ES2119119T3 - Composiciones a base de poliorganosiloxanos reticulables por via cationica y su uso en el dominio de la antiadherencia de papel, para proteger fibras opticas y circuitos integrados. - Google Patents

Composiciones a base de poliorganosiloxanos reticulables por via cationica y su uso en el dominio de la antiadherencia de papel, para proteger fibras opticas y circuitos integrados.

Info

Publication number
ES2119119T3
ES2119119T3 ES94420079T ES94420079T ES2119119T3 ES 2119119 T3 ES2119119 T3 ES 2119119T3 ES 94420079 T ES94420079 T ES 94420079T ES 94420079 T ES94420079 T ES 94420079T ES 2119119 T3 ES2119119 T3 ES 2119119T3
Authority
ES
Spain
Prior art keywords
metal
linked
binding
electrons
cationica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES94420079T
Other languages
English (en)
Inventor
Christian Priou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhodia Chimie SAS
Original Assignee
Rhodia Chimie SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rhodia Chimie SAS filed Critical Rhodia Chimie SAS
Application granted granted Critical
Publication of ES2119119T3 publication Critical patent/ES2119119T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/55—Boron-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Polymers (AREA)
  • Paints Or Removers (AREA)
  • Paper (AREA)

Abstract

COMPOSICIONES A BASE DE UNA SILICONA RETICULABLE POR VIA CATIONICA Y DE UNA CANTIDAD CATALITICA DE UN BORATO DE COMPLEJO ORGANOMETALICO, BORATO CUYA ENTIDAD CATIONICA ES UNA SAL ORGANOMETALICA DE FORMULA (L1L2L3M)+Q DONDE . M REPRESENTA UN METAL DEL GRUPO 4 A 10 DE LA CLASIFICACION PERIODICA (CHEM&ENG.NEWS, VOL 63 N.5, 26 DEL 4 DE FEBRERO DE 1985) . L1 REPRESENTA 1 LIGANDO LIGADO AL METAL M POR ELECTRONES PI, LIGANDO ELEGIDO ENTRE LOS LIGANDOS ETA3-ALKILO, ETA5CICLOPENTADIENILO Y ETA7-CICLOHEPTATRIENILO Y LOS COMPUESTOS ETA6-AROMATICOS; . L2 REPRESENTA 1 LIGANDO LIGADO AL METAL M POR ELECTRONES PI, LIGANDO ELEGIDO ENTRE LOS LIGANDOS ETA7CICLOPENTATRIENILO Y LOS COMPUESTOS ETA6-AROMATICOS; . L3 REPRESENTA DE 0 A 3 LIGANDOS IDENTICOS O DIFERENTES LIGADOS AL METAL M POR ELECTRONES SIGMA,LIGANDO(S) ELEGIDO(S) ENTRE CO Y NO2+: SIENDO LA CARGA ELECTRONICA TOTAL Q DEL COMPLEJO IGUAL A +1 O +2; Y CUYA ENTIDAD CATIONICA DE BORATO TIENE POR FORMULA [B XA RB]DONDE OS QUE VAN DE 0 A 4 CON A + B = 4, N:. UN ATOMO DE HALOGENO CON A = 0 A 3 . UNA FUNCION OH CON A = 0 A 2 TA UN RADICAL . FENILO SUSTITUIDO POR AL MENOS UN ELEMENTOS O UN GRUPO ELECTROATRAYENTE . ARILO QUE CONTIENEN AL MENOS DOS NUCLEOS AROMATICOS, EVENTUALMENTE SUSTITUIDO POR AL MENOS UN ELEMENTO O UN GRUPO ELECTROATRAYENTE. ESTAS COMPOSICIONES PUEDEN SER UTILIZADAS EN CAPA DELGADA PARA LA REALIZACION DE REVESTIMIENTOS ANTIADHESIVOS O EN CAPA ESPESA PARA EL ENVAINADO DE LAS FIBRAS OPTICAS O LA PROTECCION DE CIRCUITOS IMPRESOS EN ELECTRONICA.
ES94420079T 1993-03-10 1994-03-09 Composiciones a base de poliorganosiloxanos reticulables por via cationica y su uso en el dominio de la antiadherencia de papel, para proteger fibras opticas y circuitos integrados. Expired - Lifetime ES2119119T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9302749A FR2702485B1 (fr) 1993-03-10 1993-03-10 Compositions à base de polyorganosiloxanes réticulables par voie cationique et leur utilisation dans le domaine de l'antiadhérence papier, de la protection des fibres optiques et des circuits imprimés.

