EP4646576A1 - Dispositif et procédé de mesure d'erreurs d'alignement d'une source de faisceau dirigé - Google Patents

Dispositif et procédé de mesure d'erreurs d'alignement d'une source de faisceau dirigé

Info

Publication number
EP4646576A1
EP4646576A1 EP24704348.2A EP24704348A EP4646576A1 EP 4646576 A1 EP4646576 A1 EP 4646576A1 EP 24704348 A EP24704348 A EP 24704348A EP 4646576 A1 EP4646576 A1 EP 4646576A1
Authority
EP
European Patent Office
Prior art keywords
radiation sensor
partial
source
beam source
rotation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP24704348.2A
Other languages
German (de)
English (en)
Inventor
Christian Buss
Kim-Philip WIESE
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Trioptics GmbH
Original Assignee
Trioptics GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trioptics GmbH filed Critical Trioptics GmbH
Publication of EP4646576A1 publication Critical patent/EP4646576A1/fr
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means

Definitions

  • the invention relates to a device and a method for measuring alignment errors of laser diodes and similar directed beam sources.
  • the alignment errors can in particular be tilts or displacements.
  • Laser diodes and similar directed beam sources are often attached by gluing or similar in a mount, which is then installed in a higher-level optical system.
  • the outer surface of the mount is machined with precision and allows the mount to be installed in the higher-level optical system in a desired orientation.
  • the position of the optical axis of the beam source can only be measured sequentially, since the intensity in both planes must be recorded one after the other.
  • the object of the invention is therefore to provide a device and a method for measuring alignment errors of directed beam sources, with which the required measuring time can be shortened.
  • a device for measuring alignment errors of a directed beam source which has a mount for the beam source, a first spatially resolving radiation sensor and a beam splitter which is designed to split a beam generated by the beam source into a first partial beam and a second partial beam.
  • the device also has a focusing optics which is arranged in a radiation path of the first partial beam and has a focal plane in which the first radiation sensor is arranged.
  • a second spatially resolving radiation sensor is arranged in a radiation path of the second partial beam.
  • a drive of the device is designed to bring about a relative movement about an axis of rotation between the mount on the one hand and the other parts of the device on the other.
  • a computing device is configured to calculate a tilt and a lateral offset of the beam generated by the beam source from first locations swept over by the first partial beam during rotation of the beam source relative to the above-mentioned remaining parts of the device on the first radiation sensor, and from second locations swept over by the second partial beam during rotation of the beam source relative to the above-mentioned remaining parts of the device on the second radiation sensor.
  • the invention is based on the discovery that the tilt and offset of the beam generated by the beam source can be measured simultaneously and independently of one another if the beam is divided into two partial beams and the location of the focus of the first partial beam is detected with a first radiation sensor while the mount is rotated about an axis of rotation.
  • the second partial beam is not focused and is detected with a second radiation sensor.
  • the simultaneous measurement of tilt and offset allows a significant reduction in the required measurement time.
  • the directed beam is largely collimated, focusing the first partial beam using the focusing optics translates angles into locations on the first radiation sensor. All rays that hit the focusing optics along the same direction of incidence are thus focused on the same point, the position of which on the first radiation sensor is determined by the direction of incidence. A lateral offset of the beam does not change the direction of incidence and therefore does not affect this part of the measurement.
  • the location where the unfocused beam hits the second radiation sensor depends on both the offset and the tilt of the beam. Since the tilt is measured by the first radiation sensor, it can easily be calculated out when measuring with the second radiation sensor, so that this second part of the measurement provides the lateral offset between the mechanical axis of the mount and the optical axis of the beam.
  • the device contains an imaging optics which is arranged in the beam path of the second
  • the tilt does not have to be factored out when calculating the offset, because the location at which the second partial beam hits the second radiation sensor then only depends on the offset and not on the tilt.
  • an imaging optics it can be set up to image the beam source either reduced or enlarged onto the second radiation sensor. Whether you decide on a reduction or an enlargement depends, among other things, on the radiation sensor used and on the properties of the beam, e.g. its diameter and its intensity profile. A large beam cross-section can be helpful in detecting small shifts, but the sensor surface must be sufficiently large. With an intensity profile that deviates greatly from a Gaussian shape and may have secondary maxima, it can be difficult to clearly determine its position on the sensor for large diameters, so a reduction can be useful in such a case.
  • the imaging scale is normally fixed, but can also be variably adjustable.
  • the device can contain an afocal optic, e.g. in the form of a Keppler telescope, which is arranged in the beam path of the beam generated by the beam source, the first partial beam or the second partial beam.
  • the angles and/or the diameter of the beams can be adjusted using the afocal optic.
  • the device has a beam deflection unit that deflects the second partial beam in such a way that the deflected second partial beam runs at least approximately parallel to the first partial beam.
  • the beam deflection unit can be, for example, a deflection prism or a deflection mirror.
  • the drive only causes the mount with the beam source accommodated in it to rotate.
  • the mount and the beam source may remain stationary and instead an arrangement comprising the beam splitter, the focusing optics and the radiation sensors to be rotated around the axis of rotation. After the tilt and offset have been measured, the beam source can be aligned to the axis of rotation in such a way that the remaining alignment errors are tolerable.
  • the mount can be reworked to change its mechanical axis.
  • the device has a cutting tool that is designed to machine an outer surface of the mount of the beam source in such a way that a mechanical longitudinal axis of the mount runs parallel to the optical axis of the beam source.
  • Such tools are known from conventional adjustment turning.
  • the measurement results can be used to first optimally align the beam source and the frame relative to each other and only then to glue them together.
  • a directional bonding process can be used here.
  • an adhesive is first applied to the space between the beam source and the frame using a dispenser.
  • the spatial position of the frame is first measured optically or tactilely in a preceding step.
  • the frame can be brought into a desired position, e.g. relative to the axis of rotation or another mechanical reference.
  • the beam source is then aligned relative to the frame using the device according to the invention and an alignment chuck, hexapod, a piezo actuator or another suitable alignment device.
  • the alignment is carried out until the tolerance specifications for translation and rotation are reached.
  • the adhesive is cured using a UV light source.
  • a method for measuring alignment errors of a directed beam source comprises the following steps: a) the beam source is inserted into a holder and a relative rotation about an axis of rotation is generated; b) simultaneously with step a), a beam generated by the beam source is split by a beam splitter into a first partial beam and a second partial beam; c) the first partial beam is directed via a focusing optics onto a first spatially resolving radiation sensor which is arranged in a focal plane of the focusing optics; d) the second partial beam is directed onto a second spatially resolving radiation sensor; e) a tilt and a lateral offset of the beam generated by the beam source are calculated from first locations which are swept over by the first partial beam during the relative rotation on the first radiation sensor and from second locations which are swept over by the second partial beam during the relative rotation of the beam source on the second radiation sensor.
  • Figure 1 is a schematic representation of a device according to the invention according to a first embodiment, assuming that the optical axis of the beam is coaxial with the axis of rotation;
