ES2028034T3 - Fluido revelador para placas litograficas. - Google Patents

Fluido revelador para placas litograficas.

Info

Publication number
ES2028034T3
ES2028034T3 ES198787117386T ES87117386T ES2028034T3 ES 2028034 T3 ES2028034 T3 ES 2028034T3 ES 198787117386 T ES198787117386 T ES 198787117386T ES 87117386 T ES87117386 T ES 87117386T ES 2028034 T3 ES2028034 T3 ES 2028034T3
Authority
ES
Spain
Prior art keywords
fluid
action
developing fluid
negative
lithographic plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198787117386T
Other languages
English (en)
Inventor
David S. Riley
Gregory P. Turner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horsell Graphic Industries Ltd
Original Assignee
Horsell Graphic Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horsell Graphic Industries Ltd filed Critical Horsell Graphic Industries Ltd
Application granted granted Critical
Publication of ES2028034T3 publication Critical patent/ES2028034T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

UN FLUIDO DE REVELADO PARA PLACAS DE IMPRESION LITOGRAFICA REVERSIBLE Y DE ACCION - POSITIVA, ACCION - NEGATIVA COMPRENDE METASILICATO COMO ALKALI JUNTO CON UNA MASA DE COPOLIMERO DE OXIDO DE ETILENO / OSIDO DE PROPILENO Y OPCIONALMENTE, TETRABORATO DE SODIO, UN ESTER FOSFATO, UN AGENTE ANTI ESPUMOSO Y UN AGENTE SUAVIZADOR O DE RETENCION. EL FLUIDO TIENE UN ALTO CONTENIDO DE ALKALI PARA REDUCIR LA NECESIDAD DE RELLENAR FRECUENTEMENTE MIENTRAS AL MISMO TIEMPO, DISMINUYE EL DAÑO A LA IMAGEN, PARTICULARMENTE EN PLACAS NEGATIVAS E INVERTIDAS Y EVITAR LA INACEPTABLE ESPUMA Y TURBIDEZ.
ES198787117386T 1986-11-29 1987-11-25 Fluido revelador para placas litograficas. Expired - Lifetime ES2028034T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB868628613A GB8628613D0 (en) 1986-11-29 1986-11-29 Developing fluid for lithographic plates

Publications (1)

Publication Number Publication Date
ES2028034T3 true ES2028034T3 (es) 1992-07-01

Family

ID=10608204

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198787117386T Expired - Lifetime ES2028034T3 (es) 1986-11-29 1987-11-25 Fluido revelador para placas litograficas.

Country Status (8)

Country Link
US (1) US4945030A (es)
EP (1) EP0274044B1 (es)
DE (1) DE3776536D1 (es)
DK (1) DK625487D0 (es)
ES (1) ES2028034T3 (es)
FI (1) FI875247A0 (es)
GB (1) GB8628613D0 (es)
NO (1) NO874953D0 (es)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4027299A1 (de) * 1990-08-29 1992-03-05 Hoechst Ag Entwicklerzusammensetzung fuer bestrahlte, strahlungsempfindliche, positiv und negativ arbeitende sowie umkehrbare reprographische schichten und verfahren zur entwicklung solcher schichten
EP0555098B1 (en) * 1992-02-07 1999-05-26 Tadahiro Ohmi Lithographic developer and lithographic process
US6007970A (en) * 1992-02-07 1999-12-28 Canon Kabushiki Kaisha Lithographic developer containing surfactant
ATE172551T1 (de) * 1992-02-10 1998-11-15 Tadahiro Ohmi Lithographisches verfahren
CN1064074C (zh) * 1993-12-03 2001-04-04 巴科曼实验室国际公司 用嵌段共聚物促使酶稳定
EP0732628A1 (en) 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Aqueous alkaline solution for developing offset printing plate
US5897985A (en) * 1996-10-11 1999-04-27 Kodak Polychrome Graphics, Llc Potassium silicate developing composition and method of use to process lithographic printing plates
US5766826A (en) * 1996-10-11 1998-06-16 Eastman Kodak Company Alkaline developing composition and method of use to process lithographic printing plates
US5811221A (en) * 1997-05-30 1998-09-22 Kodak Polychrome Graphics, Llc Alkaline developing composition and method of use to process lithographic printing plates
US6083662A (en) * 1997-05-30 2000-07-04 Kodak Polychrome Graphics Llc Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate
DE19811331A1 (de) * 1998-03-16 1999-09-23 Du Pont Deutschland Entwickler und Verfahren zur Herstellung von flexographischen Druckformen
DE19845605A1 (de) 1998-10-05 2000-04-06 Agfa Gevaert Ag Konzentrat und daraus hergestellter wäßriger Entwickler für bildmäßig bestrahlte Aufzeichnungsmaterialien
US6143479A (en) * 1999-08-31 2000-11-07 Kodak Polychrome Graphics Llc Developing system for alkaline-developable lithographic printing plates
JP4689804B2 (ja) * 1999-12-21 2011-05-25 コダック株式会社 ポジ画像形成方法及びそれに用いる現像液
US6649324B1 (en) 2000-08-14 2003-11-18 Kodak Polychrome Graphics Llc Aqueous developer for lithographic printing plates
US6562555B2 (en) 2001-08-01 2003-05-13 Kodak Polychrome Graphics Llc Method for developing lithographic printing plate precursors using a coating attack-suppressing agent
GB0226101D0 (en) * 2002-11-08 2002-12-18 Rhodia Cons Spec Ltd White rust corrosion inhibitors
ITMI20040162A1 (it) * 2004-02-02 2004-05-02 Bozzetto Giovanni Spa Uso di polliaaminometilenfosfonati quali agenti disperdenti
JP4166167B2 (ja) * 2004-02-05 2008-10-15 富士フイルム株式会社 感光性平版印刷版用現像液及び平版印刷版の製版方法
US20060257798A1 (en) * 2004-05-10 2006-11-16 Agfa-Gevaert Alkaline developer for radiation sensitive compositions
US20060154187A1 (en) * 2004-12-17 2006-07-13 John Wilson Development of radiation-sensitive elements
DE602005024371D1 (de) 2005-05-10 2010-12-09 Agfa Gevaert Nv Verfahren zur Verarbeitung von Flachdruckplatten
US20060257789A1 (en) * 2005-05-10 2006-11-16 Agfa-Gevaert Method for processing lithographic printing plates
US20080299491A1 (en) * 2007-05-31 2008-12-04 Miller Gary R Highly alkaline developer composition and methods of use
US7883833B2 (en) 2007-06-20 2011-02-08 Eastman Kodak Company Use of highly alkaline developer regenerator composition

