EP4580505A1 - Mikrobearbeitete doppel- und mehrfachmembran-ultraschallwandler - Google Patents

Mikrobearbeitete doppel- und mehrfachmembran-ultraschallwandler

Info

Publication number
EP4580505A1
EP4580505A1 EP22957594.9A EP22957594A EP4580505A1 EP 4580505 A1 EP4580505 A1 EP 4580505A1 EP 22957594 A EP22957594 A EP 22957594A EP 4580505 A1 EP4580505 A1 EP 4580505A1
Authority
EP
European Patent Office
Prior art keywords
cavity
electrode
primary
mut
coupled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP22957594.9A
Other languages
English (en)
French (fr)
Inventor
Haesung Kwon
Brian Bircumshaw
Sandeep Akkaraju
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Exo Imaging Inc
Original Assignee
Exo Imaging Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Exo Imaging Inc filed Critical Exo Imaging Inc
Publication of EP4580505A1 publication Critical patent/EP4580505A1/de
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B06GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06BMETHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/06Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
    • B06B1/0607Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using multiple elements
    • B06B1/0622Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using multiple elements on one surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B06GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06BMETHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/0292Electrostatic transducers, e.g. electret-type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B06GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06BMETHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/06Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
    • B06B1/0644Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using a single piezoelectric element
    • B06B1/0651Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using a single piezoelectric element of circular shape
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B06GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06BMETHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/06Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
    • B06B1/0644Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using a single piezoelectric element
    • B06B1/0659Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using a single piezoelectric element of U-shape
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B06GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06BMETHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/06Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
    • B06B1/0644Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using a single piezoelectric element
    • B06B1/0662Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using a single piezoelectric element with an electrode on the sensitive surface
    • B06B1/0666Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using a single piezoelectric element with an electrode on the sensitive surface used as a diaphragm
    • GPHYSICS
    • G10MUSICAL INSTRUMENTS; ACOUSTICS
    • G10KSOUND-PRODUCING DEVICES; METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING, NOISE OR OTHER ACOUSTIC WAVES IN GENERAL; ACOUSTICS NOT OTHERWISE PROVIDED FOR
    • G10K9/00Devices in which sound is produced by vibrating a diaphragm or analogous element, e.g. fog horns, vehicle hooters or buzzers
    • G10K9/12Devices in which sound is produced by vibrating a diaphragm or analogous element, e.g. fog horns, vehicle hooters or buzzers electrically operated
    • G10K9/122Devices in which sound is produced by vibrating a diaphragm or analogous element, e.g. fog horns, vehicle hooters or buzzers electrically operated using piezoelectric driving means
    • G10K9/125Devices in which sound is produced by vibrating a diaphragm or analogous element, e.g. fog horns, vehicle hooters or buzzers electrically operated using piezoelectric driving means with a plurality of active elements

