ES2062889T3 - Procedimiento y dispositivo para la limpieza de piezas de trabajo que llevan residuos organicos. - Google Patents

Procedimiento y dispositivo para la limpieza de piezas de trabajo que llevan residuos organicos.

Info

Publication number
ES2062889T3
ES2062889T3 ES92904002T ES92904002T ES2062889T3 ES 2062889 T3 ES2062889 T3 ES 2062889T3 ES 92904002 T ES92904002 T ES 92904002T ES 92904002 T ES92904002 T ES 92904002T ES 2062889 T3 ES2062889 T3 ES 2062889T3
Authority
ES
Spain
Prior art keywords
organic waste
procedure
cleaning
fluid
cleaning workpieces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES92904002T
Other languages
English (en)
Inventor
Robert Adler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Union Industrie Comprimierter Gase GmbH Nfg KG
Original Assignee
Union Industrie Comprimierter Gase GmbH Nfg KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Industrie Comprimierter Gase GmbH Nfg KG filed Critical Union Industrie Comprimierter Gase GmbH Nfg KG
Application granted granted Critical
Publication of ES2062889T3 publication Critical patent/ES2062889T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
    • B08B3/104—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid using propellers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

EL PROCESO DESCRIBE LA LIMPIEZA DE PIEZAS DE TRABAJO, QUE PRESENTAN RESIDUOS ORGANICOS, CON EMPLEO DE UN FLUIDO QUE SE INTRODUCE A PRESION EN UN RECIPIENTE BAJO PRESION CARGADO CON LAS PIEZAS. DE ACUERDO CON LA INVENCION SE HACE CIRCULAR EL FLUIDO DURANTE EL PROCESO DE LIMPIEZA, PARA LO CUAL SE EMPLEAN CON PREFERENCIA COMO FLUIDO GASES LICUADOS, POR EJEMPLO, DIOXIDO DE CARBONO. UTILIZANDO UN CAMBIADOR DE CALOR SE PUEDE REGULAR LA TEMPERATURA DEL FLUIDO DURANTE EL PROCESO.
ES92904002T 1991-02-19 1992-02-14 Procedimiento y dispositivo para la limpieza de piezas de trabajo que llevan residuos organicos. Expired - Lifetime ES2062889T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT0034291A AT395951B (de) 1991-02-19 1991-02-19 Reinigung von werkstuecken mit organischen rueckstaenden

Publications (1)

Publication Number Publication Date
ES2062889T3 true ES2062889T3 (es) 1994-12-16

Family

ID=3488054

Family Applications (1)

Application Number Title Priority Date Filing Date
ES92904002T Expired - Lifetime ES2062889T3 (es) 1991-02-19 1992-02-14 Procedimiento y dispositivo para la limpieza de piezas de trabajo que llevan residuos organicos.

Country Status (12)

Country Link
US (1) US5980648A (es)
EP (1) EP0571426B1 (es)
JP (1) JPH06505189A (es)
AT (1) AT395951B (es)
AU (1) AU1226892A (es)
CA (1) CA2103909A1 (es)
CZ (1) CZ282595B6 (es)
DE (1) DE59200370D1 (es)
DK (1) DK0571426T3 (es)
ES (1) ES2062889T3 (es)
NO (1) NO180003C (es)
WO (1) WO1992014558A1 (es)

