EP3074239B1 - Corps multicouche comme élément de sécurité et procédé pour sa production - Google Patents

Corps multicouche comme élément de sécurité et procédé pour sa production Download PDF

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Publication number
EP3074239B1
EP3074239B1 EP14805273.1A EP14805273A EP3074239B1 EP 3074239 B1 EP3074239 B1 EP 3074239B1 EP 14805273 A EP14805273 A EP 14805273A EP 3074239 B1 EP3074239 B1 EP 3074239B1
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EP
European Patent Office
Prior art keywords
layer
partial
layer system
region
sub
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
EP14805273.1A
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German (de)
English (en)
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EP3074239B2 (fr
EP3074239A1 (fr
Inventor
René Staub
Ludwig Brehm
Patrick KRÄMER
Rouven SPIESS
Karin FÖRSTER
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OVD Kinegram AG
Leonhard Kurz Stiftung and Co KG
Original Assignee
OVD Kinegram AG
Leonhard Kurz Stiftung and Co KG
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Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=51999431&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP3074239(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by OVD Kinegram AG, Leonhard Kurz Stiftung and Co KG filed Critical OVD Kinegram AG
Priority to PL14805273.1T priority Critical patent/PL3074239T5/pl
Priority to RS20190222A priority patent/RS58357B2/sr
Publication of EP3074239A1 publication Critical patent/EP3074239A1/fr
Application granted granted Critical
Publication of EP3074239B1 publication Critical patent/EP3074239B1/fr
Publication of EP3074239B2 publication Critical patent/EP3074239B2/fr
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/43—Marking by removal of material
    • B42D25/445—Marking by removal of material using chemical means, e.g. etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/14—Multicolour printing
    • B41M1/18—Printing one ink over another
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/29—Securities; Bank notes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/364—Liquid crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/378—Special inks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/415—Marking using chemicals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/43—Marking by removal of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/45—Associating two or more layers

Definitions

  • the invention relates to a multilayer body with two layers or layer systems and to a method for its production.
  • Multilayer bodies as a security element are known in the prior art as known and are widely used for counterfeit protection of banknotes, securities, identity documents or for the authentication of products. They are based on a combination of several functional layers, which may have, for example, optical variable devices (OVD), diffractive elements, partially metallized layers or printed features.
  • ODD optical variable devices
  • diffractive elements diffractive elements
  • partially metallized layers printed features.
  • the document US 2012/0189159 relates to a security element comprising an optical system.
  • the document DE 10 2007 007 914 A1 relates to a high-index embossing lacquer for producing micro-optical assemblies.
  • WO 2009/053673 A1 relates to a security element for use in or on security substrates.
  • the document GB 2464496 A relates to a security feature having a printed image.
  • the document DE 103 33 255 B3 relates to a method for producing a surface pattern.
  • Register or register accuracy is the positionally accurate arrangement of superimposed layers relative to each other while maintaining a desired positional tolerance to understand.
  • the partial second layer or the partial second layer system As a mask in order to structure the partial first layer or the partial first layer system, it is possible to arrange the two layers or layer systems exactly in register with one another. In this case, it is of particular importance that the second partial layer or the second partial layer system does not only extend into those regions which are covered by the first partial layer or the first partial layer system-that is, the first partial region-but also in FIG the areas not covered by the first partial layer or the first partial layer system, ie the second partial area.
  • the second partial layer or the second partial layer system as mask, it is to be understood that when structuring the first partial layer or the first partial layer system, this or these in those regions which are of the second partial layer or second partial layer system are either selectively retained or selectively removed. In the structuring, therefore, a defined positional relationship arises between the two layers or layer systems, so that they are arranged in register with one another, for example seamlessly connected to one another.
  • Layer system is to be understood here as any arrangement of several layers.
  • the layers can be arranged one above the other in the direction of the surface normals of the layer system or else in a plane next to each other. A combination of such horizontally and vertically arranged layers is possible.
  • Overlapping is understood to mean that the respective subareas are at least partially superimposed in the direction of the surface normals of the planes spanned by the first or second layer, ie in the stacking direction of the multilayer body.
  • the generation of the two layers or layer systems does not have to take place in the stated order, i.
  • the second partial layer or the second partial layer system can also be produced before the first partial layer or the first partial layer system.
  • the layers or layer systems can be produced directly on the substrate, directly on one another or to form any intermediate layers.
  • the structuring of the partial first layer or of the partial first layer system in step c) is preferably carried out by etching. It is expedient if the partial second layer or the partial second layer system is an etching resist, or comprises an etching resist.
  • An etch resist should be understood to mean a substance which is resistant to an etchant and which can protect a substance which is sensitive to the etchant from attack by the etchant where it covers it.
  • an etchant is applied to the resulting layer stack which removes the first partial layer or the first partial layer system where it is not covered by the second partial layer or the second partial layer system is.
  • the etch resist is preferably a lacquer which may in particular comprise binders, dyes, pigments, in particular colored or achromatic pigments, effect pigments, thin-film layer systems, cholesteric liquid crystals and / or metallic or non-metallic nanoparticles.
  • the second partial layer or the second partial layer system does not meet only one Protective function in structuring the first partial layer or the first partial layer system, but can itself develop a decorative effect. It is also possible for the second partial layer or the second partial layer system to use a plurality of different etching resists, for example resist coatings with different colors, in order to produce further visual effects.
  • the etchant used for structuring the first partial layer or the first partial layer system depends on the composition of this layer or this layer system.
