EP4355752A1 - Verfahren zur herstellung von organozinnverbindungen - Google Patents
Verfahren zur herstellung von organozinnverbindungenInfo
- Publication number
- EP4355752A1 EP4355752A1 EP22825891.9A EP22825891A EP4355752A1 EP 4355752 A1 EP4355752 A1 EP 4355752A1 EP 22825891 A EP22825891 A EP 22825891A EP 4355752 A1 EP4355752 A1 EP 4355752A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- formula
- compound
- group
- alkyl
- chosen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/22—Tin compounds
- C07F7/2208—Compounds having tin linked only to carbon, hydrogen and/or halogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/22—Tin compounds
- C07F7/2284—Compounds with one or more Sn-N linkages
Definitions
- This invention belongs to the field of organotin chemistry, and, in particular, relates to a facile process for preparing certain organotin intermediates.
- Background [0002] Certain organotin compounds have been shown to be useful in the deposition of highly pure tin (IV) oxide in applications such as extreme ultraviolet (EUV) lithography techniques used in the manufacture of certain microelectronic devices.
- EUV extreme ultraviolet
- organotin compounds having a combination of alkylamino groups (or alkoxy groups) and alkyl groups which are useful as liquid precursors in the deposition of tin-containing films onto microelectronic device substrates.
- the process of the invention can be used to prepare isopropyltriphenyl tin, which can then be reacted with tin tetrachloride, followed by dimethylamine and lithium dimethylamide, to afford tris(dimethylamido)isopropyl tin.
- Figure 1 is a 1 H-NMR of the Ph3Sn-iPr (isopropyl triphenyl tin) of Example 1, recorded in CDCl3.
- Figure 2 is a 119 Sn-NMR of the Ph 3 Sn-iPr of Example 1, recorded in CDCl 3 .
- Figure 3 is a 119 Sn-NMR of the iPrSnI3 of Example 2, recorded in 2-Iodopropane.
- the singular forms “a”, “an”, and “the” include plural referents unless the content clearly dictates otherwise.
- the term “or” is generally employed in its sense including “and/or” unless the content clearly dictates otherwise.
- the term “about” generally refers to a range of numbers that is considered equivalent to the recited value (e.g., having the same function or result). In many instances, the term “about” may include numbers that are rounded to the nearest significant figure.
- the present disclosure provides a process for preparing a compound of Formula (I): (Q)3SnR (I), wherein Q is chosen from (a) phenyl, (b) a group of the formula (C1-C12 alkyl)2N-, (c) a group of the formula (C 1 -C 12 alkyl-O)-; and (d) a halide (F, Cl, Br, I) and wherein R is a C1-C12 alkyl group, the process comprising combining a compound of the formula SnX2, wherein X is chosen from fluoro, chloro, bromo, and iodo, with a molar excess of a compound of the formula Q- M, wherein M is chosen from Li, Na, and K,
- Q is chosen from (a), (b), or (c).
- the compound of the formula Q-M is generally added slowly (while controlling the resulting exothermic reaction) to a reaction mixture comprising a dihalo tin compound (SnX 2 ) and an aprotic solvent, for example an ether such as tetrahydrofuran, diethyl ether, di-n-butyl ether, dimethoxyethane, and the like to form a compound of the formula Q3SnM.
- a molar excess of the compound of the formula Q-M is utilized, based on the starting amount of the compound of the formula SnX2.
- the reaction mixture can be heated to a temperature above ambient temperature, for example about 40°C to 80°C, or about 55°C to 65°C, for a period of time sufficient to ensure complete reaction of these two species.
- a generally equimolar amount of a compound of the formula R-X is added to the reaction mixture, which then affords the desired product of Formula (I).
- the compound of the formula R-X is added in about 0.7 to about 1.3 molar equivalents, such as about 0.8 to about 1.2 molar equivalents or about 0.9 to about 1.1 molar equivalents, based on the amount of starting material of the formula SnX2.
