ES2088536T3 - Composiciones fotopolimerizables. - Google Patents

Composiciones fotopolimerizables.

Info

Publication number
ES2088536T3
ES2088536T3 ES92300710T ES92300710T ES2088536T3 ES 2088536 T3 ES2088536 T3 ES 2088536T3 ES 92300710 T ES92300710 T ES 92300710T ES 92300710 T ES92300710 T ES 92300710T ES 2088536 T3 ES2088536 T3 ES 2088536T3
Authority
ES
Spain
Prior art keywords
photopolymerizable compositions
compound
phenylglycine
derivative
ethylenically unsaturated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES92300710T
Other languages
English (en)
Inventor
Takahisa Doba
Bunya Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Starch and Chemical Investment Holding Corp
Original Assignee
National Starch and Chemical Investment Holding Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Starch and Chemical Investment Holding Corp filed Critical National Starch and Chemical Investment Holding Corp
Application granted granted Critical
Publication of ES2088536T3 publication Critical patent/ES2088536T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

COMPOSICIONES FOTOPOLIMERIZABLES DE ALTA SENSIBILIDAD QUE CONTIENEN UN COMPUESTO ETILENICAMENTE INSATURADO POLIMERIZABLE Y UNA COMPOSICION FOTOINICIADORA QUE CONTIENE UN COMPUESTO DE TITANOCONO Y N-FENILGLICINA O UN DERIVADO DE LA MISMA.
ES92300710T 1991-01-29 1992-01-28 Composiciones fotopolimerizables. Expired - Lifetime ES2088536T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP930991 1991-01-29

Publications (1)

Publication Number Publication Date
ES2088536T3 true ES2088536T3 (es) 1996-08-16

Family

ID=11716878

Family Applications (1)

Application Number Title Priority Date Filing Date
ES92300710T Expired - Lifetime ES2088536T3 (es) 1991-01-29 1992-01-28 Composiciones fotopolimerizables.

Country Status (8)

Country Link
US (1) US5445918A (es)
EP (1) EP0497552B1 (es)
JP (1) JPH05132507A (es)
AT (1) ATE138391T1 (es)
DE (1) DE69210846T2 (es)
DK (1) DK0497552T3 (es)
ES (1) ES2088536T3 (es)
GR (1) GR3020524T3 (es)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9319961D0 (en) * 1993-09-28 1993-11-17 Horsell Plc Photopolymerisable composition
US5629354A (en) * 1995-02-28 1997-05-13 Eastman Kodak Company Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator
GB9516108D0 (en) * 1995-08-05 1995-10-04 Tioxide Specialties Ltd Printing inks
JP3470253B2 (ja) * 1996-07-24 2003-11-25 コニカミノルタホールディングス株式会社 光開始剤、光重合組成物、ラジカル発生方法、平版印刷版作成用感光材料及び平版印刷版の作成方法
US6598157B1 (en) * 1999-09-22 2003-07-22 Intel Corporation Dynamic boot block control by boot configuration determination and subsequent address modification
DE102008052586A1 (de) * 2008-10-21 2010-04-22 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Zusammensetzung zur Herstellung optischer Elemente mit Gradientenstruktur
CN102279557B (zh) * 2011-07-26 2013-10-30 华中科技大学 基于全息聚合物分散液晶光栅的彩色三维全息图的制备方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4289844A (en) * 1979-06-18 1981-09-15 Eastman Kodak Company Photopolymerizable compositions featuring novel co-initiators
US4278751A (en) * 1979-11-16 1981-07-14 Eastman Kodak Company Photopolymerization co-initiator compositions comprising amine-substituted ketocoumarins and certain acetic acid derivative activators
GB2189496B (en) * 1986-04-23 1989-11-29 Hitachi Chemical Co Ltd Photopolymerizable composition
AU599400B2 (en) * 1986-08-01 1990-07-19 Ciba-Geigy Ag Titanocenes and their use
DE3768919D1 (en) * 1986-11-26 1991-05-02 Ciba Geigy Ag Fluessige photoinitiatorgemische.
US5034429A (en) * 1987-06-03 1991-07-23 Hitachi Chemical Co., Ltd. Photopolymerizable composition
JP2536594B2 (ja) * 1987-06-08 1996-09-18 日立化成工業株式会社 光重合開始剤及びこれを用いた光重合性組成物
US5008302A (en) * 1987-12-01 1991-04-16 Ciba-Geigy Corporation Titanocenes, the use thereof, and N-substituted pyrroles
DE3918105A1 (de) * 1988-06-02 1989-12-14 Toyo Boseki Photopolymerisierbare zusammensetzung
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US5112721A (en) * 1990-01-29 1992-05-12 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing sensitizer mixtures

Also Published As

Publication number Publication date
DK0497552T3 (da) 1996-06-17
ATE138391T1 (de) 1996-06-15
EP0497552B1 (en) 1996-05-22
GR3020524T3 (en) 1996-10-31
DE69210846D1 (de) 1996-06-27
US5445918A (en) 1995-08-29
EP0497552A1 (en) 1992-08-05
DE69210846T2 (de) 1996-10-02
JPH05132507A (ja) 1993-05-28

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