  • HRI High Refractive Index
  • etchants are, for example ⁇ tzresiste based on PVC (polyvinyl chloride), polyester resins, acrylates, which typically further film-forming substances such as nitrocellulose may be mixed.
  • the etching can be assisted by mechanical agitation, for example by brushing, moving the etching bath or ultrasonic treatment. Usual temperatures for the etching process are preferably between 15 ° C and 75 ° C.
  • the structuring of the partial first layer or of the partial first layer system in step c) can furthermore preferably be effected by a lift-off method. It is expedient if the partial second layer or the partial second layer system is a washcoat, or comprises a washcoat.
  • washcoat is removed by means of a solvent.
  • the washcoat must therefore be soluble in the solvent.
  • Suitable washcoats are based for example on the basis of polyvinyl alcohol (PVA) or polyvinylpyrrolidone (PVP) and may additionally contain fillers which facilitate the subsequent removal of the washcoat.
  • PVA polyvinyl alcohol
  • PVP polyvinylpyrrolidone
  • the removal of the washcoat takes place in a solvent bath or by spraying with solvent, preferably at temperatures of 15 ° C to 65 ° C.
  • the removal of the washcoat may be mechanically assisted, for example, by brushing, moving the solvent bath, spraying, or sonicating.
  • the partial first layer or the partial first layer system is removed together with the washcoat.
  • the partial first layer or the partial first layer system thus remains only in areas in which it or it does not overlap with the partial second layer or the partial second layer system. So it creates a negative to the overlapping areas. This is particularly useful if the washcoat is part of a layer system, so that then the remaining, not removed with the washcoat components of the layer system are arranged register exactly to the remaining areas of the first layer or the first layer system.
  • the structuring of the partial first layer or of the partial first layer system in step c) can furthermore preferably be effected by mask exposure.
  • the partial second layer or the partial second layer system itself acts as an exposure mask or is structured by means of a separate exposure mask. It is expedient here if the partial second layer or the partial second layer system is a protective lacquer or comprises a protective lacquer.
  • Protective coating should be understood to mean a substance which absorbs in a wavelength range used for exposing the partial first layer or the partial first layer system.
  • the partial layers or layer systems are irradiated over the whole area with light of this wavelength range, preferably perpendicular to the layer plane.
  • Typical wavelengths used for the exposure are, for example, 250 nm to 420 nm.
  • the exposure is preferably carried out with a dose of 10 mJ / cm 2 to 500 mJ / cm 2 .
  • the exposure times result from the sensitivities of the materials used and the power of the available exposure source.
  • etch resists and conformal coatings for example by adding absorbing substances, for example UV absorbers, dyes, color pigments or scattering substances, for example titanium dioxide, to an etching resist.
  • absorbing substances for example UV absorbers, dyes, color pigments or scattering substances, for example titanium dioxide
  • the protective lacquer is preferably a lacquer which comprises in particular binders, dyes, pigments, in particular colored or achromatic pigments, effect pigments, thin-film layer systems, cholesteric liquid crystals and / or metallic or non-metallic nanoparticles.
  • Suitable protective coatings are formulated for example based on PVC, polyester or acrylates.
  • the second partial layer or the second partial layer system not only fulfills a protective function when structuring the first partial layer or the first partial layer system, but can itself have a decorative effect unfold. It is also possible for the second partial layer or the second partial layer system to use a plurality of different protective lacquers, for example with different colors, in order to produce further visual effects.
  • the partial first layer or the partial first layer system is a photoresist or comprises a photoresist.
  • a photoresist changes its chemical and / or physical properties when exposed in a certain wavelength range, so that the different properties of the exposed and unexposed areas can be exploited to selectively remove the photoresist in one of the areas. For example, when the photoresist is exposed to light, its solubility changes relative to a solvent which can be used after exposure for developing the photoresist. In the case of positive photoresists, the exposed area is selectively removed in the development step subsequent to the exposure, and in the case of negative photoresists the unexposed area is removed.
  • a photoresist can also serve as a wash.
  • Suitable positive photoresists are AZ 1518 or AZ 4562 from AZ Electronic Materials based on phenolic resin / diazoquinone.
  • Suitable negative photoresists are, for example, AZ nLOF 2000 or ma-N 1420 from micro resist technology GmbH, for example based on cinnamic acid derivatives. These can preferably be exposed by irradiation with light in a wavelength range of 250 nm to 440 nm. The required dose depends on the respective layer thicknesses, the wavelength of the exposure and the sensitivity of the photoresists.
  • tetramethylammonium hydroxide is suitable for the development of these photoresists.
  • the development is preferably carried out at temperatures of 15 ° C to 65 ° C for a preferred development time of 2 seconds to a few minutes Again, the development process and the associated local removal of the photoresist again by mechanical agitation, such as brushing, wiping, influx be supported with the development medium or ultrasound treatment.
  • the photoresist may in particular contain binders, dyes, pigments, in particular colored pigments, effect pigments, thin film layer systems, cholesteric liquid crystals and / or metallic or non-metallic nanoparticles in order to fulfill additional decorative effects.
  • the partial first layer or the partial first layer system and / or the partial second layer or the partial second layer system is first produced over the entire surface or at least in large areas and then patterned .
  • the full-surface or large-scale generating can be done for example by printing or steaming.
  • the subsequent structuring of the partial first layer or the partial first layer system and / or the partial second layer or the partial second layer system in steps a) and b) is then preferably carried out by etching, lift-off or mask exposure.
  • the required ⁇ tzresists, protective coatings or laquers may in turn part of one or both of the Layer systems or be applied as additional layers. These layers can in turn remain as part of the layer systems or be removed again in a further step.
