ES2010233A6 - Revestimientos ceramicos, metodo para su produccion y dispositivos electronicos asi revestidos. . - Google Patents
Revestimientos ceramicos, metodo para su produccion y dispositivos electronicos asi revestidos. .Info
- Publication number
- ES2010233A6 ES2010233A6 ES8703427A ES8703427A ES2010233A6 ES 2010233 A6 ES2010233 A6 ES 2010233A6 ES 8703427 A ES8703427 A ES 8703427A ES 8703427 A ES8703427 A ES 8703427A ES 2010233 A6 ES2010233 A6 ES 2010233A6
- Authority
- ES
- Spain
- Prior art keywords
- electronic devices
- ceramic
- coated
- ceramic coatings
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
- H10W74/137—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed the encapsulations being directly on the semiconductor body
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
- H10W74/43—Encapsulations, e.g. protective coatings characterised by their materials comprising oxides, nitrides or carbides, e.g. ceramics or glasses
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
- H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
- H10W74/476—Organic materials comprising silicon
Landscapes
- Formation Of Insulating Films (AREA)
- Chemically Coating (AREA)
- Paints Or Removers (AREA)
Abstract
REVESTIMIENTOS CERAMICOS, METODO PARA SU PRODUCCION Y DISPOSITIVOS ELECTRONICOS ASI REVESTIDOS. ESTA INVENCION SE REFIERE A MATERIALES PRODUCIDOS DILUYENDO EN UN DISOLVENTE UNA MEZCLA PRECERAMICA DE UNA RESINA DE HIDROGENO SILSESQUIOXANO Y UN PRECURSOR DE OXIDO METALICO SELECCIONADO DEL GRUPO FORMADO POR UN ALCOXIDO DE ALUMINIO, UN ALCOXIDO DE TITANIO Y UN ALCOXIDO DE ZIRCONIO. LA SOLUCION DE LA MEZCLA PRECERAMICA EN EL DISOLVENTE SE APLICA A UN SUSTRATO Y SE CERAMIFICA APLICANDO CALOR. SOBRE EL REVESTIMIENTO DE SIO2/OXIDO METALICO CERAMIFICADO, SE PUEDEN APLICAR UNO O MAS REVESTIMIENTOS CERAMICOS QUE CONTIENEN SILICIO Y CARBONO, SILICIO Y NITROGENO, O SILICIO, CARBONO Y NITROGENO. PARA CONSEGUIR UNA MEJOR PROTECCION, SE PUEDE APLICAR UN ULTIMO REVESTIMIENTO MEDIANTE CVD O PECVD. LA INVENCION ES PARTICULARMENTE UTIL PARA REVESTIR DISPOSITIVOS ELECTRONICOS.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/938,677 US4753855A (en) | 1986-12-04 | 1986-12-04 | Multilayer ceramic coatings from metal oxides for protection of electronic devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2010233A6 true ES2010233A6 (es) | 1989-11-01 |
Family
ID=25471786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES8703427A Expired ES2010233A6 (es) | 1986-12-04 | 1987-11-30 | Revestimientos ceramicos, metodo para su produccion y dispositivos electronicos asi revestidos. . |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4753855A (es) |
| EP (1) | EP0270263B1 (es) |
| JP (1) | JPH0646631B2 (es) |
| KR (1) | KR950014274B1 (es) |
| CA (1) | CA1329736C (es) |
| DE (1) | DE3789605T2 (es) |
| ES (1) | ES2010233A6 (es) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR910003742B1 (ko) * | 1986-09-09 | 1991-06-10 | 세미콘덕터 에너지 라보라터리 캄파니 리미티드 | Cvd장치 |
| US5708252A (en) * | 1986-09-26 | 1998-01-13 | Semiconductor Energy Laboratory Co., Ltd. | Excimer laser scanning system |
| US6149988A (en) * | 1986-09-26 | 2000-11-21 | Semiconductor Energy Laboratory Co., Ltd. | Method and system of laser processing |