  • Figure 1 b is a plan view of the first radiation sensor and the focal point generated there;
  • Figure 1 c is a plan view of the second radiation sensor and the light spot generated there;
  • Figures 2a to 2c show representations corresponding to Figures 1a to 1c for the case where the beam generated by the laser diode is laterally offset;
  • Figures 3a to 3c show the device shown in Figures 1a to 1c in the case where the light beam generated by the laser diode is tilted;
  • Figures 4a to 4c show a device according to a second embodiment in representations based on Figures 1a to 1c;
  • Figure 5 shows a device according to a third embodiment in a representation based on Figure 1a.
  • Figure 1 schematically shows a device, designated overall by 10, for measuring alignment errors of a laser diode 12 according to a first embodiment of the invention.
  • the device comprises an adjusting chuck 14 which can be set in rotation about a rotation axis 18 with the aid of a drive 16, as indicated in Figure 1 by an arrow 20.
  • the adjusting chuck 14 is not set in rotation directly by the drive 16, but rather via a spindle (not shown).
  • the adjusting chuck 14 has a holder 22 into which the laser diode 12 is attached, e.g. glued or screwed.
  • the beam 24 generated by the laser diode is directed or, what is equivalent, collimated. As a result, the beam 24 diverges so slightly in the direction of propagation that it can be imagined in terms of beam optics as a bundle of parallel individual beams.
  • the beam 24 is split by a beam splitter 26 into a first partial beam 28 and a second partial beam 30.
  • the splitting ratio can be 50:50, for example.
  • a focusing optic 32 is arranged in the radiation path of the first partial beam 28, which is only indicated with a single lens in Figure 1a, but can also consist of several lenses and/or other optical elements.
  • the focusing optic 32 is suitably positioned with respect to the axis of rotation 18, e.g. centered, and focuses the first partial beam 28 into a focal point 34, which lies in the plane of a first radiation sensor 36.
  • the first radiation sensor 36 measures the radiation intensity incident on it in a spatially resolved manner and can be designed, for example, as a CCD camera or as a PSD sensor.
  • the second partial beam 30 is not focused, but falls directly on a second radiation sensor 38, which is preferably constructed in the same way as the first radiation sensor 36.
  • the drive 16 and the two radiation sensors 36, 38 are connected via data lines to a computing device, which is indicated in Figure 1a by a PC 40.
  • the focal point 34 of the first partial beam 28 therefore remains on the axis of rotation 18, as shown in the top view of the first radiation sensor 36 in Figure 1 b.
  • the axis of rotation 18 lies at the intersection point of the two crossed lines drawn only for better orientation.
  • a stationary radiation spot 44 is also created on the second radiation sensor 38 (see Figure 1c), the diameter of which is larger than the focal point 34 of the first partial beam 28 due to the lack of focusing.
  • Figure 2a shows the situation when the laser diode 12 is laterally offset in the mount 22 by an amount d.
  • the beam 24 is then also offset accordingly to the axis of rotation 18.
  • the optical axis of the beam 24 rotates about the axis of rotation 24 when the adjustment chuck 14 rotates, but remains parallel to it. This has no effect on the first partial beam 28, since it still runs parallel to the axis of rotation 18.
  • the focal point 34 does not change its position as a result of the lateral offset.
  • the lateral offset of the optical beam axis relative to the rotation axis 18 can be seen in that the light spot 44 is no longer centered, but performs a rotational movement around the rotation axis 18 (angled by 90°), as can be seen in Figure 2c.
  • the center of the light spot 44 describes a striking circle 46, half the diameter of which corresponds to the lateral offset d.
  • the intensity distributions recorded by the second radiation sensor 38 during the rotation of the adjusting chuck 14 are evaluated by the computing device 40 in order to determine the diameter of the striking circle 46.
  • Figure 3a shows the conditions when the optical axis of the beam 24 is tilted by an angle a relative to the axis of rotation 18.
  • the focal point 34 describes a striking circle 48, the diameter D of which is linked to the focal length f of the focusing optics 32 and the tilt angle a by the relationship a ⁇ D/2-f.
  • the light spot 44 created on the second radiation sensor 38 also describes a striking circle, as shown in Figure 3c.
  • the tilt angle a can be derived from the diameter of the striking circle 50.
  • the lateral offset illustrated in Figure 2a and the tilt of the beam illustrated in Figure 3a do not occur separately, but together.
  • the tilt is then determined exclusively by evaluating the impact circle 48, which the focal point 34 of the first partial beam 28 describes on the first radiation sensor 36.
  • the movements of the light spot 44 caused by the offset and the tilt are then superimposed on the second radiation sensor 38. Since the tilt angle a is known with high accuracy from the measurement of the first partial beam 28, its effect on the impact circle 46 of the light spot 44 can be calculated out. In this way, the lateral offset d can be calculated on the basis of the locations that the light spot 44 covers during rotation on the second radiation sensor 38.
  • Figure 4 shows one way in which the calculation of the movement component caused by the tilting can be dispensed with if an imaging optics 52, indicated here only with a lens, is introduced into the beam path of the second partial beam 30 and is arranged centered on the (angled) axis of rotation 18.
  • the imaging optics 52 are designed in such a way that the laser diode 12 is imaged with its light exit window onto the second radiation sensor 38. In this way, a tilting of the beam 24 no longer has any influence on the location of the light spot 44 on the second radiation sensor 38.
  • the light spot 44 rests on the angled axis of rotation 18. If there is an offset d 0, the light spot 44 describes a circular path around the angled axis of rotation 18, from which the lateral offset d can be derived taking into account the imaging scale of the imaging optics 52.
  • an afocal optic e.g. a telescope
  • the afocal optic can be arranged, for example, in the beam path of the beam 24 between the beam source 12 and the beam splitter 26, whereby the beam angle and beam diameter of both partial beams 28, 30 can be influenced.
  • Figure 3a shows an afocal optics system designated 54 and indicated with dashed lenses, which is indicated in the beam path of the second partial beam 30.
  • the afocal optics system 54 is designed such that the second partial beam 30 is expanded to a second partial beam 30' indicated by dotted lines with a larger beam diameter.
  • the beam source 12 can be aligned relative to the axis of rotation 18. If the beam source 12 was already firmly glued to the mount 22 or connected in some other way during the measurement, an adjustment rotation using a cutting tool is recommended, as indicated at 56 in Figure 3a.
  • FIG. 4a Another possible alignment option is illustrated in Figure 4a. If the beam source 12 was still loosely, i.e. not firmly, held in the holder 22 during the measurement, the beam source 12 can still be aligned in the holder 22 after the measurement. To do this, the position of the holder 22 is first measured optically or tactilely using a distance sensor 58 and an adhesive is placed in the gap between the holder 22 and the beam source 12 using a dispenser 60. After alignment, the adhesive is hardened, e.g. by irradiation with UV light from a US lamp 62.
  • FIG. 5 A further embodiment of a device according to the invention is shown in Figure 5.
  • a deflection prism 70 is located in the beam path of the second partial beam 30.
  • the deflection prism 70 ensures that the partial beam 30 is deflected in such a way that it runs approximately parallel to the first partial beam 28 behind the deflection prism 70.
  • the partial beam 30 is deflected by the deflection prism 70, for example by an angle between 85° and 95°, preferably by an angle of 90°.
  • Such a parallel beam path of the partial beams 28, 30 allows a mechanically particularly compact design of the entire device 10.
  • the device 10 shown in Figure 5 corresponds to the device 10 shown in Figure 1a and already explained above, so that a repeated description can be omitted at this point.
  • the deflection prism 70 can be used in any of the embodiments described above. Instead of a deflection prism 70, a deflection mirror or another reflective optical element can also be used to deflect the partial beam 30.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