Definitions

  • Ultrasound is a common imaging modality and has many uses in industrial, manufacturing, medical, and other settings. For instance, non-intrusive imaging systems for imaging internal organs of a human body and displaying images of the internal organs transmit ultrasound signals into the human body and receives signals reflected from the organs to image such organs. Ultrasound also has non-imaging uses as well, such as for ablating tissue with High Intensity Focused Ultrasound (HIFU) or in manufacturing to manipulate and modify materials.
  • HIFU High Intensity Focused Ultrasound
  • Ultrasound systems have traditionally employed piezoelectric transducers (e.g., PZT transducers) to generate the transmitted signals and/or receive reflected signals.
  • MEMS microelectromechanical systems
  • MEMS ultrasound transducers include capacitive micromachined ultrasound transducers (cMUTs) and piezoelectric micromachined ultrasound transducers (pMUTs). While MEMS ultrasound transducers have many advantages, improvements are still desired.
  • a diameter 211 of the second cavity 210 is greater than a diameter 311 of the third cavity 310. In some embodiments, a diameter 211 of the second cavity 210 is less than a diameter 311 of the third cavity 310. In some embodiments, a diameter 211 of the second cavity 210 is equivalent to a diameter 311 of the third cavity 310. In some embodiments, per the exemplary MUTs shown in FIG. 5B, the second cavity 210 and third cavity 310 are asymmetrical about a ray 115 bisecting the first cavity 110. In some embodiments, per the exemplary first and second MUTs shown in FIGS.
  • a ratio between a distance 113 from the center of the primary rounded distal portion 110A to the center of the secondary distal rounded portion 110C, and a diameter 111 of the primary rounded distal portion 110A, a diameter 112 of the secondary rounded distal portion HOC, or both is about 3:1 to about 5:1.
  • a ratio between a distance 113 from the center of the primary rounded distal portion 110A to the center of the secondary distal rounded portion 1 IOC, and a diameter 111 of the primary rounded distal portion 110A, a diameter 112 of the secondary rounded distal portion 1 IOC, or both is about 3 : 1 to about 3.25:1, about 3:1 to about 3.5:1, about 3 :1 to about 3.75:1, about 3:l to about 4:1, about 3:1 to about 4.25:1, about 3:1 to about 4.5:1, about 3:1 to about 4.75:1, about 3 :1 to about 5:1, about 3.25:1 to about 3.5:1, about 3.25:1 to about 3.75:1, about 3.25:1 to about 4:1, about 3.25:1 to about 4.25:1, about 3.25:1 to about 4.5:1, about 3.25:1 to about 4.75:1, about 3.25:1 to about 5:1, about 3.5:1 to about 3.75:1, about 3.5:1 to about 4:1, about 3.5:1 to about 4.25:
  • a ratio between a distance 113 from the center of the primary rounded distal portion 110A to the center of the secondary distal rounded portion 1 IOC, and a diameter 111 of the primary rounded distal portion 110A, a diameter 112 of the secondary rounded distal portion HOC, or both is at least about 3 :1, about 3.25:1, about 3.5:1, about 3.75:1, about 4:1, about 4.25:1, about 4.5:1, or about 4.75:1.
  • a ratio between a distance 114 from the center of the primary rounded distal portion 110A to the center of the secondary distal rounded portion 110C, and a minimum width 113 of the mesial portion HOB is at least about 2:1, about 2.5:1, about 3 :1, about 3.5:1, about 4:1, about 4.5:1, about 5:1, about 5.5:1, about 6:1, or about 6.5:1.
  • a ratio between a distance 114 from the center of the primary rounded distal portion 110A to the center of the secondary distal rounded portion 110C, and a minimum width 113 of the mesial portion 11 OB is at most about 2.5:1, about 3 :1, about 3.5:1, about 4:l, about 4.5:1, about 5:l, about 5.5:l, about 6:l, about 6.5:1, or about 7:1.
  • a ratio between and a diameter 111 of the primary rounded distal portion 110A, a diameter 112 of the secondary rounded distal portion 110C, or both, and a minimum width 113 of the mesial portion 11 OB is about 1 : 1 to about 3 :1.
  • a ratio between and a diameter 111 of the primary rounded distal portion 110A, a diameter 112 of the secondary rounded distal portion 110C, or both, and a minimum width 113 of the mesial portion HOB is about 1 :1 to about 1.25:1, about 1 :1 to about 1.5:1, about 1 :1 to about 1.75:1, about 1 :1 to about 2:1, about 1 :1 to about 2.25:1, about 1 :1 to about 2.5:1, about 1 :1 to about 2.75:1, about 1 :1 to about 3:1, about 1.25:1 to about 1.5:1, about 1.25:1 to about 1.75:1, about 1.25:1 to about 2:1, about 1.25:1 to about 2.25:1, about 1.25:1 to about 2.5:1, about 1.25:1 to about 2.75:1, about 1.25:1 to about 3 :l, about 1.5:1 to about 1.75:1, about 1.5:1 to about 2:l, about 1.5:1 to about 2.25:1, about 1.5:1 to about 2.5
  • a ratio between and a diameter 111 of the primary rounded distal portion 110A, a diameter 112 of the secondary rounded distal portion HOC, or both, and a minimum width 113 of the mesial portion 11 OB is at least about 1 :1, about 1.25:1, about 1.5:1, about 1.75:1, about 2:1, about 2.25:1, about 2.5:1, or about 2.75:1.
  • a ratio between and a diameter 111 of the primary rounded distal portion 110A, a diameter 112 of the secondary rounded distal portion 1 IOC, or both, and a minimum width 113 of the mesial portion 110B is at most about 1.25:1, about 1.5:1, about 1.75:1, about 2:1, about 2.25:1, about 2.5:1, about 2.75:l, or about 3 :l.
  • a centerpoint of the second cavity 210 and a centerpoint of the third cavity 310 are coincident with the ray 115 bisecting the first cavity 110.
  • a centerpoint of the second cavity 210 and the third cavity 310 are coincident with a centerpoint of the primary diameter 111 of the first cavity 110.
  • a centerpoint of the primary diameter 111 of the first cavity 110 is coincident with a centerpoint of the primary diameter 111 of the first cavity 110.
  • FIGS. 5C-5D show top-view illustrations of additional exemplary arrangements of the first, second, and third membrane portions of a MUT 1000C 1000B.
  • the second cavity 210 and the third cavity 310 of a MUT 1000C are located oppositely about the vertical ray 115, but not symmetrically about an axis perpendicular to the vertical ray 115.
  • the vertical ray 115 of one MUT 1000C bisects the second cavity 420 of another MUT 1000C below.
  • the array in some cases is an offset triangular array.
  • the MUT 1000 further comprises one or more portions of a piezoelectric layer 600.
  • the MUT 1000 is a piezoelectric micromachined ultrasound transducer (pMUT).
  • the secondary first electrode 130 (top) is coupled to the primary first electrode 120 (bottom) by a first portion of the one or more piezoelectric layer 600 portions.
  • the secondary second electrode 230 (top) is coupled to the primary second electrode 220 (bottom) by a second portion of the one or more piezoelectric layer 600 portions
  • the secondary third electrode 330 (top) is coupled to the primary third electrode 320 320 (bottom) by a third portion of the one or more piezoelectric layer 600 portions, or any combination thereof.
  • the piezoelectric layer(s) include at least one ofPZT, PZT-N, PMN — Pt, AIN, Sc — AIN, ZnO, PVDF, and LiNiCh.
  • the primary first electrode 120 has a shape inwardly offset from the shape of the first cavity 110.
  • the primary second electrode 220 has a shape inwardly offset from the shape of the second cavity 210.
  • the primary third electrode 320 has a shape inwardly offset from the shape of the third cavity 310.
  • the secondary first electrode 130 has a shape inwardly offset from the shape of the primary first electrode 120.