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5304253A (en) * 1990-09-12 1994-04-19 Baxter International Inc. Method for cleaning with a volatile solvent
EP0564396A1 (de) * 1992-04-01 1993-10-06 SULZER Medizinaltechnik AG Verfahren und Vorrichtung zur Reinigung und Keimverminderung von textilen medizinischen Implantaten
DE4230485A1 (de) * 1992-09-11 1994-03-17 Linde Ag Anlage zur Reinigung mit verflüssigten oder überkritischen Gasen
DE4230486A1 (de) * 1992-09-11 1994-03-17 Linde Ag Reinigung von Gegenständen mit verflüssigten oder überkritischen Gasen
DE4304495A1 (de) * 1993-02-15 1994-08-18 Duerr Gmbh & Co Verfahren und Reinigungsgerät zum industriellen Reinigen von Gegenständen
DE4408784C3 (de) * 1994-03-15 2000-01-27 Linde Ag Reinigung von Materialien mit verflüssigten oder überkritischen Gasen
DE4423188C2 (de) * 1994-07-01 1999-03-11 Linde Ag Reinigung von Druckgasbehältern
DE19509573C2 (de) * 1995-03-16 1998-07-16 Linde Ag Reinigung mit flüssigem Kohlendioxid
US5881577A (en) * 1996-09-09 1999-03-16 Air Liquide America Corporation Pressure-swing absorption based cleaning methods and systems
US6051421A (en) * 1996-09-09 2000-04-18 Air Liquide America Corporation Continuous processing apparatus and method for cleaning articles with liquified compressed gaseous solvents
US6306564B1 (en) 1997-05-27 2001-10-23 Tokyo Electron Limited Removal of resist or residue from semiconductors using supercritical carbon dioxide
TW539918B (en) 1997-05-27 2003-07-01 Tokyo Electron Ltd Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
US6500605B1 (en) 1997-05-27 2002-12-31 Tokyo Electron Limited Removal of photoresist and residue from substrate using supercritical carbon dioxide process
US6277753B1 (en) 1998-09-28 2001-08-21 Supercritical Systems Inc. Removal of CMP residue from semiconductors using supercritical carbon dioxide process
US7064070B2 (en) 1998-09-28 2006-06-20 Tokyo Electron Limited Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process
DE19933034A1 (de) * 1999-07-15 2001-02-01 Fraunhofer Ges Forschung Verfahren zur Reinigung von technischen Oberflächen mit schwer zugänglicher und/oder gegenüber oxidativem Angriff empfindlicher Oberflächenstruktur
US6314601B1 (en) * 1999-09-24 2001-11-13 Mcclain James B. System for the control of a carbon dioxide cleaning apparatus
US6748960B1 (en) 1999-11-02 2004-06-15 Tokyo Electron Limited Apparatus for supercritical processing of multiple workpieces
KR100744888B1 (ko) 1999-11-02 2007-08-01 동경 엘렉트론 주식회사 소재를 초임계 처리하기 위한 장치 및 방법
US6890853B2 (en) 2000-04-25 2005-05-10 Tokyo Electron Limited Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module
AU2001290171A1 (en) 2000-07-26 2002-02-05 Tokyo Electron Limited High pressure processing chamber for semiconductor substrate
JP2006508521A (ja) 2002-02-15 2006-03-09 東京エレクトロン株式会社 溶剤浴と超臨界ｃｏ２を用いたレジストの乾燥
US7001468B1 (en) 2002-02-15 2006-02-21 Tokyo Electron Limited Pressure energized pressure vessel opening and closing device and method of providing therefor
US6924086B1 (en) 2002-02-15 2005-08-02 Tokyo Electron Limited Developing photoresist with supercritical fluid and developer
US7387868B2 (en) 2002-03-04 2008-06-17 Tokyo Electron Limited Treatment of a dielectric layer using supercritical CO2
CN1296771C (zh) 2002-03-04 2007-01-24 东京毅力科创株式会社 在晶片处理中低电介质材料的钝化方法
US7169540B2 (en) 2002-04-12 2007-01-30 Tokyo Electron Limited Method of treatment of porous dielectric films to reduce damage during cleaning
US6764552B1 (en) 2002-04-18 2004-07-20 Novellus Systems, Inc. Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials
US20040050406A1 (en) * 2002-07-17 2004-03-18 Akshey Sehgal Compositions and method for removing photoresist and/or resist residue at pressures ranging from ambient to supercritical
US20040011386A1 (en) * 2002-07-17 2004-01-22 Scp Global Technologies Inc. Composition and method for removing photoresist and/or resist residue using supercritical fluids
US6722642B1 (en) 2002-11-06 2004-04-20 Tokyo Electron Limited High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism
US7021635B2 (en) 2003-02-06 2006-04-04 Tokyo Electron Limited Vacuum chuck utilizing sintered material and method of providing thereof
US7225820B2 (en) 2003-02-10 2007-06-05 Tokyo Electron Limited High-pressure processing chamber for a semiconductor wafer
US7077917B2 (en) 2003-02-10 2006-07-18 Tokyo Electric Limited High-pressure processing chamber for a semiconductor wafer
US7270137B2 (en) * 2003-04-28 2007-09-18 Tokyo Electron Limited Apparatus and method of securing a workpiece during high-pressure processing
US7163380B2 (en) 2003-07-29 2007-01-16 Tokyo Electron Limited Control of fluid flow in the processing of an object with a fluid
US7186093B2 (en) 2004-10-05 2007-03-06 Tokyo Electron Limited Method and apparatus for cooling motor bearings of a high pressure pump
US7250374B2 (en) 2004-06-30 2007-07-31 Tokyo Electron Limited System and method for processing a substrate using supercritical carbon dioxide processing
US7307019B2 (en) 2004-09-29 2007-12-11 Tokyo Electron Limited Method for supercritical carbon dioxide processing of fluoro-carbon films
AU2005299107A1 (en) 2004-10-25 2006-05-04 Nanon A/S A method of producing a silicone rubber item and the product obtainable by the method
US7491036B2 (en) 2004-11-12 2009-02-17 Tokyo Electron Limited Method and system for cooling a pump
US7434590B2 (en) 2004-12-22 2008-10-14 Tokyo Electron Limited Method and apparatus for clamping a substrate in a high pressure processing system
US7140393B2 (en) 2004-12-22 2006-11-28 Tokyo Electron Limited Non-contact shuttle valve for flow diversion in high pressure systems
US7291565B2 (en) 2005-02-15 2007-11-06 Tokyo Electron Limited Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
US7435447B2 (en) 2005-02-15 2008-10-14 Tokyo Electron Limited Method and system for determining flow conditions in a high pressure processing system
US7550075B2 (en) 2005-03-23 2009-06-23 Tokyo Electron Ltd. Removal of contaminants from a fluid
US7380984B2 (en) 2005-03-28 2008-06-03 Tokyo Electron Limited Process flow thermocouple
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7399708B2 (en) 2005-03-30 2008-07-15 Tokyo Electron Limited Method of treating a composite spin-on glass/anti-reflective material prior to cleaning
US7442636B2 (en) 2005-03-30 2008-10-28 Tokyo Electron Limited Method of inhibiting copper corrosion during supercritical CO2 cleaning
US7494107B2 (en) 2005-03-30 2009-02-24 Supercritical Systems, Inc. Gate valve for plus-atmospheric pressure semiconductor process vessels
US7789971B2 (en) 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
US7524383B2 (en) 2005-05-25 2009-04-28 Tokyo Electron Limited Method and system for passivating a processing chamber
US8453665B2 (en) * 2007-03-15 2013-06-04 The University Of Akron Self-acting self-circulating fluid system without external pressure source and use in bearing system
KR101047862B1 (ko) * 2009-03-13 2011-07-08 주식회사 에이앤디코퍼레이션 고압 처리기를 이용한 기판처리장치 및 고압 처리기의 가스재활용방법
US9027609B2 (en) 2011-05-03 2015-05-12 United Technologies Corporation Argon gas level controller
DE102013206908A1 (de) * 2013-04-17 2014-10-23 Dürr Systems GmbH Verfahren und Vorrichtung zum Innenreinigen eines Fluidtanks