  • mask exposure it is also possible to use an external exposure mask which is placed on the respective layer or the respective layer system.
  • methods are also possible in which certain areas of the first layer or the first layer system are partially removed, for example by means of a laser. Such methods are particularly suitable for the individual marking of security elements.
  • step b) It is also possible for structuring of the partial second layer or of the partial second layer system in step b) to simultaneously structure the partial first layer or the partial first layer system according to step c). As a result, a particularly simple and fast method to be performed is created.
  • step a) and / or b) the partial first layer or the partial first layer system and / or the partial second layer or the partial second layer system are generated in a structured manner.
  • a printing method is preferably used, in particular gravure printing, flexographic printing, offset printing, screen printing or digital printing, in particular ink jet printing.
  • the partial first layer or the partial first layer system is or a reflective layer of a particular opaque metal and / or a particular transparent or translucent material having a high refractive index (thus, a high real part of the complex Refractive index meant), and / or at least one single or multi-colored color coat layer and / or a Fabry-Perot layer system.
  • the partial second layer or the partial second layer system is at least one transparent, translucent or even substantially opaque monochrome or multicolor lacquer layer, in particular an etching and / or protective lacquer, and / or a Fabry-Perot layer system or includes.
  • the use or combination of such layers or layer systems for the partial first and second layer or the partial first and second layer system can produce a variety of optical effects, which further contribute to anti-counterfeiting security and make the visual appearance particularly appealing.
  • the partial first layer or the partial first layer system and / or the partial second layer or the partial second layer system are preferably applied in the form of at least one motif, pattern, symbol, image, logo or alphanumeric characters, in particular numbers or letters.
  • the layers or layer systems can also be added to such a motif, pattern, symbol, image, logo or to alphanumeric characters, in particular numbers or letters, before or even after the structuring of the partial first layer or of the partial first layer system.
  • Such a generated graphic element which results from the interaction of several layers, is particularly difficult to reproduce and therefore particularly tamper-proof.
  • the partial first layer or the partial first layer system and / or the partial second layer or the partial second layer system in the form of a one- or two-dimensional line and / or Dot matrix is applied.
  • transformed line grids are possible, for example with wavy lines, which can also have a variable line width.
  • the points of a dot matrix can have any geometries and / or sizes and need not be circular disk-shaped.
  • dot patterns of triangular, rectangular, arbitrary polygonal, star-shaped or in the form of symbols formed points are possible.
  • the dot matrix can also be brewed from differently sized and / or differently shaped dots.
  • further graphic effects such as halftone images, can be generated.
  • the line and / or dot screen preferably has a screen width of less than 300 ⁇ m, preferably less than 200 ⁇ m and more than 25 ⁇ m, and preferably more than 50 ⁇ m.
  • the grid width can also vary across the grid.
  • Line weights or point diameters are preferably from 25 ⁇ m to 150 ⁇ m and may also vary. Such screens affect other graphic elements superimposed on the grid, but are no longer perceived as such even with the naked human eye.
  • the substrate comprises a carrier layer, in particular a film of a plastic, preferably polyester, in particular PET (polyethylene terephthalate), and / or a release layer, for example of a polymer lacquer, for example PMMA (polymethyl methacrylate) or of wax-like substances.
  • a carrier layer gives the multilayer body in its manufacture and subsequent handling stability and protects it from damage.
  • a release layer allows for easy detachment of the Security elements of unnecessary layers, such as the carrier layer, so that it can be attached to the desired document or object, in particular in the form of a hot stamping foil with the carrier layer as a carrier film and the security element as from the carrier film to a substrate to be transferred transfer layer.
  • the substrate comprises a replicating layer having a diffractive surface relief.
  • the replication layer may be made of a thermoplastic, i. thermally curable or dryable replicate varnish or a UV-curable replicate varnish or a mixture of such varnishes.
  • the surface relief introduced into the replication layer is an optically variable element, in particular a hologram, Kinegram® or Trustseal®, a preferably sinusoidal diffraction grating, an asymmetrical relief structure, a blazed grating, a preferably isotropic or anisotropic matt structure, or a light-diffractive and / or refractive and / or light-focusing micro- or nanostructure, a binary or continuous Fresnel lens, a microprism structure, a microlens structure or a combination structure forms thereof.
  • a hologram Kinegram® or Trustseal®
  • a preferably sinusoidal diffraction grating an asymmetrical relief structure
  • a blazed grating a preferably isotropic or anisotropic matt structure, or a light-diffractive and / or refractive and / or light-focusing micro- or nanostructure
  • a binary or continuous Fresnel lens a microp
  • a third layer or a third layer system is applied which is or comprises, in particular, an HRI layer and / or an adhesive layer.
  • Adhesive layers can be used to secure the multilayer body to a substrate, for example a document to be secured.
  • HRI layers are particularly useful in connection with extensive relief structures that are made visible by the transparent HRI layer even in areas where the first and / or second layer or the first and / or second layer system does not provide an opaque metallized layer can be.
  • As a material for an HRI layer for example, zinc sulfide, or titanium dioxide or zirconium dioxide is suitable.
  • a multi-layer body obtainable in this way can be used as a security element, in particular for a security document, in particular a banknote, a security, an identification document, a passport or a credit card.
  • Fig. 1 shows a first embodiment of a multi-layer body 10, which can be used as a security element for banknotes, securities, identity documents, tickets or protected product packaging.
  • the multilayer body 10 comprises a first layer 11, which may be used as a metal layer, for example, made of aluminum, and a second layer 12, which is formed as a colored ⁇ tzresistlack.
