EP3465182A4 - Procédé et appareil de microscopie à rayons x - Google Patents
Procédé et appareil de microscopie à rayons x Download PDFInfo
- Publication number
- EP3465182A4 EP3465182A4 EP17810765.2A EP17810765A EP3465182A4 EP 3465182 A4 EP3465182 A4 EP 3465182A4 EP 17810765 A EP17810765 A EP 17810765A EP 3465182 A4 EP3465182 A4 EP 3465182A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- ray microscopy
- microscopy
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
- G01N23/041—Phase-contrast imaging, e.g. using grating interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/201—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring small-angle scattering
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
- G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K7/00—Gamma- or X-ray microscopes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
- G01N2223/6116—Specific applications or type of materials patterned objects; electronic devices semiconductor wafer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
- G01N23/044—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material using laminography or tomosynthesis
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
- G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analytical Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/173,711 US10401309B2 (en) | 2014-05-15 | 2016-06-05 | X-ray techniques using structured illumination |
| US201662401164P | 2016-09-28 | 2016-09-28 | |
| US201662429587P | 2016-12-02 | 2016-12-02 | |
| US201662429760P | 2016-12-03 | 2016-12-03 | |
| US201762485916P | 2017-04-15 | 2017-04-15 | |
| US15/605,957 US10352880B2 (en) | 2015-04-29 | 2017-05-26 | Method and apparatus for x-ray microscopy |
| PCT/US2017/035800 WO2017213996A1 (fr) | 2016-06-05 | 2017-06-02 | Procédé et appareil de microscopie à rayons x |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP3465182A1 EP3465182A1 (fr) | 2019-04-10 |
| EP3465182A4 true EP3465182A4 (fr) | 2020-03-18 |
Family
ID=60578901
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP17810765.2A Withdrawn EP3465182A4 (fr) | 2016-06-05 | 2017-06-02 | Procédé et appareil de microscopie à rayons x |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP3465182A4 (fr) |
| JP (1) | JP6775035B2 (fr) |
| KR (1) | KR20190015531A (fr) |
| CN (1) | CN109564176A (fr) |
| WO (1) | WO2017213996A1 (fr) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150117599A1 (en) | 2013-10-31 | 2015-04-30 | Sigray, Inc. | X-ray interferometric imaging system |
| US10297359B2 (en) | 2013-09-19 | 2019-05-21 | Sigray, Inc. | X-ray illumination system with multiple target microstructures |
| US10269528B2 (en) | 2013-09-19 | 2019-04-23 | Sigray, Inc. | Diverging X-ray sources using linear accumulation |
| US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
| US10304580B2 (en) | 2013-10-31 | 2019-05-28 | Sigray, Inc. | Talbot X-ray microscope |
| USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
| US10401309B2 (en) | 2014-05-15 | 2019-09-03 | Sigray, Inc. | X-ray techniques using structured illumination |
| US10352880B2 (en) | 2015-04-29 | 2019-07-16 | Sigray, Inc. | Method and apparatus for x-ray microscopy |
| US10295486B2 (en) | 2015-08-18 | 2019-05-21 | Sigray, Inc. | Detector for X-rays with high spatial and high spectral resolution |
| US10247683B2 (en) | 2016-12-03 | 2019-04-02 | Sigray, Inc. | Material measurement techniques using multiple X-ray micro-beams |
| WO2018175570A1 (fr) | 2017-03-22 | 2018-09-27 | Sigray, Inc. | Procédé de réalisation d'une spectroscopie des rayons x et système de spectromètre d'absorption de rayons x |