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3100105A (en) * 1959-11-18 1963-08-06 Ramco Equipment Corp Degreaser
GB1392822A (en) * 1971-03-02 1975-04-30 Comitato Nazionale Per Lenergi Extraction of metals from solutions
DE2255667C3 (de) * 1972-11-14 1982-05-06 Studiengesellschaft Kohle mbH, 4330 Mülheim Verfahren zur Herstellung einer fettfreien, lagerbeständigen Stärke
US4375819A (en) * 1981-04-17 1983-03-08 Hurri-Kleen Corporation Apparatus for cleaning machinery parts and the like
US4439243A (en) * 1982-08-03 1984-03-27 Texas Instruments Incorporated Apparatus and method of material removal with fluid flow within a slot
WO1984002291A1 (en) * 1982-12-06 1984-06-21 Hughes Aircraft Co Method of cleaning articles using super-critical gases
US4617064A (en) * 1984-07-31 1986-10-14 Cryoblast, Inc. Cleaning method and apparatus
US4759917A (en) * 1987-02-24 1988-07-26 Monsanto Company Oxidative dissolution of gallium arsenide and separation of gallium from arsenic
DE3725611A1 (de) * 1987-08-01 1989-02-09 Henkel Kgaa Verfahren zur gemeinsamen abtrennung von stoerelementen aus wertmetall-elektrolytloesungen
JP2663483B2 (ja) * 1988-02-29 1997-10-15 勝 西川 レジストパターン形成方法
SE8900857L (sv) * 1988-03-15 1989-09-16 N Proizv Ob T Traktorn Foerfarande och anlaeggning foer rening av spaan av ferromagnetiskt material fraan en smoerj- och kylvaetska
DE3836731A1 (de) * 1988-10-28 1990-05-03 Henkel Kgaa Verfahren zur abtrennung von stoerelementen aus wertmetall-elektrolytloesungen
US5013366A (en) * 1988-12-07 1991-05-07 Hughes Aircraft Company Cleaning process using phase shifting of dense phase gases
DE3915586A1 (de) * 1989-05-12 1990-11-15 Henkel Kgaa Verfahren zur zweiphasen-extraktion von metallionen aus feste metalloxide enthaltenden phasen, mittel und verwendung
US5213619A (en) * 1989-11-30 1993-05-25 Jackson David P Processes for cleaning, sterilizing, and implanting materials using high energy dense fluids
US5306350A (en) * 1990-12-21 1994-04-26 Union Carbide Chemicals & Plastics Technology Corporation Methods for cleaning apparatus using compressed fluids
US5174917A (en) * 1991-07-19 1992-12-29 Monsanto Company Compositions containing n-ethyl hydroxamic acid chelants

