EP4570037A2 - Dispositif de préparation d'un plasma - Google Patents

Dispositif de préparation d'un plasma

Info

Publication number
EP4570037A2
EP4570037A2 EP23768111.9A EP23768111A EP4570037A2 EP 4570037 A2 EP4570037 A2 EP 4570037A2 EP 23768111 A EP23768111 A EP 23768111A EP 4570037 A2 EP4570037 A2 EP 4570037A2
Authority
EP
European Patent Office
Prior art keywords
plasma
flow channel
gas
gaseous fluid
flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP23768111.9A
Other languages
German (de)
English (en)
Inventor
Werner Wiggen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thermal Processing Solutions GmbH
Original Assignee
Thermal Processing Solutions GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thermal Processing Solutions GmbH filed Critical Thermal Processing Solutions GmbH
Publication of EP4570037A2 publication Critical patent/EP4570037A2/fr
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • F27B17/0016—Chamber type furnaces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D11/00—Arrangement of elements for electric heating in or on furnaces
    • F27D11/12—Arrangement of elements for electric heating in or on furnaces with electromagnetic fields acting directly on the material being heated
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D19/00—Arrangements of controlling devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining or circulating atmospheres in heating chambers
    • F27D7/02—Supplying steam, vapour, gases or liquids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/80—Apparatus for specific applications
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder or liquid
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0001—Heating elements or systems
    • F27D99/0006—Electric heating elements or system
    • F27D2099/0031—Plasma-torch heating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges

Definitions

  • the invention relates to a device for providing a plasma, comprising at least one plasma generation element, in or on which at least one electrical induction coil and / or a magnetron is arranged, and in which a first flow channel and a second flow channel arranged concentrically thereto are arranged, wherein the second flow channel surrounds the first flow channel at least in sections, and the first flow channel is flow-connected to a first connection for a gaseous fluid to form a heated gas stream.
  • the invention further relates to a device for the thermal treatment of a substance, in particular a solid, comprising at least one device for providing a plasma.
  • the invention relates to a method for operating a device for providing a plasma for the thermal treatment of a substance, comprising the steps: supplying a gaseous fluid into at least one plasma generating element of the device; generating a plasma in the plasma generating element; Providing a hot fluid stream through the plasma, optionally by heating the gaseous fluid with the plasma to produce a hot gas, the hot fluid stream being directed outside the plasma generating element onto the substance to be treated.
  • DE10 2020202 484 A1 describes a device for melting metals whose melting temperature is less than 1000 ° C, in which a device for forming a plasma is arranged on a melting furnace, the device being connected to an electrical power supply and to the device at least a first supply for a plasma gas, with which the plasma can be formed, is connected and the device is designed, dimensioned, arranged and / or aligned so that the formed plasma is arranged at a distance from the metal as melting material, and thereby with the plasma a hot gas stream can be formed, which is directed in the direction of the melting material and to A melting tank or a crucible is arranged in the melting furnace to receive the molten metal.
  • an inductive plasma torch with a tubular torch body with a proximal and a distal end, which further has an inner cylindrical surface with a first diameter, a tube enclosing a plasma, which is made of a material which is a high thermal conductivity, which defines an axial chamber in which a high temperature plasma is enclosed, and which has a cylindrical outer surface with a second diameter that is slightly smaller than the first diameter, wherein the tube containing the plasma is mounted within the tubular torch body and the cylindrical inner and outer surfaces are coaxially aligned with each other to form a thin annular chamber of equal thickness between the inner and outer surfaces, a gas distribution head mounted at the proximal end of the torch body for distributing at least one gaseous substance in the axial Chamber defined by the tube containing a plasma, a cooling fluid source connected to the thin annular chamber to establish a high velocity cooling fluid flow in the annular chamber, both the high thermal conductivity of the material from which the plasma is made enclos
  • US 2004/107796 A1 describes a plasma-assisted melting process comprising: forming a plasma in a cavity by exposing a first gas to electromagnetic radiation at a frequency of less than about 333 GHz in the presence of a plasma catalyst; heating a second gas with the plasma; adding a solid to a melting vessel; and directing the heated second gas toward the solid sufficient to at least melt the solid.
  • an induction plasma torch which comprises: a tubular torch body containing a cylindrical inner surface with a first diameter; a plasma containment tube made of thermally conductive ceramic material and including a first end, a second end, and a cylindrical outer surface having a second diameter that is smaller than the first diameter; wherein the plasma containment tube is mounted in the tubular torch body and forms an annular chamber between the cylindrical inner and outer surfaces; a gas distributor attached to the tubular torch body at the first end of the plasma containment tube and supplying at least one gaseous substance to the plasma containment tube, the at least one gaseous substance flowing through the plasma containment tube from its first end toward its second end; an induction coil to which an electric current is supplied for inductively energizing the at least one gaseous substance flowing through the plasma containment tube to produce and maintain plasma in the containment tube, the induction coil coaxial with the cylindrical inner and outer surfaces of the annular chamber is; and means for establishing a flow of cooling fluid in the annular
  • EP 3 314 989 B1 describes an induction plasma torch comprising: a tubular torch body with an upstream region and a downstream region, the upstream and downstream regions defining respective internal surfaces; and a plasma containment tube provided within the tubular torch body, coaxial with the tubular torch body and having an inner surface of constant inner diameter and an outer surface; and a tubular insert mounted on the inner surface of the downstream portion of the tubular torch body, the tubular insert having an inner surface; and an annular channel defined between the inner surface of the upstream portion of the tubular torch body and the inner surface of the tubular insert, and the outer surface of the plasma containment tube, the annular channel being configured to conduct a cooling liquid for cooling the plasma containment tube; and wherein the plasma confinement tube has a tubular wall having a thickness tapering over at least a portion of the plasma confinement tube in an axial direction of plasma flow.
  • EP 2 671 430 B1 describes an induction plasma torch comprising: a tubular torch body having an inner surface; a plasma containment tube disposed coaxially with the tubular torch body in the tubular torch body, the plasma containment tube having an outer surface; a gas distribution head disposed at one end of the plasma containment tube and structured to supply at least one gaseous substance into the plasma containment tube; an inductive coupling element for applying energy to the gaseous substance to generate and maintain plasma in the plasma confinement tube; and a capacitive shield including a layer of a conductive material applied to the outer surface of the plasma containment tube or the inner surface of the tubular torch body, the layer of conductive material being segmented into axial strips and the axial strips connected to one another at one end and wherein the inductive coupling element is embedded within the tubular torch body and axial grooves are formed in the outer surface of the plasma containment tube or the inner surface of the tubular torch body, one of the axial grooves being arranged between a pair of laterally adjacent axial strips
  • the object of the invention is achieved in the device mentioned at the outset for providing a plasma in that the second flow channel is connected to a second connection for a gaseous fluid to form a protective volume flow between a surface of the plasma generating element and the heated gas flow flow s.
