EP4505247A1 - Génération de multiples faisceaux d'une fréquence harmonique - Google Patents

Génération de multiples faisceaux d'une fréquence harmonique

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Publication number
EP4505247A1
EP4505247A1 EP23715330.9A EP23715330A EP4505247A1 EP 4505247 A1 EP4505247 A1 EP 4505247A1 EP 23715330 A EP23715330 A EP 23715330A EP 4505247 A1 EP4505247 A1 EP 4505247A1
Authority
EP
European Patent Office
Prior art keywords
stage
harmonic
frequency beam
fundamental frequency
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP23715330.9A
Other languages
German (de)
English (en)
Inventor
Richard John Black
Rokas DREVINSKAS
Patrick Neil Anderson
Masaaki Sakakura
Thomas Torsten DR WINKLER
David LARA SAUCEDO
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Microsoft Technology Licensing LLC
Original Assignee
Microsoft Technology Licensing LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US17/804,368 external-priority patent/US12463397B2/en
Application filed by Microsoft Technology Licensing LLC filed Critical Microsoft Technology Licensing LLC
Publication of EP4505247A1 publication Critical patent/EP4505247A1/fr
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/37—Non-linear optics for second-harmonic generation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/39—Non-linear optics for parametric generation or amplification of light, infrared or ultraviolet waves

Definitions

  • Harmonic generation is an optical process in which n initial photons of a same frequency interact with a nonlinear optical material to generate a new photon with n times the frequency of the initial photons.
  • second-harmonic generation may be used to double the frequency of the laser.
  • Examples are disclosed that relate to efficiently producing multiple laser beams of a harmonic frequency from a fundamental frequency beam.
  • a laser system comprising a laser configured to output a fundamental frequency beam, a first harmonic-generation stage, and a second harmonic-generation stage.
  • the first harmonic-generation stage is configured to receive an input of the fundamental frequency beam from the laser, and output from the laser system a first-stage harmonic frequency beam and a first-stage residual fundamental frequency beam.
  • the second harmonic-generation stage is configured to receive an input of the first-stage residual fundamental frequency beam, and to output from the laser system a second-stage harmonic frequency beam.
  • FIG. 1 shows aspects of an example data writing system.
  • FIG. 2 shows an example laser system configured to output a plurality of harmonic beams via a plurality of harmonic-generation stages.
  • FIG. 3 shows an example laser system comprising a plurality of beam splitters.
  • FIG. 4 shows an example laser system that utilizes dispersion compensation between harmonicgeneration stages.
  • FIG. 5 shows an example laser system that utilizes a same nonlinear optical medium for two harmonic-generation stages.
  • FIG. 6 depicts an example plot of measured power of a harmonic frequency beam and a residual fundamental frequency beam as a function of a power of a fundamental frequency beam.
  • FIG. 7 depicts example plots of calculated power of a harmonic frequency beam, calculated power of a residual fundamental frequency beam, and a cumulative conversion efficiency as a function of a number of harmonic generation cycles.
  • FIG. 8 depicts example plots of percent gain in optical power and percent gain in optical power per harmonic cycle as a function of a number of harmonic cycles.
  • FIG. 9 depicts an example of a measured spatial profile of a residual fundamental frequency beam after a second-harmonic module.
  • FIG. 10 shows example measured pulse durations of a fundamental frequency beam before and after a second-harmonic module.
  • FIG. 11 shows a flow diagram of an example method for generating and outputting a plurality of harmonic frequency beams.
  • FIG. 12 shows an example computing system.
  • Ultrashort pulse lasers are lasers that output pulses of light with pulse durations on the order of femtoseconds to picoseconds. Ultrashort pulse lasers have a wide range of possible uses. As one example, ultrashort pulse lasers may be used to encode data for storage in a transparent substrate such as glass. When irradiated with laser light of a suitably high instantaneous energy, a nonnative modification of the substrate structure can be made in a volume of the substrate at a focus of the laser to write a desired data symbol. This volume may be referred to as a voxel.
  • harmonic generation may be used to generate higher frequency laser light from a lower frequency laser.
  • Second-harmonic generation may utilize a crystal of a nonlinear optical material to produce one photon of the higher frequency light from two photos of the lower frequency light.
  • visible laser light used to write the data may be produced from an infrared fundamental laser frequency via second-harmonic generation.