- Q is chosen from (d).
- a compound of the formula Q-M is added to a dihalo tin compound (SnX2) in a ratio of from 1.2:1 to 1:1.2, such as a ratio of from 1.1:1 to 1:1.2, and preferably in a 1:1 ratio, wherein Q is a halide.
- the reaction mixture can be heated to a temperature above ambient temperature, for example about 180°C to 220°C, for a period of time sufficient to ensure complete reaction to form a compound having the formula Q3SnM.
- a general excess of R-X is added to the reaction mixture.
- the reaction mixture can be heated to a temperature above ambient temperature, for example about 90°C to 140°C, for a period of time sufficient to ensure complete reaction of these species, which then affords the desired product of Formula (I), wherein Q is a halide.
- the compound of the formula R-X is added in about 4 to about 8 molar equivalents, based on the amount of starting material of the formula SnX2.
- R can be chosen from C 1 -C 12 alkyl groups, which can be straight or branched-chain alkyl groups such as methyl, ethyl, propyl, butyl, isopropyl, isobutyl, sec- butyl, etc.
- R can be a cyclic C 1 -C 5 group such as a cyclopropyl group.
- R may be an unsaturated C 1 -C 5 group such as a vinyl group or an acetylenyl group.
- R may be an alkylether group, wherein the alkyl portion is a C 1 -C 5 alkyl group.
- X is chosen from chloro or bromo.
- the reactant of the formula R-X in one embodiment, can be 2-bromopropane or 2-chloropropane.
- Compounds of Formula (I), such as wherein Q is phenyl, a group of the formula (C 1 - C12 alkyl)2N-, or a group of the formula C 1 -C 12 alkyl-O-, are useful as intermediates in the synthesis of certain dialkylamido organotin precursor compounds, which compounds are useful in the vapor deposition of tin-containing films onto a surface of a microelectronic device.
- the compound of Formula (I) is isopropyl triphenyltin.
- the invention provides a process for preparing a compound of the formula , wherein R 1 is C 1 -C 6 alkyl, which comprises contacting a compound of the formula SnX 2 , wherein X is chloro or bromo, with a molar excess of a compound of the formula (Ph)Li, wherein Ph is phenyl, followed by addition of a compound of the formula R 1 X.
- R 1 is isopropyl and X is chloro.
- the compounds of Formula (I), such as wherein Q is phenyl, a group of the formula (C 1 -C 12 alkyl)2N-, a group of the formula C 1 -C 12 alkyl-O-, or a halide such as F, Cl, Br, or I, are useful as intermediates in the formation of dialkylamido alkyl tin compounds.
- the disclosure provides a process for preparing a compound of Formula (II): (II), wherein R is a C 1 -C 12 alkyl group and R 2 is a C 1 -C 12 alkyl group, which comprises (a) contacting a compound of the formula SnX 2 , wherein X is chosen from fluoro, chloro, bromo, and iodo, with a molar excess of a compound of the formula Q-M, wherein M is chosen from Li, Na, and K, and Q is phenyl, a group of the formula (C 1 -C 12 alkyl)2N-, or a group of the formula C 1 -C 12 alkyl-O-, (b) adding a compound of the formula R-X, wherein R is a C 1 -C 12 alkyl group, to afford a compound of the formula (Q)3SnR, (c) reacting with a tin (IV) halide to afford an
- steps (a) and (b) are analogous to those recited above in the first aspect.
- a compound such as [phenyl]3Sn-[isopropyl] may be formed by combining a tin (II) dihalide, such as SnCl 2 , and (Ph)Li, and further combining with an isopropyl halide.
