EP4665695A1 - Substrat métal-céramique et procédé de fabrication d'un substrat métal-céramique - Google Patents

Substrat métal-céramique et procédé de fabrication d'un substrat métal-céramique

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Publication number
EP4665695A1
EP4665695A1 EP24705412.5A EP24705412A EP4665695A1 EP 4665695 A1 EP4665695 A1 EP 4665695A1 EP 24705412 A EP24705412 A EP 24705412A EP 4665695 A1 EP4665695 A1 EP 4665695A1
Authority
EP
European Patent Office
Prior art keywords
metal
layer
ceramic element
ceramic substrate
ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP24705412.5A
Other languages
German (de)
English (en)
Inventor
Stefan Britting
Karsten Schmidt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rogers Germany GmbH
Original Assignee
Rogers Germany GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rogers Germany GmbH filed Critical Rogers Germany GmbH
Publication of EP4665695A1 publication Critical patent/EP4665695A1/fr
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/03—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite
    • C04B35/04—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite based on magnesium oxide
    • C—CHEMISTRY; METALLURGY
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C04B35/645—Pressure sintering
    • C04B35/6455—Hot isostatic pressing
    • C—CHEMISTRY; METALLURGY
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    • C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
    • C04B37/021—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles in a direct manner, e.g. direct copper bonding [DCB]
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    • C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
    • C04B37/023—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used
    • C04B37/026—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used consisting of metals or metal salts
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
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    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3205—Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
    • C04B2235/3208—Calcium oxide or oxide-forming salts thereof, e.g. lime
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    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3217—Aluminum oxide or oxide forming salts thereof, e.g. bauxite, alpha-alumina
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    • C04B2235/3224—Rare earth oxide or oxide forming salts thereof, e.g. scandium oxide
    • C04B2235/3225—Yttrium oxide or oxide-forming salts thereof
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    • C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3244—Zirconium oxides, zirconates, hafnium oxides, hafnates, or oxide-forming salts thereof
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    • C04B2235/40—Metallic constituents or additives not added as binding phase
    • C04B2235/407—Copper
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    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
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    • C04B2235/74—Physical characteristics
    • C04B2235/77—Density
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    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
    • C04B2237/04—Ceramic interlayers
    • C04B2237/06—Oxidic interlayers
    • C04B2237/064—Oxidic interlayers based on alumina or aluminates
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    • C04B2237/32—Ceramic
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Definitions

  • the present invention relates to a metal-ceramic substrate and a method for producing a metal-ceramic substrate.
  • Metal-ceramic substrates are well known as printed circuit boards or circuit boards from the prior art, for example from DE 10 2013 104 739 A1, DE 19 927 046 B4 and DE 10 2009 033 029 A1.
  • connection surfaces for electrical components and conductor tracks are arranged on one component side of the metal-ceramic substrate or the metal-ceramic substrate, wherein the electrical components and the conductor tracks can be connected together to form electrical circuits.
  • Essential components of the metal-ceramic substrates are an insulation layer, which is preferably made of a ceramic, and at least one metal layer connected to the insulation layer. Due to their comparatively high insulation strengths, insulation layers made of ceramic have proven to be particularly advantageous in power electronics. By structuring the metal layer, conductor tracks and/or connection surfaces for the electrical components can then be realized.
  • the present invention has for its object to provide a metal-ceramic substrate which is further improved compared to the known metal-ceramic substrates, in particular with regard to a temperature change resistance of the bond between the metal layer and the ceramic element and a dissipation of heat when heat is generated on the component side of the metal-ceramic substrate due to operation.
  • a metal-ceramic substrate usable as a circuit board comprising
  • the ceramic element comprises magnesium oxide, wherein a proportion of magnesium oxide is greater than 60% by weight, preferably greater than 80% and particularly preferably greater than 95% by weight.
  • the metal-ceramic substrate uses a ceramic element with a comparatively high magnesium oxide content.
  • the ceramic element consists essentially exclusively of magnesium oxide.
  • the expert understands "consisting exclusively of magnesium oxide” to mean in particular a magnesium oxide content that is between 95% by weight and 100% by weight.