  • the object of the invention is achieved with the device mentioned at the outset for the thermal treatment of a substance, which has the device according to the invention for providing a plasma.
  • the object of the invention is achieved with the method mentioned at the outset, according to which it is provided that the gaseous fluid is guided in the plasma generation element in the form of a central gas stream which is surrounded by a protective gas stream.
  • the advantage here is that the protective gas flow makes it easier or better to protect the wall of the plasma generation element from overheating. At the same time, however, it is possible to provide a relatively hot central gas stream so that more energy can be introduced into the material to be thermally treated if necessary.
  • the shape of the plasma torch can also be influenced with the protective gas flow. In addition, this makes it easy to supply various gaseous fluids to the plasma generation element.
  • the second flow channel is formed by the plasma generation element itself. This also makes it possible to simplify the design of the plasma generation element.
  • At least one further flow channel is arranged in the plasma generation element, which is connected to a further connection for a further gaseous fluid flow s, the further flow channel being at an angle to the first at least in an end section facing the first flow channel
  • Flow channel is arranged running, with the supply of the gaseous fluid via the at least one further flow channel
  • Temperature of the plasma stream and/or hot gas stream formed from the protective gas stream and the central gas stream can be changed, or in accordance with an embodiment variant of the method it can be provided that a further gaseous fluid is mixed into the gaseous fluid formed from the protective gas stream and the central gas stream in the plasma generation element.
  • a simple possibility of regulating the temperature of the plasma torch can also be achieved, which means that the device for plasma generation can be adjusted more easily to different thermal treatments or different substances that are being treated .
  • the position of the plasma torch can also be changed or adjusted.
  • At least the end section of the further flow channel encloses an angle with the first flow channel, which is selected from a range of 5 0 and 80 °.
  • each of the flow channels extends over a circular ring segment that is selected from a range of 20 to 88 °. In addition, this makes it easier to control the change in the position of the plasma torch.
  • a simpler provision of the gaseous fluids or a simpler volume flow control of the supply of these gaseous fluids can be achieved if, according to an embodiment variant of the invention, it is provided that the first connection is for a gaseous fluid and the second connection is for a gaseous fluid and/or the further connection for a gaseous fluid are flow-connected to a gas supply device, in particular from a common gas supply device.
  • the first connection is for a gaseous fluid and the second connection is for a gaseous fluid and/or the Further connection for a gaseous fluid with the same gas composition is supplied by the gas supply device, which can simplify the regulation of the individual fluid flows in the plasma generation element.
  • At least one fresh gas supply and at least one circulating gas supply opens into the gas supply device for providing at least a portion of at least one of the gaseous fluids, the circulating gas supply being connectable to a device for the thermal treatment of a substance, in particular an oven is into which the hot fluid generated by the plasma generation element can be introduced.
  • At least one conveying element for the circulating gas is arranged in the circulating gas supply. This means that an overpressure can be achieved in the circulating gas system.
  • the circulating gas fed with excess pressure into the supply of the gaseous fluids to the plasma generation element and subsequently into the device for thermal treatment of a substance can prevent the penetration of oxygen-containing gases from the environment of the device and thus oxidative problems also in the device for thermal treatment having the device of a substance.
  • the plasma generating element can have a connection for an ignition gas, which on the one hand can simplify the ignition of the plasma, but on the other hand can also expand the spectrum of gaseous fluids that can be used in the device for providing a plasma.
  • At least one heat exchanger for heating the newly supplied gaseous fluid is arranged in the fresh gas supply.
  • the heat exchanger can be used to further improve the energy balance of the device. In particular, excessive cooling of the circulating gas can be avoided.
  • the heat for heating the fresh gas can come, for example, from a residual gas stream that is removed from the system, for example introduced into a chimney, etc.
  • the inside of the first flow channel and/or the inside of the second flow channel can have a reflective coating at least in sections. It can thus be achieved that thermal energy radiated in the direction of the wall(s) is reflected back in the direction of the hot fluid flow. This also means that the plasma generating element can be better protected against overheating.
  • the reflective coating is arranged in a strip-shaped or column-shaped or helical manner. This design of the coating makes it possible to better avoid a reduction in the effectiveness of the inductive energy feed into the gaseous fluid.
  • this embodiment can also be designed so that the plasma generation elements have different outputs. It is therefore easier to adapt the device for generating plasma to different processes, for example by operating one of the plasma generating elements, in particular the one with a lower power, in the range from 0% to 100% power, and the remaining plasma generating elements in full load operation. This in turn can also improve the energy balance of the device.
  • a treatment chamber for the material in which the possibly present receptacle is arranged, is fluidly connected to an exhaust gas line, with at least one flap and/or at least one slide and/or at least in the exhaust gas line a cross-sectional taper element is arranged.
  • This makes it possible to easily regulate the pressure around the plasma generation element, which means that additional pressure regulation in the treatment chamber can be dispensed with if necessary.
  • the treatment chamber and / or the device for providing a plasma has / have a supply device for the introduction of solid particles that increase the thermal radiation .
  • the plasma is generated inductively with at least one electrical induction coil, and that further the temperature of the induction coil and/or a temperature increase of a cooling liquid for the induction coil and/or a temperature change of the wall of the plasma generation element in the area of Hot gas outlet or the plasma flow outlet is measured and the volume flow of the central gas flow is changed based on this measured value when the temperature changes.
  • the efficiency of the device for generating a plasma can thus be improved by shifting a predefinable volume flow ratio of the protective gas flow to the central gas flow in favor of the central gas flow.
  • embodiment variants of the method can provide that a temperature of the protective gas stream is measured and, based on this measured value, the volume flow of the protective gas stream is changed in the event of a temperature change and/or that a gas pressure in the plasma generating element is regulated by changing the volume flow in an exhaust pipe from the treatment chamber in which the material is thermally treated.
  • the residual gas flow withdrawn from the system can be minimized.
  • the temperature of the central gas stream is calculated and, based on this calculated value, at least one volume flow of the supplied gases, in particular the volume flow of the central gas stream, is changed when the temperature changes. In this way, it is easier to take the central gas flow into account without having to make major design changes to the plasma generation element.
  • Fig. 1 shows a device for the thermal treatment of a material
  • FIG. 2 shows a detail of a device for providing a plasma
  • FIG. 3 shows a detail from an embodiment variant of a device for providing a plasma
  • FIG. 4 shows a detail from a further embodiment variant of a device for providing a plasma
  • FIG. 5 shows a detail from a further embodiment variant of a device for providing a plasma
  • Fig. 8 shows a jet pump in a longitudinal section
  • FIG. 9 shows a detail from an embodiment variant of the device for providing a plasma
  • FIG. 10 shows an embodiment variant of a device for the thermal treatment of a material
  • Fig. 11 shows a further embodiment variant of a device for the thermal treatment of a material.
