ES2049339T3 - Reactor de plasma. - Google Patents

Reactor de plasma.

Info

Publication number
ES2049339T3
ES2049339T3 ES89401287T ES89401287T ES2049339T3 ES 2049339 T3 ES2049339 T3 ES 2049339T3 ES 89401287 T ES89401287 T ES 89401287T ES 89401287 T ES89401287 T ES 89401287T ES 2049339 T3 ES2049339 T3 ES 2049339T3
Authority
ES
Spain
Prior art keywords
plasma reactor
enclosure
cabinet
wave guide
resonant coupling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES89401287T
Other languages
English (en)
Inventor
Philippe Leprince
Patrick Chollet
Serge Saada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Original Assignee
Centre National de la Recherche Scientifique CNRS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS filed Critical Centre National de la Recherche Scientifique CNRS
Application granted granted Critical
Publication of ES2049339T3 publication Critical patent/ES2049339T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

EL INVENTO CINCIERNE UN REACTOR DE PLASMA, COMPRENDIENDO: UN RECINTO (10) SUSCEPTIBLE DE RECIBIR UN FLUJO GASEOSO ESCOGIDO, UN GENERADOR MICROONDAS (32), Y UNOS MEDIOS DE GUIA DE ONDAS (34) PARA LLEVAR LAS MICROONDAS AL RECINTO (10), SEGUN UN ACOPLAMIENTO NO RESONANTE EN EL CUAL EL RECINTO (10) NO DISIPA BAJO FORMA DE RADIACION ELECTROMAGNETICA LA ENERGIA DE HIPERFRECUENCIA QUE LE ES COMUNICADA EN PRESENCIA DEL GAS. SEGUN UNA DEFINICION GENERAL DEL INVENTO EL RECINTO (10) ES DE GRAN TAMAÑO, LA PARTE TERMINAL DE LOS MEDIOS DE GUIA DE ONDAS (38) ESTA PROGRESIVAMENTE REBAJADA EN UN SENTIDO Y ENSANCHADA EN EL OTRO, HASTA ALCANZAR UNA SECCION DERECHA RECTANGULAR PLANA RODEANDO COMPLETAMENTE DICHO RECINTO (10), Y PARA PROCURAR UN ACOPLAMIENTO NO RESONANTE (50) CON ESTA.
ES89401287T 1988-05-09 1989-05-09 Reactor de plasma. Expired - Lifetime ES2049339T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8806233A FR2631199B1 (fr) 1988-05-09 1988-05-09 Reacteur a plasma

Publications (1)

Publication Number Publication Date
ES2049339T3 true ES2049339T3 (es) 1994-04-16

Family

ID=9366134

Family Applications (1)

Application Number Title Priority Date Filing Date
ES89401287T Expired - Lifetime ES2049339T3 (es) 1988-05-09 1989-05-09 Reactor de plasma.

Country Status (7)

Country Link
US (1) US5063330A (es)
EP (1) EP0346168B1 (es)
JP (1) JPH03504301A (es)
DE (1) DE68911390T2 (es)
ES (1) ES2049339T3 (es)
FR (1) FR2631199B1 (es)
WO (1) WO1989011206A1 (es)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2695944B1 (fr) * 1992-09-24 1994-11-18 Onera (Off Nat Aerospatiale) Appareil de dépôt chimique en phase vapeur activé par un plasma micro-ondes.
DE4235914A1 (de) * 1992-10-23 1994-04-28 Juergen Prof Dr Engemann Vorrichtung zur Erzeugung von Mikrowellenplasmen
DE19600223A1 (de) * 1996-01-05 1997-07-17 Ralf Dr Dipl Phys Spitzl Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen
DE19608949A1 (de) * 1996-03-08 1997-09-11 Ralf Dr Spitzl Vorrichtung zur Erzeugung von leistungsfähigen Mikrowellenplasmen
FR2776540B1 (fr) * 1998-03-27 2000-06-02 Sidel Sa Recipient en matiere a effet barriere et procede et appareil pour sa fabrication
US6127401A (en) * 1998-06-05 2000-10-03 Cephalon, Inc. Bridged indenopyrrolocarbazoles
JP3257512B2 (ja) * 1998-06-26 2002-02-18 松下電器産業株式会社 高周波結合器、プラズマ処理装置及び方法
US6841567B1 (en) * 1999-02-12 2005-01-11 Cephalon, Inc. Cyclic substituted fused pyrrolocarbazoles and isoindolones
FR2792854B1 (fr) * 1999-04-29 2001-08-03 Sidel Sa Dispositif pour le depot par plasma micro-ondes d'un revetement sur un recipient en materiau thermoplastique
US6399780B1 (en) 1999-08-20 2002-06-04 Cephalon, Inc. Isomeric fused pyrrolocarbazoles and isoindolones
US7053576B2 (en) * 2001-07-19 2006-05-30 Correa Paulo N Energy conversion systems
DE102011111884B3 (de) * 2011-08-31 2012-08-30 Martin Weisgerber Verfahren und Vorrichtung zur Erzeugung von thermodynamisch kaltem Mikrowellenplasma
US20140202634A1 (en) * 2013-01-23 2014-07-24 Applied Materials, Inc. Radial transmission line based plasma source

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3814983A (en) * 1972-02-07 1974-06-04 C Weissfloch Apparatus and method for plasma generation and material treatment with electromagnetic radiation
JPS5740586A (en) * 1980-08-22 1982-03-06 Toshiba Corp Treatment of fluorescent substance and its device
US4581100A (en) * 1984-10-29 1986-04-08 International Business Machines Corporation Mixed excitation plasma etching system
FR2572847B1 (fr) * 1984-11-06 1986-12-26 Commissariat Energie Atomique Procede et dispositif d'allumage d'une source d'ions hyperfrequence
JPS61131454A (ja) * 1984-11-30 1986-06-19 Fujitsu Ltd マイクロ波プラズマ処理方法と装置
US4866346A (en) * 1987-06-22 1989-09-12 Applied Science & Technology, Inc. Microwave plasma generator
US4970435A (en) * 1987-12-09 1990-11-13 Tel Sagami Limited Plasma processing apparatus
DE3803355A1 (de) * 1988-02-05 1989-08-17 Leybold Ag Teilchenquelle fuer eine reaktive ionenstrahlaetz- oder plasmadepositionsanlage
US5003225A (en) * 1989-01-04 1991-03-26 Applied Microwave Plasma Concepts, Inc. Method and apparatus for producing intense microwave pulses

Also Published As

Publication number Publication date
FR2631199A1 (fr) 1989-11-10
EP0346168A1 (fr) 1989-12-13
US5063330A (en) 1991-11-05
FR2631199B1 (fr) 1991-03-15
DE68911390D1 (de) 1994-01-27
DE68911390T2 (de) 1994-07-07
JPH03504301A (ja) 1991-09-19
WO1989011206A1 (fr) 1989-11-16
EP0346168B1 (fr) 1993-12-15

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