- the resulting [phenyl]3Sn-[isopropyl] may be further reacted with a tin (IV) halide such as SnCl 4 , to afford a trihalotin intermediate, such as isopropyltin trichloride, which can then be reacted with a dialkylamine of the formula (R 2 ) 2 NH, such as dimethylamine, and a compound of the formula (R 2 )2N-M, such as lithium dimethylamide, to provide a compound of the Formula (IIa): [0020]
- the disclosure also provides a process for preparing a compound of Formula (II), wherein R is a C 1 -C 12 alkyl group and R 2 is a C 1 -C 12 alkyl group, which comprises (a) contacting a compound of the formula SnX2, wherein X is chosen from fluoro, chloro, bromo, and iodo, with a compound of the formula Q-M, wherein
- an alkyl tin trihalide such as isopropyl tin trichloride
- M-X metal halide
- SnX2 tin (II) halide
- R- X alkyl halide
- Q 3 SnR such as [chloro]3Sn-[isopropyl].
- Q is a group of the formula (C 1 -C 4 alkyl) 2 N-, and is chosen from groups of the formulae: a. (CH3)2N- ; b. (CH 3 CH 2 ) 2 N- ; c. (n-propyl)2N- ; d. (isopropyl)2N- ; e. (tert-butyl) 2 N- ; f.
- R is a group of the formula C 1 -C 4 alkyl-O-, and is chosen from groups of the formulae: a. CH3O- ; b. CH3CH2O- ; a. n-propyl-O- ; b. isopropyl-O- ; c. tert-butyl-O- ; d. sec-butyl-O- ; and e. n-butyl-O- .
- the solvent was removed from the reaction under reduced pressure and the resulting tacky yellow mixture was brought out of the glovebox and placed in a fume hood.
- the product was dissolved in dichloromethane ( ⁇ 50 mL) and washed with DI H 2 O (3 x 100 mL) in a separatory funnel. After the third water washing, the combined organic layers were dried with MgSO4, filtered through a disposable polyethylene filter frit, and the resulting peach/yellow solution dried under reduced pressure to yield a pale yellow solid: 20.2g (65.7%).
- Example 2 Synthesis of isopropylTin triiodide (iPrSnI3) [0027]
- KCl (1.93g, 26.0 mmol) and SnCl2 (5g, 26.0 mmol) were combined in a 40 mL vial equipped with a magnetic stir bar and heated at 195 °C, whereby, after heating for one hour the reaction presented as a light-yellow liquid.
- the mixture was cooled to room temperature, solidifying into a white solid.
- 2-iodopropane (26.5g, 156 mmol) was added to the reaction and the mixture stirred at 125°C for 12 hours, at which time, the reaction presented as a yellow/orange mixture.
- the disclosure provides a process for preparing a compound of Formula (I): (Q) 3 SnR (I), wherein Q is chosen from (a) phenyl, (b) a group of the formula (C 1 -C 12 alkyl)2N-, (c) a group of the formula C 1 -C 12 alkyl-O-; and (d) a halide, and wherein R is a C 1 -C 12 alkyl group, the process comprising contacting a compound of the formula SnX 2 , wherein X is chosen from fluoro, chloro, bromo, and iodo, with a molar excess of a compound of the formula Q- M, wherein M is chosen from Li, Na, and K, followed by combining with a compound of the formula R-X.
- the disclosure provides the process of the first aspect, wherein Q is phenyl, a group of the formula (C 1 -C 12 alkyl)2N-, or a group of the formula C 1 -C 12 alkyl- O- [0031]
- the disclosure provides the process of the first or second aspect, wherein M is Li.
- the disclosure provides the process of any of the first through third aspects, wherein R is a methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl, sec-butyl, n-pentyl, isopentyl, or sec-pentyl group.
- the disclosure provides the process of any of the first through fourth aspects, wherein R is a cyclic C 1 -C 5 group.
- the disclosure provides the process of any one of the first through fourth aspects, wherein R is a vinyl group or an acetylenyl group.
- the disclosure provides the process of any one of the first through the fourth aspects, wherein R is further substituted with one or more halogen groups or ether groups.