  • the same parts are provided with the same reference numbers or the same component names, whereby the disclosures contained in the entire description can be transferred analogously to the same parts with the same reference numbers or the same component names.
  • the position information selected in the description is also related to the figure directly described and shown and, if the position changes, these position information must be transferred accordingly to the new position.
  • a first and a second gaseous fluid as well as a further gaseous fluid are listed below. These fluids can be different gases or the same gases. Furthermore, the gaseous fluids can be pure gases or gas mixtures.
  • fresh gas recirculation gas
  • exhaust gas also referred to as plasma gas
  • process gas also referred to as plasma gas
  • the fresh gas and the process gas can be formed by at least one of the gaseous fluids mentioned in the previous paragraph.
  • the circulating gas is - as the name suggests - circulated in the device according to the invention and used again to generate plasma. It therefore changes from the exhaust gas back into the process gas.
  • hot fluid and “hot fluid stream” are also used in this description. In the sense of the description, these terms are used both for a plasma stream that is directed directly onto a substance to be treated and for a hot gas stream, i.e. a gas stream that is heated with a plasma and which is subsequently directed onto the substance to be treated or is used for the thermal treatment of the material.
  • gases suitable for forming a plasma can be used as gaseous fluids, such as nitrogen, argon, neon, xenon, air, carbon dioxide, carbon monoxide, hydrogen, gaseous water, or a mixture of at least two of these gases.
  • device 1 shows a device 1 for the thermal treatment (hereinafter referred to as device 1) of a material 2.
  • the substance 2 can be a liquid or a gas. However, the substance 2 is preferably a solid, in particular a metallic solid.
  • the thermal treatment can be the melting of the substance 2 or the tempering of the substance 2, for example maintaining a certain temperature, or the heating of the substance 2.
  • the thermal treatment can also include a chemical reaction that is carried out at an elevated temperature.
  • This list of possible uses of the device 2 is only to be understood as an example, with the melting of a metallic solid being one of the preferred applications. Since the areas of application of the device 1 are different, the schematic representation in FIG. 1 is not to be understood as limiting, but rather as merely illustrating the invention.
  • the device 1 includes a receptacle 3 for the substance 2.
  • the receptacle 3 can be formed by a separate container in which the substance 2 is located. In the case of a gas or in general, the receptacle 3 can also just be a housing 4 of a treatment chamber 5 or a chamber of the treatment chamber 5 in which the material 2 for the thermal treatment is located.
  • the separate container mentioned, if present, is also arranged in the treatment chamber 5.
  • receptacle 3 for the substance 2 can be arranged in the treatment chamber 5, whereby different substances 2 can also be accommodated in the receptacles 3, for example in order to carry out a chemical reaction.
  • the device 1 further comprises a device 6 for providing a plasma (hereinafter referred to as device 6), with which the thermal energy for the thermal treatment of the material 2 is provided.
  • the device 6 is arranged on the housing 4 of the treatment chamber 5 in such a way that a plasma torch or a plasma stream or a hot gas stream 7, which is generated with the plasma from the process gas, extends into or towards the treatment chamber 5.
  • the device 6 comprises at least one plasma generation element 8.
  • FIG. 8 An embodiment variant of the plasma generating element 8 (also referred to as a plasma torch) is shown in detail in a longitudinal section in FIG.
  • the plasma generating element 8 has an element body 9 (also referred to as a burner body). At least one electrical induction coil 10 for plasma generation is arranged in or on the element body 9. Several induction coils 10 can also be used, which can optionally be regulated and/or controlled independently of one another can be carried out. The plurality of induction coils 10 can be arranged one behind the other in the flow direction of the gaseous fluid(s).
  • the plasma can also be generated differently, for example by means of a magnetron or generally with microwaves (for example generated by means of a solid state microwave generator) or by means of two electrodes, etc.
  • first flow channel 11 for a first gaseous fluid and a concentrically arranged second flow channel 12 for a second gaseous fluid are arranged in the element body 9.
  • the first flow channel 11 is arranged at least in sections, for example in the area above or a partial area of the arrangement of the induction coil 10 within the second flow channel 12.
  • the first and second flow channels 11, 11 can be tubular, for example with a circular cross section.
  • the first and/or the second flow channel 11, 11 can be formed, for example, from a quartz glass tube or an aluminum oxide tube or a boron nitride tube, etc.
  • the second flow channel 12 can be arranged at a distance 13 from a surface 14 of the element body 9 (in particular that surface 9 behind which the induction coil 10 is arranged), which is selected from a range of 0 mm to 30 mm, in particular 0 mm up to 20 mm.
  • the first flow channel 11 can be arranged at a radial distance 15 from the two flow channel 12, which is selected from a range of 0.1 mm to 40 mm, in particular 0.4 mm to 30 mm.
  • the speed of the protective gas stream 20 can also be adjusted via the distance.
  • the first flow channel 11 has a first connection 16, i.e. a first supply, for the first gaseous fluid and the second flow channel 12 has a second connection 17, i.e. a second supply, for the second gaseous fluid.
  • first and second connections 16, 17 can be fed by a common supply line 18 for the gaseous fluids.
  • completely separate/independent feeds for the first and second gaseous fluid can also be present.
  • the first gaseous fluid is fed via the first connection 16 to the first flow channel 11 to form a heated gas stream (central gas stream 19).
  • the second gaseous fluid is fed to the second flow channel 12, which forms a protective volume flow (protective gas flow 20) between the surface 14 of the plasma generating element 8, ie the element body 9, and the heated gas flow or the plasma flow.
  • Both gas streams, i.e. the central gas stream 19 and the protective gas stream 20 leave the plasma generating element 8 together via an outlet 21, ie an outflow opening, in order to be available for the thermal treatment of the substance 2.
  • the representation of the plasma generation element 8 in FIG. 2 is of an exemplary nature.
  • the specific arrangement of the individual elements in the plasma generation element 8 can also be designed differently as long as the functionality is retained.
  • FIG. 3 shows a further and possibly independent embodiment of the plasma generating element 8 in longitudinal section and schematically, with the same reference numbers or component names as in FIGS. 1 and 2 being used for the same parts. In order to avoid unnecessary repetitions, reference is made to the above description.
  • the first flow channel 11 ends at a distance from the outlet 21 of the plasma generating element 8, whereby, among other things, the effect of the induction coil 10 on the central gas flow 19 can be improved.
  • the specific distance to the output 21 depends on the respective design of the plasma generating element 8.
  • the second flow channel 12 is delimited to the outside by the surface 14 of the element body 9 of the plasma generating element 8, i.e. by that Plasma generation element 8 is formed itself.