  • the efficiency of harmonic generation of ultrashort pulse lasers is limited by the fundamental process, phase matching and competing nonlinear processes, as well as damage thresholds of nonlinear crystals used to generate the second-harmonic frequency.
  • the efficiency of second-harmonic generation may be on the order of 50% or lower for a high-power ultrashort pulse laser.
  • a relatively large fraction of the laser power may be wasted due to non-use of the residual fundamental frequency light.
  • a laser system comprises a laser, a first harmonic-generation stage, and a second harmonic-generation stage.
  • the terms “first harmonic-generation stage” and “second harmonic-generation stage” indicate an order in which the stages are arranged in series relative to the laser.
  • the first harmonic-generation stage is configured to receive an input of a fundamental frequency beam from the laser, to output from the laser system a first-stage harmonic frequency beam, and to output a first-stage residual fundamental frequency beam.
  • the second harmonicgeneration stage is configured to receive an input of the first-stage residual fundamental frequency beam, and to output from the laser system a second-stage harmonic frequency beam.
  • the first-stage harmonic frequency beam and the second-stage harmonic frequency beam can be used in a multi-beam laser application, such as for writing data to and/or reading optical data.
  • the first harmonic-generation stage and the second harmonicgeneration stage can utilize different nonlinear optical media.
  • two or more stages may utilize a same nonlinear optical medium.
  • the first-stage harmonic frequency beam and/or the second-stage harmonic frequency beam may be split into a plurality of output beams via a plurality of beam splitters.
  • FIG. 1 shows aspects of an example data writing system 100.
  • Data writing system 100 is an example of a system that may utilize a plurality of harmonic ultrashort pulse laser beams generated from a fundamental frequency beam by multiple stages of harmonic generation.
  • Data writing system 100 comprises a focusing optic 102 configured to focus laser irradiance 104 on a datastorage substrate 106.
  • Data writing system 100 further comprises modulator 110 and a write controller 112.
  • Data writing system 100 is configured to receive laser irradiance 104.
  • Laser irradiance 104 may comprise ultrashort pulse laser irradiation.
  • Laser irradiance 104 is used to write and store data within data-storage substrate 106.
  • data-storage substrate 106 may comprise a silica-glass slab.
  • Laser irradiance 104 can induce a long-lived material structural perturbation at its focus, which derives from a non-linear optical process in data-storage substrate 106.
  • focusing optic 102 may include an adjustable objective lens system configured to focus laser irradiance 104 to any selected depth layer of data-storage substrate 106.
  • data writing system 100 may be configured to write a plurality of voxels in parallel.
  • laser irradiance 104 may comprise a plurality of beams, so that a corresponding plurality of voxels may be written concurrently.
  • Example laser systems configured to output a plurality of harmonic frequency beams are described in more detail below.
  • Modulator 110 is configured to control an optical property of each beam of laser irradiance 104 to encode data as material perturbations at voxels in data-storage substrate 106.
  • modulator 110 may comprise a spatial light modulator (SLM) configured as a dynamic digital hologram, and/or may comprise a polarization modulator (PM).
  • SLM spatial light modulator
  • PM polarization modulator
  • modulator 110 is coupled operatively to write controller 112.
  • Write controller 112 is configured to provide to modulator 110 electronic control signals that control the modulation to laser irradiance 104 for writing data into voxels in data-storage substrate 106.
  • laser light used to write the data may be produced from a fundamental laser frequency via second-harmonic generation.
  • the efficiency of harmonic generation of ultrashort pulse lasers may be on the order of 50%. As such, residual fundamental frequency light not used for data writing may be wasted.
  • FIG. 2 shows an example laser system 200 comprising a plurality of harmonic-generation stages that may help to reduce wasted power.
  • Laser system 200 comprises a laser 202, a first harmonic-generation stage 206 comprising a first nonlinear optical medium 208, a second harmonic-generation stage 210 comprising a second nonlinear optical medium 212, a third harmonic-generation stage 214 comprising a third nonlinear optical medium 216, and a N th harmonic-generation stage 218 comprising an N th nonlinear optical medium 220.
  • the first harmonic-generation stage receives a fundamental frequency beam from the laser, and outputs a harmonic frequency beam and a residual fundamental frequency beam.