- the disclosure provides the process of any of the first through fourth, aspects, wherein R is a perfluorinated C 1 -C 5 group.
- the disclosure provides the process of any of the first through fourth aspects, wherein R is an alkylether group having an alkyl portion that is a C 1 -C 5 group.
- R is an alkylether group having an alkyl portion that is a C 1 -C 5 group.
- the disclosure provides the process of any of the second through ninth aspects, wherein the molar excess of the compound of the formula Q-M is about 2.7 to about 3.3, based on the amount of the compound of the formula SnX 2 .
- the disclosure provides the process of any of the first through tenth aspects, herein Q is phenyl, X is chloro, R is isopropyl, and M is lithium.
- the disclosure provides the process of any of the first through eleventh aspects, wherein the compound of Formula (I) is wherein R 1 is C 1 -C 6 alkyl. [0041] In a thirteenth aspect, the disclosure provides the process of the twelfth aspect, wherein R 1 is isopropyl and X is chloro. [0042] In a fourteenth aspect, the disclosure provides a process of the first aspect, wherein Q is a halide.
- the disclosure provides a process of the fourteenth aspect, wherein the compound of the compound of formula Q-M and the compound of the formula SnX 2 are combined in a ratio of from 1.2:1 to 1:1.2
- the disclosure provides a process for preparing a compound of Formula (II): (II), wherein R is a C 1 -C 12 alkyl group and R 2 is a C 1 -C 12 alkyl group, wherein the process comprises (a) contacting a compound of the formula SnX 2 , wherein X is chosen from fluoro, chloro, bromo, and iodo, with a molar excess of a compound of the formula Q-M, wherein M is chosen from Li, Na, and K, and Q is phenyl, a group of the formula (C 1 -C 12 alkyl) 2 N-, or a group of the formula C 1 -C 12 alkyl-O-,
- the disclosure provides the process of the sixteenth aspect, comprising (a) contacting a compound of the formula SnX2, wherein X is chosen from fluoro, chloro, bromo, and iodo, with a molar excess of a compound of the formula Q-M, wherein M is chosen from Li, Na, and K, and Q is phenyl, a group of the formula (C 1 -C 12 alkyl) 2 N-, or a group of the formula C 1 -C 12 alkyl-O-, (b) adding a compound of the formula R-X, wherein R is a C 1 -C 12 alkyl group, to afford a compound of the formula (Q)3SnR, (c) reacting with a tin (IV) halide to afford an alkyl trihalotin, and (d) reacting with a compound of the formula (R 2 )2NH and with a compound of the formula (R 2 )2N-M
- the disclosure provides the process of the sixteenth aspect, comprising (a) contacting a compound of the formula SnX2, wherein X is chosen from fluoro, chloro, bromo, and iodo, with a compound of the formula Q-M, wherein M is chosen from Li, Na, and K, and Q is a halide, (b) adding a compound of the formula R-X, wherein R is a C 1 -C 12 alkyl group; to afford a compound of the formula (Q)3SnR, and (c) reacting with a compound of the formula (R 2 ) 2 NH and with a compound of the formula (R 2 )2N-M.
- the disclosure provides the process of any of the sixteenth through eighteenth aspects, wherein the compound of Formula (II) is .