  • the second flow channel 12 is formed by its own channel element 22, as is the case in the embodiment variant according to FIG. 2 and is shown in dashed lines in FIG. 3, but this channel element 22 is directly on the surface 14 of the element body 9 is arranged adjacently.
  • this channel element 22 can also be formed as a coating on the surface 14 of the element body 9. The coating can, for example, be formed at least partially from silver, gold, aluminum, etc. Of course, this is also the case Embodiment variant of the plasma generating element 8 according to FIG. 3, the spaced arrangement of the channel element 22 shown in FIG. 2 is possible.
  • the induction coil 10 can be arranged at a short distance from the surface 14 of the element body 9.
  • the induction coil 10 can be designed to be cooled, for which purpose it can have a cooling channel 23. Water, a cooling oil, etc., for example, can be used as a cooling medium that can flow through the cooling channel 23.
  • the further flow channel 24 is arranged or formed in the plasma generating element 8.
  • the further flow channel 24 can be formed in the element body 9 of the plasma generating element 8.
  • the further flow channel 24 is connected to a further connection 25 for a further gaseous fluid flow.
  • the further connection 25 can also be connected to the supply line 18 (see FIG. 2), so that all three gaseous fluids have the same composition.
  • a completely independent supply of the further gaseous fluid, independent of the supplies of the first and second gaseous fluid is also possible.
  • the further flow channel 24 is designed to run obliquely to the first flow channel 11 and to the second flow channel 12, with an angle 26 between the flow channels 11 or 12 and 24 being formed such that a flow direction through the The gas stream formed by the third fluid, in particular a cooling gas stream 27, runs in the direction of the center or in the direction of a longitudinal central axis 28.
  • the further flow channel 24 runs over its entire length in the plasma generating element 8, i.e. in the element body 9, with the same angle of inclination.
  • the end section begins at an outlet opening 29 of the further flow channel 24 in the plasma generation element 8.
  • the further flow channel 24 can therefore be designed with different inclination angles when viewed over its length or the further flow channel 24 can also have a curved course.
  • the further flow channel 24 enables the supply of the further gaseous fluid to change the temperature of the protective gas stream 20 and the central gas stream 19 formed hot gas stream 7 or plasma stream. If necessary, the position of the hot gas stream 7 or the plasma stream or the plasma torch can also be changed.
  • the angle 26, which at least the end section of the further flow channel 24 includes with the first and second flow channels 11, 12, can be selected from a range of 10 0 and 80 °, in particular from a range of 15 0 up to 70 °.
  • the angle can be 26 20 0 or 30 0 or 40 0 or 45 0 or 50 0 or 60 0 .
  • FIG. 4 shows, which shows a top view of a section of an embodiment variant of the plasma generation element 8 in cross section, several further flow channels 24 can be provided, for example four or only two or three or more than four, for example five or six, etc Several further flow channels 24 are arranged distributed along a circular circumference (or circumference), which is defined by the second flow channel 12, in particular evenly distributed or symmetrically distributed. Webs 30 of the element body 9 can be formed between the individual further flow channels 24.
  • the second flow channel 12 can also be divided into several second flow channels 12, which are arranged distributed over the circumference of the first flow channel 11.
  • each of the several further flow channels 24 extends - as shown in FIG. 4 - over a circular ring segment (or a circular ring section).
  • the circular ring segments can be selected from a range of 20 to 88°.
  • the circular ring segments can extend over a range from 10 0 to 80 0 or a range from 20 0 to 70 °.
  • a single circular ring segment can also extend over a range from 10 0 to 358 0 .
  • annulus segments can extend over a range from 2 0 to a value defined by 360 "/number of annulus segments - 1 0 , in particular up to a value defined by 360 "/number of annulus segments - 5 ° .
  • the multiple circular ring segments can all have the same length in the circumferential direction. However, at least one of the circular ring segments can also have a different length in the circumferential direction than the other circular ring segments.
  • the device 6 there is the possibility that it has a gas supply device 31.
  • the plasma generating element 8 is supplied not only with the first gaseous fluid, but also with the second and the further gaseous fluid from the gas supply device 31, as indicated by dashed lines in FIG. 1.
  • the first connection 16 for the first gaseous fluid and the second connection 17 for the second gaseous fluid and/or the further connection 25 for the further gaseous fluid can be connected to the gas supply device 31 flow s.
  • connections 16, 17 and 25 are fluidly connected to their own gas supply device 31.
  • first connection 16 for the first gaseous fluid and the second connection 17 for the second gaseous fluid and the further connection 25 for the further gaseous fluid can each be supplied with the same gaseous fluid or at least two of them or all with different gaseous fluids or .
  • the first connection 16 can be supplied with a fresh gas
  • the second connection 17 and/or the further connection 25 can be supplied with a circulating gas.
  • at least one fresh gas supply 32 and at least one circulating gas supply 33 open into the gas supply device 31 in order to provide at least a portion of at least one of the gaseous fluids, as shown in dashed lines in FIG.
  • the circulating gas supply can be connected to the device 1 for the thermal treatment of the material 2, in particular an oven, into which the hot gas or plasma generated by the plasma generating element 8 can be introduced.
  • the circulating gas is introduced directly into the plasma generating element 8, without the detour via the gas supply device 31, as shown in full lines in FIG.
  • at least one conveying element 34 for example a jet pump, for the circulating gas is arranged in the circulating gas supply.
  • conveying element 34 reference is also made to the following statements.
  • the plasma generating element 8 has a connection 35 for an ignition gas 36, for example argon, in order to improve or accelerate the formation of the plasma or to also use less suitable gases for the To be able to feed the plasma into the device 6.
  • an ignition gas 36 for example argon
  • At least one heat exchanger 37 is arranged in the fresh gas supply 32 for heating the newly supplied gaseous fluid (the fresh gas).
  • the heat exchanger can be designed according to the state of the art.
  • the fresh gas supply 32 is connected to the gas supply device 31.
  • the fresh gas supply 32 is connected directly to the plasma generating element 8, as shown in dashed lines in FIG. 1.
  • FIG. 5 shows a further and possibly independent embodiment of the plasma generating element 8 in a longitudinal section and schematically, with the same reference numbers or component names being used for the same parts as in FIGS. 1 to 4. In order to avoid unnecessary repetitions, reference is made to the above description.
  • the first flow channel 11 has/have a reflective coating 38 on the inside and/or the second flow channel 12 on the inside.
  • This coating 38 can extend over the entire length or only a portion of the length of the first flow channel 11 and/or the second flow channel 12, for example only in an initial region or an end region and/or a central region of the first flow channel 11 and/or the second Flow channel 12 extend.