  • the second through N th harmonic-generation stages each receives as input a residual fundamental frequency beam from a prior harmonic-generation stage, and uses a portion of the residual fundamental frequency beam to generate an additional harmonic frequency beam.
  • nonlinear optical media include nonlinear optical crystals, quasi-phase-matched (QPM) nonlinear optical media, and birefringently phase-matched (BPM) media.
  • QPM quasi-phase-matched
  • BPM birefringently phase-matched
  • “N” indicates any arbitrary number of stages. While FIG. 2 shows at least four harmonic-generation stages, in other examples, a laser system may have three, or even two, harmonic-generation stages.
  • Laser 202 is configured to output fundamental frequency beam 204 of any suitable wavelength, such as an infrared wavelength.
  • laser 202 can comprise an ultrashort pulse laser, such as a picosecond pulsed laser, a nanosecond pulsed laser, or a femtosecond pulsed laser.
  • First harmonic-generation stage 206 is configured to receive an input of fundamental frequency beam 204 from laser 202, to output from laser system 200 a first-stage harmonic frequency beam 222, and to output a first-stage residual fundamental frequency beam 224.
  • First harmonic-generation stage 206 may be configured to generate a second-harmonic frequency in some examples.
  • first-stage harmonic frequency beam 222 has a frequency double that of fundamental frequency beam 204.
  • first-stage harmonic frequency beam 222 comprises a visible frequency, such as a frequency corresponding to green light.
  • first harmonic-generation stage 206 may be configured as a third-harmonic frequency generator, or may be configured to generate any other suitable harmonic frequency.
  • first-stage harmonic frequency beam 222 may comprise approximately 50% or less of the power of fundamental frequency beam 204.
  • first-stage residual fundamental frequency beam 224 may comprise approximately 50% or more of the power of fundamental frequency beam 204.
  • second harmonic-generation stage 210 is configured to receive an input of first-stage residual fundamental frequency beam 224, to output from laser system 200 a second-stage harmonic frequency beam 226, and to output a second-stage residual fundamental frequency beam 228.
  • Second-stage harmonic frequency beam 226 may comprise approximately 50% or less of the power of first-stage residual fundamental frequency beam 224
  • second-stage residual fundamental frequency beam 228 may comprise approximately 50% or more of the power of first-stage residual fundamental frequency beam 224.
  • the use of second harmonic-generation stage 210 may reduce an overall energetic waste of laser power of laser 202 compared to the use of a single harmonic-generation stage. In a data writing application, this may provide cost savings as well as more efficient data writing due to less wasted power.
  • first harmonic-generation stage 206 is configured to generate a second-harmonic frequency
  • second harmonic-generation stage 210 also may be configured to generate a second- harmonic frequency.
  • Third harmonic-generation stage 214 is configured to receive an input of second-stage residual fundamental frequency beam 228, and to output from laser system 200 a third-stage harmonic frequency beam 230.
  • third-stage harmonic frequency beam 230 may comprise approximately 50% or less of the power of second-stage residual fundamental frequency beam 228.
  • a third-stage residual fundamental frequency beam 232 may comprise approximately 50% or more of the power of second-stage residual fundamental frequency beam 228.
  • N th harmonic-generation stage 218 is configured to receive an input of a (N* 11 -!)- stage residual fundamental frequency beam 234, and to output from laser system 200 a N th -stage harmonic frequency beam 236.
  • Each harmonic-generation stage may help to reduce an amount of power wasted as residual frequency light.
  • first-stage harmonic frequency beam 222, second-stage harmonic frequency beam 226, third-stage harmonic frequency beam 230, and N ⁇ -stage harmonic frequency beam 236 may be used to run parallel optical data writing lines, as well as for multi-beam data writing.
  • the harmonic frequency beams may be used in any other suitable application that utilizes parallelization and/or multi-beam exposure.
  • Laser 302 is configured to output a fundamental frequency beam 312.
  • First harmonic-generation stage 304 is configured to receive an input of fundamental frequency beam 312, to output from laser system 300 a first-stage harmonic frequency beam 314, and to output a first-stage residual fundamental frequency beam 316.
  • second-harmonic generation may have a conversion efficiency on the order of 50% for a high-power laser amplifier, first-stage harmonic frequency beam 314 may comprise approximately 50% or less of the power of fundamental frequency beam 312.
