ES2109558T3 - Metodo de impedir el agotamiento de los baños acidos de chapeado con cobre y para recuperar cobre metalico de disoluciones y lodos que contienen cobre en forma ionica. - Google Patents

Metodo de impedir el agotamiento de los baños acidos de chapeado con cobre y para recuperar cobre metalico de disoluciones y lodos que contienen cobre en forma ionica.

Info

Publication number
ES2109558T3
ES2109558T3 ES94111036T ES94111036T ES2109558T3 ES 2109558 T3 ES2109558 T3 ES 2109558T3 ES 94111036 T ES94111036 T ES 94111036T ES 94111036 T ES94111036 T ES 94111036T ES 2109558 T3 ES2109558 T3 ES 2109558T3
Authority
ES
Spain
Prior art keywords
copper
exhaustion
copped
dissolutions
ionic form
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES94111036T
Other languages
English (en)
Inventor
Leandro Taboga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Laboratori Taboga di Taboga Leandro
Original Assignee
Laboratori Taboga di Taboga Leandro
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Laboratori Taboga di Taboga Leandro filed Critical Laboratori Taboga di Taboga Leandro
Application granted granted Critical
Publication of ES2109558T3 publication Critical patent/ES2109558T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S204/00—Chemistry: electrical and wave energy
    • Y10S204/13—Purification and treatment of electroplating baths and plating wastes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S210/00—Liquid purification or separation
    • Y10S210/902—Materials removed
    • Y10S210/911—Cumulative poison
    • Y10S210/912—Heavy metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Removal Of Specific Substances (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemically Coating (AREA)

Abstract

METODO PARA EVITAR LA EXHAUSTACION DE BAÑOS (12) DE METALIZACION DE COBRE ACIDO Y PARA TRATAR AGUAS RESIDUALES O SEDIMENTOS (20) QUE CONTIENEN COBRE EN UNA FORMA IONICA, PARA RECUPERAR COBRE METALICO (39), INCLUYENDO EL METODO LA ADICION (11) DE UN COMPUESTO QUE MANTIENE LA CONCENTRACION DE HIERRO POR DEBAJO DE UN VALOR CRITICO (POR EJEMPLO, 60 GRS/LT), ORIGINANDO EL COMPUESTO LA PRECIPITACION DEL HIERRO EN FORMA DE SULFATO FERROSO, Y EVITANDO ASI LA CODEPOSICION DE CRISTALES DE SULFATO FERROSO Y SULFATO DE COBRE, CON UNA POSIBLE INCORPORACION DE IMPUREZAS ORGANICAS, TALES COMO ESTEARATOS (35), PRESENTES EN LOS BAÑOS (12) DE METALIZACION DE COBRE ACIDO.
ES94111036T 1993-07-29 1994-07-15 Metodo de impedir el agotamiento de los baños acidos de chapeado con cobre y para recuperar cobre metalico de disoluciones y lodos que contienen cobre en forma ionica. Expired - Lifetime ES2109558T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITUD930148A IT1262169B (it) 1993-07-29 1993-07-29 Procedimento per la prevenzione dell'esaurimento dei bagni acidi di ramatura e per il recupero di rame metallico da soluzioni e fanghi contenenti rame in forma ionica

Publications (1)

Publication Number Publication Date
ES2109558T3 true ES2109558T3 (es) 1998-01-16

Family

ID=11421348

Family Applications (1)

Application Number Title Priority Date Filing Date
ES94111036T Expired - Lifetime ES2109558T3 (es) 1993-07-29 1994-07-15 Metodo de impedir el agotamiento de los baños acidos de chapeado con cobre y para recuperar cobre metalico de disoluciones y lodos que contienen cobre en forma ionica.

Country Status (7)

Country Link
US (1) US5599458A (es)
EP (1) EP0636708B1 (es)
AT (1) ATE159301T1 (es)
DE (1) DE69406215T2 (es)
ES (1) ES2109558T3 (es)
GR (1) GR3025210T3 (es)
IT (1) IT1262169B (es)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI228104B (en) * 2003-07-29 2005-02-21 Min-Shing Tsai Sludge-free wastewater treatment process and apparatus
CN102259994B (zh) * 2008-04-28 2012-11-14 重庆华浩冶炼有限公司 电解铜粉废液的处理方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE623658C (es) *
US2754174A (en) * 1956-07-10 Treatment of salt solutions to
DE157184C (es) *
US4176160A (en) * 1971-06-23 1979-11-27 Societe De Prayon Process for purifying a zinc sulfate solution
DE2623658A1 (de) * 1976-05-24 1977-12-15 Schering Ag Verfahren zur gewinnung von kupfer (ii)-sulfat aus kupfersalzhaltigen aetzloesungen
SU753927A1 (ru) * 1978-07-19 1980-08-07 Химико-Металлургический Институт Ан Казахской Сср Способ переработки медного электролита электролизом
US4324629A (en) * 1979-06-19 1982-04-13 Hitachi, Ltd. Process for regenerating chemical copper plating solution
DD157184A1 (de) * 1981-01-07 1982-10-20 Guenter Reiche Verfahren zur aufbereitung und nutzbarmachung von kupferaetzrueckstaenden
JPS59162108A (ja) * 1983-03-03 1984-09-13 Tadao Nagai 硫酸溶液の浄液法
US4549946A (en) * 1984-05-09 1985-10-29 Electrochem International, Inc. Process and an electrodialytic cell for electrodialytically regenerating a spent electroless copper plating bath
US4600493A (en) * 1985-01-14 1986-07-15 Morton Thiokol, Inc. Electrodialysis apparatus for the chemical maintenance of electroless copper plating baths
US5059403A (en) * 1990-12-03 1991-10-22 Compeq Manufacturing Co., Ltd. Method for producing copper sulfate from waste copper-containing liquid
US5266212A (en) * 1992-10-13 1993-11-30 Enthone-Omi, Inc. Purification of cyanide-free copper plating baths

Also Published As

Publication number Publication date
ITUD930148A0 (it) 1993-07-29
US5599458A (en) 1997-02-04
DE69406215D1 (de) 1997-11-20
DE69406215T2 (de) 1998-05-28
EP0636708A1 (en) 1995-02-01
ITUD930148A1 (it) 1995-01-29
IT1262169B (it) 1996-06-19
EP0636708B1 (en) 1997-10-15
GR3025210T3 (en) 1998-02-27
ATE159301T1 (de) 1997-11-15

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