| US10578566B2 (en) | 2018-04-03 | 2020-03-03 | Sigray, Inc. | X-ray emission spectrometer system |
| AU2018425050B2 (en) * | 2018-05-25 | 2024-01-11 | Micro-X Limited | A device for applying beamforming signal processing to RF modulated X-rays |
| US10845491B2 (en) | 2018-06-04 | 2020-11-24 | Sigray, Inc. | Energy-resolving x-ray detection system |
| GB2591630B (en) | 2018-07-26 | 2023-05-24 | Sigray Inc | High brightness x-ray reflection source |
| US10656105B2 (en) | 2018-08-06 | 2020-05-19 | Sigray, Inc. | Talbot-lau x-ray source and interferometric system |
| US10962491B2 (en) | 2018-09-04 | 2021-03-30 | Sigray, Inc. | System and method for x-ray fluorescence with filtering |
| DE112019004478T5 (de) | 2018-09-07 | 2021-07-08 | Sigray, Inc. | System und verfahren zur röntgenanalyse mit wählbarer tiefe |
| JP7225432B2 (ja) * | 2019-04-18 | 2023-02-20 | プリズマティック、センサーズ、アクチボラグ | 医療用透過ｘ線撮影におけるｘ線の操作に使用されるインラインｘ線集束光学系 |
| US11733182B2 (en) * | 2019-12-20 | 2023-08-22 | Varex Imaging Corporation | Radiographic inspection system for pipes and other structures using radioisotopes |
| CN111221025B (zh) * | 2020-01-21 | 2021-08-24 | 中国工程物理研究院流体物理研究所 | 一种用丝阵作为阴极的探测器及使用方法及标定方法 |
| US11175243B1 (en) | 2020-02-06 | 2021-11-16 | Sigray, Inc. | X-ray dark-field in-line inspection for semiconductor samples |
| CN115667896B (zh) | 2020-05-18 | 2024-06-21 | 斯格瑞公司 | 使用晶体分析器和多个检测元件的x射线吸收光谱的系统和方法 |
| JP7640682B2 (ja) | 2020-09-17 | 2025-03-05 | シグレイ、インコーポレイテッド | Ｘ線を用いた深さ分解計測および分析のためのシステムおよび方法 |
| CN112268914B (zh) * | 2020-12-07 | 2021-04-30 | 西安稀有金属材料研究院有限公司 | 一种全尺寸核燃料包壳管元件耐事故涂层的无损检测方法 |
| KR102927910B1 (ko) | 2020-12-07 | 2026-02-19 | 시그레이, 아이엔씨. | 투과 x-선 소스를 이용한 고처리량 3D x-선 이미징 시스템 |
| US12480892B2 (en) | 2020-12-07 | 2025-11-25 | Sigray, Inc. | High throughput 3D x-ray imaging system using a transmission x-ray source |
| US12360067B2 (en) | 2022-03-02 | 2025-07-15 | Sigray, Inc. | X-ray fluorescence system and x-ray source with electrically insulative target material |
| DE112023001408T5 (de) | 2022-03-15 | 2025-02-13 | Sigray, Inc. | System und verfahren für die kompakte laminographie unter verwendung einer mikrofokus-transmissionsröntgenquelle und eines röntgendetektors mit variabler vergrösserung |
| DE112023002079T5 (de) | 2022-05-02 | 2025-02-27 | Sigray, Inc. | Sequenzielles wellenlängendispersives röntgenspektrometer |
| WO2024173256A1 (fr) | 2023-02-16 | 2024-08-22 | Sigray, Inc. | Système détecteur de rayons x avec au moins deux diffracteurs de bragg plats empilés |
| US12181423B1 (en) | 2023-09-07 | 2024-12-31 | Sigray, Inc. | Secondary image removal using high resolution x-ray transmission sources |
| WO2025101530A1 (fr) | 2023-11-07 | 2025-05-15 | Sigray, Inc. | Système et procédé de spectroscopie d'absorption des rayons x utilisant des informations spectrales provenant de deux plans orthogonaux |
| KR20250074077A (ko) * | 2023-11-20 | 2025-05-27 | 한국전기연구원 | 공간 분할 x-선을 형성하기 위한 x-선 타겟, 그것을 갖는 타겟 모듈 및 그것을 갖는 방사선 치료기 |
| WO2025151383A1 (fr) | 2024-01-08 | 2025-07-17 | Sigray, Inc. | Système d'analyse par rayons x à faisceau de rayons x focalisé et à microscope non à rayons x |
| WO2025155719A1 (fr) | 2024-01-18 | 2025-07-24 | Sigray, Inc. | Réseau séquentiel de détecteurs d'imagerie par rayons x |
| WO2025174966A1 (fr) | 2024-02-15 | 2025-08-21 | Sigray, Inc. | Système et procédé de génération d'un faisceau de rayons x focalisé |
| TWI906841B (zh) * | 2024-04-26 | 2025-12-01 | 奈視科技股份有限公司 | 應用多重x射線束的x射線反射分析系統 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100260315A1 (en) * | 2009-04-10 | 2010-10-14 | Canon Kabushiki Kaisha | Source grating for talbot-lau-type interferometer |