- the disclosure provides a compound having the formula (Q) 3 SnR, wherein Q is phenyl and wherein R is selected from the group consisting of: a methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl, sec-butyl, n-pentyl, isopentyl, or sec-pentyl group, a cyclic C 1 -C 5 group, a vinyl group or an acetylenyl group.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163212251P | 2021-06-18 | 2021-06-18 | |
| PCT/US2022/033954 WO2022266421A1 (en) | 2021-06-18 | 2022-06-17 | Process for preparing organotin compounds |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP4355752A1 true EP4355752A1 (de) | 2024-04-24 |
| EP4355752A4 EP4355752A4 (de) | 2025-07-09 |
Family
ID=84490012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP22825891.9A Pending EP4355752A4 (de) | 2021-06-18 | 2022-06-17 | Verfahren zur herstellung von organozinnverbindungen |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US20220402945A1 (de) |
| EP (1) | EP4355752A4 (de) |
| JP (1) | JP2024522233A (de) |
| KR (1) | KR20240021947A (de) |
| CN (1) | CN117651708A (de) |
| TW (1) | TWI882232B (de) |
| WO (1) | WO2022266421A1 (de) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115768777A (zh) * | 2020-07-03 | 2023-03-07 | 恩特格里斯公司 | 制备有机锡化合物的方法 |
| US11697660B2 (en) * | 2021-01-29 | 2023-07-11 | Entegris, Inc. | Process for preparing organotin compounds |
| US11827659B2 (en) * | 2022-03-31 | 2023-11-28 | Feng Lu | Organometallic tin compounds as EUV photoresist |
| WO2023235534A1 (en) * | 2022-06-02 | 2023-12-07 | Gelest, Inc. | High purity alkyl tin compounds and manufacturing methods thereof |
| EP4568977A1 (de) | 2022-08-12 | 2025-06-18 | Gelest, Inc. | Hochreine zinnverbindungen mit ungesättigtem substituenten und verfahren zu ihrer herstellung |
| US12606577B2 (en) | 2022-09-28 | 2026-04-21 | Gelest, Inc. | Iodoalkyl tin compounds and preparation methods thereof |
| CN119998302A (zh) | 2022-10-04 | 2025-05-13 | 盖列斯特有限公司 | 环状氮杂锡烷和环状氧杂锡烷化合物及其制备方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102952227B1 (ko) * | 2014-10-23 | 2026-04-13 | 인프리아 코포레이션 | 유기 금속 용액 기반의 고해상도 패터닝 조성물 및 상응하는 방법 |
| KR102508142B1 (ko) * | 2015-10-13 | 2023-03-08 | 인프리아 코포레이션 | 유기주석 옥사이드 하이드록사이드 패터닝 조성물, 전구체 및 패터닝 |
| CA2975104A1 (en) * | 2017-08-02 | 2019-02-02 | Seastar Chemicals Inc. | Organometallic compounds and methods for the deposition of high purity tin oxide |
| US10787466B2 (en) * | 2018-04-11 | 2020-09-29 | Inpria Corporation | Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods |
| KR20200144580A (ko) * | 2018-05-11 | 2020-12-29 | 램 리써치 코포레이션 | Euv 패터닝 가능한 하드 마스크들을 제조하기 위한 방법들 |
| US11092889B2 (en) * | 2018-07-31 | 2021-08-17 | Samsung Sdi Co., Ltd. | Semiconductor resist composition, and method of forming patterns using the composition |
| KR102296818B1 (ko) * | 2018-12-26 | 2021-08-31 | 삼성에스디아이 주식회사 | 반도체 레지스트용 조성물, 및 이를 이용한 패턴 형성 방법 |
| US11609494B2 (en) * | 2019-04-30 | 2023-03-21 | Samsung Sdi Co., Ltd. | Semiconductor photoresist composition and method of forming patterns using the composition |
| KR102446361B1 (ko) * | 2019-10-15 | 2022-09-21 | 삼성에스디아이 주식회사 | 반도체 포토 레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| KR102619719B1 (ko) * | 2020-05-12 | 2023-12-28 | 삼성에스디아이 주식회사 | 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| CN115768777A (zh) * | 2020-07-03 | 2023-03-07 | 恩特格里斯公司 | 制备有机锡化合物的方法 |