  • Second harmonic-generation stage 306 is configured to receive an input of first-stage residual fundamental frequency beam 316 and to output from laser system 300 a second-stage harmonic frequency beam 318.
  • second-stage harmonic frequency beam 318 may comprise approximately 50% or less of the power of first-stage residual fundamental frequency beam 316.
  • second-stage residual fundamental frequency beam 320 may comprise approximately 50% or more of the power of the first-stage residual fundamental frequency beam 316.
  • Beam splitters 308a, 308b, 308c are configured to split first-stage harmonic frequency beam 314 into a plurality of first-stage output beams 322.
  • each beam splitter 308a, 308b, 308c is configured to reflect approximately half of incident light and transmit a remainder of the incident light.
  • Beam splitter 310 is configured to split second-stage harmonic frequency beam 318 into a plurality of second-stage output beams 326.
  • first-stage harmonic frequency beam 314 may have approximately twice the power of second-stage harmonic frequency beam 318
  • splitting first-stage harmonic frequency beam 314 into four first-stage output beams 322 and splitting second-stage harmonic frequency beam 318 into two second-stage output beams 326 may result in the production of six output beams of similar power.
  • plurality of first-stage output beams 322 and plurality of second-stage output beams 326 are configured as write beams in a data writing system configured to write data into a recording medium, such as data writing system 100.
  • plurality of first-stage output beams 322 and plurality of second-stage output beams 326 may be used in any other suitable application.
  • Mirrors 311a and 311b, and 313 are configured to redirect harmonic-frequency output beams in desired directions.
  • mirrors 311a, 311b, 313 may be omitted, and/or any other suitable optics may be used to direct an output beam in a desired direction.
  • Residual fundamental frequency beams may have some dispersion caused by a harmonicgeneration stage in a laser system. This dispersion may impact a performance of a subsequent harmonic-generation stage in some examples.
  • an optical system configured to produce multiple harmonic beams may include a dispersion compensation system.
  • FIG. 4 shows an example laser system 400 that utilizes dispersion compensation.
  • Laser system 400 comprises a laser 402, a first harmonic-generation stage 404, a first dispersion compensation system 406, a second harmonic-generation stage 408, a second dispersion compensation system 410, and a third harmonic-generation stage 412.
  • Laser 402 is configured to output a fundamental frequency beam 414.
  • First harmonic-generation stage 404 is configured to receive an input of fundamental frequency beam 414 from laser 402, output from laser system 400 a first-stage harmonic frequency beam 416, and output a first-stage residual fundamental frequency beam 418.
  • First dispersion compensation system 406 is configured to compensate for dispersion of first-stage residual fundamental frequency beam 418, and to output a compensated first-stage residual fundamental frequency beam 420. Such a configuration may reduce an effect of dispersion on a beam quality of first-stage residual fundamental frequency beam 418.
  • first dispersion compensation system 406 may help to reduce an elongation of a pulse duration of first-stage residual fundamental frequency beam 418.
  • first dispersion compensation system 406 also may be configured as a dispersion and polarization compensation stage to compensate for a polarization change of first-stage residual fundamental frequency beam 418, and/or for other suitable optical phenomenon.
  • Second harmonic-generation stage 408 is configured to receive an input of compensated first- stage residual fundamental frequency beam 420, output from laser system 400 a second-stage harmonic frequency beam 422, and output a second-stage residual fundamental frequency beam 424.
  • third harmonic-generation stage 412 is configured to receive an input of a compensated second-stage residual fundamental frequency beam 426, and to output from laser system 400 a third-stage harmonic frequency beam 428.
  • Second dispersion compensation system 410 is configured to compensate for dispersion of second-stage residual fundamental frequency beam 424, and to output compensated second-stage residual fundamental frequency beam 426. While FIG. 4 shows an optical system comprising three harmonic-generation stages and two dispersion compensation stages, in other examples, a laser system may have any suitable number of harmonic-generations stages and dispersion compensation stages.
  • an optical system for generating and outputting multiple harmonic frequency beams may utilize a same nonlinear optical medium for one or more harmonic-generation stages.
  • FIG. 5 shows such an example laser system 500.
  • Laser system 500 comprises a laser 502 and a nonlinear optical medium 504 configured to generate a first-stage harmonic frequency beam 506 from a fundamental frequency beam 508 in a first harmonic-generation stage 510.
