EP3127143A4 - Verfahren zum recycling von substraten und trägersubstraten - Google Patents
Verfahren zum recycling von substraten und trägersubstraten Download PDFInfo
- Publication number
- EP3127143A4 EP3127143A4 EP15773434.4A EP15773434A EP3127143A4 EP 3127143 A4 EP3127143 A4 EP 3127143A4 EP 15773434 A EP15773434 A EP 15773434A EP 3127143 A4 EP3127143 A4 EP 3127143A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- substrates
- methods
- recycling
- carrier
- carrier substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/813—Bodies having a plurality of light-emitting regions, e.g. multi-junction LEDs or light-emitting devices having photoluminescent regions within the bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/018—Bonding of wafers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0133—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
- H10H20/01335—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7426—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used as a support during build up manufacturing of active devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/744—Details of chemical or physical process used for separating the auxiliary support from a device or a wafer
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201461972575P | 2014-03-31 | 2014-03-31 | |
| PCT/SG2015/000048 WO2015152817A1 (en) | 2014-03-31 | 2015-02-16 | Methods of recycling substrates and carrier substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP3127143A1 EP3127143A1 (de) | 2017-02-08 |
| EP3127143A4 true EP3127143A4 (de) | 2017-11-29 |
Family
ID=54240965
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP15773434.4A Withdrawn EP3127143A4 (de) | 2014-03-31 | 2015-02-16 | Verfahren zum recycling von substraten und trägersubstraten |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP3127143A4 (de) |
| CN (1) | CN106463451B (de) |
| EA (1) | EA201691900A1 (de) |
| TW (1) | TW201601192A (de) |
| WO (1) | WO2015152817A1 (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7059518B2 (ja) * | 2017-04-03 | 2022-04-26 | 住友電気工業株式会社 | 半導体光素子を作製する方法 |
| CN109037263A (zh) * | 2017-06-09 | 2018-12-18 | 美商晶典有限公司 | 具有透光基材的微发光二极管显示模块及其制造方法 |
| CN109728142B (zh) * | 2017-10-31 | 2021-02-02 | 展晶科技(深圳)有限公司 | 发光二极管晶粒的制造方法 |
| GB2593698B (en) | 2020-03-30 | 2022-12-07 | Plessey Semiconductors Ltd | Monolithic electronic device |
| JP7531151B2 (ja) * | 2020-04-15 | 2024-08-09 | 国立大学法人東海国立大学機構 | 窒化ガリウム半導体装置の製造方法 |
| CN112967992B (zh) * | 2020-12-07 | 2022-09-23 | 重庆康佳光电技术研究院有限公司 | 外延结构的转移方法 |
| TWI741911B (zh) * | 2020-12-16 | 2021-10-01 | 環球晶圓股份有限公司 | 磊晶層去除方法 |
| CN112786762B (zh) * | 2021-01-04 | 2022-05-17 | 华灿光电(浙江)有限公司 | 发光二极管外延片及其制备方法 |
| CN113257971B (zh) * | 2021-06-30 | 2021-10-22 | 南昌凯捷半导体科技有限公司 | 一种红光mini-LED芯片的制作方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080038857A1 (en) * | 2006-08-11 | 2008-02-14 | Samsung Electro-Mechanics Co., Ltd | Method of manufacturing nitride-based semiconductor light-emitting device |
| US20090253249A1 (en) * | 2008-04-07 | 2009-10-08 | Sony Corporation | Method of manufacturing semiconductor device |
| US20120107962A1 (en) * | 2010-11-01 | 2012-05-03 | National Cheng Kung University | Method of fabricating epitaxial semiconductor devices |
| US20130048945A1 (en) * | 2011-08-22 | 2013-02-28 | Lextar Electronics Corporation | Light-emitting semiconductor structure and method for fabricating light-emitting diode device |
