ES2082786T3 - Revelado de composiciones sensibles a las radiaciones. - Google Patents

Revelado de composiciones sensibles a las radiaciones.

Info

Publication number
ES2082786T3
ES2082786T3 ES89310598T ES89310598T ES2082786T3 ES 2082786 T3 ES2082786 T3 ES 2082786T3 ES 89310598 T ES89310598 T ES 89310598T ES 89310598 T ES89310598 T ES 89310598T ES 2082786 T3 ES2082786 T3 ES 2082786T3
Authority
ES
Spain
Prior art keywords
radiation sensitive
ethylene
sensitive compositions
sodium
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES89310598T
Other languages
English (en)
Inventor
Michael Ingham
Paul Anthony Styan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB888824841A external-priority patent/GB8824841D0/en
Priority claimed from GB898905577A external-priority patent/GB8905577D0/en
Priority claimed from GB898916717A external-priority patent/GB8916717D0/en
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of ES2082786T3 publication Critical patent/ES2082786T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)

Abstract

LAS COMPOSICIONES SENSIBLES A LA IRRADIACION EXPUESTAS EN RELACION CON LAS IMAGENES SE PROCESAN UTILIZANDO UN LIQUIDO REVELADOR QUE SE COMPONE DE UN SULFATO EXIL ETILO. EL LIQUIDO REVELADOR PUEDE INCLUIR ADICIONALMENTE UN AGENTE TENSOACTIVO TAL COMO UN ETER LAURIL POLIOXETILENO O UN CONDENSADO DE OXIDO DE ETILENO/OXIDO DE PROPILENO DE GLICOL DE POLI(ETILENO), UN MATERIAL ALCALINO TAL COMO EL METASILICATO DE SODIO, UNA SAL CARBOXILICA SOLUBLE EN AGUA COMO EL OCTANOATO DE SODIO, Y LA SAL SODICAQ DE ACIDO ACETICO TETRA DIAMINICO DE ETILENO. TALES LIQUIDOS REVELADORES SE PUEDEN FORMULAR PAR UTILIZAR CON CUALQUIER PLACA DE EFECTO POSITIVO O DE EFECTO NEGATIVO.
ES89310598T 1988-10-24 1989-10-16 Revelado de composiciones sensibles a las radiaciones. Expired - Lifetime ES2082786T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB888824841A GB8824841D0 (en) 1988-10-24 1988-10-24 Development of radiation sensitive compositions
GB898905577A GB8905577D0 (en) 1989-03-10 1989-03-10 Development of radiation sensitive compositions
GB898916717A GB8916717D0 (en) 1989-07-21 1989-07-21 Development of radiation sensitive compositions

Publications (1)

Publication Number Publication Date
ES2082786T3 true ES2082786T3 (es) 1996-04-01

Family

ID=27264138

Family Applications (1)

Application Number Title Priority Date Filing Date
ES89310598T Expired - Lifetime ES2082786T3 (es) 1988-10-24 1989-10-16 Revelado de composiciones sensibles a las radiaciones.

Country Status (12)

Country Link
EP (1) EP0366321B1 (es)
JP (1) JP2954951B2 (es)
AT (1) ATE134050T1 (es)
AU (1) AU607640B2 (es)
BR (1) BR8905389A (es)
DE (1) DE68925610T2 (es)
DK (1) DK529189A (es)
ES (1) ES2082786T3 (es)
FI (1) FI97573C (es)
IE (1) IE61183B1 (es)
NO (1) NO180028C (es)
NZ (1) NZ231122A (es)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004112756A1 (en) 2003-06-26 2004-12-29 Isa Odidi Proton pump-inhibitor-containing capsules which comprise subunits differently structured for a delayed release of the active ingredient
US7186498B2 (en) 2003-10-02 2007-03-06 Willi-Kurt Gries Alkaline developer for radiation sensitive compositions
US10624858B2 (en) 2004-08-23 2020-04-21 Intellipharmaceutics Corp Controlled release composition using transition coating, and method of preparing same
US10064828B1 (en) 2005-12-23 2018-09-04 Intellipharmaceutics Corp. Pulsed extended-pulsed and extended-pulsed pulsed drug delivery systems
US10960077B2 (en) 2006-05-12 2021-03-30 Intellipharmaceutics Corp. Abuse and alcohol resistant drug composition

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2110401A (en) * 1981-11-04 1983-06-15 Bicc Plc Developer solutions and processes for making lithographic printing plates
US4436807A (en) * 1982-07-15 1984-03-13 American Hoechst Corporation Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
US4780396A (en) * 1987-02-17 1988-10-25 Hoechst Celanese Corporation Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant

Also Published As

Publication number Publication date
IE893403L (en) 1990-04-24
DK529189D0 (da) 1989-10-24
JPH02178663A (ja) 1990-07-11
ATE134050T1 (de) 1996-02-15
DK529189A (da) 1990-04-25
NZ231122A (en) 1990-08-28
EP0366321B1 (en) 1996-02-07
EP0366321A2 (en) 1990-05-02
FI97573C (fi) 1997-01-10
NO894172D0 (no) 1989-10-19
DE68925610T2 (de) 1996-07-25
IE61183B1 (en) 1994-10-05
DE68925610D1 (de) 1996-03-21
JP2954951B2 (ja) 1999-09-27
NO180028C (no) 1997-01-29
FI97573B (fi) 1996-09-30
NO894172L (no) 1990-04-25
FI895029A0 (fi) 1989-10-23
AU4363689A (en) 1990-04-26
AU607640B2 (en) 1991-03-07
EP0366321A3 (en) 1990-06-20
NO180028B (no) 1996-10-21
BR8905389A (pt) 1990-05-22

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