| US20150117599A1 (en) * | 2013-10-31 | 2015-04-30 | Sigray, Inc. | X-ray interferometric imaging system |
| WO2015168473A1 (fr) * | 2014-05-01 | 2015-11-05 | Sigray, Inc. | Système d'imagerie interférométrique à rayons x |
| WO2015176023A1 (fr) * | 2014-05-15 | 2015-11-19 | Sigray, Inc. | Procédé au rayons x pour la mesure, la caractérisation et l'analyse de structures periodiques |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3512874B2 (ja) * | 1993-11-26 | 2004-03-31 | 株式会社東芝 | Ｘ線コンピュータ断層撮影装置 |
| US5513237A (en) * | 1993-11-26 | 1996-04-30 | Kabushiki Kaisha Toshiba | Computerized tomography apparatus |
| US7103138B2 (en) * | 2004-08-24 | 2006-09-05 | The Board Of Trustees Of The Leland Stanford Junior University | Sampling in volumetric computed tomography |
| JP4614001B2 (ja) * | 2006-04-13 | 2011-01-19 | 株式会社島津製作所 | 透過ｘ線を用いた三次元定量方法 |
| CN101563628A (zh) * | 2006-12-22 | 2009-10-21 | 皇家飞利浦电子股份有限公司 | 能量分辨探测系统和成像系统 |
| US7924977B2 (en) * | 2008-03-07 | 2011-04-12 | Morpho Detection, Inc. | Methods, a processor, and a system for improving an accuracy of identification of a substance |
| JP6036321B2 (ja) * | 2012-03-23 | 2016-11-30 | 株式会社リガク | Ｘ線複合装置 |
| US9129715B2 (en) * | 2012-09-05 | 2015-09-08 | SVXR, Inc. | High speed x-ray inspection microscope |
| JP2015072263A (ja) * | 2013-09-09 | 2015-04-16 | キヤノン株式会社 | Ｘ線撮像システム |
| US9449781B2 (en) * | 2013-12-05 | 2016-09-20 | Sigray, Inc. | X-ray illuminators with high flux and high flux density |
| US9390881B2 (en) * | 2013-09-19 | 2016-07-12 | Sigray, Inc. | X-ray sources using linear accumulation |
| US9874531B2 (en) * | 2013-10-31 | 2018-01-23 | Sigray, Inc. | X-ray method for the measurement, characterization, and analysis of periodic structures |
| US9719947B2 (en) * | 2013-10-31 | 2017-08-01 | Sigray, Inc. | X-ray interferometric imaging system |
| US9594036B2 (en) * | 2014-02-28 | 2017-03-14 | Sigray, Inc. | X-ray surface analysis and measurement apparatus |
| EP3139836B1 (fr) * | 2014-05-09 | 2021-07-07 | The Johns Hopkins University | Système et procédé d'imagerie par contraste de phase des rayons x |
-
2017
- 2017-06-02 JP JP2018563587A patent/JP6775035B2/ja active Active
- 2017-06-02 KR KR1020197000360A patent/KR20190015531A/ko not_active Ceased
- 2017-06-02 CN CN201780045768.2A patent/CN109564176A/zh active Pending
- 2017-06-02 EP EP17810765.2A patent/EP3465182A4/fr not_active Withdrawn
- 2017-06-02 WO PCT/US2017/035800 patent/WO2017213996A1/fr not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100260315A1 (en) * | 2009-04-10 | 2010-10-14 | Canon Kabushiki Kaisha | Source grating for talbot-lau-type interferometer |
| US20150117599A1 (en) * | 2013-10-31 | 2015-04-30 | Sigray, Inc. | X-ray interferometric imaging system |
| WO2015168473A1 (fr) * | 2014-05-01 | 2015-11-05 | Sigray, Inc. | Système d'imagerie interférométrique à rayons x |
| WO2015176023A1 (fr) * | 2014-05-15 | 2015-11-19 | Sigray, Inc. | Procédé au rayons x pour la mesure, la caractérisation et l'analyse de structures periodiques |
Non-Patent Citations (1)
| Title |
|---|
| See also references of WO2017213996A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6775035B2 (ja) | 2020-10-28 |
| EP3465182A1 (fr) | 2019-04-10 |
| CN109564176A (zh) | 2019-04-02 |
| JP2019523871A (ja) | 2019-08-29 |
| WO2017213996A1 (fr) | 2017-12-14 |
| KR20190015531A (ko) | 2019-02-13 |
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Ipc: G21K 1/02 20060101ALI20200211BHEP Ipc: G21K 1/06 20060101ALI20200211BHEP Ipc: G01N 23/04 20180101AFI20200211BHEP Ipc: G21K 7/00 20060101ALI20200211BHEP Ipc: G01N 23/201 20180101ALN20200211BHEP |
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