ES2100486T3 - Dispositivo para el deposito de polimero por medio de un plasma excitado por microondas. - Google Patents

Dispositivo para el deposito de polimero por medio de un plasma excitado por microondas.

Info

Publication number
ES2100486T3
ES2100486T3 ES93401793T ES93401793T ES2100486T3 ES 2100486 T3 ES2100486 T3 ES 2100486T3 ES 93401793 T ES93401793 T ES 93401793T ES 93401793 T ES93401793 T ES 93401793T ES 2100486 T3 ES2100486 T3 ES 2100486T3
Authority
ES
Spain
Prior art keywords
microwaves
enclosure
deposit
window
application
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES93401793T
Other languages
English (en)
Inventor
Dominique Montalan
Pascal Phan
Jean-Pierre Renoult
Pascal Rolland
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Valeo Vision SAS
Original Assignee
Valeo Vision SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Valeo Vision SAS filed Critical Valeo Vision SAS
Application granted granted Critical
Publication of ES2100486T3 publication Critical patent/ES2100486T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32238—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32266—Means for controlling power transmitted to the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

LA INVENCION SE REFIERE A UN DISPOSITIVO PARA EL DEPOSITO DE POLIMERO EN VACIO, EN FASE VAPOR, POR INTERMEDIO DE UN PLASMA EXCITADO POR MICROONDAS SOBRE SUPERFICIES (110, 210) DE UNA PLURALIDAD DE ELEMENTOS (100), EN ESPECIAL SUPERFICIES INTERIORES ALUMINIZADAS DE REFLECTORES DE FAROS DE VEHICULOS, COMPRENDIENDO UN RECINTO DE DEPOSITO (10), MEDIOS PARA ESTABLECER UN VACIO DE EMPUJE EN EL CITADO RECINTO, MEDIOS DE EXCITACION DE MICROONDAS COMPRENDIENDO UN GENERADOR DE MICROONDAS (20) Y MEDIOS DE APLICACION DE MICROONDAS EN EL RECINTO POR INTERMEDIO DE, AL MENOS, UNA VENTANA ESTANCO (32) AL GAS Y TRANSPARENTE FRENTE A LAS MICROONDAS, Y AL MENOS UN DIFUSOR DE GAS MONOMERO (40) COLOCADO EN EL RECINTO DE DEPOSITO, CERCA DE CADA VENTANA. CONFORME A LA INVENCION, LOS CITADOS MEDIOS DE APLICACION DE LAS MICROONDAS LLEVAN AL MENOS UNA GUIA DE ONDAS (30) SITUADA EN EL EXTERIOR DEL RECINTO, Y TENIENDO UNA ABERTURA DE ENTRADA DE LAS MICROONDAS Y, POR CONSIGUIENTE, UNA PARED GENERALMENTE PLANA (31), VUELTA HACIA LA CITADA VENTANA, LLEVA UNA PLURALIDAD DE RENDIJAS RADIANTES. APLICACION A LA REALIZACION DE UN DEPOSITO PROTECTOR SOBRE SUPERFICIES INTERIORES ALUMINIZADAS DE REFLECTORES DE FAROS DE AUTOMOVILES.
ES93401793T 1992-07-08 1993-07-08 Dispositivo para el deposito de polimero por medio de un plasma excitado por microondas. Expired - Lifetime ES2100486T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9208447A FR2693619B1 (fr) 1992-07-08 1992-07-08 Dispositif pour le dépôt de polymère par l'intermédiaire d'un plasma excité par micro-ondes.

Publications (1)

Publication Number Publication Date
ES2100486T3 true ES2100486T3 (es) 1997-06-16

Family

ID=9431688

Family Applications (1)

Application Number Title Priority Date Filing Date
ES93401793T Expired - Lifetime ES2100486T3 (es) 1992-07-08 1993-07-08 Dispositivo para el deposito de polimero por medio de un plasma excitado por microondas.

Country Status (4)

Country Link
EP (1) EP0578580B1 (es)
DE (1) DE69308077T2 (es)
ES (1) ES2100486T3 (es)
FR (1) FR2693619B1 (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0673055A1 (en) * 1994-03-17 1995-09-20 Shin-Etsu Chemical Co., Ltd. Method for forming a superhard carbonaceous protective film on articles
JPH07263187A (ja) * 1994-03-18 1995-10-13 Hitachi Ltd プラズマ処理装置
EP0702393A3 (en) * 1994-09-16 1997-03-26 Daihen Corp Plasma processing apparatus for introducing a micrometric wave from a rectangular waveguide, through an elongated sheet into the plasma chamber
FR2736792B1 (fr) * 1995-07-11 1997-08-22 Plasmion Excitateur a micro-ondes auto-adapte, notamment excitateur de plasma
TW385623B (en) * 1997-10-20 2000-03-21 Sumitomo Metal Ind Apparatus and method for microwave plasma process
US6186090B1 (en) * 1999-03-04 2001-02-13 Energy Conversion Devices, Inc. Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
EP1879213B1 (en) * 1999-05-26 2012-03-14 Tokyo Electron Limited Plasma processing apparatus
CN120272886B (zh) * 2025-05-08 2025-12-12 山东力冠微电子装备有限公司 一种沉积腔室结构及mpcvd设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2760845B2 (ja) * 1988-07-08 1998-06-04 株式会社日立製作所 プラズマ処理装置及びその方法
JPH07101685B2 (ja) * 1989-01-26 1995-11-01 富士通株式会社 マイクロ波プラズマ処理装置
JP2993675B2 (ja) * 1989-02-08 1999-12-20 株式会社日立製作所 プラズマ処理方法及びその装置
DE4003904A1 (de) * 1990-02-09 1991-08-14 Bosch Gmbh Robert Vorrichtung zum behandeln von substraten in einem durch mikrowellen erzeugten, gasgestuetzten plasma
JPH04144992A (ja) * 1990-10-01 1992-05-19 Idemitsu Petrochem Co Ltd マイクロ波プラズマ発生装置およびそれを利用するダイヤモンド膜の製造方法

Also Published As

Publication number Publication date
FR2693619A1 (fr) 1994-01-14
DE69308077D1 (de) 1997-03-27
FR2693619B1 (fr) 1994-10-07
EP0578580B1 (fr) 1997-02-12
DE69308077T2 (de) 1997-06-26
EP0578580A1 (fr) 1994-01-12

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