Also Published As

Publication number Publication date
NO180003B (no) 1996-10-21
ATA34291A (de) 1992-09-15
AT395951B (de) 1993-04-26
CZ282595B6 (cs) 1997-08-13
EP0571426B1 (de) 1994-08-10
DK0571426T3 (da) 1994-09-26
NO932938L (no) 1993-08-18
AU1226892A (en) 1992-09-15
DE59200370D1 (de) 1994-09-15
JPH06505189A (ja) 1994-06-16
NO932938D0 (no) 1993-08-18
NO180003C (no) 1997-01-29
WO1992014558A1 (de) 1992-09-03
CA2103909A1 (en) 1992-08-20
CZ167693A3 (en) 1994-03-16
EP0571426A1 (de) 1993-12-01
US5980648A (en) 1999-11-09

Similar Documents

Publication Publication Date Title
ES2062889T3 (es) Procedimiento y dispositivo para la limpieza de piezas de trabajo que llevan residuos organicos.
ES2033546T3 (es) Procedimiento e instalacion para la eliminacion de oxigeno disuelto en agua clorada.
FR2336483A1 (fr) Appareil pour recueillir et transporter des cultures bacteriennes vivantes
ES2151513T3 (es) Sistema de limpieza en seco con dioxido de carbono liquido supercritico.
ES2009806B3 (es) Un metodo de tratar articulos huecos, en particular preformas de tereftalato de polietileno.
ATE4635T1 (de) Vorrichtung zur entkeimung von stroemungsfaehigen mitteln.
ES8100903A1 (es) Metodo de tratar termicamente material en particulas y apa- rato correspondiente
ES2044963T3 (es) Procedimiento para el tratamiento de gases industriales que contiene compuestos de azufre.
BR0100130A (pt) Sistema de fornecimento de lìquido criogênico, aparelho montado dentro de um vaso de reação, e, aparelho de fornecimento de lìquido criogênico
EG19880A (en) A method for decomposition of hydrocarbons
AR024717A1 (es) Procedimiento para eliminar mercaptanos de corrientes de fluidos
DE59108883D1 (de) Apparatur zur plasmathermischen Bearbeitung von Werkstückoberflächen
ES2187509T3 (es) Procedimiento para la inactivacion virica de los productos plasmaticos mediante fluidos supercriticos o subcriticos.
FI862469A0 (fi) Ventil foer kemikaliebehaollare.
ES2037987T3 (es) Aparato para la disolucion de ozono en un fluido.
ES2085059T3 (es) Procedimiento para tratar gas de chimenea.
ES2079773T3 (es) Procedimiento para la eliminacion de h2s a partir de gases.
ES2073194T3 (es) Procedimiento para el tratamiento de objetos con un gas que contiene fluor, asi como dispositivo para su realizacion.
ES2027027T3 (es) Procedimiento para destoxificado anoxico in situ de napas subterraneas contaminadas.
ES2066234T3 (es) Transferencia de catalizador.
ES2114102T3 (es) Procedimiento para la obtencion de mezclas de poliisocianato, que contienen grupos isocianurato y uretodiona, con un indice de color reducido.
ES472460A1 (es) Procedimiento y aparato para circular y contactar gases y liquidos
DK156472C (da) Fremgangsmaade til kontinuerlig fjernelse af nitrogenoxider fra gasblandinger samt anlaeg til brug ved fremgangsmaaden
GB921044A (en) Improvements in or relating to methods and apparatus for the reactivation of purifiers
SE8104242L (sv) Forfarande for reducering av syrehalten i gasblandningar, varvid gasen bringas i kontakt med en losning innehallande antrahydrokinonderivat

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 571426

Country of ref document: ES