  • the coating 38 can also consist of sections with different compositions in order to ensure that the Temperature distribution in the plasma generation element 8 to correspond better, since the radiation maxima occur at different wavelengths depending on the temperature. The radiation maxima shift to shorter wavelengths at higher temperatures.
  • a material can be selected for coating sections corresponding to the respective wavelength or wavelength range, which is particularly effective at the respective maximum of the radiation.
  • a coating made of aluminum can be more effective than one made of gold or silver. At longer wavelengths this can be exactly the opposite.
  • the coating 38 can be made metallic, for example.
  • the coating 38 may be formed by silver, gold, platinum, aluminum, or an alloy with at least one of these metals. This makes it possible, among other things, to adjust or change or increase the quantity of reflected radiation and/or the wavelength range of the reflected radiation.
  • the wavelength range of the reflected radiation can be covered to wavelengths of less than 500 nm or less than 200 nm using alloys or alloy elements in order to increase the proportion of reflected radiation in this wavelength range.
  • the coating 38 in addition to the circumferential, full-surface design of the coating 38, according to one embodiment variant, there is also the possibility of designing it in strips or columns, as is indicated in FIG. 5 using the strips 39 shown in dashed lines.
  • the strips 39 can have a width in the circumferential direction of the first flow channel 11 or the second flow channel 12, which is selected from a range between 0.1% and 20%, in particular between 1% and 10%, of the circumference of the first flow channel 11 or .the second flow channel 12.
  • the strips 39 can be arranged at a distance 40 from one another, which is selected from a range between 0.1% and 20%, in particular between 1% and 10%, of the circumference of the first flow channel 11 or the second flow channel 12.
  • strips 39 can all be made of the same material. However, they can also consist of different materials, for example strips 39 made of metals with different levels of reflection can be combined with one another in a plasma generating element 8. Different materials can also be provided for the continuous coating 38 by forming it in sections from different materials, as explained above.
  • the strips 39 have a longitudinal extension in the direction of the longitudinal central axis 28 through the first flow channel 11.
  • the strip shape of the coating 38 can also be achieved by one or more helical configuration(s), whereby here too, distances can be formed between the coated sections (e.g. in the form of a helical, uncoated section).
  • the strips 39 can be designed as a coating 38. However, they can also be manufactured as separate components and subsequently connected to the first flow channel 11 or the second flow channel 12. The same applies to the coating 38 itself, in that it is manufactured as a tube and is inserted into the first flow channel 11 or the second flow channel 12. There is also the possibility that the first flow channel 11 or the second flow channel 12 is made from a correspondingly reflective material or with a correspondingly reflective surface, for example due to a developed surface structuring.
  • FIGS. 1 to 5 further and possibly independent embodiments of the device 6 are shown schematically and in sections, with the same reference numbers or component names as in FIGS. 1 to 5 being used for the same parts. In order to avoid unnecessary repetitions, reference is made to the above description.
  • plasma generation elements 8 it always only had one plasma generating element 8. However, it is also possible for several plasma generation elements 8 to be arranged in the device 6. For this purpose, embodiment variants with three or five plasma generation elements 8 are shown as examples in FIGS. 6 and 7. Only two or four or more than five, for example six, etc., plasma generation elements 8 can also be arranged in a device 6. The plasma generating elements 8 can all have the same heating power or a different heating power, as is indicated in FIGS. 6 and 7 with different sized versions of the plasma generating elements 8. It should also be noted again that the specific representations should be understood as examples. Other designs are also possible, such as three plasma generation elements 8 with the same heating power and one plasma generation element 8 with a lower heating power in comparison, in order, for example, to be able to compensate for peak loads with this “smaller” plasma generation element 8.
  • the plasma generation elements 8 are operated with 100% power (300 kW each), or that with a desired 700 kW power, the plasma generation elements 8 are operated with 78% power each, or that with the desired 600 kW power, two plasma generation elements 8 are operated with 100% power each and the third with 0% power, or that with the desired 300 kW power, one plasma generation element 8 with each 100% power and the other two are operated at 0% power. It can also be provided that at a maximum load of 400 kW, two plasma generation elements 8 are operated at 100% and one plasma generation element 8 is operated at 25% power. It can be provided that at a maximum load of 400 kW, two plasma generation elements 8 are operated with 0% and one plasma generation element 8 with 25% power in order to obtain 100 kW of desired power.
  • the multiple plasma generation elements 8 can all be designed the same, so that the statements regarding the plasma generation element 8 in this description can be applied to all plasma generation elements 8.
  • the treatment chamber 5 is connected to an exhaust gas line 41 flow s, with at least one flap 42 and/or at least one slide and/or at least one cross-sectional tapering element 43 being/are arranged in the exhaust gas line 41.
  • the cross-sectional taper element 43 can be designed, for example, as a diaphragm, possibly an adjustable diaphragm with a variable diameter of the through opening.
  • At least one flap 42 or the at least one slide or the at least one cross-sectional tapering element 43 it is possible to control or regulate the volume flow of the exhaust gas that leaves the device 1 via a diverting element 44, for example a chimney.
  • the rest of the exhaust gas becomes recirculation gas and can be fed back into the process as such via the recirculation gas supply 32.
  • the portion that leaves the device 1 through the diverting element 44 can be replaced with fresh gas via the fresh gas supply 33. It is therefore possible to control and/or regulate the volume flow ratio of circulating gas/fresh gas via the control and/or regulation by means of the at least one flap 42 and/or the at least one slide and/or the at least one cross-sectional tapering element 43. Furthermore, pressure control of the pressure in the treatment chamber 5 is also possible.
  • the treatment chamber 5 and/or the device 6 for providing a plasma has/have a feed device 45 for the introduction of solid particles that increase the thermal radiation.
  • This feed device 45 can be, for example, a nozzle, so that the solid particles can be finely distributed into the treatment chamber 5 or the plasma generating element 8 or generally the device 6.
  • the feed device 45 can also be designed differently.
  • the solid particles can be formed by graphite, a metal such as iron or copper or aluminum. Solid particles can also be used which react with the substance 2 in the treatment chamber 5, for example to form an alloy.
  • the solid particles can, for example, have an average particle size between 0.1 pm and 1000 pm.
  • a plasma can be provided which can heat a gas stream, so that the resulting hot gas stream 7 or the plasma stream itself can be used for the thermal treatment of a substance 2.
  • a gaseous fluid is introduced into at least one plasma generating element 8 of the device 6 and in which Plasma generating element 8 generates a plasma.
  • the gaseous fluid is guided in the plasma generating element 8 in the form of a central gas stream 19, which is surrounded by a protective gas stream 20.
  • a further gaseous fluid is mixed into the gaseous fluid formed from the protective gas stream 20 and the central gas stream 19 in the plasma generation element 8, the temperature and/or the position of a plasma torch being optionally adjusted or regulated with the further gaseous fluid.