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO121968C (es) * 1966-06-23 1977-06-13 Mo Och Domsjoe Ab
DK130844A (es) * 1969-09-03 1900-01-01
US3518201A (en) * 1969-09-04 1970-06-30 Grace W R & Co Chlorine release detergent composition with improved defoamer stability
US3705856A (en) * 1970-09-01 1972-12-12 Basf Wyandotte Corp Additives for alkali cleaning systems
DE2700938A1 (de) * 1977-01-12 1978-07-13 Agfa Gevaert Ag Photographische farbentwicklerzusammensetzung
US4340509A (en) * 1978-03-24 1982-07-20 Michael A. Canale Composition, concentrate and fountain solution for lithographic printing operations
US4244832A (en) * 1979-07-27 1981-01-13 Basf Wyandotte Corporation Phosphate-free machine dishwashing detergents useful at low temperatures
DE3100259A1 (de) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten
US4374920A (en) * 1981-07-27 1983-02-22 American Hoechst Corporation Positive developer containing non-ionic surfactants
US4374076A (en) * 1981-10-09 1983-02-15 Coors Porcelain Company Method for making cast epoxy resin bodies and epoxy formulation therefor
US4436807A (en) * 1982-07-15 1984-03-13 American Hoechst Corporation Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material
JPS5917552A (ja) * 1982-07-21 1984-01-28 Toray Ind Inc 画像形成用積層体の処理方法
US4540444A (en) * 1982-08-12 1985-09-10 Amchem Products, Inc. Aluminum cleaner and system
DE3346979A1 (de) * 1983-12-24 1985-07-04 Merck Patent Gmbh, 6100 Darmstadt Entwickler fuer positivfotoresists
US4680251A (en) * 1984-04-21 1987-07-14 E. I. Du Pont De Nemours And Company Process for the ozone protection of photopolymer flexographic printing plates by treatment with liquid polyethers
DE3427556C1 (de) * 1984-07-26 1986-01-02 Merck Patent Gmbh, 6100 Darmstadt Verfahren zur Herstellung von Fotoresist-Reliefstrukturen mit UEberhangcharakter
DE3501675A1 (de) * 1985-01-19 1986-07-24 Merck Patent Gmbh, 6100 Darmstadt Mittel und verfahren zur entfernung von fotoresist- und stripperresten von halbleitersubstraten
US4592992A (en) * 1985-04-11 1986-06-03 American Hoechst Corporation Developer compositions for lithographic plates

Also Published As

Publication number Publication date
GB8628613D0 (en) 1987-01-07
FI875247A0 (fi) 1987-11-27
EP0274044A1 (en) 1988-07-13
EP0274044B1 (en) 1992-01-29
DE3776536D1 (de) 1992-03-12
DK625487D0 (da) 1987-11-27
US4945030A (en) 1990-07-31
NO874953D0 (no) 1987-11-27

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