ES2040227T3 - Procedimiento de fotograbado de revestimientos superficiales a base de materiales polimericos. - Google Patents

Procedimiento de fotograbado de revestimientos superficiales a base de materiales polimericos.

Info

Publication number
ES2040227T3
ES2040227T3 ES198787109597T ES87109597T ES2040227T3 ES 2040227 T3 ES2040227 T3 ES 2040227T3 ES 198787109597 T ES198787109597 T ES 198787109597T ES 87109597 T ES87109597 T ES 87109597T ES 2040227 T3 ES2040227 T3 ES 2040227T3
Authority
ES
Spain
Prior art keywords
surface coatings
coatings based
polymeric materials
photo engraving
engraving procedure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198787109597T
Other languages
English (en)
Inventor
Fabio Dr.-Chem. Garbassi
Ernesto Dr.-Chem. Occhiello
Vincenzo Dr.-Chem. Malatesta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Montedison SpA
Original Assignee
Montedison SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Montedison SpA filed Critical Montedison SpA
Application granted granted Critical
Publication of ES2040227T3 publication Critical patent/ES2040227T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

EL PROCESO DE FOTOATAQUE AL ACIDO DE REVESTIMIENTOS SUPERFICIALES BASADO EN MATERIAL POLIMERICO, COMPRENDE LA IRRADIACCION DE LA SUPERFICIE REVESTIDA, CON PROTECTOR LOCALIZADA POR RAYOS LASER, CON LONGITUDES DE ONDA IGUALES O INFERIORES A 193 NM.
ES198787109597T 1986-07-03 1987-07-03 Procedimiento de fotograbado de revestimientos superficiales a base de materiales polimericos. Expired - Lifetime ES2040227T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT21019/86A IT1196447B (it) 1986-07-03 1986-07-03 Procedimento di fotoablazione di rivestimenti superficiali a base di materiale polimerico

Publications (1)

Publication Number Publication Date
ES2040227T3 true ES2040227T3 (es) 1993-10-16

Family

ID=11175469

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198787109597T Expired - Lifetime ES2040227T3 (es) 1986-07-03 1987-07-03 Procedimiento de fotograbado de revestimientos superficiales a base de materiales polimericos.

Country Status (7)

Country Link
US (1) US4826755A (es)
EP (1) EP0253237B1 (es)
JP (1) JPS63100726A (es)
CA (1) CA1272377A (es)
DE (1) DE3785396D1 (es)
ES (1) ES2040227T3 (es)
IT (1) IT1196447B (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5322986A (en) * 1992-04-06 1994-06-21 Eastman Kodak Company Methods for preparing polymer stripe waveguides and polymer stripe waveguides prepared thereby
US6235541B1 (en) 1997-03-13 2001-05-22 The United States Of America As Represented By The Secretary Of The Navy Patterning antibodies on a surface
US5858801A (en) * 1997-03-13 1999-01-12 The United States Of America As Represented By The Secretary Of The Navy Patterning antibodies on a surface

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3375110A (en) * 1964-12-24 1968-03-26 Union Carbide Corp Photo-masking system using p-xylylene polymers
JPS4321763B1 (es) * 1964-12-24 1968-09-18
JPS5992532A (ja) * 1982-11-18 1984-05-28 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション ポジテイブ型レジストの製造方法
US4414059A (en) * 1982-12-09 1983-11-08 International Business Machines Corporation Far UV patterning of resist materials
JPS6196737A (ja) * 1984-10-17 1986-05-15 Toshiba Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
IT8621019A1 (it) 1988-01-03
US4826755A (en) 1989-05-02
IT8621019A0 (it) 1986-07-03
CA1272377A (en) 1990-08-07
IT1196447B (it) 1988-11-16
EP0253237B1 (en) 1993-04-14
EP0253237A3 (en) 1989-05-31
JPS63100726A (ja) 1988-05-02
EP0253237A2 (en) 1988-01-20
DE3785396D1 (de) 1993-05-19

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