  • the temperature of the induction coil 10 and/or a temperature increase of the cooling liquid flowing through the cooling channel 23 of the induction coil 10 and / or a temperature change in the wall of the plasma generating element 8 is measured in the area of the hot gas outlet or plasma outlet from the plasma generating element 8. Based on this measured value, for example, the volume flow of the central gas stream 20 can be changed in the event of a temperature change.
  • the temperature can be measured using known methods.
  • at least one thermocouple can be arranged in or on the wall of the plasma generating element 8 in the area of the plasma gas outlet.
  • a temperature of the protective gas stream 20 to be measured and, based on this measured value, the volume flow of the protective gas stream 20 to be changed in the event of a temperature change and/or for a gas pressure in the plasma generating element 8 to be regulated via a change in the volume flow in the exhaust gas line 41 from a treatment chamber 5 becomes.
  • the temperature of the central gas stream 19 can be calculated and, based on this calculated value, at least one volume flow of the supplied gases, in particular the volume flow of the central gas stream 19, to be changed when the temperature changes.
  • the calculation can be carried out using the formula T ca ic x cp ca ic x the sum of the volume flows, S(Vi x Ti x cp the sum of the products from the respective volume flow times the temperature of the respective one Volume flow x the specific heat capacity of the respective volume flow and Pinduction, the inductively applied power.
  • the volume flows relate to the protective gas flow 20, the central gas flow 19 and any existing volume flow that is supplied via the at least one further flow channel 24.
  • the temperature to be calculated can be obtained by transforming the equation accordingly.
  • One of these independent inventions is the device 6 for providing a plasma comprising at least one plasma generating element 8 with at least one inlet 46 and an outlet 47 for a gaseous fluid, the first flow channel 11 being arranged or formed in the plasma generating element 8, possibly concentric thereto arranged second flow channel 12, which at least partially surrounds the first flow channel 11, is arranged, wherein the first flow channel 11 is connected to the first connection 16 for a gaseous fluid to form a heated gas stream or a plasma stream flow s.
  • the at least one inlet 46 is formed by the connection 16 for the gaseous fluid.
  • the plasma generating element 8 can also have several inlets 46, via which the further gaseous fluids can be introduced the plasma generating element 8 can be introduced. Please refer to the above statements.
  • the conveying element 34 for the gaseous fluid or several conveying elements 34 for gaseous fluids are also present or arranged.
  • the conveying element 34 is or the conveying elements 34 are fluidly connected to the inlet 46 of the plasma generating element 8.
  • only one conveyor element 34 will be discussed in more detail. If there are several conveying elements 34, some or all of them can be designed the same way, so that the following statements can also be applied to these conveying elements 34.
  • the gaseous fluid conveyed by this can be accelerated or is thereby accelerated.
  • the plasma generating element 8 can be fluidly connected to the gas supply device 31, which can preferably also have the fresh gas supply 32 and/or a circulating gas supply 33 for a circulating gas.
  • the gas supply device 31 can preferably also have the fresh gas supply 32 and/or a circulating gas supply 33 for a circulating gas.
  • the conveying element 34 is arranged in a circulating gas guide for the circulating gas, which is fluidly connected to the outlet 47 of the plasma generating element 8.
  • the output of the plasma generating element 8 is not directly fluidly connected to the conveying element 34, but at least the treatment chamber 5 is arranged between them.
  • the conveying element 34 can be a jet pump 48, as shown by way of example in FIG. 8.
  • the jet pump 48 has a first gas connection 49 and a propellant connection 50 as well as an outlet 51.
  • the first gas connection 49 can be connected to the fresh gas supply 32 or preferably to the circulating gas supply (see FIG. 1), so that fresh gas or circulating gas, which comes in particular from the exhaust gas of the treatment chamber 5, can be accelerated.
  • a propellant in particular gaseous, is supplied to the propellant connection 50 under excess pressure.
  • This excess pressure is converted into speed in the jet pump 48 through a cross-sectional narrowing 52 through which the propellant has to pass. This creates a negative pressure in the first gas connection 49, which entrains and accelerates the gas supplied there.
  • any suitable blowing agent can be used, with gaseous blowing agents being preferred.
  • a fresh gas is used as the propellant, which is also supplied to the plasma generating element 8, so that the propellant connection 50 in this embodiment variant is connected to the fresh gas supply, for example via the gas supply to the device 31, as shown in FIG is shown.
  • the volume flow of the circulating gas flow is regulated with the volume flow of fresh gas that is supplied to the jet pump 48.
  • This can be done, for example, via a control element 52, which is arranged in the fresh gas supply to the jet pump, as can also be seen from FIG.
  • the control element 52 can be, for example, a flap, a slide or a valve.
  • the device 1 or the device 6 can have a regulating and / or control device 53, to which the corresponding data from the measuring sensors of the device 1 or device 6 can be provided wirelessly or by wire and which has the corresponding control devices. and/or can output control signals, for example to change the volume flows of the process gases.
  • a controllable jet pump 48 can also be used to change or regulate the volume flows.
  • the controllable jet pump 48 can be designed with a control of the volume or quantity flow of fresh gas, which is supplied to the jet pump 48 as a propellant.
  • FIGS. 1 to 8 show a further and possibly independent embodiment of the device 6 for providing a plasma, with the same reference numbers or component names as in FIGS. 1 to 8 being used for the same parts. In order to avoid unnecessary repetitions, reference is made to the above description.
  • the inlet 46 of the plasma generating element 8 is fluidly connected to a further fresh gas supply 32.
  • a heat exchanger 54 is arranged in front of the conveying element 34 in the flow direction of the gaseous fluid, in particular the circulating gas.
  • a further heat exchanger 55 can be arranged in the further fresh gas supply 32.
  • the heat exchanger 54 and the further heat exchanger 55 can be designed according to the prior art.
  • the further heat exchanger 55 can be fluidly connected to the heat exchanger 54 in front of the conveying element 34. This can ensure that the circulating gas can be cooled in the heat exchanger 54 and the thermal energy obtained can be transferred to the fresh gas, which is supplied to the plasma generating element 8 via the further fresh gas supply 32.
  • the heat exchanger 54 in the circulation gas supply 33 can also be connected to the heat exchanger 37 of the device 1 (see FIG. 1) for the transmission of thermal energy.
  • conveying elements 34 that are less thermally resilient, such as, for example, according to an embodiment variant of the device 6, a fan or a turbine.
  • conveying elements 34 that can be used are a pump, a vacuum pump, a compressor, an injector, etc.
  • At least one filter element is arranged in front of the conveying element 34 in the flow direction in order to be able to supply a purer gas to the conveying element 34.
  • abrasive loads or blockages on the conveying element 34 and the plasma generating element 8 can be reduced or avoided.