  • magnesium oxide can be used to provide a ceramic element that has a comparatively high thermal conductivity, which has a positive effect on the thermal shock resistance of the manufactured metal-ceramic substrate. This significantly improves the bonding process of the at least one metal layer to the ceramic element and the service life of the metal-ceramic substrate.
  • At least one metal layer is bonded to the ceramic element and, after the bonding process, conductor tracks and/or connection surfaces are formed as part of a structuring process so that the metal-ceramic substrate can be used as a circuit board.
  • the bonded and structured at least one metal layer then forms the component metallization.
  • the thermal expansion coefficient of magnesium oxide typically assumes a value between 11 x 10 ' 6 1/K and 13 x 10 ' 6 1/K and is thus comparatively close to that of copper, so that when a copper metal layer is bonded to the ceramic element, the difference between the thermal expansion coefficients is as small as possible. This has a positive effect on the thermal shock resistance and reduces the formation of thermomechanical stress during temperature changes.
  • the thermal conductivity assumes a value that is greater than 30 W/mK, particularly preferably between 40 and 59 W/mK and particularly preferably between 55 and 59 W/mK.
  • magnesium oxide proves to be a comparatively cost-effective alternative to aluminum oxide or HPS ceramics, which at the same time have a comparatively high thermal conductivity.
  • the component metallization has a first thickness and the rear side metallization, which is bonded to the ceramic element on the side opposite the component metallization, has a second thickness.
  • the ceramic element has a third thickness.
  • the third thickness preferably has a value between 100 pm and 1000 pm and the second and/or first thickness has a value between 200 and 800 pm. It is particularly preferably provided that the second thickness and the first thickness correspond to one another in order to counteract any bending during a bonding process of the at least one metal layer to the ceramic element. It is also conceivable that the third thickness is smaller than the first thickness and/or second thickness.
  • the ceramic element comprising magnesium oxide is doped with an accompanying material.
  • the accompanying material is selected such that it does not impair the thermal conductivity, in particular does not lead to deviations in the thermal conductivity that are less than 50%, preferably less than 25% and particularly preferably less than 20% of the thermal conductivity of the magnesium oxide.
  • a proportion of the accompanying material in the ceramic element assumes a value that is less than 10% by weight, in particular less than 5% by weight and particularly preferably less than 3% by weight. This advantageously makes it possible to influence and in particular improve further properties of the magnesium oxide through this doping. For example, it is possible to increase the density or strength through the accompanying material, which also further increases the mechanical stability of the ceramic element. This in turn allows, for example, the ceramic element to be made thinner.
  • magnesium oxide has a density of between 3 and 4 g/cm 3 , preferably between 3.1 and 3.8 g/cm 3 and particularly preferably between 3.35 and 3.58 g/cm 3 .
  • the density value refers to the value present in the manufactured metal-ceramic substrate. This provides a comparatively high-density magnesium oxide that advantageously has high thermal conductivities.
  • the ceramic element comprises a coating, in particular a ceramic coating, preferably an aluminum oxide coating, which is arranged between the ceramic element and the component metallization.
  • a coating in particular a ceramic coating, preferably an aluminum oxide coating, which is arranged between the ceramic element and the component metallization.
  • Copper, aluminum, molybdenum, tungsten, nickel and/or their alloys such as CuZr, AlSi or AIMgSi, as well as laminates such as CuW, CuMo, CuAI and/or AICu or MMC (metal matrix composite), such as CuW, CuM or AlSiC, are conceivable as materials for the at least one metal layer or the component metallization in the metal-ceramic substrate. It is also preferably provided that the at least one metal layer on the manufactured metal-ceramic substrate is surface-modified, in particular as component metallization.
  • a sealing with a precious metal, in particular silver and/or gold, or (electroless) nickel or ENIG (“electroless nickel immersion gold”) or edge casting on the metallization to suppress crack formation or widening is conceivable as a surface modification.
  • a bonding layer is formed between the component metallization and the ceramic element in the manufactured metal-ceramic substrate, wherein an adhesion promoter layer of the bonding layer has a surface resistance which is greater than 0.5 Ohm/sq, preferably greater than 1 Ohm/sq and particularly preferably greater than 2 Ohm/sq or even greater than 15 Ohm/sq.
