大学 微型原子蒸汽泡制作方法
JP5421690B2 (ja) * 2009-08-12 2014-02-19 セイコーインスツル株式会社 パッケージの製造方法
US20110187464A1 (en) * 2010-02-04 2011-08-04 Honeywell International Inc. Apparatus and methods for alkali vapor cells
US8242851B2 (en) * 2010-02-04 2012-08-14 Honeywell International Inc. Processes for stabilizing a VCSEL in a chip-scale atomic clock
JP2012191138A (ja) * 2011-03-14 2012-10-04 Seiko Epson Corp ガスセルユニット、原子発振器および電子装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1591846A2 (fr) * 2004-04-26 2005-11-02 Northrop Grumman Corporation Couche intermédiair d' une structure de matrice avec une cavité contenant un métal alcalin
US20060022761A1 (en) * 2004-07-16 2006-02-02 Abeles Joseph H Chip-scale atomic clock (CSAC) and method for making same
JP2009212416A (ja) * 2008-03-06 2009-09-17 Epson Toyocom Corp ガスセルの製造方法及びガスセル
JP2009215099A (ja) * 2008-03-10 2009-09-24 Konica Minolta Holdings Inc 陽極接合方法及び液滴吐出ヘッドの製造方法
EP2362281A2 (fr) * 2010-02-04 2011-08-31 Honeywell International Inc. Techniques de fabrication pour améliorer l'uniformité de la pression dans des cellules de vapeur anodiquement liées

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
DOUAHI A ET AL: "New Vapor Cell Technology for Chip Scale Atomic Clock", FREQUENCY CONTROL SYMPOSIUM, 2007 JOINT WITH THE 21ST EUROPEAN FREQUEN CY AND TIME FORUM. IEEE INTERNATIONAL, IEEE, PI, 1 May 2007 (2007-05-01), pages 58 - 61, XP031137920, ISBN: 978-1-4244-0646-3 *
R F WOHENBUTTEL ET AL: "Low-temperature silicon wafer-to-wafer bonding using gold at eutectic temperature", SENSORS AND ACHCATORS A, vol. 43, 1 January 1994 (1994-01-01), pages 22 - 29, XP055429214 *

Also Published As

Publication number Publication date
EP2746876B1 (fr) 2019-04-10
CN103792838B (zh) 2017-08-11
JP2014088308A (ja) 2014-05-15
JP6198522B2 (ja) 2017-09-20
CN103792838A (zh) 2014-05-14
EP2746876A2 (fr) 2014-06-25

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