  • Laser system 500 further comprises a dichroic mirror or other wavelength-dependent splitter 511 configured to separate first-stage harmonic frequency beam 506 from first-stage residual fundamental frequency beam 512.
  • FIG. 5 further shows a mirror 514 configured to redirect first-stage harmonic frequency beam 506. In other examples, mirror 514 may be omitted, and/or any other suitable optics may be used to redirect first-stage harmonic frequency beam 506.
  • First-stage residual fundamental frequency beam 512 is directed around a folded optical path via mirrors 516, 518, and 520 to pass through nonlinear optical medium 504 in a second harmonicgeneration stage 522.
  • the second harmonic-generation stage 522 generates and outputs a second- stage harmonic frequency beam 524, and a second-stage residual fundamental frequency beam 525.
  • a dichroic mirror 526 may be used to separate second-stage harmonic frequency beam 524 and second-stage residual fundamental frequency beam 525.
  • FIG. 5 further shows a mirror 528 configured to redirect second-stage harmonic frequency beam 524. In other examples, mirror 528 may be omitted, and/or any other suitable optics may be used to redirect second-stage harmonic frequency beam 524.
  • additional harmonic-generation stages may utilize same nonlinear optical medium 504.
  • the use of nonlinear optical medium 504 for multiple harmonic-generation stages may help to reduce a cost of laser system 500 compared to systems that use separate nonlinear optical media for each harmonic-generation stage.
  • an optical path through first harmonic-generation stage 510 and an optical path through second harmonic-generation stage 522 are spatially separated within nonlinear optical medium 504.
  • the optical path through first harmonic-generation stage 510 and the optical path through second harmonic-generation stage 522 are separated by at least a width of first-stage residual fundamental frequency beam 512.
  • the optical path through first harmonic-generation stage 510 and the optical path through second harmonic-generation stage 522 may spatially overlap.
  • light pulses may be configured to be temporally separated to avoid thermally damaging nonlinear optical medium 504.
  • the plurality of harmonic frequency beams generated by laser system 500 may be used to operate parallel optical data writing lines and/or perform multi-beam data writing.
  • the harmonic frequency beams may be used in any other suitable application that utilizes parallelization and/or multi-beam processes, such as an industrial process for glass cutting.
  • FIG. 6 depicts measured power of a residual fundamental frequency beam and measured power of a harmonic frequency beam based on a power of a fundamental frequency beam (indicated along the x-axis).
  • a laser system provided the fundamental frequency beam at a maximum power of 50 W (watts) at a wavelength of 1030 nm (nanometers) (e.g., infrared light), which was converted via a commercial harmonic module into a second-harmonic frequency beam comprising a power of 20 W at a wavelength of 515 nm (e.g., green light), thus providing a conversion efficiency of 40%.
  • FIG. 7 depicts calculated output power of a residual fundamental frequency beam 700 and calculated output power of a harmonic frequency beam 702 after each generation cycle in a same harmonic module based on the measurements of FIG. 6. Further, FIG. 7 also shows a cumulative harmonic conversion efficiency 704 of an initial infrared laser power of 50 W after each cycle.
  • FIG. 7 represents the simplest case of multi-cycle harmonic generation, in which neither the harmonic module, nor the beam characteristics (e.g., beam size) are changed.
  • the output power of the harmonic frequency beam 702 drops quickly with each harmonic-generation cycle.
  • cumulative harmonic conversion efficiency 704 reaches over 70% after four generation cycles, and as such is an increase over a conversion efficiency of 40% after one generation cycle. Further, a cumulative harmonic conversion efficiency 704 of around 78% is calculated after 5 cycles.
  • the cumulative harmonic conversion efficiency 704 may be increased by adapting an efficiency of subsequent harmonic generation cycles (e.g., efficiency tuning).
  • FIG. 8 shows a number of harmonic-generation cycles and a gain in harmonic power in comparison to using a single harmonic-generation cycle. Calculated gain of total harmonic power 800 and calculated gain per harmonic generation cycle 802 are charted as a function of a number of harmonic generation cycles. FIG. 8 illustrates that efficiency gains per cycle reduce with each additional cycle.
  • FIG. 9 shows a measured spatial profile 900 of the residual fundamental frequency beam 10 cm (centimeters) after an exit of the harmonic module.