  • the surface resistance is directly related to the proportion of active metal in the bonding layer, which is crucial for the connection of at least one metal layer to the ceramic element.
  • the surface resistance increases as the proportion of active metal in the bonding layer decreases. A correspondingly high surface resistance therefore corresponds to a low proportion of active metal in the bonding layer.
  • the surface resistance does not depend on a single parameter, but can be influenced by the interaction of several parameters.
  • the purity of the active metal, the thickness of the bonding layer and/or the surface roughness of the ceramic element also contribute to determining the surface resistance.
  • high surface resistances can only be achieved through the interaction of at least two parameters.
  • the surface resistances as claimed describe bonding layers whose peel strength is improved, i.e. increased, due to the reduced formation of brittle intermetallic phases.
  • the surface resistances as claimed By specifically setting the surface resistances as claimed, particularly strong bonds of the at least one metal layer to the ceramic element can be achieved. Such an increased bond strength has a beneficial effect on the service life of the metal-ceramic substrate.
  • the metal layer and, if applicable, a solder base layer are first removed from the manufactured metal-ceramic substrate, for example by etching.
  • a surface resistance is then measured using a four-point measurement on the outside or underside of the metal-ceramic substrate freed from the at least one metal layer and the solder base layer.
  • the surface resistance of a material sample is to be understood as its resistance in relation to a square surface area. It is usual to describe the surface resistance with the unit Ohm/sq(square).
  • the physical unit of the surface resistance is Ohm.
  • a thickness of the bonding layer measured in the stacking direction, averaged over several measuring points within a predetermined area before or in several areas that run parallel to the main plane of extension assumes a value that is less than 0.20 mm, preferably less than 10 pm and particularly preferably less than 20 pm.
  • the at least one metal layer is divided into areas that are as equal in size as possible and in each of these areas dividing the at least one metal layer, at least one value, preferably several measured values, are recorded for the thickness.
  • the thicknesses determined in this way at different points are arithmetically averaged.
  • a comparatively thin bonding layer is thus formed between the at least one metal layer and the ceramic element.
  • the measured thicknesses are averaged over a large number of measuring points that lie within a predetermined or fixed area or the multiple areas.
  • the bonding layer may vary due to the undulation, in particular it may be larger in valley areas of the ceramic element than in mountain areas of the ceramic element.
  • a proportion of active metal in the adhesion promoter layer comprising an active metal is greater than 25% by weight, preferably greater than 20% by weight and particularly preferably greater than 15% by weight.
  • the bonding layer is formed flat, in particular without interruption, ie continuously, between the at least one metal layer and the ceramic element.
  • a ratio of an area in which there is no bonding between the at least one metal layer and the ceramic element layer is formed to the areas in which a bonding layer is formed between the at least one bonding layer and the ceramic element is smaller than 0.05 mm, preferably smaller than 0.02 mm and particularly preferably smaller than 0.007 mm.
  • the areas which are free of metal of the at least one metal layer due to the structuring are not taken into account.
  • the component metallization is connected via a direct bonding process.
  • a direct bonding process or hot isostatic pressing the structure is not weakened or only slightly weakened - unlike in an active soldering process - so that a mechanically stable metal-ceramic substrate is produced.
  • the component metallization has a thickness that is greater than 0.4 mm, preferably greater than 1.0 mm and particularly preferably greater than 1.5 mm. This advantageously ensures sufficient mechanical stability, even if the bonding process weakens the structure.
  • the ceramic element has a thickness that is greater than 200 pm, preferably greater than 300 pm and particularly preferably greater than 400 pm. This makes it possible, in particular together with a comparatively thick metal layer, to provide a mechanically particularly stable metal-ceramic substrate that can be used in many areas of application.
  • Another object of the present invention is a method for producing a metal-ceramic substrate according to the present invention.
  • a method for producing a metal-ceramic substrate usable as a circuit board, in particular a metal-ceramic substrate according to one of the preceding claims, comprising:
  • the metal-ceramic substrate comprises providing a ceramic element with a certain surface roughness and/or producing a surface profile on the outside of the ceramic element.
