ES2136421T3 - Procedimiento galvanoplastico para formar chapados de niquel, cobalto, aleaciones de niquel o aleaciones de cobalto. - Google Patents

Procedimiento galvanoplastico para formar chapados de niquel, cobalto, aleaciones de niquel o aleaciones de cobalto.

Info

Publication number
ES2136421T3
ES2136421T3 ES96920744T ES96920744T ES2136421T3 ES 2136421 T3 ES2136421 T3 ES 2136421T3 ES 96920744 T ES96920744 T ES 96920744T ES 96920744 T ES96920744 T ES 96920744T ES 2136421 T3 ES2136421 T3 ES 2136421T3
Authority
ES
Spain
Prior art keywords
cobalt
nickel
alloys
pct
galvanoplastic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES96920744T
Other languages
English (en)
Inventor
Peter Torben Tang
Henrik Dylmer
Per Moller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of ES2136421T3 publication Critical patent/ES2136421T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

METODO DE ELECTRODEPOSICION PARA FORMACION DE REVESTIMIENTOS ELECTROLITICOS DE NIQUEL, COBALTO, ALEACIONES DE NIQUEL O ALEACIONES DE COBALTO, CON TENSIONES REDUCIDAS, EN UN BAÑO DE ELECTRODEPOSICION, DE TIPO: BAÑO DE WATT, BAÑO DE CLORURO O UNA COMBINACION DE LOS MISMOS, EMPLEANDO UN METODO DE ELECTRODEPOSICION PULSADA, CON PULSOS PERIODICOS INVERTIDOS Y UN ADITIVO DE NAFTALENO SULFONADO. DICHO METODO PERMITE DEPOSITAR REVESTIMIENTOS ELECTROLITICOS DE NIQUEL, COBALTO, ALEACIONES DE NIQUEL O COBALTO, SIN TENSIONES INTERNAS.
ES96920744T 1995-06-21 1996-06-20 Procedimiento galvanoplastico para formar chapados de niquel, cobalto, aleaciones de niquel o aleaciones de cobalto. Expired - Lifetime ES2136421T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DK199500706A DK172937B1 (da) 1995-06-21 1995-06-21 Galvanisk fremgangsmåde til dannelse af belægninger af nikkel, kobalt, nikkellegeringer eller kobaltlegeringer

Publications (1)

Publication Number Publication Date
ES2136421T3 true ES2136421T3 (es) 1999-11-16

Family

ID=8096605

Family Applications (1)

Application Number Title Priority Date Filing Date
ES96920744T Expired - Lifetime ES2136421T3 (es) 1995-06-21 1996-06-20 Procedimiento galvanoplastico para formar chapados de niquel, cobalto, aleaciones de niquel o aleaciones de cobalto.

Country Status (12)