  • FIGS. 10 and 11 Further and possibly independent embodiments of the device 1 are shown schematically in FIGS. 10 and 11, with the same reference numbers or component names as in FIGS. 1 to 9 being used for the same parts. In order to avoid unnecessary repetitions, reference is made to the above description.
  • the device 1 for the thermal treatment of the material 2 of these embodiment variants again includes the treatment chamber 5 and at least one device 6 for providing a plasma, the treatment chamber 5 having an inlet 56 and an outlet 57 for the supply and removal of a gaseous fluid into and from the Treatment chamber 5 has.
  • the outlet 57 of the treatment chamber 5 is connected to at least one heat exchanger 58 flow s, the heat exchanger 58 having an inlet 59 and an outlet 60 for the supply and removal of the gaseous fluid.
  • the gaseous fluid is preferably the exhaust gas from the treatment chamber 5, which is circulated through the device 1.
  • the heat exchanger 58 has at least one heat storage element 61.
  • the heat storage element 61 can, for example, be made of a material based on or with aluminum oxide (Al2O3), silicon dioxide (SiCF), iron (III) oxide (Fe2O3), titanium dioxide (TiCF), potassium oxide (K2O), calcium oxide (CaO), sodium oxide (Na2O ), etc., be educated.
  • the at least one heat storage element 61 serves to absorb heat from the gaseous fluid that is passed through the heat exchanger 58 and to store it for later use.
  • At least one further heat exchanger 58 is provided, which also has at least one heat storage element 61.
  • the gas removed from the process and stored in the heat storage element 61 stored thermal energy can be used for another process, for example.
  • the thermal energy extracted from the process gas when it is cooled is used as heating energy for space heating and/or water heating and/or for generating electricity.
  • the at least one heat exchanger 58 is arranged in a fluid circuit which connects the outlet 57 of the treatment chamber 5 with the inlet of the treatment chamber 56.
  • the process gas i.e. in this case the cycle gas, is used again in the process itself.
  • this is achieved by using at least two heat exchangers 58, each with at least one heat storage element 61.
  • the hot circulating gas is passed from the outlet 57 into the first heat exchanger 58.
  • this is the upper of the two heat exchangers 58.
  • the circulating gas is cooled and the extracted thermal energy is stored in its heat storage element 61.
  • the cooled cycle gas is fed into a gas conveying element 62, such as a fan or one of the aforementioned conveying elements 34.
  • a gas conveying element 62 such as a fan or one of the aforementioned conveying elements 34.
  • the outlet 60 of the first heat exchanger 58 can be fluidly connected to the gas conveying element 62.
  • the gas delivery element 62 can build up the pressure in order to guide the circulating gas through the heat exchanger 68 or in the circuit.
  • the circulating gas is mixed with a cooler fresh gas before the gas conveying element 62.
  • the fresh gas can, for example, be injected into the cooled cycle gas.
  • the fresh gas can be supplied, for example, via the gas supply device 31.
  • a supply element for supplying a cooling medium, such as the fresh gas, into the gaseous fluid can be arranged in front of the gas conveying element 62 in the flow direction of the gaseous fluid.
  • (pre)cooling of the circulating gas can also take place at another location. It is also possible for a partial flow of the circulating gas to be branched off and, if necessary, fed to separate cooling with another heat exchanger in order to achieve a to avoid thermal overloading of the heat storage elements 61. It can be provided that the separately cooled partial gas stream is fed to the heat exchanger 58, ie to the at least one heat storage element 61, which is not heated but is (thermally) discharged.
  • a cooler fresh gas is introduced into the hot circulating gas stream before the entrance 59 or at the entrance 59, for which purpose a fresh gas supply is provided at the entrance 59 or before the entrance 59 of the heat exchanger 58 for the gaseous fluid can be arranged.
  • the gas conveying element 62 can also be arranged at another location on the device 1.
  • the cooled cycle gas preferably with the gas conveying element 61, reaches the second (lower) heat exchanger 58 via the inlet 59.
  • the inlet 59 of the second heat exchanger 58 is connected directly or indirectly to the outlet 60 of the first heat exchanger 58 the gas delivery element 61 flow s connected.
  • the at least one heat storage element 61 of the second heat exchanger 58 is already heated in normal operation, i.e. not in the start-up phase of the device 1, so that the circulating gas is heated again in this second heat exchanger 58.
  • the heat storage element 61 of the second heat exchanger 58 cools down.
  • the heated cycle gas is supplied again as process gas via the outlet 60 of the second heat exchanger 58, which is fluidly connected to the inlet 56 of the treatment chamber via the plasma generating element 8. Beforehand, it is heated to the desired process temperature in the plasma generation element 8.
  • the first heat exchanger 58 reaches a critical temperature. This can be predefined, for example, by the temperature load capacity of the gas conveying element 62.
  • cycle flaps 63 or other suitable elements for changing the flow direction of the gas can change their position accordingly, so that the exhaust gas from the treatment chamber 5 subsequently first passes through the second (lower) heat exchanger 58 for cooling and then via the first (upper) heat exchanger 58 for reheating.
  • the second heat exchanger 58 becomes the first heat exchanger 58 and the first heat exchanger 58 becomes the second heat exchanger 58.
  • This cycle then runs again until the critical temperature is reached again and the cycle flaps 63 change their position again.
  • the change in the position of the cycle flaps 63 or the elements mentioned is preferably carried out fully automatically.
  • a temperature sensor can be arranged in each of the heat exchangers 58, which deliver corresponding measurement signals.
  • the hot gas or the hot exhaust gas can be supplied via the upper part of the heat exchanger 58. It gives off its heat to the heat storage elements 61, i.e. the respective heat storage element 61 that is in the correct rotational position.
  • the cooled exhaust gas (circulation gas) is then fed back to the plasma generation element 8 as process gas.
  • the thermal energy reaches the also fixed lower part of the heat exchanger 58 via the heat storage elements 61 and can heat the cold fresh air supplied here. This becomes hot and the heat storage elements 61 cool down again and are available for a new load.
  • This process can be controlled via a temperature sensor, e.g. a thermocouple, in the cold exhaust gas.
  • the amount of heat stored per heat storage element 61 can be specified via the speed of the heat exchanger 58.
  • the heated fresh gas can subsequently be supplied to the plasma generating element 8.
  • восем ⁇ heat storage elements 61 are provided. However, fewer or more than eight heat storage elements 61 can also be used, for example three or four or five or six or seven or nine or ten, or significantly more than eight, such as more than 100, etc.
  • the heat storage elements 61 can be designed as a honeycomb body, as a spherical fill or generally as a fill, as a foam, as a body produced using an additive process, etc.
  • the permitted pressure loss, the space required, etc. can be specified via the shape.
  • the heat storage elements 61 can be provided with a coating, for example a catalytic coating.