  • a metal layer for example, made of aluminum
  • a second layer 12 which is formed as a colored ⁇ tzresistlack.
  • copper, silver or chrome are also suitable or even a wide variety of metal alloys.
  • the first layer 11 is produced, which can be done for example by vapor deposition on a not shown substrate.
  • the vapor deposition is preferably carried out in vacuo by thermal evaporation, by electron beam evaporation or by sputtering.
  • the layer thickness of the first layer 11 is preferably 5 nm to 100 nm, more preferably 15 nm to 40 nm.
  • the first vapor-deposited layer can be partially removed by means of known methods, for example by the partial application of an etching resist after vapor deposition and subsequent etching, including removal of the etching resist; by the partial application of a washcoat before steaming and wash-off (lift-off) after vapor deposition or by partial application of a photoresist after vapor deposition and subsequent exposure and subsequent removal of the exposed or unexposed components of the photoresist depending on the nature (positive, negative) of photoresist.
  • the substrate is not completely vapor-deposited, but the layer 11 is rather partially generated so that it is present in a first region 111 and is absent in a second region 112.
  • various methods are known, such as shielding by means of a follower mask or pressure of an oil, which prevents the deposition of the metal layer in the vapor deposition process.
  • a replicated diffractive structure for example in the form of an optically variable device (OVD), in particular a hologram, Kinegram® or Trustseal®, a preferably sinusoidal diffraction grating, an asymmetrical relief structure, a blaze grating, may already be present on the substrate.
  • OMD optically variable device
  • the first layer 11 need not be contiguous, as shown, but may be arbitrarily structured and of any shape.
  • the second layer 12 here in the form of a radial pattern, is printed on the first layer.
  • Gravity printing, flexographic printing, offset printing, screen printing or digital printing, in particular inkjet printing, are preferably used as the printing technique.
  • the second layer 12 extends both into the region 111 covered by the first layer 11, but does not completely cover it, as well as in the region 112 not covered by the first layer 11. If a replicated diffractive structure is present, the printing takes place preferably in register with this structure, with tolerances of +/- 1 mm, preferably +/- 0.5 mm, depending on the printing method.
  • the resist used to print the second layer 12 is an etch resist, that is, resistant to an etchant containing the metal of the first layer 11 can dissolve.
  • this etchant may be, for example, caustic soda.
  • an etch resist is then suitable, for example, a paint based on PVC / PVAc (polyvinyl acetate) copolymer.
  • the paint further contains dyes, pigments, especially colored or achromatic pigments or effect pigments, thin film layer systems or cholesteric liquid crystals or nanoparticles, so that it produces an optically visible effect.
  • the in Fig. 1b treated intermediate treated with the described etchant.
  • the etching is then preferably carried out at a concentration of 0.1% to 5%, a temperature of the etchant of 15 ° C to 75 ° C over a period of 5 seconds to 100 seconds.
  • a suitable etch resist is, for example, a paint based on PVC / PVAc (polyvinyl acetate) copolymer, which is printed in a layer thickness of preferably from 0.1 ⁇ m to 10 ⁇ m.
  • the first layer 11 dissolves.
  • the etching may be followed by a rinsing process, for example with water and a drying step.
  • Fig. 1c shows the resulting multilayer body 10 from the opposite side of the pressure side. It can be seen that the structures of the first layer 11 and second layer 12 merge seamlessly into one another, ie are arranged in register. This side is also the typical viewing side of the multi-layer body 10. If a replicated diffractive structure is present, the first layer 11 acts as a reflection layer, so that the diffractive structure is particularly clearly visible in the region of the first layer 11. By an additional coating with an adhesive layer, not shown For example, the diffractive structure in the region 111 not covered by the first layer 11 can be completely extinguished if the adhesive layer has a similar refractive index (eg about 1.5) as the replication layer and therefore no optically effective boundary layer between adhesive layer and replication layer is formed.
  • a similar refractive index eg about 1.5
  • the refractive indices of both adjacent layers should preferably differ by not more than 0.1 from each other.
  • the adhesive layer simultaneously serves to apply the multi-layer body 10 to a substrate, for example a banknote.
  • the color can be made largely transparent or translucent, so that the underlying background can be seen, but also a largely opaque design is possible.
  • a metal layer as the first layer 11, it is also possible to use a plurality of adjoining color layers which are printed on the substrate. Suitable paints for this purpose are, for example, photoresists, such as AZ 1518 from AZ Electronic Materials.
  • the second layer 12 is then preferably a protective lacquer, for example a transparent or opaque lacquer with a UV blocker. Benzophenone derivatives or finely divided titanium dioxide are particularly suitable for this purpose.
  • the second layer 12 is then preferably printed overlapping with the boundary regions of the color layers of the first layer 11.
  • a preferred exposure dose of 10 mJ / cm 2 to 500 mJ / cm 2 and etching with, for example, 0.3% NaOH at a preferred temperature of about 50 ° C for a time of preferably 10 seconds to 30 seconds then remain only the color components of the first layer 11, where they were covered by the second layer 12 and thus form a multi-colored decor.
  • the second layer 12 is in the form of Guilloche lines
  • the finished multi-layer body 10 shows guilloche lines in which color transitions are visible, that is to say a so-called iris print.
  • the in Fig. 2 shown multi-layer body 10 is analogous to Fig. 1 produced. Only in the second production step according to Fig. 2b
  • the second layer 12 is formed as a layer system by printing on two differently colored paints 121, 122.
  • the two paints 121, 122 may overlap in some areas and are preferably printed in the register with a tolerance of preferably less than 0.5 mm and more preferably less than 0.2 mm.
