ES2105171T3 - Dispositivo de deposito electrolitico de un metal sobre un substrato flexible, debilmente conductor, procedimiento de deposito electrolitico y producto obtenido por medio de este procedimiento. - Google Patents

Dispositivo de deposito electrolitico de un metal sobre un substrato flexible, debilmente conductor, procedimiento de deposito electrolitico y producto obtenido por medio de este procedimiento.

Info

Publication number
ES2105171T3
ES2105171T3 ES93402390T ES93402390T ES2105171T3 ES 2105171 T3 ES2105171 T3 ES 2105171T3 ES 93402390 T ES93402390 T ES 93402390T ES 93402390 T ES93402390 T ES 93402390T ES 2105171 T3 ES2105171 T3 ES 2105171T3
Authority
ES
Spain
Prior art keywords
procedure
electrolytic deposit
metal
product obtained
flexible substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES93402390T
Other languages
English (en)
Inventor
Renaud Jolly
Jacques Legrand
Cornelia Petrescu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Application granted granted Critical
Publication of ES2105171T3 publication Critical patent/ES2105171T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing of the conductive pattern
    • H05K3/241—Reinforcing of the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
    • H05B2203/006—Heaters using a particular layout for the resistive material or resistive elements using interdigitated electrodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

LA PRESENTE INVENCION CONCIERNE A UN DISPOSITIVO DE DEPOSITO ELECTROLITICO DE UN METAL SOBRE UN SUBSTRATO LIGERO ESCASAMENTE CONDUCTOR, UN PROCESO DE DEPOSITO Y UN PRODUCTO OBTENIDO POR ESTE PROCESO. EL OBJETO DE LA INVENCION ES REALIZAR UN DISPOSITIVO DE DEPOSITO QUE FUNCIONA DE MODO SEMICONTINUO. ESTE OBJETO ES ALCANZADO CON LA AYUDA DE UN DISPOSITIVO QUE COMPRENDE: UNA MASCARA (13'') CORONADA POR UN SEGUNDO ELECTRODO (7''), Y UNOS MEDIOS MOTORES (17'') QUE PERMITEN DESPLAZAR LA MASCARA (13'') DE FORMA PARA QUE REPOSE CONTRA EL SUBSTRATO (9) DURANTE EL DEPOSITO DE METAL. EL PRODUCTO OBTENIDO PUEDE SER UN ELEMENTO DE CALENTAMIENTO.
ES93402390T 1992-10-05 1993-09-30 Dispositivo de deposito electrolitico de un metal sobre un substrato flexible, debilmente conductor, procedimiento de deposito electrolitico y producto obtenido por medio de este procedimiento. Expired - Lifetime ES2105171T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9211766A FR2696478B1 (fr) 1992-10-05 1992-10-05 Procédé de dépôt électrolytique d'un métal sur un substrat souple faiblement conducteur, dispositif de dépôt électrolytique permettant la réalisation de ce procédé et produit obtenu par ce procédé.

Publications (1)

Publication Number Publication Date
ES2105171T3 true ES2105171T3 (es) 1997-10-16

Family

ID=9434139

Family Applications (1)

Application Number Title Priority Date Filing Date
ES93402390T Expired - Lifetime ES2105171T3 (es) 1992-10-05 1993-09-30 Dispositivo de deposito electrolitico de un metal sobre un substrato flexible, debilmente conductor, procedimiento de deposito electrolitico y producto obtenido por medio de este procedimiento.

Country Status (7)

Country Link
US (1) US5395508A (es)
EP (1) EP0592285B1 (es)
JP (1) JPH06212488A (es)
DE (1) DE69311776T2 (es)
DK (1) DK0592285T3 (es)
ES (1) ES2105171T3 (es)
FR (1) FR2696478B1 (es)

