ES2033416T3 - Metodo para el chapado electrolitico continuo de una banda metalica con una capa de chapado metalico. - Google Patents

Metodo para el chapado electrolitico continuo de una banda metalica con una capa de chapado metalico.

Info

Publication number
ES2033416T3
ES2033416T3 ES198888200990T ES88200990T ES2033416T3 ES 2033416 T3 ES2033416 T3 ES 2033416T3 ES 198888200990 T ES198888200990 T ES 198888200990T ES 88200990 T ES88200990 T ES 88200990T ES 2033416 T3 ES2033416 T3 ES 2033416T3
Authority
ES
Spain
Prior art keywords
metallic
layer
band
electrolytic plating
plated layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198888200990T
Other languages
English (en)
Inventor
Johannes Hendricus Prof. Dr. Sluyters
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tata Steel Ijmuiden BV
Original Assignee
Hoogovens Groep BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoogovens Groep BV filed Critical Hoogovens Groep BV
Application granted granted Critical
Publication of ES2033416T3 publication Critical patent/ES2033416T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

PARA FORMAR UNA CAPA DE PLAQUEADO SOBRE UNA BANDA METALICA (2) POR PLAQUEADO ELECTROLITICO CONTINUO, LA BANDA SE PASA EN CONTINUO, COMO CATODO, A TRAVES DE UNA CELULA ELECTROLITICA (8) EN LA CUAL HAY, AL MENOS UN ANODO (9) Y UN ELECTROLITO (11). PARA CONTROLAR LA CAPA DE PLAQUEDO DURANTE SU FORMACION SE DIRIGE UN RAYO DE RADIACION ELECTROMAGNETICA SOBRE LA BANDA (2) CUANDO ESTA SE ENCUENTRA DENTRO DE LA CELULA (8) Y LA INTENSIDAD DE LA REDIACION DISPERSADA DESDE LA SUPERFICIE DE LA BANDA SE MIDE CON UN ANGULO PREDETERMINADO. ESTO PROPORCIONA INFORMACION SOBRE LA FORMACION DE LA CAPA DE PLAQUEADO, POR EJEMPLO, FORMACION Y CRECIMIENTO DE LOS NUCLEOOS DE CRISTALIZACION, LO QUE PUEDE SER USADO PARA AJUSTAR EL PROCESO DE ELECTROLISIS.
ES198888200990T 1987-06-04 1988-05-18 Metodo para el chapado electrolitico continuo de una banda metalica con una capa de chapado metalico. Expired - Lifetime ES2033416T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8701307A NL8701307A (nl) 1987-06-04 1987-06-04 Werkwijze voor het continu electrolytisch bekleden van een bandvormig metalen substraat met een metallische bekledingslaag.

Publications (1)

Publication Number Publication Date
ES2033416T3 true ES2033416T3 (es) 1993-03-16

Family

ID=19850100

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198888200990T Expired - Lifetime ES2033416T3 (es) 1987-06-04 1988-05-18 Metodo para el chapado electrolitico continuo de una banda metalica con una capa de chapado metalico.

Country Status (5)

Country Link
US (1) US4808277A (es)
EP (1) EP0293966B1 (es)
DE (1) DE3873182T2 (es)
ES (1) ES2033416T3 (es)
NL (1) NL8701307A (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6001237A (en) * 1997-12-02 1999-12-14 The United States Of America As Represented By The Secretary Of The Navy Electrochemical fabrication of capacitors

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2895888A (en) * 1957-10-07 1959-07-21 Industrial Nucleonics Corp Electrolytic plating apparatus and process
US3827963A (en) * 1973-01-02 1974-08-06 Electrometallurgical Sales Reflectivity-responsive control system for electrolytic finishing apparatus
DE2312578C3 (de) * 1973-03-14 1978-09-28 Elmar 3200 Hildesheim Lecher Vorrichtung zur Steuerung des elektrolytischen Einfärbevorganges von anodischen Oxidschichten

Also Published As

Publication number Publication date
DE3873182T2 (de) 1992-12-03
EP0293966A1 (en) 1988-12-07
DE3873182D1 (de) 1992-09-03
NL8701307A (nl) 1989-01-02
EP0293966B1 (en) 1992-07-29
US4808277A (en) 1989-02-28

Similar Documents

Publication Publication Date Title
AU600878B2 (en) Process for electroplating metals
ES2039594T3 (es) Electrolisis de sales fundidas con anodos no consumibles.
IT8422935A0 (it) Vasca di elettrolisi a intensita'superiore a 250.000 ampere per laproduzione di alluminio mediante il procedimento hall-heroult.
ATE38298T1 (de) Verfahren zur stabilisierung primaerer elektrochemischer generatoren mit aktiven anoden aus zink, aluminium oder magnesium und anode fuer auf diese weise stabilisierten generator.
ES2041899T3 (es) Procedimiento para el coloreado electrolitico, con sales metalicas, de superficies de aluminio anodizado.
Sriveeraraghavan et al. Silver electrodeposition from thiosulfate solutions
ES2033416T3 (es) Metodo para el chapado electrolitico continuo de una banda metalica con una capa de chapado metalico.
ES481474A1 (es) Un procedimiento para obtener electrodepositos de estano muyigualados y brillantes.
US4155817A (en) Low free cyanide high purity silver electroplating bath and method
SE7812869L (sv) Surt zinkelektropleteringsforfarande och komposition
Von Gutfeld et al. Increase of Metal Plating and Dissolution Rates by Laser Radiation
ES549652A0 (es) Procedimiento para preparar, por electrolisis en bano de sa-les fundidas, un elemento de tierra rara o una aleacion de elemento de tierra rara
JPS5789499A (en) Composite electrodeposition of boron nitride and metal
ES2089460T3 (es) Baño y procedimiento electrolitico de deposito de un revestimiento instantaneo de una aleacion de hierro-cinc con elevado porcentaje en hierro sobre un sustrato galvanizado aleado.
GB1349796A (en) Electrolytic gold plating solutions and methods utilising such solutions
JPS55107795A (en) Gold tin alloy electroplating bath and plating method
FR2625754B1 (fr) Synthese de sels metalliques d'acides faibles et en particulier du formiate d'indium
GB1176787A (en) Improvements in or relating to Methods of Electrolytically Plating a Substrate With Indium.
ES2031989T3 (es) Metodo y aparato para producir laminas o tiras de acero electrochapadas por un lado con aptitud mejorada para la fosfatacion.
Grunwald et al. Bright Zinc Plating in Weak Acid Electrolytes in the Presence of Glyceroboric Acid
JPS56158424A (en) Electrolytic copper plating for compound semiconductor
JPS5747892A (en) Gold-palladium alloy plating solution
Dumitru et al. Some Observations on Weak Acid Bright Zinc Plating
Abys Silver Plating Procedure
GB1485083A (en) Selective electro-plating

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 293966

Country of ref document: ES