  • Spatial profile 900 has a low intensity region as indicated at 902 and a high intensity region as indicated at 904. Further, spatial profile 900 follows a Gaussian distribution, and thus may be of sufficiently good quality for further harmonic generation.
  • FIG. 10 shows a measurement of a pulse duration 1000 of an input infrared laser pulse (e.g., before the harmonic module) and a measurement of a pulse duration 1002 of a residual infrared laser pulse (e.g., after the harmonic module). Pulse duration 1002 has not significantly changed from pulse duration 1000 (e.g., within experimental error). Where elongation does occur, in some examples, dispersion correction may be used, as described above.
  • FIG. 11 depicts a flow diagram of an example method 1100 for outputting a plurality of harmonic output beams.
  • Method 1100 may be enacted on any suitable laser system, such as those described herein.
  • Method 1100 comprises, at 1102, receiving a fundamental frequency beam from a laser.
  • the fundamental frequency beam may comprise an infrared laser beam.
  • Method 1100 further comprises, at 1104, generating and outputting, via a first harmonic-generation stage, a first-stage harmonic frequency beam from the fundamental frequency beam.
  • the first harmonic-generation stage may be configured for second-harmonic generation.
  • the first harmonic-generation stage may be configured to generate any other suitable harmonic.
  • method 1100 may comprise, at 1106, splitting the first-stage harmonic frequency beam using a beam splitter to generate a plurality of first-stage harmonic frequency beams for output.
  • method 1100 further comprises, at 1108, generating and outputting, via a second harmonic-generation stage, a second-stage harmonic frequency beam based on a first-stage residual fundamental frequency beam from the first harmonic-generation stage.
  • method 1100 comprises, at 1110, generating, using a same nonlinear optical medium, the first- stage harmonic frequency beam and the second-stage harmonic frequency beam.
  • different media may be used for different harmonic-generation stages.
  • the methods and processes described herein may be tied to a computing system of one or more computing devices.
  • such methods and processes may be implemented as a computer-application program or service, an application-programming interface (API), a library, and/or other computer-program product.
  • API application-programming interface
  • FIG. 12 schematically shows an example computing system 1200 that can enact one or more of the methods and processes described above.
  • Computing system 1200 is shown in simplified form.
  • Computing system 1200 may take the form of one or more personal computers, server computers, tablet computers, home-entertainment computers, network computing devices, gaming devices, mobile computing devices, mobile communication devices (e.g., smart phone), and/or other computing devices.
  • Controller 112 as well as controllers for any of the laser systems depicted herein, may be examples of computing system 1200.
  • Computing system 1200 includes a logic subsystem 1202 and a storage subsystem 1204.
  • Computing system 1200 may optionally include a display subsystem 1206, input subsystem 1208, communication subsystem 1210, and/or other components not shown in FIG. 12.
  • Logic subsystem 1202 includes one or more physical devices configured to execute instructions.
  • the logic machine may be configured to execute instructions that are part of one or more applications, services, programs, routines, libraries, objects, components, data structures, or other logical constructs.
  • Such instructions may be implemented to perform a task, implement a data type, transform the state of one or more components, achieve a technical effect, or otherwise arrive at a desired result.
  • the logic machine may include one or more processors configured to execute software instructions. Additionally or alternatively, the logic machine may include one or more hardware or firmware logic machines configured to execute hardware or firmware instructions. Processors of the logic machine may be single-core or multi-core, and the instructions executed thereon may be configured for sequential, parallel, and/or distributed processing. Individual components of the logic machine optionally may be distributed among two or more separate devices, which may be remotely located and/or configured for coordinated processing. Aspects of the logic machine may be virtualized and executed by remotely accessible, networked computing devices configured in a cloud-computing configuration.
  • Storage subsystem 1204 includes one or more physical devices configured to hold instructions executable by the logic machine to implement the methods and processes described herein. When such methods and processes are implemented, the state of storage subsystem 1204 may be transformed — e.g., to hold different data.
  • Storage subsystem 1204 may include removable and/or built-in devices.
  • Storage subsystem 1204 may include optical memory (e.g., CD, DVD, HD-DVD, Blu-Ray Disc, etc.), semiconductor memory (e.g., RAM, EPROM, EEPROM, etc.), and/or magnetic memory (e.g., hard-disk drive, floppy-disk drive, tape drive, MRAM, etc.), among others.