  • the at least one metal layer and/or the at least one further metal layer is bonded to the ceramic element by means of an active soldering process and/or a hot isostatic pressing process and/or a DCB process.
  • a method for producing a metal-ceramic substrate comprising:
  • solder layer in particular in the form of at least one solder foil or brazing foil
  • solder material of the at least one solder layer is preferably free of a melting point-lowering material or of a phosphorus-free material
  • a multi-layer soldering system comprising at least one soldering layer, preferably free of melting point-lowering elements, particularly preferably a phosphorus-free soldering layer, and at least one active metal layer.
  • the separation of the at least one active metal layer and the at least one soldering layer proves to be particularly advantageous because it enables comparatively thin soldering layers to be realized, particularly when the soldering layer is a foil.
  • soldering materials containing active metals For soldering materials containing active metals, comparatively large soldering layer thicknesses must otherwise be used due to the brittle intermetallic phases or the high elastic modulus and high yield strength of the common active metals and their intermetallic Phases that hinder the transformation of the solder paste or solder layer are realized, whereby the minimum layer thickness is limited by the manufacturing properties of the active metal-containing solder material. Accordingly, for solder layers containing active metals, it is not the minimum thickness required for the joining process that determines the minimum solder layer thickness of the solder layer, but the minimum solder layer thickness that is technically feasible for the solder layer. This makes this thicker, active metal-containing solder layer more expensive than thin layers.
  • the expert understands phosphorus-free in particular to mean that the proportion of phosphorus in the solder layer is less than 1000 ppm, less than 500 ppm and particularly preferably less than 200 ppm.
  • the solder layer in particular the phosphorus-free solder layer, comprises several materials in addition to the pure metal.
  • indium is a component of the solder material used in the solder layer.
  • solder material for forming the solder layer is applied to the active metal layer and/or the at least one metal layer by physical and/or chemical vapor deposition and/or galvanically. This advantageously makes it possible to realize comparatively thin solder layers in the soldering system, in particular in a homogeneous distribution.
  • the container is preferably formed from the metal layer or comprises the metal layer
  • the container is preferably formed as a metal container from a metal layer and/or a further metal layer. Alternatively, it is also conceivable that a glass container is used.
  • hot isostatic pressing it is particularly intended that the bonding takes place by heating under pressure, in which the first and/or second metal layer of the metal container, in particular the subsequent metal layer of the metal-ceramic substrate and any eutectic layer occurring there, do not enter the melting phase. Accordingly, lower temperatures are required for hot isostatic pressing than for a direct metal bonding process, in particular a DCB process.
  • the present procedure advantageously makes it possible to dispense with a solder base material and only requires an active metal.
  • the use or utilization of pressure during hot isostatic pressing also proves to be advantageous because it can reduce air inclusions or cavities between the first metal layer and/or the second metal layer on the one hand and the ceramic element on the other, whereby the frequency of the formation of cavities in the formed or manufactured metal-ceramic substrate can be reduced or even avoided.
  • This has a beneficial effect on the quality of the bond between the metal layer or the first and/or second metal layer of the metal container and the ceramic element.
  • a melting temperature of the additional solder material can be lower than the temperature at which the hot isostatic pressing is carried out, i.e. lower than the melting temperature of the at least one metal layer.
  • the metal container is exposed in a heating and pressure device to a gas pressure between 100 and 2000 bar, preferably between 150 and 1200 bar and particularly preferably between 300 and 1000 bar and a process temperature of 300 °C up to a melting temperature of the at least one metal layer, in particular up to a temperature below the melting temperature. It has been found advantageous that It is possible to bond a metal layer, i.e. a first and/or second metal layer of the metal container, to the ceramic element without the required temperatures of a direct metal bonding process, for example a DCB or a DAB process, and/or without a solder base material that is used in active soldering.
  • a direct metal bonding process for example a DCB or a DAB process
  • the metal layer is bonded via an active metal layer.
  • this is a separate active metal layer, the proportion of active metal of which is or assumes preferably more than 15% by weight, very preferably more than 35% by weight, and particularly preferably more than 80% by weight.