Country Link
US (1) US6036833A (es)
EP (1) EP0835335B1 (es)
JP (1) JPH11507991A (es)
AT (1) ATE184332T1 (es)
AU (1) AU6188496A (es)
CA (1) CA2224382C (es)
DE (1) DE69604180T2 (es)
DK (1) DK172937B1 (es)
ES (1) ES2136421T3 (es)
GR (1) GR3031549T3 (es)
NO (1) NO320887B1 (es)
WO (1) WO1997000980A1 (es)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1044776B1 (en) 1999-03-17 2002-07-24 Sony DADC Austria AG Nickel plating of a mould using pulsating current
JP3423702B2 (ja) 2000-08-29 2003-07-07 創輝株式会社 金属めっき方法
DE10061186C1 (de) * 2000-12-07 2002-01-17 Astrium Gmbh Verfahren und Anordnung zur galvanischen Abscheidung von Nickel, Kobalt, Nickellegierungen oder Kobaltlegierungen mit periodischen Strompulsen und Verwendung des Verfahrens
JP4538959B2 (ja) * 2001-01-22 2010-09-08 日立金属株式会社 希土類系永久磁石の電気Ｎｉめっき方法
US6892002B2 (en) 2001-03-29 2005-05-10 Ibsen Photonics A/S Stacked planar integrated optics and tool for fabricating same
US6724067B2 (en) 2001-04-13 2004-04-20 Anadigics, Inc. Low stress thermal and electrical interconnects for heterojunction bipolar transistors
SE523309E (sv) * 2001-06-15 2010-03-02 Replisaurus Technologies Ab Metod, elektrod och apparat för att skapa mikro- och nanostrukturer i ledande material genom mönstring med masterelektrod och elektrolyt
DE10259362A1 (de) * 2002-12-18 2004-07-08 Siemens Ag Verfahren zum Abscheiden einer Legierung auf ein Substrat
GB0302222D0 (en) * 2003-01-31 2003-03-05 Univ Heriot Watt Stencil manufacture
CN1920105B (zh) 2003-10-22 2010-12-08 内克斯系统公司 用于对工件进行流体处理的方法和设备
US7727366B2 (en) * 2003-10-22 2010-06-01 Nexx Systems, Inc. Balancing pressure to improve a fluid seal
US20050283993A1 (en) * 2004-06-18 2005-12-29 Qunwei Wu Method and apparatus for fluid processing and drying a workpiece
US7329334B2 (en) * 2004-09-16 2008-02-12 Herdman Roderick D Controlling the hardness of electrodeposited copper coatings by variation of current profile
CN100441748C (zh) * 2004-10-26 2008-12-10 中国科学院兰州化学物理研究所 低应力、抗磨减摩梯度Ni-Co纳米合金镀层的制备方法
JP4678194B2 (ja) * 2005-02-02 2011-04-27 株式会社村田製作所 電子部品の製造方法、及び電子部品
US7425255B2 (en) * 2005-06-07 2008-09-16 Massachusetts Institute Of Technology Method for producing alloy deposits and controlling the nanostructure thereof using negative current pulsing electro-deposition
EP2381015B1 (en) 2005-08-12 2019-01-16 Modumetal, Inc. Compositionally modulated composite materials
US7615255B2 (en) * 2005-09-07 2009-11-10 Rohm And Haas Electronic Materials Llc Metal duplex method
US20100096850A1 (en) * 2006-10-31 2010-04-22 Massachusetts Institute Of Technology Nanostructured alloy coated threaded metal surfaces and methods of producing same
US20090283410A1 (en) * 2008-05-14 2009-11-19 Xtalic Corporation Coated articles and related methods
US20090286103A1 (en) * 2008-05-14 2009-11-19 Xtalic Corporation Coated articles and related methods
CA2730229C (en) 2008-07-07 2017-02-14 John D. Whitaker Property modulated materials and methods of making the same
US7951600B2 (en) 2008-11-07 2011-05-31 Xtalic Corporation Electrodeposition baths, systems and methods
KR100917610B1 (ko) * 2008-11-14 2009-09-17 한국에너지기술연구원 고체산화물 연료전지용 금속연결재의 코팅방법
US8545994B2 (en) * 2009-06-02 2013-10-01 Integran Technologies Inc. Electrodeposited metallic materials comprising cobalt
US8309233B2 (en) * 2009-06-02 2012-11-13 Integran Technologies, Inc. Electrodeposited metallic-materials comprising cobalt on ferrous-alloy substrates
US8367217B2 (en) * 2009-06-02 2013-02-05 Integran Technologies, Inc. Electrodeposited metallic-materials comprising cobalt on iron-alloy substrates with enhanced fatigue performance
EP3009532A1 (en) 2009-06-08 2016-04-20 Modumetal, Inc. Electrodeposited nanolaminate coatings and claddings for corrosion protection
US10030312B2 (en) * 2009-10-14 2018-07-24 Massachusetts Institute Of Technology Electrodeposited alloys and methods of making same using power pulses
EP2596150B1 (en) 2010-07-22 2020-06-17 Modumetal, Inc. Material and process for electrochemical deposition of nanolaminated brass alloys
US8425751B1 (en) 2011-02-03 2013-04-23 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Systems and methods for the electrodeposition of a nickel-cobalt alloy
CA2905536C (en) 2013-03-15 2023-03-07 Modumetal, Inc. Electrodeposited compositions and nanolaminated alloys for articles prepared by additive manufacturing processes
EP2971265A4 (en) 2013-03-15 2016-12-14 Modumetal Inc NICKEL CHROME NANOLAMINE COATING WITH HIGH HARDNESS
CA2905575C (en) 2013-03-15 2022-07-12 Modumetal, Inc. A method and apparatus for continuously applying nanolaminate metal coatings
HK1220741A1 (zh) 2013-03-15 2017-05-12 Modumetal, Inc. 纳米层压涂层
WO2016044720A1 (en) 2014-09-18 2016-03-24 Modumetal, Inc. A method and apparatus for continuously applying nanolaminate metal coatings
BR112017005534A2 (pt) 2014-09-18 2017-12-05 Modumetal Inc métodos de preparação de artigos por processos de eletrodeposição e fabricação aditiva
WO2016108077A1 (en) * 2014-12-31 2016-07-07 Essilor International (Compagnie Generale D'optique) Method of mirror coating an optical article and article thereby obtained
US9777386B2 (en) * 2015-03-19 2017-10-03 Lam Research Corporation Chemistry additives and process for cobalt film electrodeposition
CN105332029B (zh) * 2015-10-28 2017-08-25 西安科技大学 一种导电耐蚀钴锰尖晶石涂层的制备方法
RU2617470C1 (ru) * 2015-12-28 2017-04-25 Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университе имени Д. И. Менделеева (РХТУ им. Д. И. Менделеева) Способ электроосаждения покрытий никель-фосфор
EP3510185A1 (en) 2016-09-08 2019-07-17 Modumetal, Inc. Processes for providing laminated coatings on workpieces, and articles made therefrom
EP3509812B1 (en) 2016-09-09 2025-04-09 Modumetal, Inc. Manufacturing of molds by deposition of material layers on a workpiece, molds and articles obtained by said process
CN109963966B (zh) 2016-09-14 2022-10-11 莫杜美拓有限公司 用于可靠、高通量、复杂电场生成的系统以及由其生产涂层的方法
CN110114210B (zh) 2016-11-02 2022-03-04 莫杜美拓有限公司 拓扑优化的高界面填充结构
US11293272B2 (en) 2017-03-24 2022-04-05 Modumetal, Inc. Lift plungers with electrodeposited coatings, and systems and methods for producing the same
US11286575B2 (en) 2017-04-21 2022-03-29 Modumetal, Inc. Tubular articles with electrodeposited coatings, and systems and methods for producing the same
WO2019210264A1 (en) 2018-04-27 2019-10-31 Modumetal, Inc. Apparatuses, systems, and methods for producing a plurality of articles with nanolaminated coatings using rotation