| US4808653A (en) * | 1986-12-04 | 1989-02-28 | Dow Corning Corporation | Coating composition containing hydrogen silsesquioxane resin and other metal oxide precursors |
| US6261856B1 (en) | 1987-09-16 | 2001-07-17 | Semiconductor Energy Laboratory Co., Ltd. | Method and system of laser processing |
| US4849296A (en) * | 1987-12-28 | 1989-07-18 | Dow Corning Corporation | Multilayer ceramic coatings from metal oxides and hydrogen silsesquioxane resin ceramified in ammonia |
| US6756670B1 (en) | 1988-08-26 | 2004-06-29 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device and its manufacturing method |
| US5147822A (en) * | 1988-08-26 | 1992-09-15 | Semiconductor Energy Laboratory Co., Ltd. | Plasma processing method for improving a package of a semiconductor device |
| US5336532A (en) * | 1989-02-21 | 1994-08-09 | Dow Corning Corporation | Low temperature process for the formation of ceramic coatings |
| US4970097A (en) * | 1989-03-16 | 1990-11-13 | Owens-Corning Fiberglas Corporation | Method for forming abrasion resistant coating on fibrous glass substrate |
| JP2777903B2 (ja) * | 1989-04-14 | 1998-07-23 | 日本カーボン株式会社 | 耐熱耐食性無機材料およびその製造方法 |
| US4999397A (en) * | 1989-07-28 | 1991-03-12 | Dow Corning Corporation | Metastable silane hydrolyzates and process for their preparation |
| US5085893A (en) * | 1989-07-28 | 1992-02-04 | Dow Corning Corporation | Process for forming a coating on a substrate using a silsesquioxane resin |
| CA2027031A1 (en) * | 1989-10-18 | 1991-04-19 | Loren A. Haluska | Hermetic substrate coatings in an inert gas atmosphere |
| US5183684A (en) * | 1989-11-20 | 1993-02-02 | Dow Corning Corporation | Single and multilayer coatings containing aluminum nitride |
| US4973526A (en) * | 1990-02-15 | 1990-11-27 | Dow Corning Corporation | Method of forming ceramic coatings and resulting articles |
| US5059448A (en) * | 1990-06-18 | 1991-10-22 | Dow Corning Corporation | Rapid thermal process for obtaining silica coatings |
| DE4036988A1 (de) * | 1990-11-20 | 1992-05-21 | Wacker Chemie Gmbh | Verfahren zur herstellung von metallopolysilanen und deren verwendung |
| US5339211A (en) * | 1991-05-02 | 1994-08-16 | Dow Corning Corporation | Variable capacitor |
| US5312684A (en) * | 1991-05-02 | 1994-05-17 | Dow Corning Corporation | Threshold switching device |
| US5387480A (en) * | 1993-03-08 | 1995-02-07 | Dow Corning Corporation | High dielectric constant coatings |
| US5304398A (en) * | 1993-06-03 | 1994-04-19 | Watkins Johnson Company | Chemical vapor deposition of silicon dioxide using hexamethyldisilazane |
| US5661092A (en) * | 1995-09-01 | 1997-08-26 | The University Of Connecticut | Ultra thin silicon oxide and metal oxide films and a method for the preparation thereof |
| US5711987A (en) * | 1996-10-04 | 1998-01-27 | Dow Corning Corporation | Electronic coatings |
| US5807611A (en) * | 1996-10-04 | 1998-09-15 | Dow Corning Corporation | Electronic coatings |
| US5707681A (en) * | 1997-02-07 | 1998-01-13 | Dow Corning Corporation | Method of producing coatings on electronic substrates |
| US6015457A (en) * | 1997-04-21 | 2000-01-18 | Alliedsignal Inc. | Stable inorganic polymers |
| US6218497B1 (en) | 1997-04-21 | 2001-04-17 | Alliedsignal Inc. | Organohydridosiloxane resins with low organic content |