  • This is not a solder layer containing active metal, but rather a binding layer or adhesion promoter layer that only uses active metal to create the bond between the metal layer and the ceramic element.
  • the active metal layer is applied as a separate layer in addition to a solder base material, with the active metal layer and solder base material forming a solder layer system. In particular, it proves to be advantageous if the active metal layer is applied and/or used as an active metal foil.
  • the at least one metal layer is bonded by means of hot isostatic pressing, wherein in particular the density in the ceramic element is increased by the bonding.
  • the at least one metal layer is bonded using a direct bonding process.
  • an additional ceramic coating surrounds the magnesium-comprising ceramic element as an adhesion promoter, preferably to more than 75% by weight, particularly preferably more than 85% by weight and particularly preferably more than 95% by weight, and even completely surrounds it.
  • a ceramic coating made of aluminum oxide is particularly advantageous in this case.
  • Fig. 1 Metal-ceramic substrate according to a first exemplary embodiment of the present invention
  • Figure 1 shows a metal-ceramic substrate 1 according to a first exemplary embodiment of the present invention.
  • Such metal-ceramic substrates 1 preferably serve as a carrier or circuit board for electronic or electrical components, to which at least one metal layer of the metal-ceramic substrate 1 can be connected to form a component metallization 10 on the component side thereof.
  • the component metallization 10 is structured in order to form corresponding conductor tracks and/or connection surfaces (not shown), i.e. in the manufactured metal-ceramic substrate 1, the component metallization 10 comprises several metal sections that are electrically insulated from one another.
  • the component metallization 10 extending essentially along a main extension plane HSE and a ceramic element 30 extending along the main extension plane HSE are stacked one above the other along a stacking direction S running perpendicular to the main extension plane HSE. arranged and preferably joined or connected to one another via a bonding layer 12.
  • the metal-ceramic substrate 1 comprises, in addition to the component metallization 10, at least one rear-side metallization 20, which is arranged on the side of the ceramic element 30 opposite the component metallization 10, as seen in the stacking direction S, and is connected to the ceramic element 30 via a further bonding layer 12'.
  • the at least one further metal layer 20 serves as a rear-side metallization 20, which counteracts a bending of the metal-ceramic substrate 1, in particular of the metal-ceramic element 1, and/or as a heat sink, which is designed to dissipate heat input caused by electrical or electronic components on the metal-ceramic substrate 1.
  • the metal-ceramic substrate 1 has a bonding layer 12 arranged between the at least one metal layer 10 and the ceramic element 30. It has proven to be advantageous if a thickness of the bonding layer 12 measured in the stacking direction S is comparatively thin. In addition, a comparatively thin thickness of the bonding layer 12 between the at least one metal layer 10 and the ceramic element 30 proves to be advantageous if an etching process is provided for the purpose of structuring the at least one metal layer 10. For example, narrower isolation trenches, i.e. distances between individual metal sections of the at least one metal layer 10, can be realized in this way.
  • a thinner bonding layer 12 proves to be advantageous in that it can further reduce the number of possible defects in the bonding layer 12 caused by material defects in a solder material that may be used.
  • the bonding layer 12 is in particular an adhesion promoter layer 13 comprising an active metal.
  • the adhesion promoter layer 13 is preferably formed after bonding from a material composition that comprises a compound of components of the ceramic element on the one hand and an active metal on the other. Since these are very brittle compounds, a design of this adhesion promoter layer 13 that is as thin as possible is advantageous for the adhesive strength of the at least one metal layer 10 on the ceramic element 30.
  • the adhesion promoter layer 13 can form the bonding layer 12 if, for example, an active metal layer, in particular an active metal foil, is arranged for the bonding process between the ceramic element 30 and the metal layer 10 and the bonding process is carried out by hot isostatic pressing.
  • the adhesion promoter layer 13 can, however, also be formed, for example, by an active metal layer, in particular an active metal foil, which is arranged between the ceramic element 30 and a solder base layer in order to create the bond between the metal layer 10 and the ceramic element 30 via the system of active metal layer and solder base layer. In this case, the adhesion promoter layer 13 forms part of the bonding layer 12.