Un dispositif de mesure d'erreurs d'alignement d'une diode laser ou d'une autre source de faisceau dirigé (12) comprend un support (22) pour la source de faisceau (12), qui est monté rotatif autour d'un axe de rotation (18) au moyen d'un entraînement (18). Le dispositif comprend en outre un premier capteur de rayonnement (36) à résolution spatiale, un diviseur de faisceau (26) qui divise un faisceau (24) généré par la source de faisceau (12) en un premier faisceau partiel (28) et un second faisceau partiel (30), et une optique de focalisation (32). L'optique de focalisation est disposée dans un trajet de rayonnement du premier faisceau partiel (28) et présente un plan focal dans lequel est disposé le premier capteur de rayonnement (36). Un second capteur de rayonnement (38) à résolution spatiale est disposé dans un trajet de rayonnement du second faisceau partiel (30). Un dispositif informatique (40) calcule, à partir de premiers emplacements, qui sont balayés par le premier faisceau partiel (28) pendant une rotation de la source de faisceau (12) sur le premier capteur de rayonnement (36), et à partir de seconds emplacements, qui sont balayés par le second faisceau partiel (30) pendant la rotation de la source de faisceau (12) sur le second capteur de rayonnement (38), une inclinaison (d) et un décalage latéral (α) du faisceau (24) généré par la source de faisceau (12).
EP24704348.2A 2023-02-09 2024-02-05 Dispositif et procédé de mesure d'erreurs d'alignement d'une source de faisceau dirigé Pending EP4646576A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102023103144.9A DE102023103144A1 (de) 2023-02-09 2023-02-09 Vorrichtung und Verfahren zur Messung von Ausrichtfehlern einer gerichteten Strahlquelle
PCT/EP2024/052724 WO2024165472A1 (fr) 2023-02-09 2024-02-05 Dispositif et procédé de mesure d'erreurs d'alignement d'une source de faisceau dirigé