| US6743856B1 (en) | 1997-04-21 | 2004-06-01 | Honeywell International Inc. | Synthesis of siloxane resins |
| US6143855A (en) * | 1997-04-21 | 2000-11-07 | Alliedsignal Inc. | Organohydridosiloxane resins with high organic content |
| US6218020B1 (en) | 1999-01-07 | 2001-04-17 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with high organic content |
| US6177199B1 (en) | 1999-01-07 | 2001-01-23 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with low organic content |
| EP1190277B1 (en) * | 1999-06-10 | 2009-10-07 | AlliedSignal Inc. | Semiconductor having spin-on-glass anti-reflective coatings for photolithography |
| US6472076B1 (en) | 1999-10-18 | 2002-10-29 | Honeywell International Inc. | Deposition of organosilsesquioxane films |
| US6440550B1 (en) * | 1999-10-18 | 2002-08-27 | Honeywell International Inc. | Deposition of fluorosilsesquioxane films |
| US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| KR20070008546A (ko) * | 2003-12-18 | 2007-01-17 | 하이브리드 플라스틱스 인코포레이티드 | 코팅, 복합재 및 첨가제로서의 다면체 올리고머실세스퀴옥산 및 금속화 다면체 올리고머 실세스퀴옥산 |
| US7380412B2 (en) | 2004-07-21 | 2008-06-03 | Donna Roth | Food storage system |
| US8011205B2 (en) | 2004-12-27 | 2011-09-06 | Cool Gear International, Llc | Food storage system |
| US7170093B2 (en) * | 2004-11-05 | 2007-01-30 | Xerox Corporation | Dielectric materials for electronic devices |
| US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
| WO2008122292A1 (en) * | 2007-04-04 | 2008-10-16 | Ecole Polytechnique Federale De Lausanne (Epfl) | Diffusion-barrier coating for protection of moisture and oxygen sensitive devices |
| US9953952B2 (en) * | 2008-08-20 | 2018-04-24 | Infineon Technologies Ag | Semiconductor device having a sealant layer including carbon directly contact the chip and the carrier |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| US8840970B2 (en) * | 2011-01-16 | 2014-09-23 | Sigma Laboratories Of Arizona, Llc | Self-assembled functional layers in multilayer structures |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| TWI633640B (zh) | 2013-12-16 | 2018-08-21 | 新力股份有限公司 | Semiconductor element, method of manufacturing semiconductor element, and electronic device |
| JP6803842B2 (ja) | 2015-04-13 | 2020-12-23 | ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. | オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング |
| CN109427692B (zh) * | 2017-08-23 | 2020-11-20 | Tcl科技集团股份有限公司 | 封装薄膜及其应用 |
| FI129480B (en) * | 2018-08-10 | 2022-03-15 | Pibond Oy | Silanol-containing organic-inorganic hybrid coatings for high resolution patterning |
| KR102946062B1 (ko) * | 2021-12-24 | 2026-04-01 | 삼성전기주식회사 | 적층형 전자 부품 |
| US20240026186A1 (en) * | 2022-07-25 | 2024-01-25 | Vapor Technologies, Inc. | Coated article with quasi-ceramic basecoat cured at low temperatures |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3061587A (en) * | 1960-05-03 | 1962-10-30 | Hughes Aircraft Co | Ordered organo silicon-aluminum oxide copolymers and the process of making same |
| US3615272A (en) * | 1968-11-04 | 1971-10-26 | Dow Corning | Condensed soluble hydrogensilsesquioxane resin |
| US3859126A (en) * | 1970-10-27 | 1975-01-07 | Owens Illinois Inc | Ceramic substrates hermetically sealed with vitreous coatings |
