ES2076703T3 - Procedimiento para tratar, por ejemplo, la superficie de un sustrato mediante proyeccion de un flujo de plasma, y dispositivo de puesta en practica del mismo. - Google Patents

Procedimiento para tratar, por ejemplo, la superficie de un sustrato mediante proyeccion de un flujo de plasma, y dispositivo de puesta en practica del mismo.

Info

Publication number
ES2076703T3
ES2076703T3 ES92400803T ES92400803T ES2076703T3 ES 2076703 T3 ES2076703 T3 ES 2076703T3 ES 92400803 T ES92400803 T ES 92400803T ES 92400803 T ES92400803 T ES 92400803T ES 2076703 T3 ES2076703 T3 ES 2076703T3
Authority
ES
Spain
Prior art keywords
plasma
substrate
chamber
electric arc
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES92400803T
Other languages
English (en)
Inventor
Martin Hermann Lang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
European Space Agency
Original Assignee
European Space Agency
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by European Space Agency filed Critical European Space Agency
Application granted granted Critical
Publication of ES2076703T3 publication Critical patent/ES2076703T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/22—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc
    • B05B7/222—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc
    • B05B7/226—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc the material being originally a particulate material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Nozzles (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PROCESO PARA TRATA POR EJEMPLO LA SUPERFICIE DE UN SUSTRATO POR PROYECCION DE UN FLUJO DE PLASMA, Y DISPOSITIVO PARA LA APLICACION DEL PROCESO LA INVENCION SE REFIERE A UN PROCESO Y A UN DISPOSITIVO PARA TRATAR LA SUPERFICIE DE UN SUSTRATO DEPOSITANDO EN EL POR EJEMPLO UN REVESTIMIENTO POR PROYECCION DE UN FLUJO DE PLASMA, DEL TIPO QUE CONSISTE EN CREAR UN ARCO ELECTRICO EN UNA CAMARA (2) ENTRE UN CATODO (5) Y UN ANODO (1), EN INTRODUCIR UN GAS INERTE EN LA CAMARA (2) PARA QUE SE IONICE A SU PASO A TRAVES DEL ARCO ELECTRICO PARA FORMA UN PLASMA A ALTA TEMPERATURA, Y EN EXPULSAR AL EXTERIOR DE LA CAMARA EL PLASMA A TRAVES DE UN BOQUILLA DE EYECCION (3) CUYO ORIFICIO DE SALIDA (4) TIENE FORMA DE RANURA PARA PROYECTAR PARTICULAS DE UN MATERIAL CONSTITUTIVO DEL REVESTIMIENTO QUE PASA A ESTADO FUNDIDO AL CONTACTO CON EL PLASMA, SOBRE EL SUSTRATO Y FORMA SOBRE ESTE UN REVESTIMIENTO. EL ARCO ELECTRICO CREADO ENTRE EL ANODO (1) Y EL CATODO (5) SE EXTIENDE SEGUN UN EJE SENSIBLEMENTE PARALELO AL EJEDE LA RANURA DE SALIDA (4) DE LA BOQUILLA DE EYECCION (3), EL GAS INERTE SE INTRODUCE EN LA CAMARA (2) SIGUIENDO VARIAS DIRECCIONES RADIALES (F1) RESPECTO DEL EJE DEL ARCO ELECTRICO Y EL MATERIAL A PROYECTAR ES LLEVADO POR UN GAS PORTADOR EN CONDUCTOS (12) QUE DESEMBOCAN POR EJEMPLO EN EL INTERIOR DE LA BOQUILLA DE EYECCION (3)
ES92400803T 1991-03-26 1992-03-25 Procedimiento para tratar, por ejemplo, la superficie de un sustrato mediante proyeccion de un flujo de plasma, y dispositivo de puesta en practica del mismo. Expired - Lifetime ES2076703T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9103621A FR2674450B1 (fr) 1991-03-26 1991-03-26 Procede pour deposer un revetement sur un substrat par projection au plasma, et dispositif pour la mise en óoeuvre du procede.

Publications (1)

Publication Number Publication Date
ES2076703T3 true ES2076703T3 (es) 1995-11-01

Family

ID=9411110

Family Applications (1)

Application Number Title Priority Date Filing Date
ES92400803T Expired - Lifetime ES2076703T3 (es) 1991-03-26 1992-03-25 Procedimiento para tratar, por ejemplo, la superficie de un sustrato mediante proyeccion de un flujo de plasma, y dispositivo de puesta en practica del mismo.