  • Storage subsystem 1204 may include volatile, nonvolatile, dynamic, static, read/write, read-only, random-access, sequential- access, location-addressable, file-addressable, and/or content-addressable devices.
  • storage subsystem 1204 includes one or more physical devices.
  • aspects of the instructions described herein alternatively may be propagated by a communication medium (e.g., an electromagnetic signal, an optical signal, etc.) that is not held by a physical device for a finite duration.
  • a communication medium e.g., an electromagnetic signal, an optical signal, etc.
  • logic subsystem 1202 and storage subsystem 1204 may be integrated together into one or more hardware-logic components.
  • Such hardware-logic components may include field- programmable gate arrays (FPGAs), program- and application-specific integrated circuits (PASIC / ASICs), program- and application-specific standard products (PSSP / ASSPs), system-on-a-chip (SOC), and complex programmable logic devices (CPLDs), for example.
  • FPGAs field- programmable gate arrays
  • PASIC / ASICs program- and application-specific integrated circuits
  • PSSP / ASSPs program- and application-specific standard products
  • SOC system-on-a-chip
  • CPLDs complex programmable logic devices
  • display subsystem 1206 may be used to present a visual representation of data held by storage subsystem 1204. This visual representation may take the form of a graphical user interface (GUI). As the herein described methods and processes change the data held by the storage machine, and thus transform the state of the storage machine, the state of display subsystem 1206 may likewise be transformed to visually represent changes in the underlying data.
  • Display subsystem 1206 may include one or more display devices utilizing virtually any type of technology. Such display devices may be combined with logic subsystem 1202 and/or storage subsystem 1204 in a shared enclosure, or such display devices may be peripheral display devices.
  • input subsystem 1208 may comprise or interface with one or more user-input devices such as a keyboard, mouse, touch screen, or game controller.
  • the input subsystem may comprise or interface with selected natural user input (NUI) componentry.
  • NUI natural user input
  • Such componentry may be integrated or peripheral, and the transduction and/or processing of input actions may be handled on- or off-board.
  • NUI componentry may include a microphone for speech and/or voice recognition; an infrared, color, stereoscopic, and/or depth camera for machine vision and/or gesture recognition; a head tracker, eye tracker, accelerometer, and/or gyroscope for motion detection and/or intent recognition; as well as electric-field sensing componentry for assessing brain activity.
  • communication subsystem 1210 may be configured to communicatively couple computing system 1200 with one or more other computing devices.
  • Communication subsystem 1210 may include wired and/or wireless communication devices compatible with one or more different communication protocols.
  • the communication subsystem may be configured for communication via a wireless telephone network, or a wired or wireless locator wide-area network.
  • the communication subsystem may allow computing system 1200 to send and/or receive messages to and/or from other devices via a network such as the Internet.
  • a laser system comprising, a laser configured to output a fundamental frequency beam, a first stage configured to receive an input of the fundamental frequency beam from the laser, to output from the laser system a first-stage harmonic frequency beam, and to output a first-stage residual fundamental frequency beam, and a second stage configured to receive an input of the first-stage residual fundamental frequency beam, and to output from the laser system a second-stage harmonic frequency beam.
  • the laser alternatively or additionally comprises an ultrashort pulse laser.
  • the laser system alternatively or additionally comprises a third stage configured to receive an input of a second residual fundamental frequency beam from the second stage, and to output from the laser system a third-stage harmonic frequency beam.
  • the first-stage harmonic frequency beam and the second-stage harmonic frequency beam each alternatively or additionally comprises a second-harmonic of the fundamental frequency beam.
  • the laser system alternatively or additionally is incorporated into a data writing system.
  • the first stage and the second stage alternatively or additionally utilize a same nonlinear optical medium.
  • the first stage alternatively or additionally comprises a first nonlinear optical medium and the second stage alternatively or additionally comprises a second nonlinear optical medium.
  • the laser system alternatively or additionally comprises a beam splitter configured to split the first-stage harmonic frequency beam.
  • an optical system comprising, a first stage configured to receive an input of a fundamental frequency beam from a laser, to output from the optical system a first-stage harmonic frequency beam, and to output a first-stage residual fundamental frequency beam, and a second stage configured to receive an input of the first-stage residual fundamental frequency beam, and to output from the optical system a second-stage harmonic frequency beam.