| US4340619A (en) * | 1981-01-15 | 1982-07-20 | Dow Corning Corporation | Process for the preparation of poly(disilyl)silazane polymers and the polymers therefrom |
| US4312970A (en) * | 1981-02-20 | 1982-01-26 | Dow Corning Corporation | Silazane polymers from {R'3 Si}2 NH and organochlorosilanes |
| US4395460A (en) * | 1981-09-21 | 1983-07-26 | Dow Corning Corporation | Preparation of polysilazane polymers and the polymers therefrom |
| DE3278567D1 (en) * | 1981-10-03 | 1988-07-07 | Japan Synthetic Rubber Co Ltd | Solvent-soluble organopolysilsesquioxanes, processes for producing the same, and compositions and semiconductor devices using the same |
| US4397828A (en) * | 1981-11-16 | 1983-08-09 | Massachusetts Institute Of Technology | Stable liquid polymeric precursor to silicon nitride and process |
| CA1204527A (en) * | 1982-08-13 | 1986-05-13 | Theodore F. Retajczyk, Jr. | Polymeric films for electronic circuits |
| US4540803A (en) * | 1983-11-28 | 1985-09-10 | Dow Corning Corporation | Hydrosilazane polymers from [R3 Si]2 NH and HSiCl3 |
| US4543344A (en) * | 1983-11-28 | 1985-09-24 | Dow Corning Corporation | Silicon nitride-containing ceramic material prepared by pyrolysis of hydrosilazane polymers from (R3 Si)2 NH and HSiCl3 |
| US4482669A (en) * | 1984-01-19 | 1984-11-13 | Massachusetts Institute Of Technology | Preceramic organosilazane polymers |
| US4482689A (en) * | 1984-03-12 | 1984-11-13 | Dow Corning Corporation | Process for the preparation of polymetallo(disily)silazane polymers and the polymers therefrom |
| US4535007A (en) * | 1984-07-02 | 1985-08-13 | Dow Corning Corporation | Silicon nitride-containing ceramics |
| US4756977A (en) * | 1986-12-03 | 1988-07-12 | Dow Corning Corporation | Multilayer ceramics from hydrogen silsesquioxane |
| US4826733A (en) * | 1986-12-03 | 1989-05-02 | Dow Corning Corporation | Sin-containing coatings for electronic devices |
| US4822697A (en) * | 1986-12-03 | 1989-04-18 | Dow Corning Corporation | Platinum and rhodium catalysis of low temperature formation multilayer ceramics |
-
1986
- 1986-12-04 US US06/938,677 patent/US4753855A/en not_active Expired - Lifetime
-
1987
- 1987-10-19 CA CA000549574A patent/CA1329736C/en not_active Expired - Fee Related
- 1987-11-11 EP EP87309966A patent/EP0270263B1/en not_active Expired - Lifetime
- 1987-11-11 DE DE3789605T patent/DE3789605T2/de not_active Expired - Fee Related
- 1987-11-30 ES ES8703427A patent/ES2010233A6/es not_active Expired
- 1987-12-03 JP JP62304654A patent/JPH0646631B2/ja not_active Expired - Lifetime
- 1987-12-04 KR KR1019870013837A patent/KR950014274B1/ko not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
Also Published As
| Publication number | Publication date |
|---|---|
| US4753855A (en) | 1988-06-28 |
| EP0270263A3 (en) | 1989-12-13 |
| JPH0646631B2 (ja) | 1994-06-15 |
| JPS63152131A (ja) | 1988-06-24 |
| KR950014274B1 (ko) | 1995-11-24 |
| CA1329736C (en) | 1994-05-24 |
| DE3789605D1 (de) | 1994-05-19 |
| DE3789605T2 (de) | 1994-11-03 |
| EP0270263A2 (en) | 1988-06-08 |
| EP0270263B1 (en) | 1994-04-13 |
| KR880008443A (ko) | 1988-08-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| SA6 | Expiration date (snapshot 920101) |
Free format text: 2007-11-30 |