  • the active metal layer preferably has a proportion of active metal that is greater than 15% by weight, particularly preferably greater than 35% by weight and particularly preferably greater than 80% by weight. This means that it is not a solder layer containing active metal that is used to connect the at least one metal layer. It is particularly preferred if only one active metal layer is arranged between the ceramic element 30 and the at least one metal layer when the connection process takes place.
  • a solder base layer is dispensed with, which is additionally arranged next to the active metal layer between the ceramic element and the at least one metal layer when the soldering process is carried out to form the component metallization 10.
  • this at least one metal layer is structured, i.e. insulation trenches are introduced which separate individual metal sections of the component metallization 10 from one another in an insulating manner.
  • the proportion of magnesium oxide is preferably more than 60% by weight, preferably more than 80% by weight and particularly preferably more than 95% by weight.
  • the thermal expansion coefficient is comparable to that of copper. This has a positive effect on the resistance to thermal shock, since thermal stresses develop less strongly than with conventional ceramic materials.
  • the connection of the at least one metal layer to the ceramic element is carried out via an active solder, ie by means of a solder layer containing active metal. In this case, for example, the active metal content in the solder layer takes on a value that is less than 15% by weight.
  • the bonding of the at least one metal layer to the ceramic element 30 consisting of magnesium oxide or comprising magnesium oxide takes place by applying pressure, if an active metal layer is arranged between the ceramic element 30 and the at least one metal layer, preferably only one active metal layer, i.e. the intermediate region between the ceramic element and at least one metal layer is free of a solder material or a solder base material.
  • an active metal layer is arranged between the ceramic element 30 and the at least one metal layer, preferably only one active metal layer, i.e. the intermediate region between the ceramic element and at least one metal layer is free of a solder material or a solder base material.
  • the density of the magnesium oxide to be increased, for example to a value that is greater than 75 TD, particularly preferably greater than 85 TD and particularly preferably greater than 95 TD.
  • TD to mean in particular the theoretical density, i.e. the smallest or closest theoretically possible packing of the individual molecules in the solid body of the ceramic element.
  • the component metallization has a first thickness D1
  • the rear-side metallization has a second thickness D2
  • the ceramic element has a third thickness.
  • the first thickness D1, the second thickness D2 and the third thickness D3 are measured parallel to the stacking direction S.
  • the first thickness D1 essentially corresponds to the second thickness D2 in order to thereby create a desired symmetry that counteracts bending during production of the metal substrate. This is not absolutely necessary, for example, if the connection takes place as part of a pressing process, since in this case the pressing process already counteracts bending.
  • common soldering processes it proves to be particularly advantageous if the first thickness D1 and the second thickness D2 essentially correspond to one another.
  • the third thickness D3 preferably has a value between 50 pm and 2 mm, preferably between 100 pm and 1000 pm and particularly preferably between 200 pm and 800 pm.
  • the first thickness D1 and/or second thickness D2 preferably have a value between 100 pm and 1000 pm, particularly preferably between 200 pm and 800 pm and particularly preferably between 300 pm and 700 pm.
  • the third thickness D3 is greater than the first thickness D1 and/or second thickness D2. It is also conceivable that the third thickness D3 is smaller than the first thickness D1 and/or second thickness D2.
  • the magnesium oxide preferably has a density of between 3 g/cm 3 and 4 g/cm 3 , particularly preferably between 3.15 and 3.7 g/cm 3 and particularly preferably between 3.3 and 3.56 g/cm 3 .
  • the magnesium oxide in the ceramic element 30 particularly preferably has a proportion of 95 to 100%. This advantageously makes it possible to make use of the high thermal conductivities of the single crystal.
  • the density of the magnesium oxide is increased by at least 20% by pressing.
  • FIG. 2 shows a second embodiment of a metal-ceramic substrate 1 according to the present invention.
  • the ceramic element 30 is surrounded, in particular completely surrounded, by a ceramic coating (for example made of aluminum oxide Al2O3).
  • This coating 30 serves the purpose of improving or simplifying the bonding of the at least one metal layer to the insulation body.
  • a hardening of the surface is possible through spinel formation and thus a DCB bond, i.e. a direct bond, is also possible.