  • the secondary second electrode 230 has a shape inwardly offset from the shape of the primary second electrode 220.
  • the secondary third electrode 330 has a shape inwardly offset from the shape of the primary third electrode 320.
  • the offset between the primary first electrode 120 and the first cavity 110 is equal to the offset between the primary first electrode 120 and the secondary first electrode 130. In some embodiments, the offset between the primary first electrode 120 and the first cavity 110 is greater than the offset between the primary first electrode 120 and the secondary first electrode 130. In some embodiments, the offset between the primary first electrode 120 and the first cavity 110 is less than the offset between the primary first electrode 120 and the secondary first electrode 130.
  • the offset between the primary second electrode 220 and the second cavity 210 is equal to the offset between the primary second electrode 220 and the secondary second electrode 230. In some embodiments, the offset between the primary second electrode 220 and the second cavity 210 is greater than the offset between the primary second electrode 220 and the secondary second electrode 230. In some embodiments, the offset between the primary second electrode 220 and the second cavity 210 is less than the offset between the primary second electrode 220 and the secondary second electrode 230.
  • the offset between the primary third electrode 320 and the third cavity 310 is equal to the offset between the primary third electrode 320 and the secondary third electrode. In some embodiments, the offset between the primary third electrode 320 and the third cavity 310 is greater than the offset between the primary third electrode 320 and the secondary third electrode. In some embodiments, the offset between the primary third electrode 320 and the third cavity 310 is less than the offset between the primary third electrode 320 and the secondary third electrode.
  • the secondary first electrode 130 is coupled to the primary first electrode 120 by a piezoelectric layer 400. In some embodiments, the secondary second electrode 230 is coupled to the primary second electrode 220 by a piezoelectric layer 400.
  • the secondary third electrode 330 is coupled to the primary third electrode 320 by a piezoelectric layer 400.
  • at least a portion of the membrane 500 is formed of a plastic.
  • the plastic comprises silicon.
  • at least a portion of the membrane 500 is formed of silicon and/or silicon dioxide.
  • the primary first electrode 120 has a shape inwardly offset from the shape of the first cavity 110.
  • the primary second electrode 220 has a shape inwardly offset from the shape of the second cavity 210.
  • the primary third electrode 320 has a shape inwardly offset from the shape of the third cavity 310.
  • the secondary first electrode 130 has a shape inwardly offset from the shape of the primary first electrode 120.
  • the secondary second electrode 230 has a shape inwardly offset from the shape of the primary second electrode 220.
  • the secondary third electrode 330 has a shape inwardly offset from the shape of the primary third electrode 320.
  • the offset between the first cavity 110 and the primary first electrode 120 is equal to the offset between the secondary first electrode 130 and the primary first electrode 120. In some embodiments, the offset between the first cavity 110 and the primary first electrode 120 is greater than the offset between the secondary first electrode 130 and the primary first electrode 120.
  • the offset between the first cavity 110 and the primary first electrode 120 is less than the offset between the secondary first electrode 130 and the primary first electrode 120.
  • the offset between the second cavity 210 and the primary second electrode 220 is equal to the offset between the primary second electrode 220 and the secondary second electrode 230.
  • the offset between the second cavity 210 and the primary second electrode 220 is greater than the offset between the primary second electrode 220 and the secondary second electrode 230.
  • the offset between the second cavity 210 and the primary second electrode 220 is less than the offset between the primary second electrode 220 and the secondary second electrode 230.
  • the offset between the third cavity 310 and the primary third electrode 320 is equal to the offset between the primary third electrode 320 and the secondary third electrode. In some embodiments, the offset between the third cavity 310 and the primary third electrode 320 is greater than the offset between the primary third electrode 320 and the secondary third electrode. In some embodiments, the offset between the third cavity 310 and the primary third electrode 320 is less than the offset between the primary third electrode 320 and the secondary third electrode. [0046] In some embodiments, at least a portion of the membrane 500 has a thickness of about 1 pm to about 10 pm.
  • At least a portion of the membrane 500 has a thickness of about 1 pm to about 2 pm, about 1 pm to about 3 pm, about 1 pm to about 4 pm, about 1 pm to about 5 pm, about 1 pm to about 6 pm, about 1 pm to about 7 pm, about 1 pm to about 8 pm, about 1 pm to about 9 pm, about 1 pm to about 10 pm, about 2 pm to about 3 pm, about 2 pm to about 4 pm, about 2 pm to about 5 pm, about 2 pm to about 6 pm, about 2 pm to about 7 pm, about 2 pm to about 8 pm, about 2 pm to about 9 pm, about 2 pm to about 10 pm, about 3 pm to about 4 pm, about 3 pm to about 5 pm, about 3 pm to about 6 pm, about 3 pm to about 7 pm, about 3 pm to about 8 pm, about 3 pm to about 9 pm, about 3 pm to about 10 pm, about 4 pm to about 5 pm, about 4 pm to about 6 pm, about 3 pm to about 7 pm, about 3 pm to about 8 pm, about 3 pm to about 9 pm, about 3 pm to about 10 pm,
  • At least a portion of the membrane 500 has a thickness of about 1 pm, about 2 pm, about 3 pm, about 4 pm, about 5 pm, about 6 pm, about 7 pm, about 8 pm, about 9 pm, or about 10 pm. In some embodiments, at least a portion of the membrane 500 has a thickness of at least about 1 pm, about 2 pm, about 3 pm, about 4 pm, about 5 pm, about 6 pm, about 7 pm, about 8 pm, or about 9 pm. In some embodiments, at least a portion of the membrane 500 has a thickness of at most about 2 pm, about 3 pm, about 4 pm, about 5 pm, about 6 pm, about 7 pm, about 8 pm, about 9 pm, or about 10 pm.
  • the array 4000 comprises a rhomboid array of the MUTs 1000.
  • the array comprises a rectilinear array.
  • the array comprises a polar array.
  • the array comprises or a polygonal array.
  • the polygonal array 4000 comprises a triangular array, a pentagonal array, a parallelogram array, a rhomboid array, a hexagonal array, or an octagonal array.
  • the MUTs 1000 in the MUT arrays 4000 described herein are pMUTs.
  • one or more MUTs 1000 in the MUT arrays 4000 are capacitive micromachined ultrasound transducers (cMUTs) and the MUT cavities as described herein are sandwiched between their accompanying electrode pairs, with one electrode of the pair being coupled to a membrane or portion thereof.
  • a resonant cavity can be connected to the cMUT.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Multimedia (AREA)
  • Transducers For Ultrasonic Waves (AREA)
  • Ultra Sonic Daignosis Equipment (AREA)
EP22957594.9A 2022-09-02 2022-09-02 Mikrobearbeitete doppel- und mehrfachmembran-ultraschallwandler Pending EP4580505A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2022/042500 WO2024049447A1 (en) 2022-09-02 2022-09-02 Dual and multiple membrane micromachined ultrasound transducers