  • the optical system alternatively or additionally comprises a first, greater number of first-stage beam splitters configured to split the first-stage harmonic frequency beam into a plurality of first-stage output beams, and a second, lesser number of second-stage beam splitters configured to split the second-stage harmonic frequency beam into a plurality of second-stage output beams.
  • the plurality of first-stage output beams and the plurality of second-stage output beams alternatively or additionally are configured as write beams in a data writing system.
  • the first stage alternatively or additionally comprises a first nonlinear optical medium
  • the second stage alternatively or additionally comprises a second nonlinear optical medium.
  • the first stage and the second stage alternatively or additionally utilize a same nonlinear optical medium.
  • alternatively or additionally an optical path through the first stage and an optical path through the second stage are configured to temporally separate pulses of the fundamental frequency beam and the first-stage residual fundamental frequency beam in the same nonlinear optical medium.
  • an optical path through the first stage and an optical path through the second stage are spatially separated in the same nonlinear optical medium.
  • the optical system alternatively or additionally comprises a third stage configured to receive an input of a second-stage residual fundamental frequency beam from the second stage and to output from the optical system a third-stage harmonic frequency beam.
  • the first-stage harmonic frequency beam and the second-stage harmonic frequency beam each alternatively or additionally comprises a second-harmonic of the fundamental frequency beam.
  • Another example provides, enacted on an optical system comprising a first harmonic-generation stage and a second harmonic-generation stage, a method comprising receiving a fundamental frequency beam from a laser, generating and outputting, via the first harmonic-generation stage, a first-stage harmonic frequency beam from the fundamental frequency beam, and generating and outputting, via the second harmonic-generation stage, a second-stage harmonic frequency beam based on a first-stage residual fundamental frequency beam from the first harmonic-generation stage.
  • the method alternatively or additionally comprises splitting the first-stage harmonic frequency beam using a beam splitter to generate a plurality of first-stage harmonic frequency beams for output.
  • generating the second-stage harmonic frequency beam alternately or additionally comprises generating, using a same nonlinear optical medium as the first harmonic-generation stage, the second-stage harmonic frequency beam.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)

Abstract

Des exemples sont divulgués qui se rapportent à la production efficace de multiples faisceaux laser d'une fréquence harmonique à partir d'un faisceau de fréquence fondamentale. Un exemple concerne un système optique comprenant un premier étage et un second étage. Le premier étage est configuré pour recevoir une entrée d'un faisceau de fréquence fondamentale provenant d'un laser, et délivrer en sortie à partir du système optique un faisceau de fréquence harmonique de premier étage et un faisceau de fréquence fondamentale résiduel de premier étage. Le second étage est configuré pour recevoir une entrée du faisceau de fréquence fondamentale résiduel de premier étage, et pour délivrer en sortie à partir du système optique un faisceau de fréquence harmonique de second étage.
EP23715330.9A 2022-04-08 2023-03-15 Génération de multiples faisceaux d'une fréquence harmonique Pending EP4505247A1 (fr)

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US202263362729P 2022-04-08 2022-04-08
US17/804,368 US12463397B2 (en) 2022-04-08 2022-05-27 Generating multiple beams of a harmonic frequency
PCT/US2023/015249 WO2023196091A1 (fr) 2022-04-08 2023-03-15 Génération de multiples faisceaux d'une fréquence harmonique

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US9219344B2 (en) * 2012-01-06 2015-12-22 Calmar Optcom, Inc. Generating ultrashort laser pulses based on two-stage pulse processing
LT6231B (lt) * 2014-03-25 2015-11-25 Uab "Ekspla" Femtosekundinių šviesos impulsų gavimo būdas ir lazerinis šaltinis
LT6425B (lt) * 2015-12-14 2017-07-10 Uab "Ekspla" Ultratrumpųjų šviesos impulsų generavimo būdas ir lazerinis šaltinis
US12080996B2 (en) * 2019-02-13 2024-09-03 Sony Group Corporation Laser processing machine, processing method, and laser light source
US11404841B2 (en) * 2019-08-20 2022-08-02 Coherent, Inc. Optical parametric chirped-pulse amplifier
US11005227B2 (en) * 2019-09-05 2021-05-11 Nufern Multi-wavelength adjustable-radial-mode fiber laser

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