  • Figure 3 shows a third embodiment of a metal-ceramic substrate 1 according to the present invention.
  • the at least one metal layer and/or the at least one further metal layer is bonded to the ceramic element 30 via a direct bonding method, in particular is bonded directly to the ceramic element 30 which essentially comprises magnesium oxide.
  • the same material specifications for the magnesium oxide apply to all embodiments shown here. It is particularly preferred if a doped magnesium oxide is used or provided as the ceramic element 30.
  • an additional or accompanying material is used as doping, the proportion of which in the ceramic element 30 is less than 10 wt. %, particularly preferably less than 8 wt. %, and particularly preferably less than 5 wt. %.
  • the accompanying material that will be used for doping is selected in such a way that it has as little influence as possible on the thermal conductivity. This means that the accompanying material that used for doping leads to a change in the thermal conductivity of the ceramic element, wherein the change is less than 5%, less than 2.5% and particularly preferably less than 1% of the measured thermal conductivity in a pure magnesium oxide ceramic element with comparable density.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Ceramic Products (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)

Abstract

L'invention concerne un substrat métal-céramique, qui peut être utilisé comme carte de circuit imprimé et comprend -un élément céramique et - au moins une métallisation de composant liée à l'élément céramique, dans lequel : la métallisation de composant est structurée afin de former des pistes conductrices ; l'élément céramique comprend de l'oxyde de magnésium ; et une proportion d'oxyde de magnésium est supérieure à 60% en poids, de préférence supérieure à 80% et de manière particulièrement préférée supérieure à 95% en poids.
EP24705412.5A 2023-02-16 2024-02-13 Substrat métal-céramique et procédé de fabrication d'un substrat métal-céramique Pending EP4665695A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102023103850.8A DE102023103850A1 (de) 2023-02-16 2023-02-16 Metall-Keramik-Substrat und Verfahren zur Herstellung eines Metall-Keramik-Substrats
PCT/EP2024/053560 WO2024170534A1 (fr) 2023-02-16 2024-02-13 Substrat métal-céramique et procédé de fabrication d'un substrat métal-céramique

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EP (1) EP4665695A1 (fr)
JP (1) JP2026505210A (fr)
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WO (1) WO2024170534A1 (fr)

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JPH0748180A (ja) * 1993-08-03 1995-02-21 Noritake Co Ltd セラミックス−金属接合体
DE19927046B4 (de) 1999-06-14 2007-01-25 Electrovac Ag Keramik-Metall-Substrat als Mehrfachsubstrat
DE102009033029A1 (de) 2009-07-02 2011-01-05 Electrovac Ag Elektronische Vorrichtung
DE102013104739B4 (de) 2013-03-14 2022-10-27 Rogers Germany Gmbh Metall-Keramik-Substrate sowie Verfahren zum Herstellen eines Metall-Keramik-Substrates
DE102013113734B4 (de) 2013-12-10 2018-03-08 Rogers Germany Gmbh Verfahren zum Herstellen eines Metall-Keramik-Substrates
DE102018101750A1 (de) * 2018-01-26 2019-08-01 Rogers Germany Gmbh Verbundkeramik für eine Leiterplatte und Verfahren zu deren Herstellung
WO2020115869A1 (fr) * 2018-12-06 2020-06-11 日本碍子株式会社 Substrat pour dispositif à semi-conducteur
DE102020111698A1 (de) * 2020-04-29 2021-11-04 Rogers Germany Gmbh Verfahren zur Herstellung eines Metall-Keramik-Substrats und ein Metall-Keramik-Substrat hergestellt mit einem solchen Verfahren
CN112811922B (zh) * 2021-01-20 2021-11-02 中国科学院上海硅酸盐研究所 一种覆铜板的氮化硅陶瓷基片及其制备方法
DE102021105520B4 (de) * 2021-03-08 2022-10-27 Rogers Germany Gmbh Metall-Keramik-Substrat und Verfahren zur Herstellung eines Metall-Keramik-Substrats

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CN120693312A (zh) 2025-09-23
WO2024170534A1 (fr) 2024-08-22

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