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL72938C (es) * 1947-07-09
US3437568A (en) * 1966-07-18 1969-04-08 Electro Optical Systems Inc Apparatus and method for determining and controlling stress in an electroformed part
FR16632E (fr) * 1969-05-07 1913-03-18 Pestourie & Quentin Soc Soupape d'échappement libre
US3726768A (en) * 1971-04-23 1973-04-10 Atomic Energy Commission Nickel plating baths containing aromatic sulfonic acids
US3741234A (en) * 1971-04-26 1973-06-26 Liquid Controls Corp Valve
NL8105150A (nl) * 1981-11-13 1983-06-01 Veco Beheer Bv Werkwijze voor het vervaardigen van zeefmateriaal, verkregen zeefmateriaal, alsmede inrichting voor het uitvoeren van de werkwijze.
US5352266A (en) * 1992-11-30 1994-10-04 Queen'university At Kingston Nanocrystalline metals and process of producing the same

Also Published As

Publication number Publication date
JPH11507991A (ja) 1999-07-13
GR3031549T3 (en) 2000-01-31
AU6188496A (en) 1997-01-22
WO1997000980A1 (en) 1997-01-09
EP0835335A1 (en) 1998-04-15
DK172937B1 (da) 1999-10-11
NO975769L (no) 1997-12-08
DK70695A (da) 1996-12-22
CA2224382C (en) 2005-07-19
US6036833A (en) 2000-03-14
CA2224382A1 (en) 1997-01-09
DE69604180D1 (de) 1999-10-14
NO320887B1 (no) 2006-02-06
NO975769D0 (no) 1997-12-08
DE69604180T2 (de) 2000-03-09
EP0835335B1 (en) 1999-09-08
ATE184332T1 (de) 1999-09-15

Similar Documents

Publication Publication Date Title
GR3031549T3 (en) An electroplating method of forming platings of nickel, cobalt, nickel alloys or cobalt alloys
DE59902232D1 (de) Schichtverbundwerkstoff für gleitelemente und verfahren zu seiner herstellung
ES8606915A1 (es) Un procedimiento para aplicar por chapado electrolitico un acabado de cromo sobre un sustrato
GB2321647B (en) Electroplating baths and plating processes for nickel or nickel alloy
GB2218111A (en) Coating metallic substrates by the PVD process
GB1224680A (en) Electroplating a ductile zinc nickel alloy onto a metallic article
IT1215985B (it) Procedimento elettrochimico per la realizzazione di rivestimenti di cromo e metalli simili mediante corrente pulsante ad inversione periodica della polarita'
KR850002850A (ko) 아연-니켈 합금 전기 도금 강판의 후처리 방법
GB855695A (en) Composite chromium electroplate and method of making same
NO884475D0 (no) Elektrolytisk avsatte hoeykvalitets-kromsjikt.
GB1531081A (en) Method of manufacturing a reflecting mirror by electroplating
Zhang et al. Factors affecting internal stress in nickel deposited from sulfamate bath
Kollia et al. Preparation of Smooth and Hard Nickel Electrodeposits by Using Pulse Reversed Current
BR9006995A (pt) Processos de eletrodeposicao e deposicao de cromo,banho de eletrodeposicao de cromo de corrosao reduzida e composicao de reabastecimento para uso em um banho de deposicao de cromo
Sultan Application of pulse plating for Nickel electrodeposition from a formamide/water bath
Ohkubo et al. Electroplating of Nickel on Aluminum by Activation Using Periodic Reversal of Current
Herrmann Jr Chromium Plating
Thangavelu et al. Electroforming of nickel-tin-zinc alloy
Kupper et al. XPS and SEM studies of bright deposits from pulse and DC electroplating
Ravindran et al. Corrosion resistant Zn-Ni electrodeposits
Mircheva et al. The role of 2. 4 dichlor-5 sulfamoyl benzoic acid(CHT) during deposition and hard nickel plate from sulfamate electrolytes
Colombini Hard Chromium Plating by Means of Rectifiers With Pulsating Waves and Periodic Reversal of Polarity
Colombini Hard Chrome Using Rectifiers With Pulsed Waves With Periodic Polarity Reversal
Zaki et al. A quality zinc alloy plate: how to produce and evaluate it
Wake A New Dark Coloured Chromium Based Electrodeposit

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 835335

Country of ref document: ES