EP3178969A4 - Kupfer-zinn-legierungsplattierungsbad - Google Patents

Kupfer-zinn-legierungsplattierungsbad Download PDF

Info

Publication number
EP3178969A4
EP3178969A4 EP15829133.6A EP15829133A EP3178969A4 EP 3178969 A4 EP3178969 A4 EP 3178969A4 EP 15829133 A EP15829133 A EP 15829133A EP 3178969 A4 EP3178969 A4 EP 3178969A4
Authority
EP
European Patent Office
Prior art keywords
copper
plating bath
alloy plating
tin alloy
tin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP15829133.6A
Other languages
English (en)
French (fr)
Other versions
EP3178969B1 (de
EP3178969A1 (de
Inventor
Takamitsu TSUJIMOTO
Toshimitsu Nagao
Kenji Hara
Junichi Katayama
Kuniaki Otsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Okuno Chemical Industries Co Ltd
Original Assignee
Okuno Chemical Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Okuno Chemical Industries Co Ltd filed Critical Okuno Chemical Industries Co Ltd
Publication of EP3178969A1 publication Critical patent/EP3178969A1/de
Publication of EP3178969A4 publication Critical patent/EP3178969A4/de
Application granted granted Critical
Publication of EP3178969B1 publication Critical patent/EP3178969B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/58Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/02Alloys based on copper with tin as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/60Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
EP15829133.6A 2014-08-08 2015-07-28 Kupfer-zinn-legierungsplattierungsbad Active EP3178969B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014162294 2014-08-08
PCT/JP2015/071330 WO2016021439A1 (ja) 2014-08-08 2015-07-28 銅-スズ合金めっき浴

Publications (3)

Publication Number Publication Date
EP3178969A1 EP3178969A1 (de) 2017-06-14
EP3178969A4 true EP3178969A4 (de) 2017-12-27
EP3178969B1 EP3178969B1 (de) 2020-01-01

Family

ID=55263710

Family Applications (1)

Application Number Title Priority Date Filing Date
EP15829133.6A Active EP3178969B1 (de) 2014-08-08 2015-07-28 Kupfer-zinn-legierungsplattierungsbad

Country Status (7)

Country Link
US (1) US20170204528A1 (de)
EP (1) EP3178969B1 (de)
JP (1) JP6048712B2 (de)
CN (1) CN106661752B (de)
CA (1) CA2957587C (de)
TW (1) TWI641729B (de)
WO (1) WO2016021439A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019052355A (ja) * 2017-09-15 2019-04-04 上村工業株式会社 電解Sn又はSn合金めっき液及びSn又はSn合金めっき物の製造方法
JP6645609B2 (ja) * 2018-07-27 2020-02-14 三菱マテリアル株式会社 錫合金めっき液
CN110205659B (zh) * 2019-07-17 2020-06-16 广州三孚新材料科技股份有限公司 一种电镀锡添加剂及其制备方法
CN120485893A (zh) * 2025-06-18 2025-08-15 东强(连州)铜箔有限公司 一种超高精细化pcb用高强度vlp铜箔及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040035714A1 (en) * 2000-09-20 2004-02-26 Michael Dietterle Electrolyte and method for depositing tin-copper alloy layers
EP1591563A1 (de) * 2003-01-24 2005-11-02 Ishihara Chemical Co., Ltd. Zinnhaltiges metallabscheidungsbad
US20050263403A1 (en) * 2002-10-11 2005-12-01 Enthone Inc. Method for electrodeposition of bronzes
US20100216302A1 (en) * 2008-12-31 2010-08-26 Rohm And Haas Electronics Materials Llc Lead-free tin alloy electroplating compositions and methods

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3871013B2 (ja) * 1998-11-05 2007-01-24 上村工業株式会社 錫−銅合金電気めっき浴及びそれを使用するめっき方法
EP1408141B1 (de) * 2002-10-11 2014-12-17 Enthone Inc. Verfahren und Elektrolyt zur galvanischen Abscheidung von Bronzen
JP5419021B2 (ja) * 2008-11-11 2014-02-19 ユケン工業株式会社 ジンケート型亜鉛めっき浴
JP5313773B2 (ja) * 2009-06-04 2013-10-09 三菱伸銅株式会社 めっき付き銅条材及びその製造方法
JP6133056B2 (ja) * 2012-12-27 2017-05-24 ローム・アンド・ハース電子材料株式会社 スズまたはスズ合金めっき液

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040035714A1 (en) * 2000-09-20 2004-02-26 Michael Dietterle Electrolyte and method for depositing tin-copper alloy layers
US20050263403A1 (en) * 2002-10-11 2005-12-01 Enthone Inc. Method for electrodeposition of bronzes
EP1591563A1 (de) * 2003-01-24 2005-11-02 Ishihara Chemical Co., Ltd. Zinnhaltiges metallabscheidungsbad
US20100216302A1 (en) * 2008-12-31 2010-08-26 Rohm And Haas Electronics Materials Llc Lead-free tin alloy electroplating compositions and methods

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2016021439A1 *

Also Published As

Publication number Publication date
WO2016021439A1 (ja) 2016-02-11
JP6048712B2 (ja) 2016-12-21
CA2957587C (en) 2019-03-05
JPWO2016021439A1 (ja) 2017-04-27
HK1232261A1 (zh) 2018-01-05
TWI641729B (zh) 2018-11-21
CN106661752A (zh) 2017-05-10
CN106661752B (zh) 2021-08-10
EP3178969B1 (de) 2020-01-01
EP3178969A1 (de) 2017-06-14
TW201612362A (en) 2016-04-01
US20170204528A1 (en) 2017-07-20
CA2957587A1 (en) 2016-02-11

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