Publications (1)

Publication Number Publication Date
EP4580505A1 true EP4580505A1 (de) 2025-07-09

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP22957594.9A Pending EP4580505A1 (de) 2022-09-02 2022-09-02 Mikrobearbeitete doppel- und mehrfachmembran-ultraschallwandler

Country Status (4)

Country Link
EP (1) EP4580505A1 (de)
JP (1) JP2025527858A (de)
KR (1) KR20250048795A (de)
WO (1) WO2024049447A1 (de)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3318687B2 (ja) * 1993-06-08 2002-08-26 日本碍子株式会社 圧電/電歪膜型素子及びその製造方法
DE19643893A1 (de) * 1996-10-30 1998-05-07 Siemens Ag Ultraschallwandler in Oberflächen-Mikromechanik
US6775388B1 (en) * 1998-07-16 2004-08-10 Massachusetts Institute Of Technology Ultrasonic transducers
US20160081324A1 (en) * 2014-09-19 2016-03-24 Floyd Arnold Patton Turkey call device
US11039814B2 (en) * 2016-12-04 2021-06-22 Exo Imaging, Inc. Imaging devices having piezoelectric transducers
CN111001553B (zh) * 2019-12-18 2021-01-26 武汉大学 一种可调谐的超声传感器阵列
JPWO2021132074A1 (de) * 2019-12-23 2021-07-01

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JP2025527858A (ja) 2025-08-22
WO2024049447A1 (en) 2024-03-07
KR20250048795A (ko) 2025-04-10

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