Country Status (8)

Country Link
US (1) US5239161A (es)
EP (1) EP0506552B1 (es)
JP (1) JPH0657397A (es)
CA (1) CA2063899A1 (es)
DE (1) DE69203127T2 (es)
DK (1) DK0506552T3 (es)
ES (1) ES2076703T3 (es)
FR (1) FR2674450B1 (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012035181A1 (es) * 2010-09-17 2012-03-22 Asociación De La Industria Navarra (Ain) Dispositivo de ionización

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5679167A (en) * 1994-08-18 1997-10-21 Sulzer Metco Ag Plasma gun apparatus for forming dense, uniform coatings on large substrates
EP0851720B1 (de) * 1996-12-23 1999-10-06 Sulzer Metco AG Indirektes Plasmatron
DE19820240C2 (de) 1998-05-06 2002-07-11 Erbe Elektromedizin Elektrochirurgisches Instrument
DE10011274A1 (de) * 2000-03-08 2001-09-13 Wolff Walsrode Ag Plasmabehandelte bahnförmige Werkstoffe
US6476342B1 (en) * 2000-11-24 2002-11-05 Creo Srl Method of surface preparation using plasma in air
US7079370B2 (en) * 2003-04-28 2006-07-18 Air Products And Chemicals, Inc. Apparatus and method for removal of surface oxides via fluxless technique electron attachment and remote ion generation
TWI274622B (en) * 2003-04-28 2007-03-01 Air Prod & Chem Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation
US7521653B2 (en) * 2004-08-03 2009-04-21 Exatec Llc Plasma arc coating system
US7434719B2 (en) * 2005-12-09 2008-10-14 Air Products And Chemicals, Inc. Addition of D2 to H2 to detect and calibrate atomic hydrogen formed by dissociative electron attachment
CN101601333A (zh) * 2006-12-28 2009-12-09 埃克阿泰克有限责任公司 用于等离子电弧涂敷的方法和设备
KR101588174B1 (ko) * 2007-05-17 2016-01-27 엑사테크 엘.엘.씨. 공통 플라즈마 코팅 구역에서 복수의 코팅 재료를 침착시키기 위한 장치 및 방법
JP5710185B2 (ja) * 2010-09-10 2015-04-30 株式会社Ｃｍｃ総合研究所 微小コイルの製造方法及び製造装置
USD681706S1 (en) * 2010-12-30 2013-05-07 Sulzer Metco (Us), Inc. Neutrode stack
US11783138B2 (en) 2012-04-04 2023-10-10 Hypertherm, Inc. Configuring signal devices in thermal processing systems
US12275082B2 (en) 2013-11-13 2025-04-15 Hypertherm, Inc. Consumable cartridge for a plasma arc cutting system
US10456855B2 (en) 2013-11-13 2019-10-29 Hypertherm, Inc. Consumable cartridge for a plasma arc cutting system
US9981335B2 (en) 2013-11-13 2018-05-29 Hypertherm, Inc. Consumable cartridge for a plasma arc cutting system
US11278983B2 (en) 2013-11-13 2022-03-22 Hypertherm, Inc. Consumable cartridge for a plasma arc cutting system
US11432393B2 (en) 2013-11-13 2022-08-30 Hypertherm, Inc. Cost effective cartridge for a plasma arc torch
US11684995B2 (en) 2013-11-13 2023-06-27 Hypertherm, Inc. Cost effective cartridge for a plasma arc torch
US12521905B2 (en) 2014-03-07 2026-01-13 Hypertherm, Inc. Liquid pressurization pump and systems with data storage
CN106715027B (zh) * 2014-08-12 2020-04-21 海别得公司 用于等离子弧焊炬的成本有效的筒
WO2017024155A1 (en) 2015-08-04 2017-02-09 Hypertherm, Inc. Cartridge for a liquid-cooled plasma arc torch
AU2018217728B2 (en) 2017-02-09 2022-04-14 Hypertherm, Inc. Swirl ring and contact element for a plasma arc torch cartridge
CN108257906B (zh) * 2018-01-16 2021-05-04 京东方科技集团股份有限公司 吹气装置、吸附机台和柔性基板承载系统

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1177941A (en) * 1965-12-22 1970-01-14 Tetronics Res And Dev Company Improvements in or relating to High Temperature Apparatus
US3573090A (en) * 1968-12-09 1971-03-30 Avco Corp Method of applying a plasma spray coating
FR2039566A5 (es) * 1969-03-31 1971-01-15 Soudure Autogene Elect
BE763709A (fr) * 1971-03-03 1971-08-02 Soudure Autogene Elect Plasma en rideau.
CA1272661A (en) * 1985-05-11 1990-08-14 Yuji Chiba Reaction apparatus
US4916273A (en) * 1987-03-11 1990-04-10 Browning James A High-velocity controlled-temperature plasma spray method
US5090482A (en) * 1990-01-03 1992-02-25 Spectronix Ltd. Method and apparatus for extinguishing fires

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012035181A1 (es) * 2010-09-17 2012-03-22 Asociación De La Industria Navarra (Ain) Dispositivo de ionización

Also Published As

Publication number Publication date
US5239161A (en) 1993-08-24
JPH0657397A (ja) 1994-03-01
FR2674450A1 (fr) 1992-10-02
DE69203127T2 (de) 1995-11-30
EP0506552B1 (fr) 1995-06-28
DK0506552T3 (da) 1995-11-06
DE69203127D1 (de) 1995-08-03
FR2674450B1 (fr) 1994-01-21
EP0506552A1 (fr) 1992-09-30
CA2063899A1 (fr) 1992-09-27

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