Publications (1)

Publication Number Publication Date
ES2119119T3 true ES2119119T3 (es) 1998-10-01

Family

ID=9444821

Family Applications (1)

Application Number Title Priority Date Filing Date
ES94420079T Expired - Lifetime ES2119119T3 (es) 1993-03-10 1994-03-09 Composiciones a base de poliorganosiloxanos reticulables por via cationica y su uso en el dominio de la antiadherencia de papel, para proteger fibras opticas y circuitos integrados.

Country Status (4)

Country Link
EP (1) EP0614958B1 (es)
DE (1) DE69410661T2 (es)
ES (1) ES2119119T3 (es)
FR (1) FR2702485B1 (es)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2724660B1 (fr) * 1994-09-16 1997-01-31 Rhone Poulenc Chimie Amorceurs de reticulation, par voie cationique, de polymeres a groupements organofonctionnels, compositions a base de polyorganosiloxanes reticulables et contenant ces amorceurs et application desdites compositions en antiadherence
FR2757529B1 (fr) * 1996-12-24 1999-03-05 Rhodia Chimie Sa Compositions stables a base de polyorganosiloxanes a groupements fonctionnels reticulables et leur utilisation pour la realisation de revetements anti-adherents
FR2757530A1 (fr) * 1996-12-24 1998-06-26 Rhodia Chimie Sa Utilisation pour la stereophotolithographie - d'une composition liquide photoreticulable par voie cationique comprenant un photoamorceur du type sels d'onium ou de complexes organometalliques
FR2757870B1 (fr) * 1996-12-30 1999-03-26 Rhodia Chimie Sa Utilisation de compositions silicones reticulables par voie cationique sous uv et d'un photoamorceur du type borate d'onium, pour le revetements de joints plats, notamment de joints de culasse
US6587628B1 (en) 1999-11-22 2003-07-01 3M Innovative Properties Company Optical fiber with improved strength in high humidity/high temperature environments
DE60315103T2 (de) * 2002-10-11 2008-04-10 Rohm And Haas Co. Verfahren zur Verbesserung von Viskosität von Verdickungsmitteln für wässrige Systeme
JO3598B1 (ar) 2006-10-10 2020-07-05 Infinity Discovery Inc الاحماض والاسترات البورونية كمثبطات اميد هيدروليز الحامض الدهني
TW201000107A (en) 2008-04-09 2010-01-01 Infinity Pharmaceuticals Inc Inhibitors of fatty acid amide hydrolase
MX361692B (es) 2010-02-03 2018-12-13 Infinity Pharmaceuticals Inc Inhibidores de amida hidrolasa de ácido graso.

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4370358A (en) * 1980-09-22 1983-01-25 General Electric Company Ultraviolet curable silicone adhesives
US5073476A (en) * 1983-05-18 1991-12-17 Ciba-Geigy Corporation Curable composition and the use thereof
US4952612A (en) * 1987-08-28 1990-08-28 Minnesota Mining And Manufacturing Company Energy-induced curable compositions
US5057358A (en) * 1990-03-23 1991-10-15 General Electric Company Uv-curable epoxy silicones
JP2545006B2 (ja) * 1990-07-03 1996-10-16 ザ ダウ ケミカル カンパニー 付加重合触媒
FR2688783A1 (fr) * 1992-03-23 1993-09-24 Rhone Poulenc Chimie Nouveaux borates d'onium ou de complexe organometallique amorceurs cationiques de polymerisation.

Also Published As

Publication number Publication date
FR2702485A1 (fr) 1994-09-16
DE69410661D1 (de) 1998-07-09
DE69410661T2 (de) 1998-12-10
EP0614958A1 (fr) 1994-09-14
EP0614958B1 (fr) 1998-06-03
FR2702485B1 (fr) 1995-04-14

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