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* Cited by examiner, † Cited by third party
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US6197180B1 (en) 1996-02-09 2001-03-06 Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College High aspect ratio, microstructure-covered, macroscopic surfaces
US6027630A (en) 1997-04-04 2000-02-22 University Of Southern California Method for electrochemical fabrication
PL344993A1 (en) * 1998-06-16 2001-11-19 Intelligent Safety Dev Device for individual protection against mechanical, electrical or thermal risks
TWI227285B (en) * 2001-10-15 2005-02-01 Univ Southern California Methods of and apparatus for producing a three-dimensional structure
WO2003049514A2 (en) 2001-12-03 2003-06-12 Memgen Corporation Miniature rf and microwave components and methods for fabricating such components
US9614266B2 (en) 2001-12-03 2017-04-04 Microfabrica Inc. Miniature RF and microwave components and methods for fabricating such components
US20030168344A1 (en) * 2002-03-08 2003-09-11 Applied Materials, Inc. Selective metal deposition for electrochemical plating
US6991717B2 (en) * 2002-04-05 2006-01-31 3M Innovative Properties Company Web processing method and apparatus
US20040065555A1 (en) * 2002-05-07 2004-04-08 University Of Southern California Conformable contact masking methods and apparatus utilizing in situ cathodic activation of a substrate
US7368044B2 (en) * 2002-11-26 2008-05-06 Microfabrica, Inc. Non-conformable masks and methods and apparatus for forming three-dimensional structures
US8613846B2 (en) * 2003-02-04 2013-12-24 Microfabrica Inc. Multi-layer, multi-material fabrication methods for producing micro-scale and millimeter-scale devices with enhanced electrical and/or mechanical properties
US10416192B2 (en) 2003-02-04 2019-09-17 Microfabrica Inc. Cantilever microprobes for contacting electronic components
US10297421B1 (en) 2003-05-07 2019-05-21 Microfabrica Inc. Plasma etching of dielectric sacrificial material from reentrant multi-layer metal structures
US9671429B2 (en) 2003-05-07 2017-06-06 University Of Southern California Multi-layer, multi-material micro-scale and millimeter-scale devices with enhanced electrical and/or mechanical properties
WO2004101857A2 (en) * 2003-05-07 2004-11-25 Microfabrica Inc. Methods and apparatus for forming multi-layer structures using adhered masks
US10641792B2 (en) 2003-12-31 2020-05-05 University Of Southern California Multi-layer, multi-material micro-scale and millimeter-scale devices with enhanced electrical and/or mechanical properties
US7531203B2 (en) * 2005-01-06 2009-05-12 The Hong Kong Polytechnic University Method for the production of conductive flexible textile arrays
JP4769962B2 (ja) * 2006-03-22 2011-09-07 独立行政法人産業技術総合研究所 金属系微細構造物の作製方法及びその装置
US7655126B2 (en) * 2006-03-27 2010-02-02 Federal Mogul World Wide, Inc. Fabrication of topical stopper on MLS gasket by active matrix electrochemical deposition
US20080128019A1 (en) * 2006-12-01 2008-06-05 Applied Materials, Inc. Method of metallizing a solar cell substrate
EP2476784A1 (en) * 2011-01-18 2012-07-18 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Method for manufacturing an electronic device by electrodeposition from an ionic liquid
US9817440B2 (en) 2012-09-11 2017-11-14 L.I.F.E. Corporation S.A. Garments having stretchable and conductive ink
US10201310B2 (en) 2012-09-11 2019-02-12 L.I.F.E. Corporation S.A. Calibration packaging apparatuses for physiological monitoring garments
US10462898B2 (en) 2012-09-11 2019-10-29 L.I.F.E. Corporation S.A. Physiological monitoring garments
US8945328B2 (en) 2012-09-11 2015-02-03 L.I.F.E. Corporation S.A. Methods of making garments having stretchable and conductive ink
US11246213B2 (en) 2012-09-11 2022-02-08 L.I.F.E. Corporation S.A. Physiological monitoring garments
US10159440B2 (en) 2014-03-10 2018-12-25 L.I.F.E. Corporation S.A. Physiological monitoring garments
US9282893B2 (en) 2012-09-11 2016-03-15 L.I.F.E. Corporation S.A. Wearable communication platform
WO2015103620A1 (en) 2014-01-06 2015-07-09 Andrea Aliverti Systems and methods to automatically determine garment fit
EP3324831A1 (en) 2015-07-20 2018-05-30 L.I.F.E. Corporation S.A. Flexible fabric ribbon connectors for garments with sensors and electronics
EP3478174A1 (en) 2016-07-01 2019-05-08 L.I.F.E. Corporation S.A. Biometric identification by garments having a plurality of sensors
US11262383B1 (en) 2018-09-26 2022-03-01 Microfabrica Inc. Probes having improved mechanical and/or electrical properties for making contact between electronic circuit elements and methods for making
US12078657B2 (en) 2019-12-31 2024-09-03 Microfabrica Inc. Compliant pin probes with extension springs, methods for making, and methods for using

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3723283A (en) * 1970-12-23 1973-03-27 Select Au Matic Selective plating system
US4409924A (en) * 1982-07-01 1983-10-18 National Semiconductor Corporation Self-adjusting plating mask
GB2214930A (en) * 1988-02-11 1989-09-13 Twickenham Plating & Enamellin Mask for use in electriplating on elongate substrate

Also Published As

Publication number Publication date
JPH06212488A (ja) 1994-08-02
DE69311776T2 (de) 1998-01-08
EP0592285A1 (fr) 1994-04-13
US5395508A (en) 1995-03-07
DK0592285T3 (da) 1998-01-26
FR2696478B1 (fr) 1994-10-28
EP0592285B1 (fr) 1997-06-25
FR2696478A1 (fr) 1994-04-08
DE69311776D1 (de) 1997-07-31

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