  • FIGS. 3 to 5 show the manufacturing steps of an alternative multi-layer body 10, but in the basic structure of the in Fig. 2 shown corresponds.
  • the essential difference lies in the fact that the second layer 12 is not already printed in a structured manner in this case, but first applied over the entire surface or at least in large areas and then structured.
  • a release layer 14 and a replication layer 15 of, for example, a thermoplastic material or a radiation- or temperature-curable replication lacquer are first applied to a carrier layer 13 made of polyester, in particular PET, these layers in turn may consist of several layers.
  • Diffractive structures 151 are then formed in the replication layer 15, for example by embossing with a metallic embossing tool.
  • HRI High Refractive Index
  • the second layer 12 is applied over the entire surface or at least in large areas, which in turn consists of two different-colored paints 121, 122 adjacent to each other.
  • the paints 121, 122 are UV-sensitive photoresists, such as AZ 1518 from AZ Electronic Materials based on phenolic resin / diazoquinone.
  • a mask layer 16 is partially printed on the second layer 12.
  • the mask layer 16 simultaneously serves as an etching and protective lacquer.
  • an etching resist for example based on PVC / PVAc (polyvinyl acetate) copolymer, for example, be provided with UV absorbing titanium dioxide particles or other UV blockers.
  • an exposure with UV light takes place from the side of the mask layer 16.
  • the exposure is preferably carried out at a wavelength of 365 nm with a dose of 25 mJ / cm 2 to 500 mJ / cm 2 .
  • NaOH in a preferred concentration of 0.05% to 2.5%, which preferably acts on the intermediate for a period of 2 seconds to 60 seconds at a temperature of 20 ° C to 65 ° C.
  • the photoresist 121, 122 of the layer 12 was exposed during the UV irradiation and therefore dissolves in the developer bath. You get that in Fig. 4 represented intermediate. This is not isolated. Rather, the etching process is continued, wherein now the HRI layer 11 is where it is not protected by the remaining layer 12, is attacked. The paints 121, 122 thus act simultaneously as etching resist. After the etching process, the results in Fig. 5 shown finished multi-layer body 10. On this still an adhesive layer can be applied, which fills the exposed diffractive structures 151 where they are not covered by the first layer 11. The diffractive structures 151 are then visible only where the HRI material of the first layer 11 acts as a reflection layer.
  • FIG. 6 another multilayer body 10 is shown.
  • the order of the layers 11 and 12 is analogous to in Fig. 1 illustrated embodiment.
  • a further transparent HRI layer 17 is applied over the entire surface, so that a diffractive element 18 not covered by the first layer 11 becomes visible.
  • Diffractive structures are thus recognizable in the opaque metallic regions of the first layer 11 and in the regions of the transparent HRI layer 17, but typically not in the pressure regions of the second layer 12, because the diffractive structures are extinguished by the color coat of the second layer 12 printed directly on the diffractive structures, because the color coat preferably has a similar refractive index (about 1.5) as the replication layer and therefore no optically effective boundary layer is formed between color coat and replication layer.
  • the refractive indices of both adjacent layers should preferably differ by not more than 0.1 from each other.
  • the embodiment according to Fig. 7a-c again corresponds to the exemplary embodiment Fig. 1 ,
  • the only difference is that two different metals 113, 114, such as Al and Cu, are used for the first layer 11.
  • the two metals 113, 114 may be spatially separated, adjacent or partially overlapping.
  • Fig. 7b again shows how the second layer 12 is printed on the first layer 11, viewed from the printing side.
  • Fig. 7c shows the finished multilayer body viewed from the metal side. Due to the opaque metal layers, the pressure of the layer 12 under the metal regions of the layer 11 is not visible.
  • the structuring of the first layer 11 can take place in two steps, since, for example, different etchants have to be used for the two metals or metal alloys used. In the case of using Al and Cu for the first layer 11, these are, for example, NaOH and FeCl 3. However, since the same printed mask, namely the second layer 12, is used for the structuring, the transitions of the two metals 113, 114 take place first layer 11 in the perfect register, that is in exact relative position to the pressure of the second layer 12th
  • the embodiment according to Fig. 8 again corresponds to the exemplary embodiment Fig. 1 ,
  • only one more transparent HRI layer 17 is applied.
  • an opaque metal 113 such as aluminum
  • the HRI layer 17 of ZnS or TiO 2 is applied, which can also be done by vapor deposition or sputtering, so that a layer arrangement according to Fig. 8a is present.
  • the HRI layer 17 can also be present only partially, adjacent to the metal layer 113, or they also overlap at least partially.
  • the metal layer 113 and the HRI layer 17 together form the first layer 11.
  • the non-overprinted regions of the two reflection layers 113, 17 are removed, if appropriate also in two process steps with chemicals adapted to the layers to be removed, for example two different bases.
  • NaOH can be used under the conditions described to remove the aluminum content
  • to remove an HRI layer of ZnS it is also preferable to use NaOH or Na 2 CO 3 at a temperature of 20 ° C to 60 ° C for a period of 5 seconds Used for 60 seconds.
  • the finished multilayer body is in Fig. 8c seen from the side of the first layer 11.
  • Fig. 8c seen from the side of the first layer 11.
  • the effect of the diffractive structures in the substrate is recognizable, while at the same time the color print of the second layer 12 can be seen, because between the printed and the diffractive structures still the HRI layer 17 is arranged as an optical boundary layer.
  • the color coat can be made transparent, translucent or largely opaque.
  • the Fig. 9 corresponds to Fig. 1 , The only difference is that the first layer 11 is finely structured, here as repetitions of the number "50".