| US20130214284A1 (en) * | 2012-02-17 | 2013-08-22 | The Regents Of The University Of California | Method for the reuse of gallium nitride epitaxial substrates |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030189215A1 (en) * | 2002-04-09 | 2003-10-09 | Jong-Lam Lee | Method of fabricating vertical structure leds |
| US8236583B2 (en) * | 2008-09-10 | 2012-08-07 | Tsmc Solid State Lighting Ltd. | Method of separating light-emitting diode from a growth substrate |
| US8581229B2 (en) * | 2009-11-23 | 2013-11-12 | Koninklijke Philips N.V. | III-V light emitting device with thin n-type region |
| US7781242B1 (en) * | 2009-12-10 | 2010-08-24 | Walsin Lihwa Corporation | Method of forming vertical structure light emitting diode with heat exhaustion structure |
| WO2013004188A1 (zh) * | 2011-07-07 | 2013-01-10 | 厦门市三安光电科技有限公司 | 太阳能电池,系统,及其制作方法 |
-
2015
- 2015-02-16 EP EP15773434.4A patent/EP3127143A4/de not_active Withdrawn
- 2015-02-16 CN CN201580028692.3A patent/CN106463451B/zh not_active Expired - Fee Related
- 2015-02-16 WO PCT/SG2015/000048 patent/WO2015152817A1/en not_active Ceased
- 2015-02-16 EA EA201691900A patent/EA201691900A1/ru unknown
- 2015-03-10 TW TW104107540A patent/TW201601192A/zh unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080038857A1 (en) * | 2006-08-11 | 2008-02-14 | Samsung Electro-Mechanics Co., Ltd | Method of manufacturing nitride-based semiconductor light-emitting device |
| US20090253249A1 (en) * | 2008-04-07 | 2009-10-08 | Sony Corporation | Method of manufacturing semiconductor device |
| US20120107962A1 (en) * | 2010-11-01 | 2012-05-03 | National Cheng Kung University | Method of fabricating epitaxial semiconductor devices |
| US20130048945A1 (en) * | 2011-08-22 | 2013-02-28 | Lextar Electronics Corporation | Light-emitting semiconductor structure and method for fabricating light-emitting diode device |
| US20130214284A1 (en) * | 2012-02-17 | 2013-08-22 | The Regents Of The University Of California | Method for the reuse of gallium nitride epitaxial substrates |
Non-Patent Citations (1)
| Title |
|---|
| See also references of WO2015152817A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| EA201691900A1 (ru) | 2017-05-31 |
| CN106463451B (zh) | 2019-07-16 |
| WO2015152817A1 (en) | 2015-10-08 |
| CN106463451A (zh) | 2017-02-22 |
| EP3127143A1 (de) | 2017-02-08 |
| TW201601192A (zh) | 2016-01-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| 17P | Request for examination filed |
Effective date: 20161019 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
| AX | Request for extension of the european patent |
Extension state: BA ME |
|
| DAX | Request for extension of the european patent (deleted) | ||
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: H01L 33/08 20100101ALI20170724BHEP Ipc: H01L 21/77 20170101ALI20170724BHEP Ipc: H01L 33/00 20100101ALI20170724BHEP Ipc: H01L 21/683 20060101ALI20170724BHEP Ipc: H01L 21/64 20060101ALI20170724BHEP Ipc: H01L 21/02 20060101AFI20170724BHEP |
|
| A4 | Supplementary search report drawn up and despatched |
Effective date: 20171030 |
|
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: H01L 21/77 20170101ALI20171024BHEP Ipc: H01L 33/00 20100101ALI20171024BHEP Ipc: H01L 21/64 20060101ALI20171024BHEP Ipc: H01L 21/02 20060101AFI20171024BHEP Ipc: H01L 21/683 20060101ALI20171024BHEP Ipc: H01L 33/08 20100101ALI20171024BHEP |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
| 18W | Application withdrawn |
Effective date: 20190409 |