  • the at least one heat exchanger 58 is arranged in a fluid circuit that connects the outlet 57 of the treatment chamber 5 with the inlet 56 of the treatment chamber 5 connects.
  • a third heat exchanger 64 is arranged in the flow direction in front of the gas conveying element 62 in order to further cool the gaseous fluid after it leaves the first heat exchanger 58.
  • This third heat exchanger 64 can be designed without heat storage elements 61.
  • the exemplary embodiments show possible embodiment variants, and combinations of the individual embodiment variants with one another are also possible.
  • Supply line 45 Supply device central gas stream 46 Inlet protective gas stream 47 Output

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Abstract

L'invention concerne un dispositif (6) pour préparer un plasma comprenant au moins un élément générateur de plasma (8), dans lequel ou sur lequel est disposé au moins une bobine d'induction (10) électrique et/ou un magnétron, et dans lequel sont en outre disposés un premier canal d'écoulement (11) et un deuxième canal d'écoulement (12) disposé concentriquement à celui-ci, le deuxième canal d'écoulement (12) entourant au moins par endroits le premier canal d'écoulement (11), et le premier canal d'écoulement (11) se trouvant en liaison d'écoulement avec un premier raccord (16) pour un fluide gazeux pour la formation d'un flux de gaz ou d'un flux de plasma chauffé, et le deuxième canal d'écoulement (12) étant en liaison d'écoulement avec un deuxième raccord (17) pour un fluide gazeux pour la formation d'un courant volumique de protection entre une surface (14) de l'élément générateur de plasma (8) et le flux de gaz ou le flux de plasma chauffé.
EP23768111.9A 2022-08-09 2023-08-08 Dispositif de préparation d'un plasma Pending EP4570037A2 (fr)

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ATA50613/2022A AT526239B1 (de) 2022-08-09 2022-08-09 Vorrichtung zur Bereitstellung eines Plasmas
PCT/AT2023/060267 WO2024031117A2 (fr) 2022-08-09 2023-08-08 Dispositif de préparation d'un plasma

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT526910A1 (de) * 2023-02-14 2024-08-15 Bern Reinhold Heizvorrichtung zur Einbringung von Prozesswärme in einen Schmelz- oder Erwärmungsofen
AT528041B1 (de) * 2024-02-21 2025-12-15 Thermal Proc Solutions Gmbh Einrichtung zur thermischen Behandlung eines Stoffes
US20250299937A1 (en) * 2024-03-25 2025-09-25 Applied Materials, Inc. Cryogenic moisture trap for improved etch and particle reduction

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3723290A (en) * 1970-01-07 1973-03-27 United States Borax Chem High temperature chemical reaction apparatus
US5120930A (en) * 1988-06-07 1992-06-09 Hypertherm, Inc. Plasma arc torch with improved nozzle shield and step flow
US5200595A (en) * 1991-04-12 1993-04-06 Universite De Sherbrooke High performance induction plasma torch with a water-cooled ceramic confinement tube
JPH067671A (ja) * 1992-06-29 1994-01-18 Sansha Electric Mfg Co Ltd インダクションプラズマ溶射による変態物質の抽出方法
JP3538225B2 (ja) * 1994-07-29 2004-06-14 電気興業株式会社 熱プラズマを用いた塊状半導体材の破砕方法とその装置
JPH0886755A (ja) * 1994-09-16 1996-04-02 Horiba Ltd プラズマガスの使用方法
JPH08131757A (ja) * 1994-11-01 1996-05-28 Jeol Ltd 有害物質の分解処理装置
US5844192A (en) * 1996-05-09 1998-12-01 United Technologies Corporation Thermal spray coating method and apparatus
US6080954A (en) * 1996-12-27 2000-06-27 Neturen Co., Ltd Heat treatment method and apparatus using thermal plasma, and heat treated substance produced thereby
JP3566824B2 (ja) * 1996-12-27 2004-09-15 高周波熱錬株式会社 熱プラズマによる加熱処理装置
US5925266A (en) * 1997-10-15 1999-07-20 The Perkin-Elmer Corporation Mounting apparatus for induction coupled plasma torch
CN1283131C (zh) * 2001-10-05 2006-11-01 泰克纳等离子系统公司 用于固态电源的多线圈感应等离子体火炬
US7189940B2 (en) * 2002-12-04 2007-03-13 Btu International Inc. Plasma-assisted melting
JP2004216231A (ja) * 2003-01-10 2004-08-05 Toshiba Corp 高周波プラズマによる化合物分解方法および化合物分解装置
US7304263B2 (en) * 2003-08-14 2007-12-04 Rapt Industries, Inc. Systems and methods utilizing an aperture with a reactive atom plasma torch
US7465430B2 (en) * 2004-07-20 2008-12-16 E. I. Du Pont De Nemours And Company Apparatus for making metal oxide nanopowder
JP4988164B2 (ja) * 2005-03-08 2012-08-01 株式会社日清製粉グループ本社 微粒子の製造方法と装置
US9516734B2 (en) * 2009-03-24 2016-12-06 Tekna Plasma Systems Inc. Plasma reactor for the synthesis of nanopowders and materials processing
US9380693B2 (en) * 2011-02-03 2016-06-28 Tekna Plasma Systems Inc. High performance induction plasma torch
US8633648B2 (en) * 2011-06-28 2014-01-21 Recarbon, Inc. Gas conversion system
JP5992358B2 (ja) * 2013-04-10 2016-09-14 東芝三菱電機産業システム株式会社 微粒子生成装置
EP3314989B1 (fr) * 2015-06-29 2020-05-27 Tekna Plasma Systems Inc. Torche à plasma à induction avec une plus grande densité d'énergie du plasma et procédé de remplacement d' un composant
CN107201309B (zh) * 2016-03-16 2021-03-09 洛阳华清天木生物科技有限公司 一种新型等离子体诱变育种装置
IT201800020206A1 (it) * 2018-12-19 2020-06-19 Directa Plus Spa Apparecchiatura per il trattamento di materiali con plasma.
SG11202111576QA (en) * 2019-04-30 2021-11-29 6K Inc Mechanically alloyed powder feedstock
US20240051833A1 (en) * 2019-10-09 2024-02-15 Tekna Plasma Systems Inc. Nanosize powder advanced materials, method of manufacturing and of using same
DE102020202484A1 (de) * 2020-02-26 2021-08-26 Technische Universität Bergakademie Freiberg Vorrichtung zum Schmelzen von Metallen

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AU2023322206A1 (en) 2025-03-13
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WO2024031117A2 (fr) 2024-02-15
WO2024031117A3 (fr) 2024-04-11
AT526239A4 (de) 2024-01-15
MX2025001474A (es) 2025-04-02
JP2025528160A (ja) 2025-08-26

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