  • the manufacturing process comprises a first step, in which the finely structured first layer 11 according to FIG Fig. 9a is produced.
  • Correspondingly finely structured metal layers can be produced, for example, in the following way: by structuring a photoresist layer by means of a high-resolution mask exposure, which in turn is then used to pattern the metal layer, or by using a method for tolerance-free partial metallization, as described, for example, in US Pat WO 2006/084685 A2 is known.
  • the layer 11 consists of a fine grid, which consists for example of a microscopic text.
  • the second layer 12 in this example is a comparatively roughly structured motif in the form of the large number "50".
  • the second layer 12 may also be very finely structured.
  • the colored printing of the layer 12 serves as a mask for register-accurate removal of the first layer 11, so that the in Fig. 9c shown multi-layer body 10 is obtained. This takes place analogously to the etching methods already described.
  • first layer 11 and the second layer 12 are, for example, finely structured line screens, superposition effects occur depending on their relative position to each other, and the final structure is a finely structured overlay structure of the first layer 11 and second layer 12 Overlay structure can produce, for example, a desired moiré effect.
  • the fine structuring of the first layer 11 may, for example, also be embodied as guilloche of a multiplicity of fine lines, preferably as a metallic reflection layer in combination with diffractive optical structures, for example with a KlNEGRAM® Fig. 17A Subsequently, the colored printing of the second layer 12 takes place according to FIG Fig. 17B ,
  • the colored print can have several different colored areas, for example in the form of a country flag (as shown here) and / or a geographical contour of a country or in the form of a coat of arms or another multi-colored motif.
  • the colored printing of the layer 12 serves as a mask for register-precise removal of the first layer 11, so that in Fig. 17C shown multi-layer body 10 is obtained. This takes place analogously to the etching methods already described.
  • the observer recognizes as tamper-proof and independent features that the finely structured lines are present only in the colored areas and the finely structured lines recognizable in a colored area continue in register in an adjacent further colored area.
  • FIG. 18 Another embodiment with a finely structured first layer 11 shows Fig. 18 , Again, the fine patterning of the first layer 11, for example, as a guilloche of a plurality of fine lines, preferably as a metallic reflection layer in combination with diffraction-optical structures, for example, with a KINEGRAM® be executed, like this Fig. 18A shows.
  • a colorless, preferably transparent ⁇ tzresist with a UV absorber is used.
  • This etch resist is then intended to fulfill a dual function: On the one hand, the etch resist serves for further substructuring of the finely structured first layer 11 by means of etching and, on the other hand, later as an exposure mask for structuring a color region.
  • the fine structure of the first layer 11 in the areas is removed by etching in which the etching resist is not provided.
  • a colored photoresist is printed, which comprises at least the area which is not covered by the colorless ⁇ tzresist.
  • the photoresist may also overlap with the etch resist.
  • the colored photoresist is cured in those areas that have no transparent ⁇ tzresist and can be removed in the remaining areas register accurate to the etch resist and the protected by the etch resist areas of the finely structured first layer 11.
  • the observer recognizes as counterfeit-proof and independent features that the fine structures of the first layer 11 are present only in the colorless areas and end in register with the colored area of the photoresist and that the fine structures of the first layer 11 are practically "over the colored Area "register in a neighboring transparent area continue.
  • FIGS. 10 to 13 show the manufacturing steps of an alternative multi-layer body 10, but in the basic structure of the in Fig. 9 shown corresponds.
  • the essential difference lies in the fact that the second layer 12 is not already printed in a structured manner in this case, but is first applied over the entire surface or at least over large areas and then structured.
  • a release layer 14 and a replication layer 15 are first applied to a carrier layer 13 made of polyester or PET. Diffractive structures 151 are then formed in the replication layer 15.
  • the entire surface of the second layer 12 applied which in turn consists of two different colored paints 121, 122 is adjacent to each other.
  • the paints 121, 122 are UV-sensitive colored photoresists.
  • a mask layer 16 is partially printed on the second layer 12, so that the in Fig. 12 obtained intermediate product is obtained.
  • the mask layer 16 may be in the form of another raster.
  • the mask layer 16 simultaneously serves as an etching and protective lacquer.
  • an etching resist can for example be provided with UV-absorbing titanium dioxide particles or other UV blockers.
  • an exposure with UV light from the side of the Mask layer 16 ago The exposure parameters and lacquers used correspond to those already described above.
  • FIG Fig. 14 Screenings of the first layer 11 and the second layer 12 are shown in FIG Fig. 14 shown.
  • the first layer 11 and / or the second layer 12 may be provided with a further grid of diffractive structures on the respective replication layer of the first and / or second layer.
  • the diffractive grating (s) of the first and / or second layer or their optically variable effects can vary greatly depending on how similar or different the screen rulings and / or screen shapes are for the rasters involved in the overlay.
  • the viewing angle and / or illumination angle dependence of the diffractive grids can lead to surprising optical effects in this complex superposition.
  • the exemplary embodiments discussed so far are based on the fact that first a partial Reflection layer of opaque metal or transparent HRI material (first layer 11) produced and then a pressure (second layer 12) is applied.
  • the pressure of the second layer 12 serves as a mask layer, for example analogously to an etching resist pressure, for the further structuring of the partial metal layer 11 Fig. 15
  • a pressure (second layer 12) is introduced into the starting material, in which subsequently a diffractive structure, not shown, is molded (see Fig. 15a ).
  • a first partial metal region (first layer 11) is produced, as in FIG Fig. 15b shown.