Publications (1)

Publication Number Publication Date
EP4646576A1 true EP4646576A1 (fr) 2025-11-12

Family

ID=89900973

Family Applications (1)

Application Number Title Priority Date Filing Date
EP24704348.2A Pending EP4646576A1 (fr) 2023-02-09 2024-02-05 Dispositif et procédé de mesure d'erreurs d'alignement d'une source de faisceau dirigé

Country Status (7)

Country Link
US (1) US20260227183A1 (fr)
EP (1) EP4646576A1 (fr)
JP (1) JP2026504557A (fr)
CN (1) CN121039461A (fr)
DE (1) DE102023103144A1 (fr)
TW (1) TW202447173A (fr)
WO (1) WO2024165472A1 (fr)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3836954A1 (de) * 1988-10-29 1990-05-03 Philips Patentverwaltung Verfahren und anordnung zur ermittlung der lage der optischen achse eines lwl
US7708204B2 (en) * 2005-02-07 2010-05-04 Hamar Laser Instruments, Inc. Laser alignment apparatus
CZ305542B6 (cs) * 2014-12-04 2015-11-25 VĂšTS, a.s. Způsob stanovení svěšení a/nebo průběhu svěšování a/nebo stanovení úhlu sklonění a/nebo průběhu sklánění horizontálního nebo šikmého vřetena, zejména horizontálního nebo šikmého vřetena obráběcího stroje, a snímací zařízení k jeho provádění
DE102018112436A1 (de) 2018-05-24 2019-11-28 Carl Zeiss Jena Gmbh Verfahren und Vorrichtungen zur Bestimmung von Ausrichtungsfehlern von Strahlquellen und für deren Korrektur

Also Published As

Publication number Publication date
WO2024165472A1 (fr) 2024-08-15
JP2026504557A (ja) 2026-02-05
TW202447173A (zh) 2024-12-01
CN121039461A (zh) 2025-11-28
DE102023103144A1 (de) 2024-08-14
US20260227183A1 (en) 2026-08-06

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