ES2127183T3 - Cuerpo ceramico metalizado y metodo para fabricarlo. - Google Patents

Cuerpo ceramico metalizado y metodo para fabricarlo.

Info

Publication number
ES2127183T3
ES2127183T3 ES90400458T ES90400458T ES2127183T3 ES 2127183 T3 ES2127183 T3 ES 2127183T3 ES 90400458 T ES90400458 T ES 90400458T ES 90400458 T ES90400458 T ES 90400458T ES 2127183 T3 ES2127183 T3 ES 2127183T3
Authority
ES
Spain
Prior art keywords
ceramic body
layer
manufacture
substrate
metallic ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES90400458T
Other languages
English (en)
Inventor
Pierre Jalby
Frederic Rotman
Pierre Claverie
Juichi Arai
Maso Kimura
Jean-Marie Friedt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Application granted granted Critical
Publication of ES2127183T3 publication Critical patent/ES2127183T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
    • C04B41/5133—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal with a composition mainly composed of one or more of the refractory metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/42—Silicides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Structural Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Ceramic Products (AREA)

Abstract

ESTA INVENCION HACE REFERENCIA A UN CUERPO DE CERAMICA SINTETIZADA CUBIERTO DE UNA CAPA DE METAL O UNA ALEACION DE METAL Y UN METODO PARA FABRICARLO. SEGUN LA INVENCION ESTA CAPA METALIZADA SE DEPOSITA EN EL SUSTRATO MEDIANTE UN PROCESO CVD, EN EL QUE EL TUNGSTENO Y/O EL HALOGENURO DE MOLIBDENO REACCIONAN CON HIDRUROS DE SILICIO, ESTA CAPA METALICA ESTA ASI DEPOSITADA DIRECTAMENTE EN EL SUSTRATO, SIN NINGUNA CAPA INTERMEDIA ENTRE AMBAS. SE OBTIENEN RESISTENCIAS DE ENLACE MINIMAS DE 3.2. (MAS MENOS) 0,4 KG/MM (AL CUADRADO) .
ES90400458T 1990-02-20 1990-02-20 Cuerpo ceramico metalizado y metodo para fabricarlo. Expired - Lifetime ES2127183T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP90400458A EP0443277B1 (en) 1990-02-20 1990-02-20 Metallized ceramic body and method to make the same

Publications (1)

Publication Number Publication Date
ES2127183T3 true ES2127183T3 (es) 1999-04-16

Family

ID=8205684

Family Applications (1)

Application Number Title Priority Date Filing Date
ES90400458T Expired - Lifetime ES2127183T3 (es) 1990-02-20 1990-02-20 Cuerpo ceramico metalizado y metodo para fabricarlo.

Country Status (7)

Country Link
EP (1) EP0443277B1 (es)
JP (1) JPH04218674A (es)
KR (1) KR910015718A (es)
AT (1) ATE175179T1 (es)
CA (1) CA2036541A1 (es)
DE (1) DE69032867T2 (es)
ES (1) ES2127183T3 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118702507B (zh) * 2024-08-14 2024-12-20 湖南省新化县鑫星电子陶瓷有限责任公司 一种氧化铝陶瓷基片的表面金属化工艺

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2344642A1 (fr) * 1976-03-16 1977-10-14 Thomson Csf Procede de realisation de depots metalliques sur des supports en nitrure de bore
US4629635A (en) * 1984-03-16 1986-12-16 Genus, Inc. Process for depositing a low resistivity tungsten silicon composite film on a substrate
US4766006A (en) * 1986-05-15 1988-08-23 Varian Associates, Inc. Low pressure chemical vapor deposition of metal silicide
US4756927A (en) * 1986-05-29 1988-07-12 Massachusetts Institute Of Technology Method and apparatus for refractory metal deposition
EP0305143B1 (en) * 1987-08-24 1993-12-08 Fujitsu Limited Method of selectively forming a conductor layer

Also Published As

Publication number Publication date
EP0443277B1 (en) 1998-12-30
DE69032867D1 (de) 1999-02-11
EP0443277A1 (en) 1991-08-28
CA2036541A1 (en) 1991-08-21
DE69032867T2 (de) 1999-06-17
ATE175179T1 (de) 1999-01-15
JPH04218674A (ja) 1992-08-10
KR910015718A (ko) 1991-09-30

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