  • the pressure already present in the starting material is used as an exposure mask for a photoresist layer applied thereon in order to pattern the first layer 11 in the perfect register for printing the second layer 12.
  • the materials and process parameters used correspond to those already described above.
  • the second layer 12 is thus generated in time and place completely independent of the first layer 11.
  • the second layer 12 may, for example, also be arranged on the rear side of the substrate, not shown, and the first one Layer 11 on the front side.
  • Fig. 16 shows a multi-layer body 10.
  • first the first layer 11 as a metal layer with a recessed lettering 19 produced.
  • the second layer 12 becomes, as in Fig. 16b represented as wavy rastered lacquer layer printed on the first layer 11 and then serves as ⁇ tzresistmaske for further patterning of the first layer 11 in a lye bath.
  • the in Fig. 16c shown multi-layer body 10, in which the colored lines of the second layer 12 in the area of the recessed lettering in the perfect register to the remaining metallic lines of the first layer 11 outside the lettering 19 continue.
  • the line widths need not be constant, but may additionally be modulated, resulting in different local area densities of the grid, which form additional information.
  • the line widths are preferably from 25 .mu.m to 150 .mu.m.
  • the raster width can also be modulated and is preferably less than 300 .mu.m and preferably less than 200 .mu.m, and preferably more than 25 .mu.m.

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  • Business, Economics & Management (AREA)
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  • Finance (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Credit Cards Or The Like (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Holo Graphy (AREA)
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Claims (15)

  1. Procédé servant à fabriquer un élément de sécurité (10), comprenant les étapes suivantes consistant à :
    a) produire une première couche (11) partielle ou un premier système de couches partiel sur un substrat, dans lequel la première couche (11) partielle ou le premier système de couches partiel est présente ou présent dans une première zone partielle (111) et n'est pas présente ou présent dans une deuxième zone partielle (112) :
    b) produire une deuxième couche (12) partielle ou un deuxième système de couches partiel, dans lequel la deuxième couche (12) partielle ou le deuxième système de couches partiel est présente ou présent dans une troisième zone partielle et n'est pas présente ou présent dans une quatrième zone partielle et dans lequel la troisième zone partielle chevauche la première (111) et la deuxième zone partielle (112) ;
    c) structurer la première couche (11) partielle ou le premier système de couches partiel en utilisant la deuxième couche (12) partielle ou le deuxième système de couches partiel en tant que masque, dans lequel lors de la structuration de la première couche (11) partielle ou du premier système de couches partiel, cette dernière ou ce dernier est soit conservée ou conservé de manière sélective soit est supprimée ou supprimé de manière sélective dans les zones précisément, en particulier dans la troisième zone partielle, qui sont recouvertes par la deuxième couche (12) partielle ou le deuxième système de couches partiel.
  2. Procédé selon la revendication 1,
    caractérisé en ce
    que la structuration de la première couche (11) partielle ou du premier système de couches partiel est effectuée lors de l'étape c) par gravure.
  3. Procédé selon la revendication 2,
    caractérisé en ce
    que la deuxième couche (12) partielle ou le deuxième système de couches partiel est un film résistant à la gravure ou comprend au moins un film résistant à la gravure, lequel est de préférence un vernis, qui comprend en particulier des liants, des pigments, en particulier des pigments colorés ou non colorés, et/ou des pigments à effet, des systèmes de film à couche mince, des cristaux liquides cholestériques, des colorants et/ou des nanoparticules métalliques ou non métalliques.
  4. Procédé selon l'une quelconque des revendications 1 à 3,
    caractérisé en ce
    que la structuration de la première couche (11) partielle ou du premier système de couches partiel est effectuée à l'étape c) par lift-off.
  5. Procédé selon la revendication 4,
    caractérisé en ce
    que le deuxième système de couches partiel comprend un vernis lavable, qui est soluble dans un solvant, en particulier dans l'eau, dans lequel le vernis lavable est de préférence un vernis, qui comprend en particulier des liants et des charges.
  6. Procédé selon l'une quelconque des revendications 1 à 5,
    caractérisé en ce
    que la structuration de la première couche (11) partielle ou du premier système de couches partiel est effectuée à l'étape c) par un éclairage par masques.
  7. Procédé selon la revendication 6,
    caractérisé en ce
    que le deuxième système de couches partiel comprend au moins un vernis de protection.
  8. Procédé selon la revendication 6 ou 7,
    caractérisé en ce
    que la première couche (11) partielle ou le premier système de couches partiel est un vernis photosensible ou comprend au moins un vernis photosensible.
  9. Procédé selon l'une quelconque des revendications 1 à 8,
    caractérisé en ce
    que lors des étapes a) et/ou b), la première couche (11) partielle ou le premier système de couches partiel et/ou la deuxième couche (12) partielle ou le deuxième système de couches partiel sont produits dans un premier temps sur toute la surface ou au moins dans des zones de grande surface et sont immédiatement après structurés, dans lequel la structuration de la première couche (11) partielle ou du premier système de couches partiel et/ou de la deuxième couche (12) partielle ou du deuxième système de couches partiel est effectuée lors des étapes a) ou b) en particulier par gravure, par lift-off ou par éclairage par masques, et dans lequel de préférence la structuration de la première couche (11) partielle ou du premier système de couches partiel selon l'étape c) est effectuée de manière simultanée lors de la structuration de la deuxième couche (12) partielle ou du deuxième système de couches partiel lors de l'étape b).
  10. Procédé selon l'une quelconque des revendications 1 à 9,
    caractérisé en ce
    que lors de l'étape a) et/ou b), la première couche (11) partielle ou le premier système de couches partiel et/ou la deuxième couche (12) partielle ou le deuxième système de couches partiel sont produits de manière structurée.