| WO2022046736A1 (en) * | 2020-08-25 | 2022-03-03 | Inpria Corporation | Methods to produce organotin compositions with convenient ligand providing reactants |
| TWI821891B (zh) * | 2021-01-28 | 2023-11-11 | 美商恩特葛瑞斯股份有限公司 | 製備有機錫化合物的方法 |
| US11697660B2 (en) * | 2021-01-29 | 2023-07-11 | Entegris, Inc. | Process for preparing organotin compounds |
-
2022
- 2022-06-17 CN CN202280050405.9A patent/CN117651708A/zh active Pending
- 2022-06-17 US US17/843,021 patent/US20220402945A1/en not_active Abandoned
- 2022-06-17 TW TW111122574A patent/TWI882232B/zh active
- 2022-06-17 JP JP2023577665A patent/JP2024522233A/ja active Pending
- 2022-06-17 KR KR1020247001515A patent/KR20240021947A/ko active Pending
- 2022-06-17 WO PCT/US2022/033954 patent/WO2022266421A1/en not_active Ceased
- 2022-06-17 EP EP22825891.9A patent/EP4355752A4/de active Pending
-
2024
- 2024-09-12 US US18/884,024 patent/US20250002509A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN117651708A (zh) | 2024-03-05 |
| US20250002509A1 (en) | 2025-01-02 |
| US20220402945A1 (en) | 2022-12-22 |
| WO2022266421A1 (en) | 2022-12-22 |
| TW202304941A (zh) | 2023-02-01 |
| EP4355752A4 (de) | 2025-07-09 |
| JP2024522233A (ja) | 2024-06-11 |
| KR20240021947A (ko) | 2024-02-19 |
| TWI882232B (zh) | 2025-05-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP4355752A1 (de) | Verfahren zur herstellung von organozinnverbindungen | |
| TWI814231B (zh) | 製備有機錫化合物的方法 | |
| JP7684409B2 (ja) | 有機スズ化合物を調製する方法 | |
| EP1849789B1 (de) | Metallkomplexe aus Polydentat-Betaketoiminaten | |
| JP2023539735A (ja) | 反応物の供給に好都合な配位子を持つ有機スズ組成物の製造方法 | |
| US20250257082A1 (en) | High purity tin compounds containing unsaturated substituent and method for preparation thereof | |
| US20250257081A1 (en) | High purity tin compounds containing fluoroalkoxy substituent and methods for preparation thereof | |
| US10858379B2 (en) | Metal precursor for making metal oxide | |
| KR101306810B1 (ko) | 신규의 텅스텐 아미노알콕사이드 화합물, 이의 제조방법 및 이를 이용하여 박막을 형성하는 방법 | |
| JP7094987B2 (ja) | カルボキシレートの存在下におけるトリアルキルインジウム化合物の生成 | |
| JP5488786B2 (ja) | アザボラシクロペンテン化合物の製造方法及びその合成中間体 | |
| JP5463750B2 (ja) | アザボラシクロペンテン化合物の製造方法 | |
| JP5488789B2 (ja) | アルコキシアザボラシクロペンテン化合物の製造方法 | |
| CN117924348B (zh) | 一种ald前驱体锡配合物的一锅法制备工艺 | |
| JP2014005214A (ja) | アリールジクロロホスフィンの製造方法 | |
| KR20250071029A (ko) | 반도체 박막 형성용 전구체의 제조방법. | |
| JP5423212B2 (ja) | アミノアザボラシクロペンテン化合物の製造方法 | |
| TW202423938A (zh) | 用於極紫外光微影術的組合物及相關方法 | |
| US20110040124A1 (en) | Method for Preparing Metal Complexes of Polydentate Beta-Ketoiminates |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
| 17P | Request for examination filed |
Effective date: 20240115 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
| DAV | Request for validation of the european patent (deleted) | ||
| DAX | Request for extension of the european patent (deleted) | ||
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: C07F 7/22 20060101AFI20250307BHEP |
|
| A4 | Supplementary search report drawn up and despatched |
Effective date: 20250605 |
|
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: C07F 7/22 20060101AFI20250530BHEP |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: EXAMINATION IS IN PROGRESS |
|
| 17Q | First examination report despatched |
Effective date: 20260216 |