  11. Procédé selon l'une quelconque des revendications 1 à 10,
    caractérisé en ce
    que la première couche (11) partielle ou le premier système de couches partiel et/ou la deuxième couche (12) partielle ou le deuxième système de couches partiel sont appliqués sous la forme au moins d'un motif, d'un modèle, d'un symbole, d'une image, d'un logo, de caractères alphanumériques, en particulier de chiffres et/ou de lettres.
  12. Procédé selon l'une quelconque des revendications 1 à 11,
    caractérisé en ce
    que la première couche (11) partielle ou le premier système de couches partiel et/ou la deuxième couche (12) partielle ou le deuxième système de couches partiel sont appliqués sous la forme d'une trame de lignes et/ou de points mono- ou bidimensionnelle, laquelle présente une largeur de trame inférieure à 300 µm, de manière préférée inférieure à 200 µm, et supérieure à 25 µm, de manière préférée supérieure à 50 µm.
  13. Procédé selon l'une quelconque des revendications 1 à 12,
    caractérisé en ce
    que le substrat comprend une couche de réplication pourvue d'un relief en surface diffractif, ou le substrat est lui-même réalisé sous la forme d'une couche de réplication, dans lequel le relief en surface pratiqué dans la couche de réplication réalise un élément optiquement variable, en particulier un hologramme, un Kinegram®, un réseau de diffraction de préférence sinusoïdal, une structure en relief asymétrique, un réseau blaze, une structure mate de préférence isotrope ou anisotrope, ou une micro- ou nanostructure à diffraction de lumière et/ou à réfraction de lumière et/ou à concentration de lumière, une lentille de Fresnel binaire ou continue, une structure à micro-prismes ou une structure combinée à partir de ces éléments.
  14. Elément de sécurité (10), en particulier pouvant être obtenu selon un procédé selon l'une quelconque des revendications 1 à 13, dans lequel l'élément de sécurité comprend un substrat, une première couche (11) partielle ou un premier système de couches partiel ainsi qu'une deuxième couche (12) partielle ou un deuxième système de couches partiel, dans lequel la première couche (11) partielle ou le premier système de couches partiel est structurée ou structuré en utilisant la deuxième couche (12) partielle ou le deuxième système de couches partiel en tant que masque avec un repérage exact pour former la deuxième couche (12) partielle ou le deuxième système de couches partiel et dans lequel avant la structuration, la première couche (11) partielle ou le premier système de couches partiel est présente ou présent dans une première zone partielle (111) et n'est pas présente ou présent dans une deuxième zone partielle (112), dans lequel la deuxième couche (12) partielle ou le deuxième système de couches partiel est présente ou présent dans une troisième zone partielle et n'est pas présente ou présent dans une quatrième zone partielle, et dans lequel la troisième zone partielle chevauche la première (111) et la deuxième zone partielle (112), et dans lequel après la structuration de la première couche (11) partielle ou du premier système de couches partiel, cette dernière ou ce dernier est soit conservée ou conservé de manière sélective soit est supprimée ou supprimé de manière sélective dans les zones précisément, en particulier dans la troisième zone partielle, qui sont recouvertes par la deuxième couche (12) partielle ou le deuxième système de couches partiel et dans lequel après la structuration, la deuxième couche partielle (12) ou le deuxième système de couches partiel reste au moins dans la zone du chevauchement entre la deuxième (112) et la troisième zone partielle.
  15. Document de sécurité, en particulier billet de banque, papier de valeur, document d'identité, passeport ou carte de crédit comprenant un élément de sécurité (10) selon la revendication 14.
EP14805273.1A 2013-11-29 2014-11-28 Corps multicouche comme élément de sécurité et procédé pour sa production Active EP3074239B2 (fr)

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DE (1) DE102013113283A1 (fr)
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DE102015015991A1 (de) * 2015-12-10 2017-06-14 Giesecke & Devrient Gmbh Sicherheitselement mit Linsenrasterbild
FR3057205B1 (fr) * 2016-10-10 2020-10-16 Arjowiggins Security Procede de fabrication d'un element de securite
DE102017106721A1 (de) 2017-03-29 2018-10-04 Leonhard Kurz Stiftung & Co. Kg Verfahren zum Herstellen einer Mehrschichtfolie und eine Mehrschichtfolie sowie ein Sicherheitselement und ein Sicherheitsdokument
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CN113795390B (zh) 2019-05-20 2024-08-20 克瑞尼股份有限公司 使用纳米颗粒调谐聚合物基质层的折射率以优化微光学（mo）聚焦
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TR201902966T4 (tr) 2019-03-21
CN105793060A (zh) 2016-07-20
US9956807B2 (en) 2018-05-01
EP3074239B2 (fr) 2022-04-13
WO2015079017A1 (fr) 2015-06-04
US20180290480A1 (en) 2018-10-11
PL3074239T5 (pl) 2022-07-18
RS58357B1 (sr) 2019-03-29
ES2711547T5 (es) 2022-07-12
CA2930911A1 (fr) 2015-06-04
CN105793060B (zh) 2017-10-24
JP2017500607A (ja) 2017-01-05
ES2711547T3 (es) 2019-05-06
JP6634659B2 (ja) 2020-01-22
DE102013113283A1 (de) 2015-06-03
US10850551B2 (en) 2020-12-01
RS58357B2 (sr) 2022-06-30
EP3074239A1 (fr) 2016-10-05
CA2930911C (fr) 2021-12-28
US20170028765A1 (en) 2017-02-02

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